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Journal of Alloys and Compounds 853 (2021) 157375

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Journal of Alloys and Compounds


journal homepage: http://www.elsevier.com/locate/jalcom

Low ligand field strength ion (I) mediated 1D inorganic material


MoI3: Synthesis and application to photo-detectors
Kyung Hwan Choi a, 1, Seungbae Oh b, 1, Sudong Chae b, Byung Joo Jeong b, Bum Jun Kim a,
Jiho Jeon a, Sang Hoon Lee b, Sang Ok Yoon b, Chaeheon Woo b, Xue Dong a,
Asghar Ghulam a, Changmo Lim b, Zhixiang Liu a, Cong Wang b, Ali Junaid a,
Jae-Hyun Lee c, Hak Ki Yu c, *, Jae-Young Choi a, b, **
a
SKKU Advanced Institute of Nanotechnology (SAINT), Sungkyunkwan University, Suwon, 16419, Republic of Korea
b
School of Advanced Materials Science & Engineering, Sungkyunkwan University, Suwon, 16419, Republic of Korea
c
Department of Materials Science and Engineering & Department of Energy Systems Research, Ajou University, Suwon, 16499, Republic of Korea

a r t i c l e i n f o a b s t r a c t

Article history: A new type of 1D inorganic material, MoI3, which can be separated into individual 1D chains, was
Received 10 August 2020 synthesized through a vapor transport reaction between molybdenum and iodine. High-purity and
Received in revised form centimeter-scale large MoI3 crystals were obtained by controlling the growth temperature and the
25 September 2020
stoichiometric ratio between molybdenum and iodine. Their semiconductor characteristics were
Accepted 27 September 2020
Available online 28 September 2020
confirmed by measuring the electrical conductivity as a function of temperature (conductivity increased
with increased temperature across the range 70 to 30  C). Furthermore, it was confirmed that MoI3
with a 1.27 eV band gap can be separated to a few nanometer scale through mechanical and chemical
Keywords:
1D inorganic materials
exfoliation methods and can be used as a photodetector in the near IR (less than 1000 nm)-to-visible
MoI3 light region. This novel 1D material is expected to play an important role in the development of addi-
Photodetectors tional low-dimensional materials and in advanced nano-optoelectronic devices.
Mechanical exfoliation © 2020 Elsevier B.V. All rights reserved.

1. Introduction Halogen ions (F, Cl, Br, and I), which have four paired
electrons, can form various chemical compounds through ligand
Low-dimensional (2D and 1D) materials, which have been field-induced bonding with several transition elements [13e15].
extensively studied in recent years, mainly form a unit crystal The intensity of the ligand field varies depending on the ligand
structure through ionic bonds between transition metals (such as polarizability. The smaller the ion, the stronger the attraction be-
Mo, Nb, W, Ta, and V) and group 16 chalcogenide elements (Se and tween its nucleus and outermost electrons, thereby resulting in
S). Such materials form a 3D bulk structure through weak van der decreased polarizability and in increased intensity of the ligand
Waals (vdW) bonds between unit crystals [1e8]. These low- field accordingly. In contrast, if the ion is large, such as I, the effect
dimensional materials can have band gaps of ~1 eV, which is suit- of ligand field on the d orbitals of the transition metal decreases so
able for using as a semiconductor electronic device. They also have that M-X-M angle in octahedral configuration also decreases,
limitations, including atmospheric instability and low charge mo- leading to short distances between the central cations. Therefore,
bilities [9e12]. Therefore, it is necessary to devise a method to find the binding force between the ligand compounds is weakened such
new types of low-dimensional materials to enhance material di- as vdW forces because the strong interactions are limited only
versity of low-dimensional material-based devices. along the direction of central cations [16e23]. That is, these ma-
terials are likely to be used as new, low-dimensional materials, by
exfoliating between unit materials, such as the vdW-based mate-
rials [24e27].
* Corresponding author.
In this study, we designed experiments by selecting molybde-
** Corresponding author. SKKU Advanced Institute of Nanotechnology (SAINT),
Sungkyunkwan University, Suwon, 16419, Republic of Korea.
num (Mo) among the elements having a 4d orbital, to be coordi-
E-mail addresses: hakkiyu@ajou.ac.kr (H.K. Yu), jy.choi@skku.edu (J.-Y. Choi). nated by I ions, because the Mo forms 2D chalcogenides easily
1
K.H. Choi and S. Oh contributed equally to this work.

https://doi.org/10.1016/j.jallcom.2020.157375
0925-8388/© 2020 Elsevier B.V. All rights reserved.
K.H. Choi, S. Oh, S. Chae et al. Journal of Alloys and Compounds 853 (2021) 157375

(such as MoS2 and MoSe2) [1,4]. By examining the stability of the surface. The polymer tape was strongly adhered to, and pressed
phase, based on the crystal structure, it was confirmed that the against, the SiO2/Si substrate. After adhesion, the polymer tape was
MoI3 phase, which is assigned to the orthorhombic space group removed from the SiO2/Si substrate; this process was repeated for
Pmmn and composed of bonds between Mo-centered ions and I in exfoliation.
a face-sharing octahedral configuration, forms a basic chain and can
form a 3D structure through weak vdW bonding between chains
2.3. Characterization
(Fig. 1a) [28,29]. MoI3 was placed in a vacuum ampule in accor-
dance with stoichiometry to induce the reaction, and the structure
XRD (D8 Advance, Bruker) was performed using Cu Ka radiation
of the synthesized material, bandgap measurement, and the pos-
(l ¼ 0.154 nm). Field-emission scanning electron microscopy (FE-
sibility of single chain exfoliation were evaluated to investigate the
SEM, Hitachi, S-4300SE) and an energy dispersive spectrometer
possibility of a new type of 1D material. Furthermore, experiments
(EDS) attached to the FE-SEM were used for morphological and
were conducted to demonstrate that it can be used as a photode-
compositional analysis. Atomic force microscopy (AFM, Park sys-
tector by utilizing the band gap of the synthesized material.
tems, NX 10) was performed in non-contact mode for topographic
analysis of the mechanically exfoliated MoI3 on SiO2/Si substrates.
2. Materials and methods An aberration-corrected scanning transmission electron micro-
scopy (Cs-STEM, JEOL, JEM-ARM200F) was operated at an acceler-
2.1. Synthesis ation voltage of 80 kV. Diffuse-reflectance UVeViseNIR
spectrophotometer (Shimadzu, SolidSpec-3700) was performed at
Single crystals of MoI3 were grown via a chemical vapor trans- room temperature in the 200e2500 nm range. A current-voltage
port (CVT) method. Elemental powders of Mo (99.9%, 1e5 mm, curve (Vacuum chamber probe-station, MSTECH, M6VC) was ob-
Sigma-Aldrich) and iodine (crystalline, 99.99þ%, Alfa Aesar) were tained in the temperature range 70 to 30  C for exfoliated MoI3.
thoroughly mixed with a molar ratio of 1:4 and sealed into a 15 cm- Electrical contact, Cr/Au, was deposited using TEM grid as a shadow
long quartz tube (inner diameter ¼ 1.2 cm) under vacuum. The mask. Photo-reactive response properties using four-probe tech-
quartz tube was placed in a horizontal tube furnace, heated to nique were characterized using a laser at wavelengths of 635 and
400  C for 120 h, with a temperature gradient to 350  C at one end, 1342 nm. Laser power was calibrated using a laser power meter.
and then gradually cooled to room temperature. After the reaction, Photo switching was examined by turning the laser on and off.
long needle-like MoI3 crystals were formed at the cold end, and
these were collected mechanically. Excess iodine on the surface of
3. Results and discussion
crystals was removed by sublimation in a tube furnace at 100  C
under Ar flow.
In general, the crystal growth in CVT method occurs when the
reactants volatilized in the reaction zone is transferred to and
2.2. Exfoliation deposited in a growth zone with an appropriate temperature
gradient [30]. To determine the optimal conditions for synthesis of
The MoI3 was placed on wafer dicing tape (BT150E-KL, Nitto), MoI3, experiments were conducted using different composition
and the materials were stuck several times to yield thinner-than- ratios of Mo/I and reaction temperatures. The higher the reaction
bulk materials. A substrate of SiO2/Si was cleaned by ultra- temperature and the higher the amount of Mo, the more stable is
sonication in acetone, ethanol, and deionized water for 15 min, the thermodynamically stable phase, MoI2 (Fig. S1). Therefore, in
followed by heating at 100  C to remove moisture from the SiO2/Si this experiment, a temperature of reaction zone was maintained at

Fig. 1. (a) Crystal structure of MoI3. (b) Growth mechanism of MoI3 through chemical vapor transport method. (c) SEM image of bulk MoI3 crystal. Inset is an optical image of bulk
MoI3 crystal (scale bar: 0.5 cm).

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K.H. Choi, S. Oh, S. Chae et al. Journal of Alloys and Compounds 853 (2021) 157375

400  C, but the amount of iodine was increased (the amount of Mo temperature and light absorption were measured. In the electrical
was relatively small). As the growth proceeds, the crystals gradually conductivity measurement according to the temperature change,
grow into long (centimeter-scale) needle-like single crystals due to the Electrical conductivity increased as temperature increased
the intrinsic 1D structure characteristics of MoI3 (Fig. S2). Although from 70 to 30  C (Fig. 3a). This phenomenon occurs in typical
the actual reaction zone temperature was 400  C, the temperature semiconductor materials, and thus it was confirmed that the syn-
of the transport zone was 350  C, and it was confirmed that the thesized MoI3 has semiconductor properties. To measure the band
MoI3 phase can be stabilized (Fig. 1b). In the optical and electron gap of MoI3, UVevis diffuse reflectance spectroscopy (DRS) was
micrographs of the synthesized crystals, a long shape can be measured (Fig. 3b). A Tauc plot (inset) confirmed that the band gap
observed in one direction, and the thickness was tens of micro- was approximately 1.27 eV. As 1.27 eV corresponds to a wavelength
meters (Fig. 1c). in the 1000 nm region, it can be used as a photodetector that ab-
X-ray diffraction results demonstrated that a pure single phase sorbs light from the near IR (less than 1000 nm)-to-visible light
MoI3 was synthesized (Fig. 2a). The reason for the (200) preferred region [32e35]. In order to verify the measured band gap and
orientation is that the alignment occurred in the process of trans- possibility to a photodetector, measurements of photoelectric
ferring the centimeters-long wires, obtained in the transport zone, reactivity to a light source of 635 nm, corresponding to visible light,
to the substrate for XRD measurement. In addition, the Mo 3d core and 1342 nm, corresponding to IR, was performed. (Fig. 3c). There
level XPS spectrum shows that the Mo3þ was evidently seen in the was almost no reaction at 1342 nm because MoI3 has a band cor-
Mo 3d core level XPS spectrum (Fig. 2b), demonstrating that MoI3 responding to 1000 nm and the energy of incident light is insuffi-
was successfully synthesized in accordance with stoichiometry (see cient to make excitation of free electron-hole pairs. On the other
the supporting information about survey scan and I 3d spectrum, hand, at 635 nm which is an energy larger than the band gap of
Fig. S3). The presence of Mo4þ and Mo6þ in the spectrum are MoI3, there was steep rising and falling in current with respect to
attributed to oxides formed on the surface when the crystals are light on and off, which is attributed to photoelectric effect [36]. The
exposed to air after synthesis [31]. To perform TEM analysis, the gradual increase in current after rapid current rising is mainly
MoI3 single crystal was dispersed in isopropyl alcohol (IPA; Fig. S4), caused by the thermal effect. In addition, the photocurrent
and it was confirmed that a thread-shape appeared easily (Fig, 2c). increased proportionally to increased light intensity at 635 nm
This is considered because there is only a weak vdW bond between (Fig. 3d), which suggests that it can be used as an excellent
the unit chains. The HR-TEM image and Fourier transformation photodetector in the near IR (less than 1000 nm)-to-visible light
analysis confirmed that the synthesized material is a MoI3 material region.”
having 0.712 nm between unit chains, corresponding to (001) plane To utilize the semiconductor characteristics MoI3, with a band
(Fig. 2d and e). gap of 1.2 eV, to low-dimensional devices, the possibility of unit
To evaluate the electrical and optical properties of the synthe- chain exfoliation must also be verified. The MoI3 chain that was
sized material, changes in electrical resistance as a function of primarily exfoliated through mechanical exfoliation (Fig. 4a, c) had

Fig. 2. (a) XRD pattern of the as-synthesized crystalline MoI3. Black lines at the bottom represent the calculated powder pattern of MoI3 in space group Pmmn. (b) XPS spectrum of
Mo 3d peak of the as-synthesized MoI3. (c)e(e) TEM images and fast Fourier transform pattern (inset) of dispersed MoI3 chains.

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K.H. Choi, S. Oh, S. Chae et al. Journal of Alloys and Compounds 853 (2021) 157375

Fig. 3. (a) Electrical conductivity of MoI3, with T ranging from 200 to 300 K. (b) UVevis DRS spectrum of MoI3. Inset shows a Tauc plot of the absorption spectrum. (c) Time function
of the on-off photocurrent response at different light sources; visible (635 nm) and IR (1342 nm) lasers. (d) Current change with respect to visible light intensity.

Fig. 4. (a) AFM image of the mechanical exfoliated MoI3 on a 300 nm SiO2/Si substrate. Inset shows an optical microscope image of exfoliated MoI3. (b) AFM image of the exfoliated
MoI3 after additional peeling process. (c) and (d) Line profile of the MoI3 before and after a second exfoliation.

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K.H. Choi, S. Oh, S. Chae et al. Journal of Alloys and Compounds 853 (2021) 157375

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