Supplementary Material

Preparation of the NiNPs/ITO Electrode

Ion implantation was carried out using a Beijing Normal University (BNU) metal
vapor vacuum arc (MEVVA) implanter. A piece of glass slide coated with an ITO film
(110 110 mm) was used as the substrate. The substrate was cleaned ultrasonically in
triply distilled water, ethanol and then again with triply distilled water for 5 min
before being used. Nickel ions with 10 KeV at a fluences of 1x10 17 ions cm-2 were
implanted onto the pretreated ITO surface, forming the NiNPs/ITO electrode. All of
the bare ITO and NiNP/ITO electrodes were washed with distilled water, dried with
nitrogen gas, and cut into pieces (A = 30 mm2) before being used.

Fig. S1 (A) Amperometric responses of the NiNPs/ITO electrode to 100 pM of insulin, glucose,
AA and UA in 0.1 M NaOH. (B) CV of NiNPs/ITO electrode in the presence of insulin and
interferences in 0.1 M NaOH. Scan rate: 100 mV s-1.

Fig. S2 Chronoamperometric responses of the NiNPs/ITO electrode in 0.1 M NaOH towards 5M

insulin.

Table S1 Determination of insulin in a Bovine insulin injection

Insulin added (pM)
0

Insulin found (pM)a

98.92.14b

Recovery (%)
-

100
200
400

99.32.20
99.3
204.22.52
102.1
405.23.37
101.3
a
Average of four determinations relative standard deviation.
b

The expected concentration of insulin claimed by the producer was 100 pM.