Reflection and Refraction at an Interface, Total Internal Reflection, Brewsters Angle

z k Refracted wave

n = 1 + i Vacuum n=1 k Incident wave

x k Reflected wave

incident wave: refracted wave: reflected wave:

(3.30a) (3.30b) (3.30c)

(1) All waves have the same frequency, , and |k| = |k| = c (2) The refracted wave has phase velocity V =
c = , thus k = |k| = c (1 + i) k n

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_ReflctnRefrctn_2007.ai

Boundary Conditions at an Interface

E and H components parallel to the interface must be continuous (3.32a) (3.32b) D and B components perpendicular to the interface must be continuous (3.32c) (3.32d)

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_BndryConditns.ai

Spatial Continuity Along the Interface

Continuity of parallel field components requires
(3.33) (3.34a) (3.34b)
n = 1 + i Vacuum n=1 k k sin

z k sin k k k sin x

Conclusions: Since k = k (both in vacuum)

(3.35a)

(3.36)

k = c and k = c/n = c sin = n sin

The angle of incidence equals the angle of reflection

(3.35b)

(3.38)

Snells Law, which describes refractive turning, for complex n.

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_SpatialContin.ai

Total External Reflection of Soft X-Rays and EUV Radiation

Snells law for a refractive index of n 1 , assuming that 0
(3.39) > + = 90

Consider the limit when

sin c 1= 1 2

(3.40)

Glancing incidence ( < c) and total external reflection

(3.41)
Exponential decay of the fields into the medium

The critical angle for total external reflection.

< c
ica Crit l ray

Totally reflected wave

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_TotalExtrnlRflc1.ai

Total External Reflection (continued)

(3.41)

(3.42a)

The atomic density na, varies slowly among the natural elements, thus to first order
(3.42b)

where f10is approximated by Z. Note that f10is a complicated function of wavelength (photon energy) for each element.

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_TotalExtrnlRflc2.ai

Total External Reflection with Finite b

Reflectivity (%)

Glancing incidence reflection as a function of /

1 Reflectivity A B C A: / = 0 B: / = 102 C: / = 101 D: / = 1 E: / = 3 E 1.5 /c 2 2.5 3

. . . for real materials

(a)
100 80 60 40 20 0 100 80 60 40 20 0 100 80 60 40 20 0 100 80 60 40 20 0 100

30 mr

Carbon (C)

80 mr Aluminum (Al)

0.5

Reflectivity (%)

(b)

30 mr 80 mr

D 0 0.5 1

Reflectivity (%)

(c)

Reflectivity (%)

finite / rounds the sharp angular dependence cutoff angle and absorption edges can enhance the sharpness note the effects of oxide layers and surface contamination

Aluminum Oxide (Al2O3) 80 mr (4.6) 30 mr (1.7) Gold (Au) 30 mr 80 mr Photon energy (eV)
1,000 10,000

(d)

Professor David Attwood Univ. California, Berkeley

(Henke, Gullikson, Davis)

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007 Ch03_TotalExtrnlReflc3.ai

The Notch Filter

Combines a glancing incidence mirror and a filter Modest resolution, E/E ~ 3-5 Commonly used
1.0

Mirror reflectivity (low-pass)

Absorption edge

Filter transmission (high-pass) Filter/reflector with response E/E 4

Photon energy

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_NotchFilter.ai

Reflection at an Interface
E0 perpendicular to the plane of incidence (s-polarization) tangential electric fields continuous (3.43) tangential magnetic fields continuous (3.44)
n = 1 + i n=1 H H cos E z H

H cos

x E H H cos

(3.45) Snells Law: Three equations in three unknowns , E0 , ) (for given E0 and ) (E0

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_ReflecInterf1.ai

Reflection at an Interface (continued)

E0 perpendicular to the plane of incidence (s-polarization) (3.47)

(3.46) The reflectivity R is then (3.48) With n = 1 for both incident and reflected waves,

Which with Eq. (3.46) becomes, for the case of perpendicular (s) polarization (3.49)

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_ReflecInterf2.ai

Normal Incidence Reflection at an Interface

Normal incidence ( = 0) (3.49)

For n = 1 + i

Which for << 1 and << 1 gives the reflectivity for x-ray and EUV radiation at normal incidence ( = 0) as (3.50) Example: Nickel @ 300 eV (4.13 nm) From table C.1, p. 433 f10= 17.8 f20= 7.70 = 0.0124 = 0.00538

R = 4.58 105

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_NormIncidReflc.ai

Glancing Incidence Reflection (s-polarization)

(3.49) For where
Reflectivity 0.5 E 1.5 /c 2 2.5 3 A B C

A: / = 0 B: / = 102 C: / = 101 D: / = 1 E: / = 3

For n = 1 + i

D 0 0 0.5 1

E. Nhring, Die Totalreflexion der Rntgenstrahlen, Physik. Zeitstr. XXXI, 799 (Sept. 1930).

Professor David Attwood Professor David AST 210/EECS 213Attwood Univ. California, Berkeley Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_GlancIncidReflc.ai

Reflection at an Interface
E0 perpendicular to the plane of incidence (p-polarization) (3.54) (3.55) The reflectivity for parallel (p) polarization is (3.56) which is similar in form but slightly different from that for s-polarization. For = 0 (normal incidence) the results are identical.
n = 1 + i n=1 E cos E H H E cos E z E H E cos x

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_ReflecInterf3.ai

Brewsters Angle for X-Rays and EUV

For p-polarization (3.56) There is a minimum in the reflectivity where the numerator satisfies (3.58) Squaring both sides, collecting like terms involving B, and factoring, one has or the condition for a minimum in the reflectivity, for parallel polarized radiation, occurs at an angle given by (3.59) For complex n, Brewsters minimum occurs at or
Professor David Attwood Univ. California, Berkeley

k n = 1 + i n=1 k B
E
0
E 0

90

sin2 radiation pattern

1 Reflectivity 102 104 106 0 S P W 4.48 nm 45 90 Incidence angle,

(Courtesy of J. Underwood)
Ch03_BrewstersAngle.ai

(3.60)

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

E 0 =

Focusing with Curved, Glancing Incidence Optics

The Kirkpatrick-Baez mirror system

(Courtesy of J. Underwood)

Two crossed cylinders (or spheres) Astigmatism cancels Fusion diagnostics Common use in synchrotron radiation beamlines See hard x-ray microprobe, chapter 4, figure 4.14

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_FocusCurv.ai

0 0 Determining f1 and f2

f20 easily measured by absorption f10 difficult in SXR/EUV region Common to use Kramers-Kronig relations
(3.85a)

(3.85b)

as in the Henke & Gullikson tables (pp. 428-436) Possible to use reflection from clean surfaces; Soufli & Gullikson With diffractive beam splitter can use a phase-shifting interferometer; Chang et al. Bi-mirror technique of Joyeux, Polack and Phalippou (Orsay, France)

Professor David Attwood Univ. California, Berkeley

Reflection and Refraction at an Interface,Total Internal Reflection, Brewsters Angle, EE290F, 1 Feb 2007

Ch03_Determining.ai