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Abstract
Ce substituted Bi1xCexFeO3 (BCFO) films with x ¼ 0–0.15 were deposited on indium tin oxide (ITO)/glass substrates by sol–gel
process annealed at 500 1C. Rhombohedral phase was confirmed by XRD study and no impure phases were observed till x ¼ 0.15.
Substantially enhanced ferroelectricity was observed at room temperature due to the substitution of Ce. In the films with x ¼ 0.05 and
0.10, the double remnant polarization are 75.5 and 57.7 mC/cm2 at an applied field 860 kV/cm. Moreover, the breakdown field was
enhanced in the films with Ce substitution.
r 2008 Elsevier B.V. All rights reserved.
Keywords: A1. Ce substitution; B1. BiFeO3; B2. Ferroelectricity; B2. Leakage current
Perovskite-typed multiferroic materials such as BiFeO3 deposition method on RuSrO3 coated SrTiO3 substrate
(BFO), BiMnO3, and TbMnO3 that simultaneously show recently by Wang et al. [3]. BFO films deposited on Pt or
electric and magnetic orderings are currently gaining more some conductive oxide bottom electrodes by chemical
attention due to the fact that they are promising for the solution deposition method usually showed a low polariza-
design of multifunctional devices and also because of the tion with a large DC leakage current at room temperature
interesting physics found in this class of materials [1–3]. In [6,7]. In thin films of ferroelectrics, the leakage current is
the above multiferroic materials, BFO exhibits antiferro- mainly dominated by electrode effects, such as Schottky
magnetic ordering (TN=380 1C) and ferroelectric behavior barrier formation if one uses materials with a high work
with high ferroelectric Curie temperature (TC=830 1C) and function such as Pt. While the high DC leakage current in a
it has been studied extensively since 1950s [4]. In recent BFO thin film arises due to intrinsic low resistivity of the
years, more attentions were focused on the preparation of film, which is attributed to the presence of Fe2+ and O
BFO films since they allow direct integration of the vacancies [8]. Alliovalent ion substitution on the B site such
material into the semiconductor technology. Magnetic as Ti4+ and Ni2+ showed a significant change in the
controlling sputtering method was first used to prepared leakage current on Pt/silicon substrates [9]. Work on A site
BFO film [5]. Heteroepitaxially constrained BFO thin films substitution with same valence ions in such as La3+ has
of large polarization have been prepared with pulsed laser also been carried out. Unsaturated electric hysteresis loops
were observed in the La substituted BiFeO3 films on
Corresponding author at: Hubei Key Laboratory of Bioanalytical Pt/TiO2/SiO2/Si substrates prepared by pulsed laser de-
Technology, Hubei Normal University, Huangshi 435002, China. position method [10]. In our previous work, we have
Tel./fax: +86 0714 6571339. prepared La substituted BiFeO3 films on LaNiO3 bottom
E-mail address: lhr1229@126.com (H. Liu). electrodes, and observed Pr values of several mC/cm2 [11].
0022-0248/$ - see front matter r 2008 Elsevier B.V. All rights reserved.
doi:10.1016/j.jcrysgro.2008.02.003
ARTICLE IN PRESS
H. Liu et al. / Journal of Crystal Growth 310 (2008) 2934–2937 2935
Fig. 2. Surface SEM photos of Bi1-xCexFeO3 films with (a) x ¼ 0, (b) x ¼ 0.05, (c) x ¼ 0.10, and (d) x ¼ 0.15.
higher applied field is another factor for the larger Pr in the x ¼ 0.10 and 0.15, small leakage current densities
Ce doped BiFeO3 films since under higher applied field, the below 105 A/cm2 are observed under an applied field of
films are able to get fully polarization. 535 kV/cm. The results are smaller than the La substituted
Fig. 4 shows current density vs. applied electric field BFO film [14]. In the whole applied electric field range, no
(JE) characteristics of the BCFO films with x ¼ 0–0.15. breakdown was observed. Therefore, by the Ce substitu-
From which we find that the BFO has the least leakage tion, the breakdown electric field was enhanced rather than
current density at the positive bias electric field below the leakage current density was reduced. We suggest that
200 kV/cm. Near 200 kV/cm, the current density of the the improvement of interface between the BCFO film and
BFO film (x ¼ 0) increases drastically and gets breakdown. ITO bottom electrode is responsible for the higher break-
For the film with x ¼ 0.05, the breakdown electric field is down fields, which make the BCFO films able to bear
enhanced to about 400 kV/cm. After getting breakdown, higher applied fields and get polarization fully.
the films with x ¼ 0 and 0.05 show large current density In conclusion, Ce substituted BFO films were prepared
under negative bias electric fields. For the films with on ITO/glass substrates by sol–gel process at an annealing
ARTICLE IN PRESS
H. Liu et al. / Journal of Crystal Growth 310 (2008) 2934–2937 2937
temperature of 500 1C. All films take on random orienta- N.A. Spaldin, K.M. Rabe, M. Wuttig, R. Ramesh, Science 299 (2003)
tion. By the substitution of Ce, the films show enhanced 1719.
[4] C. Michel, J.-M. Moreau, G.D. Achenbach, R. Gerson, W.J. James,
ferroelectricity and breakdown electric field. The enhanced
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The work is supported by the Young People Program of [8] V.R. Palkar, J. John, R. Pinto, Appl. Phys. Lett. 80 (2002) 1628.
Hubei Province Education Committee under Grant no [9] X. Qi, J. Dho, R. Tomov, M.G. Blamire, J.L. MacManus-Driscoll,
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