Electronics and Communication Engineering Department

Thapar Institute of Engineering and Technology

MOS Circuit Design- UEC609/750

Assignment/Tute 3

1. What is LOCOS? Why it is required and also discuss its advantages and disadvantages?
2. How LOCOS is performed? Explain in detail.
3. What is photoresist? Differentiate between a positive and negative photoresist.
4. What is photolithography? How it is performed?
5. What is channel-stop implant? Why it is required? Discuss the steps involved during its fabrication
with the help of diagrams.
6. What is Annealing and why it is performed?
7. Explain the various steps involved in the fabrication of n-channel MOSFET in a p-substrate
including its substrate contact.
8. Discuss the various steps involved in the fabrication of a CMOS inverter in a given p-well double
metal process with the help of diagrams. Also list the masks used in the sequence.