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All-Inorganic Light-Emitting Diodes Based On Solution-Processed Nontoxic and Earth-Abundant Nanocrystals
All-Inorganic Light-Emitting Diodes Based On Solution-Processed Nontoxic and Earth-Abundant Nanocrystals
3, MARCH 2013
325
I. I NTRODUCTION
326
Fig. 1.
0.4
Absorbance
0.3
0.2
0.1
0.0
200
400
600
800
0.2
0.0
Absorbance
1.5
400
1.0
0.5
0.0
300
600
800
Wavelength (nm)
(b)
Wavelength (nm)
(a)
2.0
ZnO nanoparticles
in 2-propanol
400
500
600
PL Intensity (a.u.)
Absorbance
NiO thin-film
0.4
0.5
327
0.25
0.20
Ni(OH)2 solution
was spun at
6000 rpm
5000 rpm
4000 rpm
3000 rpm
0.15
0.10
0.05
0.00
Voltage (V)
(a)
700
Wavelength (nm)
(c)
Fig. 2. Optical absorption of (a) NiO thin-film and (b) ZnO nanoparticles in
2-propanol solution. (c) Optical absorption and PL spectra of Mn-doped ZnS
nanoparticles in chloroform solution.
(b)
Fig. 3. (a) Currentvoltage and (b) luminancevoltage plots of ITO/NiO/Mndoped ZnS/Al devices. Thickness of the NiO layer has been varied by varying
the speed during spun-cast film formation. Mn-doped ZnS nanoparticles were
spun from 10-mg/mL solution (1600 rpm).
0.1
0.0
0
10
10
0.2
10
10
-1
10
-2
10
-3
10
0.1
Voltage (V)
Voltage (V)
(a)
(b)
10
10
Mn-doped ZnS
nanoparticles
were spun at
10 mg/mL
20 mg/mL
30 mg/mL
40 mg/mL
10
10
-1
10
-3
-4
-3
-2
10
10
with ZnO
without ZnO
-1
10
-2
10
-3
10
10
Fig. 5.
Luminance versus voltage plots of ITO/NiO/Mn-doped ZnS/Al
devices with and without a thin-film of n-ZnO as an electron-transporting
layer, that is, (1) ITO/NiO/Mn-doped ZnS/n-ZnO/Al and (2) ITO/NiO/Mndoped ZnS/Al devices.
10
10
10
Voltage (V)
-2
-5
0.1
10
10
EL Intensity (Cd/m )
328
-1
10
10
2
-17
10
(a)
-18
10
-19
10
-7
1x10
-7
-7
2x10
EL Intensity (a.u.)
-16
10
J/E (A m /V )
329
2.5 V
3.0 V
3.5 V
4.0 V
-7
3x10
4x10
(a)
ITO / NiO / Mn-doped ZnS / Al
without n-ZnO
with n-ZnO
-16
10
e-
10
NiO
ITO
-3.2 eV
Mn- -4.3 eV
doped
-5.4 eV ZnS
J/F (A m /V )
(b)
e-
-1.6 eV
-17
-6.8 eV
-18
10
Al
nZnO
-7
1x10
-7
2x10
-7
3x10
A thin-film of
Mn-doped ZnS
nanoparticles
400
-7.7 eV
500
600
700
Wavelength (nm)
-19
10
PL Intensity (a.u.)
1/E (m/V)
-7
4x10
1/E (m/V)
(b)
Fig. 6. FowlerNordheim plots, that is, plots of ln (J /E 2 ) versus 1/E,
for devices (a) with and without hole-transport NiO layer and (b) with and
without electron-transport n-ZnO layer. Inset of (b) includes a band diagram
of ITO/NiO/Mn-doped ZnS/n-ZnO/Al sandwiched structure.
330
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