BITS Pilani

Dubai Campus
VLSI DESIGN
(MEL G621)
Dr Jagadish Nayak
BITS Pilani
Dubai Campus
CMOS FABRICATION
BITS Pilani, Dubai Campus
p-well process
N-well process
The twin-tub
Silicon-on-insulator processes












Methods
BITS Pilani, Dubai Campus
N-well:
N-well is made in P-substrate.
Where, N-well acts as substrate/ body for PMOS,
NMOS uses the main P-substrate as it body(usual)

P-well:
P-well is made in N-substrate.
Where, P-well acts as substrate/ body for NMOS,
PMOS uses the main N-substrate as it body(usual)

Twin tub:
Two tubs (well) are used both N-well and P-well.
threshold voltage and body effect parameters can be individually optimized here.
SOI:
wells are not digged. Instead Islands are developed and various layers are
Formed further. (field inversion, latch up and body effect problems doesnt occur).

Methods
BITS Pilani, Dubai Campus
Structure consist of n-type substrate in which p-devices may
be formed by suitable masking and diffusion.
Diffusion must be carried in special care since p-well doping
concentration and depth will effect the threshold voltages.

P-well process
BITS Pilani, Dubai Campus

P-well Process
BITS Pilani, Dubai Campus

P-well Process
BITS Pilani, Dubai Campus
P-well process