Professional Documents
Culture Documents
共Received 18 June 2007; revised manuscript received 19 August 2007; published 23 October 2007兲
Recently discovered ultralow friction 共superlubricity兲 between incommensurate graphitic layers has raised
great interest in understanding the interlayer interaction between graphene sheets under various physical
conditions. In this work, we have studied the effects of interlayer distance change and in-sheet defects in
modifying the interlayer friction in graphene sheets by extensive molecular-force-field statics calculations. The
interlayer friction between graphene sheets with commensurate or incommensurate interlayer stacking in-
creases with decreasing interlayer distance, but in the case of incommensurate stacking, ultralow friction can
exist in a significantly expanded range of interlayer distance. The ultralow interlayer friction in the incommen-
surate stacking sheets is insensitive to the in-sheet defect of vacancy at a certain orientation. These results
provide knowledge for possibly controlling friction between graphene sheets and offer insight into their
applications.
40
(a) y y AB stacking ∆R = 0.34 nm
0
30 Incommensurate stacking θ = 90
Force Fθ (pN/atom)
20
10
-10
-20
θ θ
Oc x x
-30
Oc 0.0 0.5 1.0 1.5 2.0 2.5 3.0
Sliding distance (nm)
(b)
Commensurate AB stacking Incommensurate stacking
155429-2
MODIFYING ATOMIC-SCALE FRICTION BETWEEN TWO… PHYSICAL REVIEW B 76, 155429 共2007兲
1000 1000
0 (a) 0 (a)
0.40 0.38 0.36 0.34 0.32 0.30 0.28 0.26 0.24 0.40 0.38 0.36 0.34 0.32 0.30 0.28 0.26 0.24
Interlayer distance (nm) Interlayer distance (nm)
20 25
18
Incommensurate stacking 20 Incommensurate stacking
16 0
0 θ = 90
14 θ = 90 15
12 0
θ = 80 no defect
10 0
8
θ = 60 10 5-7 defect
θ = 30
0 vacancy
6 5
0
4 θ=0
2 0
0
(b)
(b)
-2 -5
0.40 0.38 0.36 0.34 0.32 0.30 0.28 0.26 0.24 0.40 0.38 0.36 0.34 0.32 0.30 0.28 0.26 0.24
Interlayer distance (nm) Interlayer distance (nm)
FIG. 3. 共Color online兲 Maximum resistance force acting on the FIG. 4. 共Color online兲 Variations of maximum resistance forces
perfect graphene flakes in 共a兲 AB stacking and 共b兲 incommensurate acting on the graphene flakes of different defects in 共a兲 AB stacking
stacking with different interlayer distances along different sliding and 共b兲 incommensurate stacking with interlayer distance along
directions . = 90° direction.
Figure 3 plots the variations of maximum resistance force 0.3 nm. The total average normal forces acting on the ⌬R
with interlayer distance in the AB commensurate and incom- = 0.3 nm graphene flakes for the AB stacking and incommen-
mensurate stackings along different sliding directions. When surate stacking are 2002 and 1875 nN, respectively. Along
the interlayer distance is 0.39 nm, the two graphene sheets different sliding directions, the variations of the maximum
are still bound together, but the average maximum resistance resistance forces of these two systems are different, as shown
forces in the AB and incommensurate stacking systems are in Fig. 3. The maximum resistance force variations for the
only 3 and 0.05 pN/atom. Compared to the average maxi- AB stacking system fall on a smaller number of scaling
mum resistance force at the interlayer distance of 0.34 nm, curves, indicating less influence of the sliding direction on
the small force in the AB stacking case suggests that the low friction in the AB stacking system. The reduction in inter-
interlayer friction can be realized in commensurate graphene layer distance strengthens the interlayer registry effect. As a
sheets by increasing the interlayer distance to a suitable consequence, the interlayer friction in the AB stacking sys-
value. In the incommensurate stacking case, the maximum tem increases much faster than that in the incommensurate
resistance force at each interlayer distance is approximately 2 stacking system. For instance, the maximum resistance force
orders of magnitude lower than that in the AB stacking case. along = 90° in the AB stacking system increases from
Thus, the incommensurate graphene sheets can be consid- 23.9 to 963.7 pN/atom when the interlayer distance de-
ered as an interlayer superlubric system. Previous experi- creases from 0.34 to 0.24 nm, while the maximum resistance
mental and theoretical studies show that the total friction force in the incommensurate stacking system increases from
force in flat graphite for most relative orientations was lower 0.3 to 10.8 pN/atom. The calculated results show that the
than 50 pN 共superlubricity兲, but for narrow ranges of orien- variation in the maximum resistance force of the incommen-
tation, the friction was as high as 250 pN.6–8 Although the surate stacking system is much more sensitive to the pulling
magnitude of the resistance forces in our calculations is not direction. At = 60°, the friction remains ultralow even as the
suitable to directly compare with the friction forces mea- interlayer distance decreases to 0.24 nm, as shown in Fig.
sured in experiments and calculated in other theoretical stud- 3共b兲.
ies, the ultralow resistance force in the incommensurate To investigate the effect of defects, the variations of maxi-
stacking and high resistance force in the AB stacking are still mum resistance forces acting on the defected graphene flakes
consistent with those studies of superlubricity in graphite.6–8 in the AB stacking and incommensurate stacking systems are
The normal force acting on the graphene flakes increases plotted in Fig. 4. Same as the perfect flake, the maximum
with decreasing interlayer distance. This enhances the inter- resistance forces in these defected systems increase sharply
layer friction in both the AB and incommensurate stacking when the interlayer distance ⌬R is less than 0.3 nm. The
cases. The maximum resistance forces in these two systems corresponding total average normal forces acting on the
increase sharply when the interlayer distance ⌬R is less than graphene flakes with the AB stacking are 2004 nN for the 5-7
155429-3
GUO, GUO, AND CHEN PHYSICAL REVIEW B 76, 155429 共2007兲
15 14
155429-4
MODIFYING ATOMIC-SCALE FRICTION BETWEEN TWO… PHYSICAL REVIEW B 76, 155429 共2007兲
5 IV. CONCLUSION
(a)
4 AB stacking We have carried out extensive molecular-force-field cal-
∆Fmax (pN/atom)
350-atom / 190-atom culations to study the interlayer friction between graphene
0
3 θ = 90 sheets with different interlayer stackings and defects. We
have identified low static friction between graphene sheets
2 no defect
5-7 defect
with both commensurate and incommensurate stackings.
1 vacancy Upon reduction of interlayer distance below the equilibrium
value of 0.34 nm, the interlayer friction between the
0 graphene sheets increases sharply with decreasing interlayer
0.40 0.38 0.36 0.34 0.32 0.30 0.28 0.26 0.24 distance. Friction in the AB stacking graphene sheets is more
Interlayer distance (nm) sensitive to the change of interlayer distance than that in the
35 incommensurate stacking sheets. The interlayer ultralow fric-
30
(b) tion state can remain in the incommensurate stacking sheets
25
Incommensurate stacking even when the interlayer distance is reduced to 0.24 nm. Due
∆Fmax (pN/atom)
*yfguo@nuaa.edu.cn 12
R. W. Carpick, Science 313, 184 共2006兲.
†wlguo@nuaa.edu.cn 13 J. Frenken, Nat. Nanotechnol. 1, 20 共2006兲.
‡ 14
chen@physics.unlv.edu S. Y. Krylov, K. B. Jinesh, H. Valk, M. Dienwiebel, and J. W. M.
1 C. M. Mate, G. M. McClelland, R. Erlandsson, and S. Chiang, Frenken, Phys. Rev. E 71, 065101共R兲 共2005兲.
Phys. Rev. Lett. 59, 1942 共1987兲. 15 A. Socoliuc, R. Bennewitz, E. Gnecco, and E. Meyer, Phys. Rev.
2 J. A. Ruan and B. Bhushan, J. Mater. Res. 8, 3019 共1993兲. Lett. 92, 134301 共2004兲.
3
U. D. Schwarz, O. Zwörner, P. Köster, and R. Wiesendanger, 16
G. A. Tomlinson, Philos. Mag. 7, 905 共1929兲.
Phys. Rev. B 56, 6987 共1997兲. 17 H. Hölscher, U. D. Schwarz, O. Zwörner, and R. Wiesendanger,
4 E. Liu, B. Blanpain, J. P. Celis, and J. R. Roos, J. Appl. Phys. 84, Phys. Rev. B 57, 2477 共1998兲.
4859 共1998兲. 18 N. Sasaki, K. Kobayashi, and M. Tsukada, Phys. Rev. B 54, 2138
5 R. Buzio, E. Gnecco, C. Boragno, and U. Valbusa, Carbon 40, 共1996兲.
883 共2002兲. 19 N. Sasaki, M. Tsukada, S. Fujisawa, Y. Sugawara, S. Morita, and
6 M. Dienwiebel, G. S. Verhoeven, N. Pradeep, J. W. M. Frenken, J. K. Kobayashi, Phys. Rev. B 57, 3785 共1998兲.
A. Heimberg, and H. W. Zandbergen, Phys. Rev. Lett. 92, 20 W. L. Guo and Y. F. Guo, J. Am. Chem. Soc. 129, 2730 共2007兲.
155429-5