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Basic Layout Techniques
Basic Layout Techniques
Rahul Shukla
Advisor: Jaime Ramirez-Angulo
Spring 2005
Mixed Signal VLSI Lab
Klipsch School of Electrical and Computer Engineering
New Mexico State University
Outline
Transistor layout
Resistor Layout
Capacitor Layout
Common Centroid and Inter-digitization Techniques
Example layouts
Pad Frame
Transistor layout
NMOS
1.5um/0.6um
S/D
D/S
PMOS
G
1.5um/0.6um
S/D
D/S
Transistor layout
A single large transistor layout is not a good idea !!!
To make a large transistor we split the large transistors and
connect them in parallel.
G
S
D
120um/1.8um
B
30um/1.8um
Generally
PMOS width (W) < 50m/1.8m
NMOS width (W) < 30m/1.8m
B
B
30um/1.8um 30um/1.8um
B
30um/1.8um
Transistor layout
G
120um/1.8um
S/D
D/S
Transistor layout
S
150m/1.05m
D
S
Resistor layout
Resistor value is calculated using R=Rs (L/W) where Rs is sheet
resistance of ELEC layer and its value in AMI 0.5m process is
1024/ L and W are length and width of resistor.
Resistor is implemented using a POLY2 layer or ELEC as it is
called in Cadence.
A High-Res layer is also used as a layer ID.
Use minimum W of ELEC to calculate length of ELEC layer
Value of W and L calculated using formula is an approximate
value. To get a value close enough to desired value, layout the
resistor, extract the layout using the extractor tool in Cadence and
and see the value in extracted view of your cell and change the size
of the resistor in layout view to get to a desired value. This, as we
can see is an iterative process.
Resistor layout
Example 5k resistor layout.
L
W
ELEC
M1_ELEC
Contact
Highres
Resistor layout
For laying out a big resistor it is recommended to split it into
series connection of small resistors.
E.g.: 25k using five 5k resistor layout. (note the 25k is not
a large value resistor)
Capacitor layout
Capacitor value is calculated using R=Cox W.L where Cox is
capacitance of oxide layer per unit area. Its value in AMI 0.5m
process is 2.4fF/m2, L and W are length and width of capacitor.
A parallel plate Capacitor is implemented using a POLY2 layer or
ELEC as it is called in Cadence and POLY layer. The two layer act
act as the parallel plate.
A cap-id layer can also be used as a layer ID.
Use minimum W=L so that a square capacitor implementation is
possible.
Value of W and L calculated using formula is an approximate value.
To get a value close enough to desired value, layout the capacitor,
extract the layout using the extractor tool in Cadence and see the
value in extracted view of your cell and accordingly change the size
of the capacitor in layout to get to a desired value. This, as we can
see is an iterative process.
Capacitor layout
Example 1pF capacitor layout.
M1_ELEC
contact
ELEC
POLY
M1_POLY
contact
Cross section
Oxide layer
Iout
W/L M1
M2 4W/L
B
W/L M1
W/L M21
W/L M22
W/L M23
W/L M24
S
D
B
W/L M1
S
1.01W/L M21 1.02W/L M22 1.03W/L M23
S
1.04W/L M24
Vdd
Vbias
Vin+
VinM3
M1
Differential pair
Mirror
M4
Vout
M5
M2
Differential Amplifier
B1
A2
A3
B2
B3
A4
B4
B1
B2
A2
A3
B3
B4
A4
M3
M4
M4
M3
M3
M4
M4
M3
M1
M2
M1 M1
M2
M1
Dummy capacitors
Example layouts
Use NTAP contact around transistors and try to use M2 for horizontal connections and M3
for vertical connections or vice versa.
Example layouts
Pad Frame
40 PINS
P pins are protected
pins
+ is VDD pin
- is VSS pin
Pins with no names
are bare pins.
It has a global
guard rings.
Guard rings
Pin # 1
Pin # 40