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KEYWORDS: strain gauge, rGO, direct GO patterning, shear alignment, high sensitivity, flexible substrate
Figure 1. Masked shear-alignment process. (a) The process starts with a blank substrate. (b) Then, a vinyl mask with the desired features is placed
on the substrate, (b) 0.5 mL of a GO dispersion is poured on the edge of the substrate, and (c) the dispersion is cast by moving a Doctor Blade. (d)
The mask is peeled off, and (e) remaining features on the substrate are reduced at 110 °C for 8 h and diced. (f) Photograph of the rGO film on the
substrate after the casting process. (g) FTIR spectra of the graphene-based sensor before and after reduction by thermal treatment. (h) XRD pattern
of the graphene-based sensor before and after reduction by thermal treatment.
2. EXPERIMENTAL SECTION the oxygen functional groups from the GO sheets to obtain a
conductive rGO film. In this regard, a heat treatment technique was
2.1. Preparation and Concentration of GO Dispersion. The used (at 110 °C for 8 h) to reduce the GO film (Figure 1e).
high concentration nematic liquid crystal phase of GO dispersion used During the drying and heat treatment stages, the thickness of the
in the fabrication is a shear-thinning fluid which allows casting of a GO film decreased substantially. A photograph of the rGO sensor
uniform liquid thin film under high shear stress imposed by the motion resulting from this casting process is shown in Figure 1f.
of a doctor blade, while a highly viscous phase in the absence of shear 2.5. Film Characterization. The GO film was characterized via X-
stress ensures uniformity during the subsequent film drying step. A low ray diffraction (XRD) and Fourier transform infrared (FTIR) methods
concentration GO (∼0.25 mg mL−1) was prepared by Hummers’ before and after reduction. The FTIR spectra were obtained using an
method30 followed by concentrating the dispersion by the dehydration attenuated total reflectance Fourier transform infrared (ATR-FTIR)
technique,27 where a cross-linked polyacrylate copolymer hydrogel was instrument (PerkinElmer, United States) in the range of 600−4000
used to absorb the water content until the desired concentration of 35 cm−1 at an average of 32 scans with a resolution of 4 cm−1. In the case
mg/mL was achieved. Polarized light microscopy using an LC- of GO, there was a strong and broad peak in the range of 3100−3700
PolScope imaging system (40× 0.75/0.85NA objective) was used to cm−1 and a peak at 1650 cm−1 corresponding to the stretching of
confirm the nematic phase of the GO dispersion.31,32 With the LC- hydroxyl groups, possibly from COOH groups in GO and/or the
Polscope technique, it is possible to detect the retardance along with presence of H2O in GO interlayers. Peaks at 1728, 1205, and 1070
their dominant orientation simultaneously at all points of the image cm−1 are attributed to stretching of the CO in carbonyl groups, C−
without having to mechanically rotate the sample (Figure S1). O−C in epoxide groups, and C−O in alkoxy groups, respectively.
2.2. PDMS Substrate Preparation. A mixture of Sylgard 184 Peaks at 1383 and 1400 cm−1 are attributed to the vibration of O−H
curing agent and base with a mass ratio of 1:10 was prepared. The in C−OH groups. The XRD patterns of the GO and rGO films were
mixture was then poured in to a 6″ Petri dish and placed in a recorded using a Phillips 1140 diffractometer with a Cu Kα line
desiccator for half an hour for degassing. Later, degassed PDMS was generated at 40 kV and 25 mA at a scan rate of 1°/min and a step size
thermoset for 6 h at 70 °C on a hot plate. Finally, the cured PDMS of 0.02°.
substrate was plasma treated with 18 W power under 0.3 mbar
pressure for 5 min (Harrick Plasma PDC-32G) to introduce oxygen-
bearing functionalities to improve adhesion with the GO dispersion. 3. RESULTS AND DISCUSSION
2.3. Masking Process. Rectangular patterns (35 × 10 mm) on the The FTIR spectra of the cast rGO film (Figure 1g) showed that
vinyl tape were drawn using CutStudio and programmed to be cut by a the oxygen functional groups experienced a reduction as
vinyl plotter (Roland SV-8). The plotter removes the rectangular
features from the vinyl tape (so that later the openings will be filled evidenced by a significant decrease in the intensity of the
with GO in the casting process). The desired sensor patterns were relevant oxygen functional group peaks and a presence a new
attached onto a plasma-treated 800 μm-thick PDMS substrate, peak at 1550 cm−1 which corresponds to a CC bond,
effectively masking selected regions on the substrate confirming reduction of the GO by the thermal treatment.
2.4. GO Film Casting. A simple lab-scale Doctor Blade (MTI Similarly, the XRD spectrum (Figure 1h) revealed that the
Corporation, United States) was used as a shear-alignment apparatus interlayer distance of the rGO film decreased from ∼0.91 nm
to cast a continuous GO film. A 0.5 mL of nematic phase GO (2θ = 9.68°) for the GO film to ∼0.39 nm (2θ = 22.8°),
dispersion (35 mg mL−1) was deposited at the edge of the mask confirming reduction of the GO sensor in agreement with the
(Figure 1b). To create the thin film, the Doctor Blade was then moved observed FTIR spectra for these two samples. The end result
over the surface of the vinyl. This enabled spreading of the GO
dispersion into the patterned features shown in Figure 1c and crucially after casting was a uniform 6.4 μm-thick continuous film of
provided the shear required for alignment of the graphene flakes. rGO on an 800 μm-thick flexible PDMS substrate, as shown in
Removal of the vinyl mask resulted in the desired GO patterns on the Figures 2a and b. The reduction step19 resulted in a wrinkled
substrate (Figure 1d), which was left overnight at room temperature to surface with a 928 nm root-mean-square (rms) surface
dry. With the casting process complete, the final step was to remove roughness (Figure 2c), as measured with an optical
22502 DOI: 10.1021/acsami.6b06290
ACS Appl. Mater. Interfaces 2016, 8, 22501−22505
ACS Applied Materials & Interfaces Research Article
4. CONCLUSION
In summary, a new type of flexible and highly sensitive rGO-
based strain sensor was demonstrated. The device combines a
low cost and scalable deposition method and a simple detection
circuitry with a very high sensitivity (gauge factor up to 261).
The sensor can accurately detect strains as small as 0.025%
under cyclic loadings, hence providing significant advantages
for continuous real-time monitoring of minute deformations.
Direct pattern transfer through a masking process primarily
allows multiple copies of identical devices to be produced by a
single fabrication step. It also provides significant potential to
further improve the sensor size and performance through
geometric modifications.
■
*
ASSOCIATED CONTENT
S Supporting Information
The Supporting Information is available free of charge on the
ACS Publications website at DOI: 10.1021/acsami.6b06290.
Formation of liquid crystals of graphene oxide,
experimental results for rGO on the polyamide 66
substrate, and tabulated gauge factors of the previous
works from the literature (PDF)
■ AUTHOR INFORMATION
Corresponding Authors
*E-mail: Tuncay.Alan@monash.edu.au.
*E-mail: Daniel.Lai@vu.edu.au.
Figure 4. (a) Response of rGO-coated PDMS to cyclic strain cycles Present Address
(0.05, 0.4, 0.8, and 1.2%) recorded with a 100 Hz sampling frequency. °
M.B.C.: Department of Mechanical Engineering, University of
(b) Response of the film after 50 cycles of strains under 0.6%. Voltage Texas at Dallas, Richardson, Texas 75080, United States.
output here is converted to the rate of change of resistance via eq 1.
(c) Percentage change in the resistance of rGO. The slope of the linear Author Contributions
•
fits defines the gauge factor as 137.2 ± 7.9 for strains below 0.8% and M.B.C. and A.A. contributed equally to the work. A.A.
261.2 ± 15.1 for strains above 0.8%. prepared the rGO samples and characterized material proper-
ties. M.B.C. fabricated the flexible sensors, performed the
experiments and analyzed the data. D.L and T.A. oversaw the
research. The manuscript was written through contributions of
higher strain inputs. Hence, the measurement range of the all authors. All authors have given approval to the final version
present devices were set from 0 to 2% strain. of the manuscript.
The common way to relate electrical changes to the Notes
mechanical parameters for the strain sensors is the gauge The authors declare no competing financial interest.
■
factor (GF). This is effectively a measure of the sensitivity of
the strain sensor and is acquired from the slope of the rate of ACKNOWLEDGMENTS
change of the resistance-strain curve23
Part of this work was performed at the Melbourne Centre for
ΔR Nanofabrication (MCN), the Victorian Node of the Australian
GF =
( R ) National Fabrication Facility (ANFF). The authors acknowl-
ε (2) edge support received from the Monash University Post-
graduate Publications Award and Monash Centre for Atomi-
The GF was calculated by fitting a line to the data shown in cally Thin Materials.
Figure 4c for the two regimes. Using the slope of these portions
of the response curve yields GF values of 137.3 and 261.2 for
strains below and above 0.8%, respectively. As the strain cycles
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