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CRYSTAL
GROWTH
SUMMARY :
Several very useful studies on the history of
crystal growth in general can be found in the
literature . Many significant contributions were
made to the fundamentals of crystal growth
during the eighteenth and nineteenth centuries,
including the development of thermodynamics,
undercooling and supersaturation . In terms of
crystal growth techniques, it is accepted that the
first method applied to produce usable crystals on
a large scale was that of flame fusion by Verneuil .
Before World War II, synthetic crystals (other than
ruby) were mainly used in scientific instruments.
However, between 1900 and 1940 there were
enormous advances in both the theoretical area
of this field and in producing samples for scientific
study. The diffusion boundary layer was applied
by Nernst , while ideas on the growth of perfect
crystals were proposed by Volmer, Kossel and
Stranski .
Many of the growth techniques now used
were also initially developed during this
period. The flame fusion of Verneuil was
followed by hydrothermal growth , crystal
pulling , Kyropoulos , Bridgman growth , and
vertical gradient freeze .
Techniques :
1. Verneuil
2. Czochralski
3. Kyropoulos
4. Stepanov
5. Edge-Defined Film Growth
6. Bridgman
7. Vertical Gradient Freeze
8. Float Zone
9. Travelling Heater Method
(THM)
10. Low-Temperature Solution
Growth
11. High-Temperature Solution
Growth (Flux)
12. Hydrothermal
13. Growth from the Vapor
Materials Grown
This section attempts to summarize the
current position regarding the wide range of
materials used in electronics and
optoelectronics. Again the reader is referred
to the following relevant chapters for more
in-depth coverage of a particular material.
The section is subdivided roughly into Group
IV, Group III–V, Group II–VI, oxides, halides,
and finally phosphates/borates.