EFFECT OF TEMPERATURES AND DEPOSITION RATE ON SURFACE

MORPHOLOGY OF THIN AL METAL FILMS ON GLASS SUBSTRATE :

APPLICATION IN SOLAR CELL
Soham Das1, Dr. Moumita Mukherjee2, Dr. Swarup Neogi2
1
University of Calcutta, Kolkata 700009, India
2
Adamas University, Kolkata 700126, India
Email: sohamdas11@gmail.com

Development of low cost metallic thin film development using glass substrate.
PURPOSE: To minimize the surface roughness of the thin film for increasing efficiency
of proposed solar cell.

Introduction to Thin Film Solar
A thin-film solar cell is a second-generation solar
cell that is made by depositing one or more thin layers,
or thin film (TF) of photovoltaic material on a
substrate, such as glass, plastic or metal.
➢ Thin-film solar panels are flexible and lightweight.
➢ Layers are deposited using Physical Vapour
Deposition Process.
AL Thin Films
SEM imaging of Al glass films reveals the morphology
and surface roughness for different deposition rate and
substrate temperature
➢ The SEM images of thermal evaporated Al thin films on glass
substrates for deposition rates varying within 0.2nm/s to
2.5nm/s.
➢ Metallic films produced at 0.2 nm/s deposition rate shows
comparatively smoother surface morphology.
➢ At Higher deposition rate of 2.5nm/s more defective areas
observed.

➢ Aluminium in the form of thin evaporated films has

numerous applications in different branches of modern
technology. It is known to be one of the most important
materials for optoelectronics industries. Because of its
high reflectance and good adherence to glass, evaporated Deposition Rate: 0.2nm/s Deposition Rate: 0.5nm/s
aluminium is the most frequently used coating for solar
cells.
➢ The surface properties depends on substrate temperature,
Deposition rate and Vacuum level in the chamber.

Deposition Rate: 1.5nm/s Deposition Rate: 2.5nm/s

Thin Films are deposited on the glass substrate using
Thermal Evaporation Technique Range of grain sizes of thin Al films evaporated on glass
substrate as a function of deposition rate and Thickness
correlation observation
➢ Thermal Evaporation and Vacuum coating technique equipped
with diffusion pumping system in used.
➢ Thickness and Deposition rate is monitored using
Quartz crystal monitoring system.
➢ Deposition Rates and temperature are varied.

Scanning Electron Microscopy (SEM) and Ellipsometry

is used to study the Thin Al films. Range of grain size Thickness: 300 nm Thickness: 400 nm
with Deposition rate

➢ SEM imaging with a commercial instrument ZEISS EVO 18

with acceleration voltage of 15 KV of thin evaporated Al
films allowed us to observe the microstructure of the films as
a function of deposition rate and to estimate the grain size.
➢ Surface roughness is studied with SEM and thickness is
correlated with ellipsometric study.
➢ The grainy surface which were spherical or circular and voids
are observed.
➢ Grain size increases with deposition rate and thus the surface
roughness increases.
Conclusions and Innovations
➢ The study has focussed on the low cost metallic film
development on glass substrate.
➢ It is observed that with the increase in deposition the grain
size has been increased.
➢ Novel experiment for Future Development of metallic thin
film solar cell.
➢ Useful for Optoelectronic Industries.

Acknowledgement: CRNN,University of Calcutta.