Classification of methods for deposition of platinum on counter electrode of

a DSSC:
Methods used for Platinum deposition:
1. Spray Deposition method
2. Spin coating
3. Screen printing the paste of platinum
4. Drop casting: A drop of platinum sol. is deposited on the surface of the electrode.
5. Dip coating/Direct soaking of substrate in platinum sol./CBD(Chemical Bath
deposition):
6. Sputter deposition method: it provides the controlled fabrication of good quality
coatings with very good adhesion to substrate
7. ALD (Atomic layer deposition): Variant of CVD(Chemical vapor deposition)
technique where gaseous reactants (precursors) are introduced into the reaction
chamber for forming the desired material via chemical surface reactions.
• Suited for preparing high-quality conformal thin films
• relatively low deposition temperatures
• The thickness of the deposited films can be controlled by simply counting the
number of ALD process cycles
• Plasma-assisted atomic layer deposition (ALD) processes were developed for
the deposition of platinum films at room temperature.
8. Inkjet Printing:
9. Successive ionic layer adsorption and reaction (SILAR): In the SILAR
method, the substrate is immersed separately into two precursor solutions, and
washed in between with water to get rid of the loosely bound species.
10. FTCD (Flow through chemical deposition) method
11. Thermal reduction with ethylene glycol (EG): EG was selected as the solvent and the
reductant of H2PtCl6, since EG had low boiling point and low viscosity among the
polyols and the other products from the EG reduction of H2PtCl6 were simple and
readily removed.[1]
12. Nanostructures platinum films deposition: A Pt film was deposited by dropping 400 µL
of EG solution of H2PtCl6 on a substrate of 2 × 2 cm2 on a hot plate at 180 °C. The Pt film
was formed within 5 min. Then, the Pt film was cooled to room temperature in air, and
subsequently was rinsed with ethanol three times.[2]
13. Spray pyrolysis deposition (SPD) : Sprays a precursor solution toward the heated
substrate. To form a Pt top layer of the counter electrode, 10 mg of H2PtCl6 and 10 ml of
ethanol are mixed to prepare the spraying solution. The solution is sprayed on an FTO
conductive glass heated at 130°C. The formed film is sintered at 500°C for 30min. [3]
14. Pulsed laser deposition: Pulsed laser deposition (PLD) is a physical vapor
deposition (PVD) technique where a high-power pulsed laser beam is focused inside
a vacuum chamber to strike a target of the material that is to be deposited. This material
is vaporized from the target (in a plasma plume) which deposits it as a thin film on a
substrate

References:
 1. Min Young Song, Kiran N. Chaudhari, Jinsol Park, Dae-Soo Yang, Jung Ho Kim, Min-Sik
Kim, Kimin Lim, Jeajung Ko, Jong-Sung Yu, ’High efficient Pt counter electrode
prepared by homogeneous deposition method for dye-sensitized solar cell’
2. Kuan Sun, Benhu Fan, and Jianyong Ouyang, ’ Nanostructured Platinum Films
Deposited by Polyol Reduction of a Platinum Precursor and Their Application as
Counter Electrode of Dye-Sensitized Solar Cells’
3. Kenji Murakami , Sho Fujiwara, Daisuke Kobayashi, Hiroki Ishihara and Masaru Shimomura,
Nanostructural Control of Pt Layer on Counter Electrode for Application to Dye-Sensitized
Solar Cells
4. Wu, Tianxing; Wang, Guozhong; Zhang, Yunxia; Knag, Shenghong; Zhang, Haimin,
Electrochemical deposition of Pt on carbon fiber cloth utilizing
Pt mesh counter electrode during hydrogen evolution reaction for electrocatalytic
hydrogenation reduction of p-nitrophenol

No paper on Comparative study on thin film deposition of

platinum techniques

1 table for discarding not feasible models + details of feasible models comparative study
2 Sieve properties
3. carry out that