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GROUP 4 11-HUMSS B

Molecular
Geometry
BF3
NON-POLAR BF3 - Trigonal Planar: Boron
trifluoride
is acid
(BF3) is widely used as a Lew
che mic al rea ctions,
BeCl2 catalyst in var ious
lation, and
such as polymerization, alky
used in the
condensation reactions. It is
rma ceuticals,
production of plastics, pha
tura l che mic als. BF3 is also
and agricul
synthesis
used as a reagent in organic
ride (BeCl2) is
BeCl2 - Linear: Beryllium chlo and as a fluorinating agent.
as a cata lyst in org anic synthesis
primarily used production
use d in the
reactions. It is commonly
rma ceu tica ls, poly mer s, and other
of pha
chemicals. BeCl2 is also use
of beryllium metal and as a
d in the purification
precursor for other CH4 (CH4) is the
beryllium compounds. CH4 - Tetrahedral: Methane
ura l gas and is used as
main component of nat
for hea ting , coo king , and electricity
a fuel
dstock in

PCl5
: fee
PCl5 - Trigonal Bipyramidal generation. It is also use d as a
Phosphorus pentachloride duc tion of var ious che mic als, such as
the pro
(PCl5) is primarily used as a thane is an
methanol and hydrogen. Me
reagent in organic synthesis. orta nt gre enh ous e gas and is being
imp
It is commonly used in the explored as a potential ene
rgy source
conversion of carboxylic through pro ces ses like biog as pro duction and
in
acids to acid chlorides and methane hyd rate ext rac tion .
the pre par atio n of oth er
phosphorus compounds. PCl5
is also used as a chlorinating
agent in various chemical
reactions.

SF6 as an
afluoride (SF6) is widely used
SF6 - Octahedral: Sulfur hex pow er tran smis sion
tage
electrical insulator in high-vol
akers and switchgear. It has
equipment, such as circuit bre ing it
es and is non-flammable, mak

POLAR excellent dielectric properti


suitable for use in electrica
electronics industry for plas
l syst ems
ma etch
. SF6
ing
tracer gas in leak detectio
is
proc
n.
also
esse
used
s and
in the
as a

2 l4CCl4 - Square Planar: Carbon


CaF CCtetrachloride (CCl4) has been widely used
in the past as a solvent for cleaning and
CaF2 - BENT: As mentioned degreasing. However, due to its harmful
earlier, CaF2-BENT is effects on human health and the
commonly used as a drilling environment, its use has been significantly
fluid additive in the oil and reduced. It is now primarily used in
gas industry to improve fluid laboratory settings as a reagent and
properties, stabilize the solvent for certain chemical reactions.
wellbore, and prevent
formation damage.

NH3- Trigonal Pyramidal: NH3, also known as ammonia, has


NH3 rs,
in the production of fertilize
various uses. It is widely used also used as a refr iger ant,
es. It is
cleaning agents, and explosiv indu stry, and as a cleaning
in the pha rma ceu tica l
a precursor

TeF6
.
agent in household products

CliF5 ClF5 - Square Pyramidal:


TeF6 - Octahedral: Tellurium hexafluoride
(TeF6) is primarily used in the
5) is semiconductor industry as a precursor for
Chlorine pentafluoride (ClF the deposition of thin films of tellurium.
g age nt and is
a strong oxidizin These films are used in the manufacturing
used in the chemical industry of electronic devices, such as transistors
can
for various applications. It and solar cells. TeF6 is also used in the
nt
be used as a fluorinating age production of specialty chemicals and as a
in organic synthesis to fluorinating agent in organic synthesis.
introduce fluorine atoms into
the
molecules. It is also used in
produc tion of spe cial ty Members:
chemicals and as a rocket Bonaobra, Revillosa, Mejares, Casinao,
propellant.
Arcillas, Bernardo, Arizala, Misa

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