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DESIGN FOR X (DFX): KEY TO

COMPETITIVE, PROFITABLE PRODUCTS

_ _ _ _ _. - - David A. Gatenby and George Foo

George Foo is manu-


facturing and engineer-
Akeyto competitive, profitable product realization is
ing director of the AT&Tdesign for i.e., design for manufacturability, test-
X (DFX);
Little Rock Works, Lit- ability, installability, compliance, reliability, and other
tle Rock, Arkansas.
David A. Gatenby is
downstream considerations. is a philosophy and
DFX
supervisor of the practice thatensures quality products and services,
Design for X (DFX)
Technology and Imple-
reduces the time to market for a product, and minimizes
mentation group at life-cycle costs. Therefore, it is crucial to achieving custo-
AT&T Bell Laboratories mersatisfaction. This paper introduces as a strategic
DFX
in Princeton, New Jer-
sey. Mr. Foo is respon-
concept for product realization, provides a framework
sible for engineering, and examples oftechniques for supporting and
DFX,
new-product introduc- gives an overview ofthe otherpapers in thisissue ofthe
tion, and provisioning
of system solutions AT&T Technical Journal.
to the customer. He
2 joined the company in The DFX Concept
1977. Mr. Foo earned Overthe past several years, AT&T and many other companies
a B.S. in metallurgical havemadesignificant stridesin reducing both costs and productreali-
engineering from Poly- zation intervals and improving quality by reevaluating and streamlining
technic Institute of individual functions and processes. However, we are reaching a point
New York, Brooklyn; where additional cost reductions and efficiency improvements will be
an M.B.A. in finance increasingly difficult to achieve by concentrating solely on specific
from New York Univer- functions and processes.
sity; and a Ph.D. in Although wecontinue to strive for incremental improvements
materials engineering in unitprocesses, we now need to move to the next logical plateau of
from the Massachu- competitive advantage: integration and optimization ofthe entirepro-
setts Institute of Tech- duct realization process, or PRP. (See Panel 1for a listofacronyms.)
nology, Cambridge. Integrating and optimizing the PRP is especially critical for
Mr. Gatenby is responsi- largecompanies whosecompetitive advantage reliesonvertical inte-
ble for DFX technology gration. Further, the successofthese companies depends on howwell
and implementation in theyintegrate the various functional areas along the PRP andbusiness-
AT&T. He joined the operation chain. In the future, only those companies that recognize the
company in 1981. implications ofend-to-end integration-and are ableto capitalize on
Mr. Gatenby earned a it-can be competitive leaders. For example, the integration of
B.S. in computer and research and development (R&D) with production is an essential step
electrical engineering for U.S.-based companies to retainor regain technological preem-
(continued on page 13) inencein global markets.'

AT&T TECHNICAL JOURNAL. MAY/JUNE 1990


In the sectionsthat follow, we elaborate on the Panel 1. Acronyms in This Paper
DFX environment and describe howDFX ensures quality
productsand services, reduces time to market, and ASIC application-specific integrated circuit
minimizes life-cycle costs.Then, we discussDFX trade- BIST built-in self-test
offs and the electronic packaging hierarchy. CAD computer-aided design
The DFX Environment. In a noncompetitive environ- CAE computer-aided engineering
ment, designersofelectronic systemshavefocused pri- CMOS complimentary metal-oxide semiconductor
marily on productperformance and features without EMC electromagnetic compatibility
always considering downstream needs, i.e., the needs of ESD electrostatic discharge
the processesand operations that follow design. DFA design for assembly
True, a product'sprimary operating character- DFM design for manufacturability
isticsand functionality are essential. Butthe lackofinte- DFS designfor simplicity
gration between product design and other functions DFf designfor testability
resultedin productsthat were difficult to manufacture, DFX design for X, where X standsfor manufac-
install, service, and maintain. In addition, environmental, turability, installability, reliability, safety,
safety, and reliability considerations sometimes were not serviceability, and other downstream con-
considered in productand processdesigns. The priceof siderations beyond performance and
this lack offorethought was oftenredesign, production functionality
and deployment expense, and market-entry delays. Fig- GaAs gallium arsenide 3
ure la depicts this nonintegrated, pre-DFX environment. IC integrated circuit
DFX is an integrated approach to designing lEAP Inter-Entity Assignment Program
productsand processesfor cost-effective, high-quality IM&M information movement and management
downstream operations from manufacture (including PRP productrealization process
fabrication, assembly, and test) through service and PWB printed-wiring board
maintenance. [The X in DFX standsfor manufacturability, R&D research and development
installability, reliability, safety, serviceability, and other ROM read-only memory
downstream considerations beyond performance and SRAM staticrandom-access memory
functionality. In AT&T and elsewhere.l DFX has also VLSI verylarge-scale integration
been called designing for the "ilities." The term DFX is
an extension ofthe well-known terms DFA (design for service, and maintenance-while considering reliability,
assembly), DFM (design for manufacturability), and DFf environment, and safety. The integrated DFX environ-
(design for testability) and preservesthe design for con- mentleads to higher quality, reducedtimeto market,
cept. It is flexible enough to accommodate alldown- and lowercost.
stream considerations-some ofwhich do not havean Quality. Aquality designis one that meets or
ility suffix, e.g., safety and compliance.] exceedsthe full range ofdesignobjectives requiredto
As Figure lb shows, productand process design satisfy a company's customers-i.e., performance and
are integrated from end to end in the DFX environment. features, as well as DFX considerations. Akey concept in
This integration across PRP and business-operation func- AT&T for process-quality management and improvement
tions permitsthe designofproductsand processesfor is the customer-supplier model (Figure 2).3
easier manufacture, distribution, installation, operation, In the DFX environment we showin Figure lb, the

AT&TTECHNICALJOURNAL. MAY/JUNE 1990


---" "-"" -----------

Process Product
design design
Process
Product design
design

------- " Process


I /
'\ design
I Environmental, safety, \
\ and ~elia~i1ity J
\ engineenng /
" -.._-----" /

* Customers are responsible


for these activities for some
products.

o Environmental, safety,

________________J
and reliability concerns I

(a) (b)

Figure 1. The design environment. (a) Before DFX principles product and process design are integrated end to end. Pro-
were used, product designers focused on product features, ducts and processes are designed for downstream X con-
functions, and performance (operational characteristics) siderations (ease of manufacture, distribution, installation,
and were decoupled from manufacturing, installation, and operation, service, and maintenance, each with associated
service engineers. Environmental and safety specialists and reliability, environmental, and safety concerns), as well as
reliability engineers were often decoupled from designers for operating features and performance.
and other engineers, as well. (b) In the DFX environment,

AT&TTECHNICALJOURNAL. MAY/JUNE \990


functions are linked through customer-supplier relation-
shipsand are driven by the customer's quality require-
ments, as well as by internal businessobjectives. DFX
II
requirements andfeedback are key elements in each of
the customer-supplier relationships in the PRP.
The fourth phase ofthe quality-systems
evolution-that is, quality by design-goes beyond the

l._~__
first three phases (inspection, process control, and quality
improvement).4 In this phase,quality is designed intothe
product and intothe manufacturing process, starting
with the initial concept ofthe product. Designed-in qual- Requirements Requirements
ityis a primary characteristic ofthe DFX approach. In and feedback and feedback
terms ofthe cost ofquality (i.e., the coststo prevent, ---l

appraise, and correct defects), the emphasis ofDFX is on


preventing defects early in the PRP rather than finding Figure 2. In thi~ customer-supplier model, customer require-
them downstream. DFX helps to achieve manyofthe ments and feedback-as well as internal business
attributes ofthe broad definitions ofquality-e.g., fitness obJectives-drive the process as it converts supplier inputs
for use, which includes reliability, and ease ofinstallation, into outputs delivered to customers. These customer-
service, and maintenance." supplier relationships link all functions in the DFX environ- 5
Time to Market. Through DFX, wecan reducethe ment, Figure 1b. (Reproduced from Process Quality Manage-
PRP time-to-market interval by minimizing the numberof ment and Improvement Guidelines. 3 )
designiterations and changes, instituting parallel proc-
esses, and eliminating activities that do not addvalue. neerint) embodies inherentrisks,the benefits ofparal-
In previous years (thepre-DFX days), there was lelism can be substantial when this approach translates
little dialog between design and manufacturing during intogettingproducts to marketfaster.
product development. A product's designers rarelycon- Cost. From80to 90percentofthe total life-cycle
sideredmanufacturing's needs in their designs. Process cost ofa product (e.g., manufacturing, distribution,
designers wereforced to tailor their processesaround a installation, and servicing) is determined during the
productdesign that often wasnot compatible with exist- designphase. But as Figure3 shows, the design-phase
ing processes. In the DFX environment, that is no longer efforts representonly about5 percentofthe life-cycle
true. For existing downstream processes, DFX is some- costs. The downstream functions contribute a sizable
timesviewed as designing intofixed processwindows. percentage ofthe totalbusiness-cost and expense base.
Whenneither product nor processdesigns are fixed, or Thus, products that have notbeen designed for down-
whennewproducts are designed intonewprocesstech- streamneeds have notbeen designed to optimize our
nologies, major opportunities existfor concurrent pro- business objectives.
duct and processdesign. DFX techniques are key ena- Tradeoffs. For a DFX methodology to be success-
blersfor this concurrency. ful, the development teamthat is formed mustconsistof
Although simultaneous product and process designers andindividuals from the otherfunctional areas
design (sometimes referredto as concurrent engi- that are part ofthe PRP.

AT&TTECHNICALJOURNAL. MAY/JUNE 1990


important for mechanical piece-parts andhousings," as
High well as for silicon integrated circuits (ICs) and printed-
wiring boards (PWBs).
Similarly, the teammustconsciously evaluate
tradeoffs between DFX and performance or functionality

t
considerations. For example, an assembly that hasfewer
parts is usually mucheasierto manufacture. However,
one criterion for eliminating a partis that its elimination
~
o does not affect the assembly's function. Alternatively, the
assembly's function could be reengineered, so thatthe
part could be eliminated or combined with anotherpart.
Similarly, reducing the numberofgates on an IC
Low 1-0::::::::::..- _ could leadto a lower cost chip. Butmaintaining the
Time- requiredfunctions, while reducing the gate count, canbe
Conceptual Production Operation
a challenge. For example, whencircuits that generate
design and dual-tone, multifrequency signals for dialing werecom-
evaluation binedwith those that produce the telephone's ring, a
Full-scale
development
Distribution and,
installation
Service and
maintenance
cost-effective, single-chip implementation ofa telephone
6 circuit wasachieved. The gate countwashalved, com-
paredto separate dialing and ringing circuits."
These typesofDFX relationships and tradeoffs,
Figure 3. Design and Iife-cycle costs. The earliest stages of their inherentinterdisciplinary scope, and rapid changes
product realization have the greatest effect on Iif~cycle in many technologies allmakeDFX complex. Product
costs, yet they represent the smallest proportion of life- development teams mustworktogetherto understand
cycle expenditures. the breadth ofdesignobjectives, including DFX consider-
ations, and makethe appropriate tradeoffs to ensure
The team needs to understand howa design's profitability as well as customer satisfaction.
attributes affect allthe Xs, so that one DFX concern is not Electronic Packaging Hierarchy. DFX considerations
inadvertently optimized at the expense ofanother. For are important for alllevels ofthe electronic packaging
example, suppose a development teamwants to combine hierarchy. For example, design fortestability (DFf) tech-
or integrate parts to improve assembly operations and niques'' are applied to devices, PWB assemblies (also
reliability. The teamalsoneeds to consider: known as circuit packs), and unitsand systems.
- Manufacturability from a parts-fabrication viewpoint. Designing for electrostatic discharge (ESD) pro-
- Repairability and serviceability. tection" andfor electromagnetic compatibility (EMC) 11
- Material-logistics overhead for introducing additional, also requiresDFX for every packaging level. For example,
unique parts. (Material logistics is the planning, man- we must design for ESD protection at the:
aging, and movement ofmaterials neededto manu- - Device level-e.g., apply CMOS (complementary metal-
facture a product and deliver it to customers.) oxide semiconductor) protection-circuit design rules.
- The effects on purchasing volumes ofexisting parts. - Board level-e.g., selectdevices with the highest pos-
These parts-reduction DFX considerations are sible ESD thresholds.

AT&TTECHNICAL JOURNAL • MAY/JUNE 1990


- Unitand system levels-e.g., provide groundingand One usually acquires DFX knowledge through
circuit-isolation arrangements. experimentswith test vehicles (e.g., IC and PWB inter-
Similarly, designingfor EMC is necessary at the: connection features), failure-mode and effects analyses,
- Device level-e.g., minimize IC emissions. or experienceswith designs and downstream operations
- Boardlevel-e.g., apply filtering and grounding tech- (e.g., servicing or maintaining electronic products). The
niques in the layout. systematic acquisition of DFX knowledge is a first step
- Unitand system levels-e.g., use shielded enclosures toward implementing DFX in productand process designs.
and cabling. Once understood, DFX knowledge can be com-
Evendesign for assembly (DFA), a well-known municated in severalforms:
DFX approach for mechanical assemblies, is importantfor - Verbal-e.g., in dialogs with DFX experts or in multi-
device-packaging and circuit-pack design. functional development teams
DFX must be integralto product realization to - Written-e.g., in designguidelines, rules, standards,
achieve high quality, rapid product introduction, and or practices
profitability. This integration must be driveninto educa- - Digitally encoded-e.g., in computerized databasesof
tionalprograms,product realization processes and infor- components and design rules.
mation systems, and organization and reward systems. The mode ofcommunicating DFX knowledge influences
The next sectiondescribes DFX-related tech- its effectiveness. For example, rule-based toolscan be a
niques in each ofthese areas. must for some applications. However, DFM experts have
observedthat some product-design techniquesdepend 7
Supporting DFX in Product Realization too much on rules and that these rules are no substitute
DFX considerations should be built into every for experienced people.l/
design early in the product realization process. In this Throughout the PRP, clear,continual communi-
section, we describe the mechanisms for supportingDFX cationof DFX knowledge is essential.
in the PRP: Development Process. Here, we discuss methods
- The technicalcore: knowledge base, development for applying DFX knowledge in development processes.
processes, and information systems A carefully formulated and documented PRP
- Education and training description or methodology is needed to achieve produc-
- Managerial considerations, such as organization and tivity and quality improvements, especially for complex
reward systems. electronic products, such as computersand network-
Communication and teamwork, which underlie allthese systems equipment.
support mechanisms, are also briefly discussed. Process definitions include DFX-related tasks at
Knowledge Base. DFX knowledge is the under- key pointsin the development process.Among these
standingof how a design's attributes affect downstream tasks are:
operations, and how the characteristicsof a downstream - Establishing DFX rules, guidelines, checklists, and
process constrain a design's attributes. For example, the targets
characteristicsof the fabrication process for ICs or PWBs - Team design or redesign activities
determine the minimum clearancesbetween intercon- - Team inspections, evaluations, and reviews ofa design
nectionson an IC or PWB. Similarly, the capabilities ofan relative to DFX considerations
injection-molding or sheet-metal-forming process deter- - TrackingDFX performance (e.g., the conformance to
mine the bend radiifor features on a mechanical part. rules, and the results in target X processes).

AT&TTECHNICALJOURNAL. MAY/JUNE 1990


Proceduresfor executingthese tasks are also important. designs-e.g., when combined withrobust-design
For example, disciplined processes for design reviews'! approaches.P'-! Today'semergingdesign-automation
and inspections'! are considered best practices that systems are incorporating more DFX considerations into
reduce design defects. their on-line knowledge bases and algorithms. Examples
Teamworkis essential to achieve DFX. Selecting includeexpert systemsfor PWB producibility.F synthesis
the right team for each activity is crucialto an effective toolsthat incorporate built-in self-test (BIST) ,23 and
process. Integratinginformation systems into the pro- optimization systems that use robust circuitdesign'" to
cess is also important. For example, on-line design sys- improve the yieldsofsemiconductor manufacturing. DFX
tems at severallocations can be networked, so that support is one advantage of in-house developed CAE/CAD
designers and manufacturers at those sites simultane- systems.
ouslyviewdesigns and jointly improve DFX in real time. Education and Training. Courses and workshops on
Information Systems: CAE/CAD. Here, we discuss the technical aspects of DFX knowledge, processes, and
computer-aided engineeringand computer-aided design CAE/CAD systems are importantfor enhancingthe DFX
(CAE/CAD) support ofDFX. skillsofthe development team. Day-to-day teamwork
In a CAE/CAD environment, DFX can be sup- withpersonnelfrom other functions is also an important
ported in manyways. The CAE/CAD tools can: part ofthe DFX education and trainingprocess.
- Manage DFX knowledge on line-e.g., in component Rotations and internships [acrossfunctions in
or DFX-rule databases." the DFX environment (Figure 1b)1are excellent ways to
8 - Build in DFX considerations automatically-e.g., incor- accelerate DFX knowledge acquisition and appreciation.
poratetestability into circuitsand physical layouts.v'! For example, the Inter-Entity Assignment Program
- Audit designs against DFX rules-e.g., design-rule (lEAP) at AT&T BellLaboratories (a division ofAT&T)
checkingof PWBs and of VLSl (verylarge-scale integra- enables BellLaboratories designers to spend 6 to 12
tion) chips.I0.15,16 months in manufacturing organizations. Designerswho
- Model or predict DFX performance or behavior-e.g., have participated in the lEAP havelearnedvaluable DFM
for manufacturing yields of chips'? and for board- and lessons that they have shared withtheir development
system-level reliability.l" teams. lEAP alsogives manufacturing engineers the
- Enableon-lineDFX reviews-e.g., via networked opportunity to spend 6 to 12 months in design organiza-
CAE/CAD systems used for simultaneously reviewing tions at BellLaboratories. Internshipsin other functional
and improving DFX of mechanical and PWB designs and areas, such as marketing, are also offered.
documentation. Personnel at alllevels need to understand DFX
CAE/CAD support of DFX is closely coupled with concepts and the relationship ofthese conceptsto pro-
the development methodologies and PRP definitions dis- ductivity and quality improvement. And, they need to
cussed in the previous section. Where DFX criteria are understand that DFX requires skillsand discipline that
more subjective or qualitative (e.g., designingfor foresee- may differ from those embedded in past, traditional cor-
able misuse to enhance product safetyand preventliabil- porate cultures.Top-management supportofDFX is essen-
ityl9) , development processes and checklistprocedures tialbecause DFX activities typically require increased
are the dominant means of DFX support. efforts earlier in the PRP, withpaybacks to be reaped
Simulation and modeling techniques (e.g., for downstream. Middle managers need to understand the
circuitand physical designs) are increasingly important reasons for changingtheir operations and allocating peo-
to ensure proper design margins and robustness of plefor DFX-related activities. Personnelat the operational

AT&TTECHNICAL JOURNAL • MAY/JUNE 1990


levels need an appreciation for DFX and its benefits to engineersis to combine them intoa single organization
help motivate them to implement DFX in their work. that reportsto a common manager. Thus, manufactura-
Universities have started to pave the way for DFX bility becomes a common, high-priority goalthat
by emphasizing designand the interaction ofmultiple designersand manufacturers workonjointly from
disciplines in engineering curricula and research. Exam- design concept through production. The Japanese have
plesinclude graduate-level DFM courses'" for mechanical been particularly successful at the teamapproach. Their
design, and research in rc designfor enhanced yields manufacturers are involved at productconception, and
and designcentering. 26•27 Afundamental need at alllev- their designersare involved through the start ofproduc-
els ofour educational systemis to emphasize cooperative tion. Variations on this approach have proved successful
or team learning, notjust individual learning. Team atti- in many industries.F-" Atthe macro level, AT&T's
tudes, methods, and communication skills need to be recent restructuring intofocused business unitsis help-
nurtured to laya solid foundation for DFX practitioners. ing us to achieve some ofthe end-to-end PRP integration
Organization and RewardSystems. Successin high- that improves DFX.
technology markets cannotbe achieved through tech- DFX accomplishments need to be singled out and
nical solutions alone. People-the human resources of rewarded. For example, in determining teamand indivi-
a business-have many nontechnical needs and dimen- dualperformance, DFX should haveequalor higher
sionsthat must be recognized and managed for DFX suc- weightthan fire fighting (Le., solving an immediate prob-
cess. Some productivity expertscontendthat the major lem) , thus creatinga balance between DFX and short-
problems ofour work are more sociological than techno- term needs. 9
Iogical/" This is especially relevant for the multifunc- DFX innovations must be highly valued, just as
tional teams requiredfor DFX. functional innovations havebeen in the past. These
Organizational approaches and reward systems values should be reflected in reward systems, because
are people-oriented DFX supportmechanisms that have both DFX and functional innovations translate into
tremendous leverage. Buthistorically, they have profits-the bottom line.
received short shriftin high-technology companies. Communication. Acommon thread throughthe
For effective DFX, organizing the multifunctional DFX supportmechanisms is communication. Effective
teamfor development is critical. If weget the right peo- communication is essential for teamwork, for developing
plefrom the different PRP functions and "grow" them into and usingthe DFX knowledge base, andfor making DFX
jelled teams,wehelp enablethe collaboration required processes work. In a DFX environment, a premium is
for DFX implementation. Rewarding DFX teamwork, to placed on interpersonal communication skills. Informa-
ensure that the team's desirable behavior continues, can tionmovement and management (IM&M) technology is
involve the application ofpsychological principles. For also valuable for enhancing communications on DFX.
example, we shoulduse nonfinancial recognition, avoid AT&T successfully applies its voice, data, and
interfering withintrinsic motivation, and reward teams video IM&M technology to overcome many ofthe prob-
and the individuals in them-but tip the balance toward lems ofdoing DFM whenboth design and manufacturing
the team-" are geographically separated. For example, liberal use of
Many successful companies haveachieved DFX IM&M technology helped an AT&T R&D organization in
through functionally integrated, organizational struc- New Jersey and a manufacturing organization in Colo-
tures.-" For example, one approach to ensuringcoopera- rado to achieve DFM at a distance.'!
tionbetween productdesigners and manufacturing DFX technology, trials, tribulations, and triumphs

AT&TTECHNICAL JOURNAL. MAY/JUNE 1990


Table I. Profile of Downstream Impact for DFX Papers

Downstream activity
Service and
DFXpaper Manufacture Distribution Installation Operation maintenance
Design for simplicity? ..j ..j ..j ..j ..j
Design for multinational EMCl1 ..j ..j ..j ..j ..j
Computer-aided design for ..j ..j ..j
quality'"
Design for material logisticsv ..j
Design for ESD protection 10 ..j ..j ..j ..j ..j
Automated BIST in ASICs9 ..j ..j ..j

NOTE: Each downstream activity also has associated reliability, environmental, and safety considerations. Also see
Figure lb, the DFX environment.

should be shared throughouta corporation. AT&T, for ability) and personnel from all PRPfunctions are becom-
example, holdsan annual DFX conference where employ- ing better integrated intomainstream PRP activities. They
10 ees share experiences on implementing DFX. are alsobecoming moreinfluential in the development of
Industry-wide conferences on DFX (e.g., on DFM) PRP supporttechnologies likeCAE/CAD.
havealsobeen valuable sources ofinformation on DFX Although muchprogress has been made, DFX
experiences and techniques. One added benefitofthese knowledge bases and educational programs mustbe
external activities is that they enableus to take the pulse extended, DFX toolsand processesmust be improved,
ofprogress in DFX. Overthe past five years, the scope and DFX technologies and experiences must be shared
and intensity of DFX-focused activities in industries and and leveraged. Those whofocus on prevention in the
universities haveincreased dramatically. PRP, which is synonymous with DFX and quality by
design, will successfully compete-and profit.
Summary and Future Directions
This paperhas given a broadview ofDFX- Some DFX Experiences at AT&T
designing for downstream considerations from manufac- This issue's papers provide a sampling ofrecent
ture through service and maintenance. We havediscus- and ongoing DFX workin AT&T. Their authorsare a
sed knowledge bases, development processes, CAE/CAD blend of representatives from productdevelopment
information systems, education, and managerial teamswhohaveimplemented DFX, and technologists
approaches for supporting DFX in productrealization. whoworkwith the teams to develop and deploy DFX
For U.S.-based electronics companies to become methods and tools.
more competitive, their level of DFX commitment in pro- The paperscontain a blendofpragmatic,
duct realization and PRP supporttechnologies needs to experience-based information, as well as technical princi-
increase. DFX specialists (e.g., in designing for EMC, ESD, ples and results. Therefore, the issue should appeal to a
safety and liability prevention, reliability, and maintain- broad audience: productmanagement, marketing,

AT&T TECHNICAL JOURNAL • MAY/JUNE 1990


design, manufacturing, installation, and service people discussindustrystandards and future trends.
who are directly involved withbringinga productto the - Design for testability (DFT)-Aadsen, Scholz, and
marketplace; and R&D peoplewhowork on the underly- Zorian describe? efforts on BIST for regular structures
ing technologies ofproducts, productivity, and quality. [e.g., read-only memory (ROM) and staticrandom-
The papers coverthese DFX disciplines: access memory (SRAM) 1, embeddedin application-
- Design forassembly andsimplicity- Watson, Theis, and specific IC (ASIC) devices. They provide somehistori-
Janek describe? a successful DFX method-design for calbackground on BIST; describefault models, test
simplicity (DFS)-that AT&T has applied to mechani- algorithms, and accessfor BIST (e.g., interfaces for
cal equipment. This equipmentrepresents the boundary scan); present some specific applications;
mechanical and electromechanical portions of our and share their views on future directions for BIST.
electronic products, such as computersand telecom- Table I showsa profile ofthe downstream
munications networking systems. impact ofthe DFX techniques described in this issue's
- Design for electromagnetic compatibility (EMC)- papers. Techniquesin allthe papershave a strong
Heirman, Morris, and Crosby address" the develop- impact on manufacturability. Distribution material logis-
ment ofproducts that satisfy regulatory compliance tics are affected by DFS, EMC design, and ESD protection.
requirementsin a multinational environment. They DFS,EMC design, and ESD protection also affect installa-
describe a successful design processfor EMC compli- tionproceduressuch as assembly; and BIST can stream-
ance,testing considerations, and quality metricsfor linetests and diagnostic proceduresduringinstallation,
the EMC-compliance design process. as well as duringservice and maintenance. Techniques 11
- Design formanufacture (DFM)-A paper by Liu, in four ofthe six papers (DFS, EMC design, CAD for qual-
Nazaret, and Beale discusses'" a computer-aided, ity, and ESD protection) influence both operational relia-
robust-design approach that has been successfully bility or robustness and the ease and frequency of ser-
applied to integratedcircuits. They describetheir viceand maintenance.
sample-approximate-optimize method, givean optimi- Although this issue's papers concentrate on
zation example using a gallium-arsenide (GaAs) IC hardware DFX, most ofthe DFX principles and techniques
circuit, and compare their method to other robust- they describehave analogies in software. There are
design approaches (e.g., the Taguchimethod).21,24,32 somefundamental differences between hardware and
A paper by Foo et al. hlghlights-' design- software (e.g., withrespect to manufacturing variation
documentation considerations for the planning, and wear-out mechanisms), but both must be designed
management, and control ofmaterials. Designing for forX to realize competitive products.
material logistics is an important dimension ofDFM
because the cost ofmaterials dominates the totalcost References
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- Design for reliability and maintainability-Welsher Scientific American, Vol. 261, No.4, October 1989, pp.41-47.
et al. report'? on designing for ESD protection in 2. B.Huthwaite, "Manufacturing Competitiveness and Quality by
telecommunications products. They review ESD Design," Proceedings ofthe 4th International Conference onProduct
Design forManufacture andAssembly, Newport, Rhode Island, June
modelsand effects, describefactory and field ESD- 5 to 6, 1989, Institute for Competitive Design, Rochester, Min-
controlprocedures, explain designed-in protection for nesota, 1989, pp. 17-25.
alllevels ofthe electronic packaginghierarchy, and 3. R. Ackerman, R. Coleman, E. Leger, andJ. MacDorman, Process

AT&TTECHNICALJOURNAL. MAY/JUNE 1990


Quality Management andImprovement Guidelines, Issue 1.1,Select with Confidence Limits," Proceedings ofthe 1989 IEEE Interna-
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lis,Indiana, 1988. Tampa, Florida, October 23to 24, 1989, Institute ofElectrical and
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Biographies (continued)
from Trinity College in Hartford, Connecticut, and an M.S. in
computer engineering from Carnegie-Mellon University in
Pittsburgh, Pennsylvania.

(Manuscript received December 21, 1989)


13

AT&TlECHNICALJOURNAL. MAY/JUNE 1990

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