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Chapter 5, Diffusion
What is diffusion?
Diffusion is material transport by atomic motion.
Chapter 5, Diffusion
(Heat)
Before
After
Chapter 5, Diffusion
Before
Vacancy migration
After
Chapter 5, Diffusion
Interstitial atom
after jump
Chapter 5, Diffusion
Diffusion Flux
The flux of diffusing atoms, J, is used to quantify
how fast diffusion occurs. The flux is defined as
either the number of atoms diffusing through unit area
per unit time (atoms/m2-second) or the mass of atoms
diffusing through unit area per unit time, (kg/m2second).
For example, for the mass flux we can write
J = M / At (1/A) (dM/dt) (Kg m-2 s-1)
where M is the mass of atoms diffusing through the
area A during time t.
J
A
Chapter 5, Diffusion
Steady-State Diffusion
Steady state diffusion: the diffusion flux does not
change with time.
Concentration
profile:
concentration
of
atoms/molecules of interest as function of position in
the sample.
Concentration gradient: dC/dx (Kg m-4): the slope
at a particular point on concentration profile.
dC C C A C B
=
dx x x A x B
Chapter 5, Diffusion
dC
J = D
dx
Chapter 5, Diffusion
dC
J = D
dx
Why do the random jumps of atoms result in a flux of
atoms from regions of high concentration towards the
regions of low concentration?
Chapter 5, Diffusion
C
C
2C
=
D
=D
x 2
t
x x
Solution of this equation is concentration profile as
function of time, C(x,t):
Chapter 5, Diffusion
10
C
C
=D
t
x 2
2
Chapter 5, Diffusion
11
Energy
Em Vacancy
Atom
Distance
Chapter 5, Diffusion
12
R j = R 0 exp m
k
T
B
Chapter 5, Diffusion
13
P = z exp v
k
T
B
z is coordination number
(number of atoms adjacent to
the vacancy)
R j = R 0 exp E m
k
T
B
E
exp QV
=
D zR0 a 2 exp m
k BT
k BT
(E + Q V ) = D exp Q d
= D 0 exp m
0
k
T
k
T
B
B
Chapter 5, Diffusion
14
dC
J = D
dx
D = D 0 exp d
RT
Qd 1
ln D = ln D0
R T
Qd 1
or log D = log D0
2.3R T
Chapter 5, Diffusion
15
b = logD0
a=
y = ax + b
Qd
2.3R
x = 1/T
Qd 1
log D = log D0
2.3R T
log D1 log D 2
Qd = 2.3R
1 T1 1 T2
MSE 2090: Introduction to Materials Science
Chapter 5, Diffusion
16
logD = logD0
Qd 1
2.3R T
Chapter 5, Diffusion
17
Interstitial
diffusion
mechanism
Impurity
C in FCC Fe
23
138
C in BCC Fe
1.1
87
N in FCC Fe
0.34
145
N in BCC Fe
0.47
77
H in FCC Fe
0.63
43
H in BCC Fe
0.12
15
Vacancy
diffusion
mechanism
Fe in FCC Fe
65
279
Fe in BCC Fe
410
246
Ni in Cu
230
242
180000
460
Si in Si
Chapter 5, Diffusion
18
transform data
ln D
Temp = T
1/T
Qd 1
ln D = ln D0
R T
Q
D = D 0 exp d
k BT
Qd
lnD2 = lnD0
R
1
T2
and
Qd
lnD1 = lnD0
R
Qd
D2
=
lnD2 lnD1 = ln
D1
R
MSE 2090: Introduction to Materials Science
1
T1
1 1
T2 T1
Chapter 5, Diffusion
19
Q
D
ln 2 = d
D1
R
1 1
T2 T1
Qd
D2 = D1 exp
R
1 1
T2 T1
Chapter 5, Diffusion
20
Chapter 5, Diffusion
21
Chapter 5, Diffusion
22
Chapter 5, Diffusion
23
Chapter 5, Diffusion
24
silicon
3. Result: Doped
semiconductor
regions.
2. Heat it.
silicon
MSE 2090: Introduction to Materials Science
Chapter 5, Diffusion
25
Summary
Make sure you understand language and concepts:
Activation energy
Concentration gradient
Diffusion
Diffusion coefficient
Diffusion flux
Driving force
Ficks first and second laws
Interdiffusion
Interstitial diffusion
Self-diffusion
Steady-state diffusion
Nonsteady-state diffusion
Temperature dependence of D
Vacancy diffusion
Chapter 5, Diffusion
26
Chapter 5, Diffusion
27