(Cause of generation of non-equilibrium plasma ‘On the account of the following given reason ‘The thermal plasma is produced at high pressure with (>10kPa) with the electron and ion temperature of the order of 1-2 eV. But due to the high gas temperature atmospheric plasma suc as corona may be preferred for surface etching, Because of collision occur very infrequently in tengus plasma, log pressure plasma, the approac tothe thermal equilibrium is very slow. Therefore non- equilibrium effect are common in plasm Since the electron and ion masses are very different, therate of energy transferis much slower, between ion and electron. Therefore, when the plasmais heated, a substantial temperature difference is often developed between electron and ions, thus for a glow discharges, ions and neutral have much lower temperature, whereas the clectron are much{hotter