EE136: Lab 1

Introductory Class

Spring 2017
Wenhao Shi
 EE136 Lab Contents
Introductory Lab
MOS Capacitor Fabrication and
Characterization
MOS Capacitor simulation
Cleanroom Tour
 Objective
Laboratory Instruction 40%: Project 10%; Lab
performance and lab report (IEEE Transactions on
Electron Devices-type paper) 30%
Lab Report Due: 5:00pm Friday 06/12/2017 (pdf or
word file only)
Project Due: One-month project, pending on the
assignment date
Lab: Device simulation: via online simulation
www.nanohub.org. Device fabrication and
characterization: at BCOE Microelectronics
Laboratory (Rm. 1441, Pierce Hall).
Lab report: Your IEEE-type journal paper to include
device simulation results, device fabrication
procedures (you learned through course and
interactions with TA), device characterization results
and discussion of the results between simulation and
 Introductory Lab

Lab Safety Issues

Theory: MOS Capacitor
Device Fabrication Process
 Lab Safety: Dress for
Cleanroom

Head Cover
Face Mask and Hand Gloves
Body Gown (one piece)
Shoe Cover
 Lab Safety Training
http://ehs.ucr.edu/training/online/lso/ind
exlms.html
Lab Safety Training
Theory: MOS Capacitor

An MOS transistor is an MOS capacitor

with PN junctions at two ends.
Theory: MOS Capacitor
Theory: MOS Capacitor
Theory: MOS Capacitor
Device Fabrication Process

Substrate Cleaning Process

Photolithography
Photoresist coating
Mask Alignment
UV Exposure
Develop
Metal Deposition and Lift-of
Device Fabrication Process
Photoresist and Developer
 Device Fabrication Process
Basic Steps of
Photolithography: Etching
Device Fabrication Process

https://www.youtube.com/watch?
v=UvluuAIiA50#