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Article history: The solid–solid interfacial reaction in the Mg–Ni binary diffusion couples was studied for the first time
Received 5 November 2007 in bulk form. The reaction temperature was at 400, 430, 450, and 480 ◦ C, with reaction time ranging
Received in revised form 26 March 2008 from 10 to 75 h. The Mg–Ni phase diagram shows two stable compounds, Mg2 Ni and MgNi2 , at these
Accepted 26 March 2008
temperatures, but only Mg2 Ni was observed at the interface after the reaction. The growth of Mg2 Ni
Available online 12 May 2008
followed the parabolic kinetics, and the apparent activation energy was determined to be 120 kJ/mol. The
dominant diffusing species was identified by using thin W lines as markers. After the reaction, these W
Keywords:
markers located near the Mg/Mg2 Ni interface, suggesting that Mg was the dominant diffusing species in
Hydrogen storage materials
Mg2 Ni
Mg2 Ni. This is consistent with the general trend that in many metal/metal systems the dominant diffusing
Intermetallic compounds species are usually the majority elements in the compounds that formed first.
Thermodynamic properties © 2008 Elsevier B.V. All rights reserved.
Interdiffusion
0925-8388/$ – see front matter © 2008 Elsevier B.V. All rights reserved.
doi:10.1016/j.jallcom.2008.03.124
M.Y. Tsai et al. / Journal of Alloys and Compounds 471 (2009) 90–92 91
Fig. 1. Schematic drawing of the sample holder used in the diffusion couple exper-
iment. The screws of the sample holder were tightened to keep the two disks in
contact. The whole sample holder was enclosed in an evacuated quartz capsule
during reaction to prevent oxidation.
Fig. 3. X-ray diffraction pattern of the reaction product after annealing at 480 ◦ C
for 75 h, showing the formation of the Mg2 Ni phase. The Ni peaks were from the Ni
thickness was reported. An electron microprobe (EPMA), operated at 15 keV, was sheet beneath Mg2 Ni. This pattern was taken from a fracture diffusion couple, with
used to measure the composition of each phase and the concentration profiles of a thin fractured layer of Mg2 Ni remained over the Ni substrate.
the diffusion couples. In EPMA analysis, the standards used were pure Ni and pure
Mg, and the weight percentages of Ni and Mg were measured independently, and
the total percentage was within 100 ± 1 wt.% in each case. It was estimated that the there was only a very slight concentration gradient across this layer,
accuracy of the compositions determined in this study was within 1 wt.%. and Mg2 Ni could indeed be classified as a line compound. X-ray
The marker experiment was carried out by depositing parallel W lines on the
diffraction pattern, shown in Fig. 3, revealed that the compound
surface of the Ni plates before the assembly of the diffusion couples. The W stripes
were 3-m wide and 0.5-m thick. No evidence of interaction with Ni or Mg was formed was indeed the hexagonal Mg2 Ni phase. This diffraction
observed during the reaction of the diffusion couples. pattern was taken from a fractured half of a diffusion couple, with
a thin layer of Mg2 Ni remained over the Ni substrate. The Ni side
3. Results and discussion of the fractured diffusion couple was used for the diffraction mea-
surement because, if MgNi2 had formed, MgNi2 would have formed
For all the temperatures (400–480 ◦ C) and the reaction time between Mg2 Ni and Ni. As shown in Fig. 3, no diffraction peak
(10–75 h) used in this study, the only intermetallic compound from MgNi2 was detected. Some Ni peaks were present from the
observed was Mg2 Ni. According to the Mg–Ni phase diagram Ni substrate beneath the Mg2 Ni layer.
[10,11], there is another intermetallic phase MgNi2 which is also sta- As mentioned earlier, the second Mg–Ni stable phase, MgNi2 ,
ble at these temperatures. Nevertheless, MgNi2 was not detected, was not observed in this or earlier studies [12,13]. In the literature,
even after careful examination along the Mg–Ni interface by using a three probable reasons had been proposed for the missing of one
SEM at high magnification. The observation that only Mg2 Ni formed or more phases in a binary diffusion couple [14]. The first reason
is the same as in the thin film reaction at 225 ◦ C [12], and in the was that the missing phase(s) were actually there, but were too
reaction between Ni and molten Mg carried out at 660–680 ◦ C [13]. thin to be resolved by the characterization techniques used. The
As shown in Fig. 2, Mg2 Ni formed after the reaction at 480 ◦ C for second and the third reasons assumed that the missing phase(s)
45 h exhibited a layered morphology. This layered morphology is indeed does not form due to the nucleation barrier or slow growth
quite characteristic for solid-state reactions, and is different from kinetics, respectively. The second reason, the nucleation barrier, is
the scallop morphology often observed in the reaction between self-explanatory and is not discussed further here. The third rea-
solid and liquid, such as the reaction between Ni and molten Mg son, the slow growth kinetics, had been shown to be the case
[13]. Reactions at all other temperatures and reaction time used in for the Ni–Bi system [14] and for the Ti–Al system [15]. In these
this study always produced only Mg2 Ni with this layered morphol- two systems, it was shown that if the interdiffusion coefficient for
ogy. The composition of this Mg2 Ni was determined to be 31 at.% the missing phase was substantially lower than the other phases,
Ni by using EPMA. Line-scan across the reaction zone showed that then this phase would disappear even though this phase had been
Fig. 2. Backscattered electron micrograph showing the reaction product after reac- Fig. 4. Thickness of Mg2 Ni plotted against the reaction time. This illustrates that the
tion at 480 ◦ C for 45 h. The only reaction product formed was Mg2 Ni. growth of Mg2 Ni was diffusion controlled.
92 M.Y. Tsai et al. / Journal of Alloys and Compounds 471 (2009) 90–92
Acknowledgement