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Article history: Herein, LiAlSiO4 was used as electrolyte material for all-solid-state electrochromic devices for the first
Received 3 December 2020 time, and an electrochromic device (ECD) with the structure of glass/ITO/NiO/Ta2O5/LiAlSiO4/Ta2O5/
Received in revised form 5 February 2021 WO3/ITO was prepared by magnetron sputtering method. Since LiAlSiO4 electrolyte exhibits high trans-
Accepted 19 February 2021
parency and good ionic conductivity, the ECD shows good electrochromic performance including: large
Available online 25 February 2021
optical transmittance modulations (50.8% at 586 nm, 64.1% at 1000 nm), good stability (optical modula-
tion is still maintained at 81.4% (586 nm) and 89.0% (1000 nm) of initial state after 1000 cycles) and high
Keywords:
coloration efficiency (60.3 cm2 C1 at 586 nm, 150.6 cm2 C1 at 1000 nm). Considering the low cost and
Sputtering
Thin films
abundance of Al and Si, LiAlSiO4 may be acknowledged as a sustainable electrolyte for future high-
Electrochromic device performance ECDs.
Electrolyte Ó 2021 Elsevier B.V. All rights reserved.
LiAlSiO4
All-solid-state
https://doi.org/10.1016/j.matlet.2021.129592
0167-577X/Ó 2021 Elsevier B.V. All rights reserved.
Y. Zhao, X. Zhang, X. Chen et al. Materials Letters 292 (2021) 129592
Fig. 1. Structural schematic diagram (a) and cross-sectional SEM image (b) of the ECD.
ceramic plate (99.99%) and ITO ceramic plate (99.99%). Previously, undesired doping effects [10–12]. And these will be reported in a
the cleaned ITO glass substrates were placed in a vacuum sputter- succeeding paper.
ing chamber. The base pressure in chamber was kept below The electrochemical properties of the ECD were characterized
3 103 Pa, and the distance between target and substrate was by cyclic voltammetry (CV) and Chronoamperometry (CA) tests.
6.5 cm. Before each layer was deposited, the targets were pre- The CV tests in the 1st cycle and 1000th cycle of the ECD were car-
sputtered for 10 min under Ar to prevent cross-contaminants. ried out at a scan rate of 100 mV s1 in a voltage range of 2.0 to
The substrate was rotated at 5 rpm in deposition process to ensure 2.0 V (Fig. S4). The shape of CV curves of the ECD is similar to those
the homogeneity of the films. The deposition parameters of WO3, of single-layer WO3 films reported in previous literatures [13,14].
NiO, Ta2O5 and LiAlSiO4 films are shown in Table S1. The ECDs were Besides, the area of voltammograms in the 1000th cycle was
annealed at 350 °C in air after deposition to improve their cyclic slightly smaller than that in the 1st cycle, which indicates that
stability. the active units in the ECD participate in EC reaction are slightly
The structural profiles of the ECD with cross-sectional images reduced due to the ion-trapping effect existed in WO3 and NiO
were obtained by scanning electron microscopy (SEM, Zeiss supra layers.
55) at an acceleration voltage of 20 kV. The crystal structures of The in-situ transmittance test was conducted by applying con-
films were characterized by a X’ pert Pro-diffractometer (with Cu stant voltages (2.0 V for 30 s in the coloration process, 2.0 V for
Ka radiation of k = 1.5405 Å) at a constant incidence angle of 0.2°. 60 s in the bleaching process) to investigate the EC behaviors of
The electrochromic and electrochemical properties of the ECDs ECD. As shown in Fig. 2, the blue and orange lines represent
were recorded on a Vis-NIR optic spectrometer (MAYA 2000-Pro, bleached and colored state of the ECD, respectively. And the ECD
Ocean Optics) and an electrochemical station (CHI 660E). The displays a relatively high bleached-state transmittance (Tb) in the
transmittance modulation and response time of the ECDs at differ- visible and NIR region, showing a transparent feature. When a volt-
ent voltages (2.0 V and +2.0 V) were recorded by chronoamper- age of 2.0 V is applied, the ECD changes to colored state with a
ometry at the specific wavelength of 586 nm and 1000 nm. relatively low colored-state transmittance (Tc). The transmittance
modulation DT (DT = Tb Tc) of the ECD at the wavelength of
586 nm and 1000 nm reaches 50.8% and 64.1%, respectively. The
digital photographs of the ECD at bleached and colored states are
3. Results and discussion shown in Fig. S5. After 1000 cycles, the DT values of the ECD at
586 nm and 1000 nm still remain at 41.4% and 57.1%, respectively,
The transmittance spectra of the films prepared on ITO glass indicating good optical modulation ability of the ECD.
substrates are shown in Fig. S1. The LiAlSiO4 film has high trans- Response time is defined as the time required for a 90% change
mittance in the wavelength range of 400–1100 nm, confirming in transmittance modulation [15]. The transmittance-time curves
its suitability as electrolyte for ECDs. Besides, the ITO glass, WO3, of the ECD at 586 nm and 1000 nm in 1st cycle and 1000th cycle
NiO and Ta2O5 layer also exhibit high transmittance in the range are shown in Fig. 3a and b. The coloration and bleaching time of
of 400–1100 nm. Fig. 1b illustrates the cross-sectional images of the ECD are listed in Table S2. There is no obvious difference
the ECD, which is the structure of ITO/NiO/Ta2O5/LiAlSiO4/Ta2O5/ between coloration time of the ECD in the 1st and 1000th cycle.
WO3/ITO from bottom to top, and corresponding thicknesses are While the response speed in bleaching process becomes faster after
200, 130, 30, 60, 30, 470 and 180 nm, respectively. In order to 1000 cycles. The mechanism of response change of the device is
investigate the microstructure of each layer in ECD, XRD analysis studied by the electrochemical impedance spectroscopy of ECD
was carried out and the XRD patterns of WO3, NiO, Ta2O5 and in 1st cycle and 1000th cycle. And the results are shown in
LiAlSiO4 films are shown in Fig. S2. The WO3 and NiO films show Fig. S6 and Table S3.
the characteristic crystalline phases of monoclinic WO3 (JCPDF- Coloration efficiency (CE) is another important parameter to
#43-1035) and face-centered cubic NiO (JCPDF-#47-1049), which evaluate the performances of the ECD, which can be evaluated
indicate their crystalline structures. For the Ta2O5 and LiAlSiO4 according to the following equations [16–18]:
film, no diffraction peaks can be observed, indicating that these
CEðkÞ ¼ DOD=Q ð1Þ
films are amorphous in nature. Before studying the electrochemi-
cal and electrochromic properties of the ECD, the ionic conductiv- DODðkÞ ¼ logðT b =T c Þ ð2Þ
ity of the LiAlSiO4 film was tested by AC impedance and it was
determined to be about 2.7*108 S cm1 (see Fig. S3). In addition, Z
the ionic conductivity of LiAlSiO4 is also affected by oxygen Q¼ jdt ð3Þ
vacancy concentration, lithium ions vacancy concentration and
2
Y. Zhao, X. Zhang, X. Chen et al. Materials Letters 292 (2021) 129592
Fig. 2. Transmittance spectra of the ECD at bleached and colored state in the 1st cycle (a) and 1000th cycle (b).
Fig. 3. The coloration/bleaching response time (a, b) and coloration efficiency (c, d) of the ECD in the 1st cycle and 1000th cycle at the wavelength of 586 nm and 1000 nm.
where Q denotes inserted charge density during coloration process, the ECD could obtain large optical modulation with small changes
and j and t are current density and time derived from CA tests. of inserted charges. In addition, the CE values decrease after cycling,
Fig. S7 exhibits CA curves of the ECD. Fig. 3c and d compare the cor- which are ascribed to the decreases of optical density changes and
responding relationship of optical density (OD) relative to charge the existence of leakage current [19].
density for the ECD in the 1st and 1000th cycle at the wavelength
of 586 nm and 1000 nm. The calculated CE values of the ECD are
listed in Table S2. Obviously, the ECD exhibits a higher CE value 4. Conclusion
in NIR region (at 1000 nm) than that in visible region (at 586 nm),
which is attributed to larger transmittance modulation of the ECD In summary, LiAlSiO4 film prepared by RF magnetron sputtering
in NIR region than in visible region. The high CE values indicate that method, has been used as electrolyte in the all-solid-state ECD
with the structure of glass/ITO/NiO/Ta2O5/LiAlSiO4/Ta2O5/WO3/
3
Y. Zhao, X. Zhang, X. Chen et al. Materials Letters 292 (2021) 129592
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