Editor-in-Chief Associate editors

M. Paolone T. Funabashi P. Panciatici

Swiss Federal Institute of Technology Nagoya University, Nagoya, Japan RtE, France
(EPFL), Lausanne, Switzerland T. Gomez J.A. Peças Lopes
E-mail: mario.paolone@epfl.ch Universidad Pontificia Comillas, INESC TEC & FEUP, Porto, Portugal
Madrid, Spain
F. Pilo
Editors J.M.M. González
Università di Cagliari, Cagliari, Italy
Technical University of Denmark,
G. Chicco
Lyngby, Denmark J. Sun
Politecnico di Torino
X. Guillaud Rensselaer Polytechnic Institute,
Torino, Italy
Ecole Centrale de Lille, Lille, France Troy, New York, USA
E-mail: gianfranco.chicco@polito.it
D.J. Hill C.-W. Ten
C. Dent The University of Hong Kong, Michigan Technological University,
University of Edinburgh, Edinburgh, UK Hong Kong, China Houghton, MI, USA
M. Ilic V. Terzija
Carnegie Mellon University, University of Manchester, Manchester,
Pittsburgh, Pennsylvania, USA England, UK
J.-Y. Le Boudec
M. Thottan
École Polytechnique Fédérale de Lausanne
Bell Laboratories Alcatel-Lucent, Murray Hill,
(EPFL), Lausanne, Switzerland
New Jersey, USA
M. Liserre
Christian-Albrechts-Universität zu Kiel D.J. Van Hertem
(CAU), Kiel, Germany KU Leuven, Leuven, Belgium
S. Low L. Wehenkel
California Institute of Technology, Université de Liège, Liège, Belgium
Pasadena, California, USA
A. Wierman
R. Palma-Behnke California Institute of Technology,
Universidad de Chile, Chile Pasadena, California, USA

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