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Semiconductor Devices and Circuits

Unit 3

Junction and other Diodes

Dr. Pramod Kumar Tiwari


Associate Professor
EE, IIT Patna
Unit Content

• Junction and other Diodes: Physical description of p-n junction,


Forward and reverse bias, depletion region, depletion and diffusion
capacitance, transport equations, current voltage characteristics and
temperature dependence, tunnelling current, Diode breakdown:
Avalanche and Zener, Metal Semiconductor Junction, Varactor Diodes,
Tunnel Diode;

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References

• S. M. Sze, Semiconductor Devices: Physics and Technology, Wiley


• S. M. Sze, Physics of Semiconductor Devices, Wiley
• D. A. Neamen, Semiconductor Physics and Devices, Mc Graw Hill
• Streetman, and Banerjee, Solid State Electronic Devices, Pearson

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p-n Junction (Diode)
• In a p-type substrate, a small n-type
region is created, or vice versa
A K
p n

Applications of PN Junction: Rectification, switching,


waveform shaping, other devices like BJT, thyristors,
and MOSFETs

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https://www.electricaltechnology.org/2018/12/types-of-diodes-their-applications.html
Slide 4

H1 HP, 9/25/2021
Fabrication Steps
N-type Si Substrate with required crystal
orientation and resistivity

Wet/Dry Oxidation

Application of resist

Resist Exposure through Mask (Transferring


of Pattern)
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Fabrication Steps
Etching of the weaker Diffusion (Junction
portion (Pattern Transfer) Formation)

Metallization
SiO2 Removal for Contacts
Creation

P-n Junction
Resist Removal Complete View
after processes
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p-n Junction Current Voltage Characteristics
Forward Bias: Current increases rapidly
with applied voltage. The applied voltage
under forward bias is usually less than 1V

Reverse Bias:
Current is very small and does not
increase significantly with bias voltage

Breakdown: When the reverse bias


voltage becomes equal to some critical
voltage, the current increases at
significant rate, the break down voltage
can vary from few volts to thousands of
volt depending upon material and device
design

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Band Bending (Revisit)
p n Band bending is the variation in band energies with position
E when an electric field exist inside the material
E

KE
Potential Energy (PE) of an Electron
EC
PE −𝑞𝑉 = 𝐸 − 𝐸

EV where, V is the electrostatic potential


Eref
1
𝑉=− 𝐸 −𝐸
V 𝑞

As, 𝐸 = − , the electric field can be written as


x
E 1 𝑑𝐸 1 𝑑𝐸 1 𝑑𝐸
𝐸= = =
x 𝑞 𝑑𝑥 𝑞 𝑑𝑥 𝑞 𝑑𝑥
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p-n Junction under Thermal Equilibrium
 At the physical junction, space charge regions are
Band Diagram created on each side of the junction as a result of
diffusion of the carriers across the junction

 In space charge region, also called as depletion region,


the mobile carrier concentration will be low

 Towards the p-side there will uncompensated negatively


charged acceptor ions. Uncompensated positively
charged donors ions will be present towards n-side of the
junction

 Space charge regions create an electric field that will be


directed from n-side to p-side

 The electric field give rise to electron and hole drift


current as per the movement of the carriers shown in
the picture
 In the equilibrium, the drift current will cancel the
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diffusion current 9
p-n Junction under Thermal Equilibrium
Fermi Levels In thermal equilibrium, electron and hole current flowing
across the junction will be zero. For each type of carriers, the
drift current will balance the diffusion current.

The total hole current:

As:

1 𝑑𝐸
𝐸=
𝑞 𝑑𝑥

𝑘𝑇
Now, we know that 𝐷 =
𝑞
𝜇

( ) 𝑑𝑝 𝑝 𝑑𝐸 𝑑𝐸
= −
𝑑𝑥 𝑘𝑇 𝑑𝑥 𝑑𝑥
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p-n Junction under Thermal Equilibrium

Thus, the total hole current density For zero net current, the Fermi Level has
to be constant.
1 𝑑𝐸 𝑑𝑝
𝐽 = 𝑞𝜇 𝑝 − 𝑘𝑇𝜇
𝑞 𝑑𝑥 𝑑𝑥
Built in Potential
1 𝑑𝐸 𝑝 𝑑𝐸 𝑑𝐸 𝑉
𝐽 = 𝑞𝜇 𝑝 − 𝑘𝑇𝜇 −
𝑞 𝑑𝑥 𝑘𝑇 𝑑𝑥 𝑑𝑥

𝑑𝐸
𝐽 = 𝑝𝜇
𝑑𝑥

Similarly, the total electron current density The total electrostatic potential
difference between p-side and n-side
𝐽 = 𝑛𝜇
𝑑𝐸 neutral regions at thermal equilibrium
𝑑𝑥 is called the built in potential
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Built in Potential

1
𝜓 =− 𝐸 −𝐸
𝑞 𝑘𝑇 𝑁 𝑘𝑇 𝑁
Similarly, 𝑉 = 𝑙𝑛 + 𝑙𝑛
( ) 𝑞 𝑛 𝑞 𝑛
𝑘𝑇 𝑁
Using 𝜓 = 𝑙𝑛
𝑞 𝑛

And 𝑝 = 𝑁 Thus, built in voltage 𝑘𝑇 𝑁 𝑁


𝑉 = 𝑙𝑛
𝑞 𝑛
𝑘𝑇 𝑁 𝑉 =𝜓 −𝜓
𝜓 =− 𝑙𝑛
𝑞 𝑛

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Built in Potential
Calculate the built in potential for a Si p-n
junction with and
at 300K.

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Depletion Region Width (Abrupt Junction)
𝑑 𝜓 𝑞𝑁
=
𝑑𝑥 𝜖

Similarly for 0 < 𝑥 ≤ 𝑥

𝑑 𝜓 𝑞𝑁
=−
𝑑𝑥 𝜖
To maintain the charge neutrality, total charge per unit area in p-
The Poisson’s Equation side depletion region must be equal to the total charge per unit
𝑑 𝜓 𝜌 area in n-side, thus
=−
𝑑𝑥 𝜖 𝑁 𝑥 =𝑁 𝑥
where 𝜌 is charge density and 𝜖 is the material
permittivity Total depletion region width is

For −𝑥 ≤ 𝑥 < 0, The above equation can be 𝑊 = 𝑥 +𝑥


written as
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Electric Field (Abrupt Junction)
For −𝑥 ≤ 𝑥 < 0 Substituting c in the electric field
equation, gives the following field
𝑑 𝜓 𝑞𝑁 equation in −𝑥 ≤ 𝑥 < 0
=
𝑑𝑥 𝜖
𝑞𝑁
𝐸=− 𝑥+𝑥
Integrating above Equation: 𝜖
𝑑𝜓 𝑞𝑁
= 𝑥+𝑐 The peak of the Electric Field is observed
𝑑𝑥 𝜖
at 𝑥 = 0, which is
Electric Field in −𝑥 ≤ 𝑥 < 0

𝑑𝜓 𝑞𝑁 𝑞𝑁
𝐸=− =− 𝑥−𝑐 𝐸=− 𝑥 = −𝐸
𝑑𝑥 𝜖 𝜖

At 𝑥 = −𝑥 , 𝐸 = 0 Where 𝐸 is the magnitude of peak of


electric field.
Thus , 𝑐 = 𝑥

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Electric Field (Abrupt Junction)
For, 0 < 𝑥 ≤ 𝑥 Thus, Electric Field in 0 < 𝑥 ≤ 𝑥

𝑑 𝜓 𝑞𝑁 𝑞𝑁 𝑞𝑁
=− 𝐸= 𝑥−𝑥 = −𝐸 + 𝑥
𝑑𝑥 𝜖 𝜖 𝜖
Integrating the above equation
𝑑𝜓 𝑞𝑁
=− 𝑥+𝑐 Now, built in voltage can be also determined
𝑑𝑥 𝜖
by Electric Field Equation as
Electric Field in 0 < 𝑥 ≤ 𝑥

𝑑𝜓 𝑞𝑁 𝑉 =− 𝐸 𝑑𝑥 = − 𝐸 𝑑𝑥 − 𝐸 𝑑𝑥
𝐸=− = 𝑥−𝑐
𝑑𝑥 𝜖
At 𝑥 = 0, 𝐸 = −𝐸 , 𝑞𝑁 𝑞𝑁
𝑉 =− − 𝑥+𝑥 𝑑𝑥 − 𝑥 − 𝑥 𝑑𝑥
𝜖 𝜖
Thus 𝑐 = 𝐸
𝑞𝑁 𝑥 𝑞𝑁 𝑥
Further at 𝑥 = 𝑥 , 𝑐 = 𝑥 𝑉 =− −𝑥 −− −𝑥
𝜖 2 𝜖 2
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Depletion Region Width (Abrupt Junction)
𝑞𝑁 𝑥 𝑞𝑁 𝑥 Using Charge neutrality equation
𝑉 = + 𝑁 𝑥 = 𝑁 𝑥 in the above
2𝜖 2𝜖
equation
Area under the electric field curve is
also equal to built in voltage, thus 1 𝑞𝑁 𝑁
𝐸 𝑊= +1 𝑥
2 2𝜖 𝑁
1
𝐸 𝑊=𝑉
2
Now, using 𝑥 = 𝐸 to eliminate 𝑥
Thus the depletion width
1 𝑞𝑁 𝑁 𝜖 𝐸
𝐸 𝑊= +1
2𝑉 2 2𝜖 𝑁 𝑞𝑁
𝑊=
𝐸
Further, Solving the above equation, we get
𝑁 𝜖 𝐸
1 𝑞𝑁 𝑥 𝑞𝑁 𝑥 𝑊= +1
𝐸 𝑊= + 𝑁 𝑞𝑁
2 2𝜖 2𝜖
Now eliminating 𝐸 using 𝑊 =
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Depletion Region Width (Abrupt Junction)
Electric Field in one-sided
Now eliminating 𝐸 , using 𝑊 = , we get junction is
𝑞𝑁 𝑞𝑁
𝐸= 𝑥 − 𝑊 = −𝐸 + 𝑥
2𝜖 1 1 𝜖 𝜖
𝑊= + 𝑉 where, 𝑊=𝐸
𝑞 𝑁 𝑁
𝑥
Thus, 𝐸 = −𝐸 1−
𝑊
One sided Junction
Now, the potential profile
If 𝑁 ≫ 𝑁 , 𝑥 ≪ 𝑥 , The total
𝜓 𝑥 =− 𝐸 𝑥 𝑑𝑥
depletion width can be given as
𝑥
=𝐸 𝑥− +𝑐
2𝜖 1 2𝑊
𝑊≅𝑥 = 𝑉 Iet us consider that potential is zero in neutral p region
𝑞 𝑁
𝑉 𝑥 𝑥
𝜓 𝑥 = 2−
𝑊 𝑊
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Impact of the Bias Voltage
The depletion width in one sided p-n junction,
under bias voltage

2𝜖 1 𝑉 = 0, in Equilibrium
𝑊= (𝑉 −𝑉) 𝑉=𝑉 in Forward Bias
𝑞 𝑁
𝑉=𝑉 in Reverse Bias

 In Forward Bias, the voltage drop across the


depletion region decreases, therefore the
band bending and the width of the depletion
region also decreases

 In reverse bias, the voltage drop across


depletion, band banding, and the depletion
width increases with increasing bias voltage
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Depletion Capacitance p Na Nd n V

• Depletion layer capacitance per unit area

𝑉 + 𝑑𝑉
p n
Considering an abrupt one-sided junction
Charge Density

𝑑𝑄

Position
-𝑑𝑄

Vs. V produces a strait line. The slope provides impurity concentration


of n side, and the intercept on voltage axis gives
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Depletion Capacitance

• For one sided abrupt junction with ,


calculate the junction capacitance at zero bias and reversed bias of 4V (T=300K).
The built in voltage: 𝐶 = = 2.78 × 10 F/cm
|

2 × 10 × 8 × 10 Similarly,
𝑉 = 0.0259 × 𝑙𝑛
9.65 × 10
= 0.906𝑉 2𝜀 (𝑉 −𝑉)
𝑊 =
𝑞𝑁
2𝜀 𝑉
𝑊 =
𝑞𝑁 2 × 11.9 × 8.85 × 10 × 4.906
=
1.6 × 10 × 8 × 10
2 × 11.9 × 8.85 × 10 × 0.906
= = 0.899µm
1.6 × 10 × 8 × 10
= 0.386µm 𝜀
𝐶 = = 1.172 × 10 F/cm
𝑊|
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Varactor Diode
Many circuits utilize voltage variable property of
reverse bias p-n junction

For a reverse Biased p-n junction:

𝐶 ∝ 𝑉 +𝑉

or, 𝐶 ∝ 𝑉 for 𝑉 ≫ 𝑉

𝑛 = for lineally graded Junction

𝑛= is used for an abrupt junction


𝑛> is used for an hyperabrupt junction

Voltage sensitivity is greater for an abrupt junction


https://en.wikipedia.org/wiki/Varicap#/media/File:AMFMM_01.jpg
https://electronics.stackexchange.com/questions/268970/using-a-varactor-diode-to-tune-a-resonance-frequency
10/18/2021 Dr. P. K. Tiwari 22
Current-Voltage (I-V) Characteristics
Modeling of I-V Characteristics:
A
Assumptions:
RL

V Depletion region has abrupt boundaries, outside the


boundaries semiconductor is neutral

Carrier density at the boundaries of depletion region depend


upon the potential difference across the depletion region

Low carrier injection condition

 Carrier generation and recombination is negligible in the


depletion region

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Current-Voltage (I-V) Characteristics
Under equilibrium
p - 𝑉 +
Built in voltage n
Depletion Region

Carrier Concentration
𝑘𝑇 𝑁 𝑁
𝑉 = 𝑙𝑛
𝑞 𝑛 𝑝
𝑛
𝑘𝑇 𝑝 𝑛
𝑉 = 𝑙𝑛
𝑞 𝑛 𝑝
𝑛

This can be re-written as Position

𝑘𝑇 𝑛 𝑘𝑇 𝑝 𝑛 =𝑛 𝑒
𝑉 = 𝑙𝑛 = 𝑙𝑛
𝑞 𝑛 𝑞 𝑝
𝑝 =𝑝 𝑒
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Current-Voltage (I-V)
Characteristics
Charges under non-equilibrium

𝑛 =𝑛 𝑒

𝑝 =𝑝 𝑒

Using the equations of equilibrium and non-equilibrium

𝑛 𝑛 𝑒
=
𝑛 𝑛
𝑒
Under low level injection 𝑛 = 𝑛 , thus
FB RB
𝑛 =𝑛 𝑒
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Current-Voltage (I-V)
Characteristics
Thus excess minority carrier concentration at 𝑥 = −𝑥 is

∆𝑛 = 𝑛 − 𝑛 =𝑛 𝑒 −1

Similarly excess minority carrier concentration at 𝑥 = 𝑥

∆𝑝 = 𝑝 − 𝑝 =𝑝 𝑒 −1

Now, the excess carriers will diffuse in n and p regions as


per following equations (one-sided carrier injection)

∆𝑛 𝑥 = 𝑛 𝑒 −1 𝑒

∆𝑝 𝑥 = 𝑝 𝑒 −1 𝑒

where, 𝐿 = 𝐷 𝜏 and 𝐿 = 𝐷 𝜏

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Current-Voltage (I-V) Characteristics
Now, the diffusion current at 𝑥 = 𝑥 and 𝑥 = −𝑥 , respectively is

𝑑𝑝 𝑞𝐷 𝑝
𝐽 𝑥=𝑥 = −𝑞𝐷 = 𝑒 −1
𝑑𝑥 𝐿

𝑑𝑛 𝑞𝐷 𝑛
𝐽 𝑥 = −𝑥 = −𝑞𝐷 = 𝑒 −1
𝑑𝑥 𝐿

Total current in the depletion as well as in other regions of the


device

𝐽 = 𝐽 (𝑥 = −𝑥 ) + 𝐽 (𝑥 = 𝑥 )

𝐽=𝐽 𝑒 −1

where, 𝐽 = + : Saturation current density or Scale current


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Current-Voltage (I-V) Characteristics

𝐽=𝐽 𝑒 −1

For 𝑉 ≥ , the rate of current increase is constant

At T=300K, for every 1 decade change in the current, the voltage change is 60mV.

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Effects of Non-Idealities
The total device current

𝐼=𝐼 𝑒 −1 +𝐼 𝑒 −1

𝐼≅𝐼 𝑒 −1
Under low forward bias voltage, generation
recombination current dominates, thus

Under medium forward bias condition, diffusion


current dominates, thus

At very high forward bias voltage, low level injection condition is violated and diode
behaves like a resistor. Voltage drop across the neutral regions are significant and injected
carriers will also drift. Total current will be determined by resistance of p and n regions as
well 10/18/2021
as contacts. Dr. P. K. Tiwari 29
Diffusion Capacitance
Under forward bias condition, minority charges
accumulated in the neural regions, next to depletion
region, give rise to the diffusion capacitance ( . The
diffusion capacitance in one-sided junction (p+-n) can be
given as
𝑑𝑄
𝐶 =
𝑑𝑉

Where, 𝑄 = 𝑞 ∫ 𝑝 −𝑝 𝑑𝑥

𝑄 = 𝑞∫ 𝑝 𝑒 −1 𝑒 𝑑𝑥 = 𝑞𝐿 𝑝 𝑒 −1 =𝜏 𝐽 𝑥

Now, 𝑑𝑄 𝑞 𝐿 𝑝
𝐶 = = 𝑒
𝑑𝑉 𝑘𝑇
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Small-Signal Model

To account for the current through the device, we use a conductance G

𝑑𝐼 𝐴𝑑𝐽 𝑞𝐴 𝑞𝐼 𝐼
𝐺= = = 𝐽 𝑒 = =
𝑑𝑉 𝑑𝑉 𝑘𝑇 𝑘𝑇 Φ

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Transient Behavior
Under forward bias, the total stored
minority charges in neutral n-region of
a p+-n junction is

Turn-off time ( ) is the length of


time required to remove the total
charge

𝑄 =
𝜏 𝐼
=
𝑡 𝐼 : Average Current Flowing during the
𝐴 𝐴
turn-off period
𝐼
𝑡 =𝜏
𝐼
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