NANOELECTROMECHANICAL

SYSTEMS
Unveiling the Tiny World
of NEMS and Its
Revolutionary Potential
 INTRODUCTION TO NEMS

Definition of NEMS:

Nanoelectromechanical systems (NEMSs) are

systems with characteristic dimensions of a
few nanometers. By exploiting nanoscale
effects, NEMSs present interesting and
unique characteristics, which deviate greatly
from their
predecessor microelectromechanical
systems (MEMSs).
 INTRODUCTION TO NEMS CONTD...

Scale comparison: NEMS vs. MEMS

Micro scale – 10-8 to 10-5 m

Nano scale – 10-10 to 10-8 m
 INTRODUCTION TO NEMS CONTD...

History

• In 1960, MOSFET was fabricated for the first time with 100 nm gate
oxide thickness.
• In 1962, a nanolayer-base metal-semiconductor junction transistor
using gold thin films with 10 nm thickness was fabricated.
• In 1998, at UC Berkeley, FinFET devices were fabricated down to a
channel length of 17 nm.
• At IBM, in 2000, the researchers for the first time demonstrated the
very-large-scale integration (VLSI) device of NEMS.
 INTRODUCTION TO NEMS CONTD...

Importance and potential applications

1. Miniaturization
2. Enhanced Sensitivity and Performance
3. Diverse Applications
4. Potential for Innovation
5. Future of Technology
6. Efficiency and Energy Savings
7. Research and Development
 Top-Down Fabrication:

• Lithography Techniques: These methods involve

patterning on a nanometer scale.
• Focused Ion Beam (FIB): Using a focused beam of ions
for etching, milling, and deposition at the nanoscale.
NEMS
Fabrication Bottom-Up Fabrication:

• Self-Assembly Techniques: Utilizing chemical or

Techniques biological processes to guide the assembly of nanoscale
components into functional structures.
• Atomic Layer Deposition (ALD): Precisely depositing
atomic layers on a substrate, enabling control over
thickness and composition at the atomic level.
• Chemical Vapor Deposition (CVD): Depositing thin films
of material onto a substrate, allowing precise control
over layer thickness and composition.
 Top-down fabrication vs bottom-up
fabrication

Top-down Nanoscale Structure Bottom-up

Lithography Technique
Lithography is typically the transfer of a pattern
to a photosensitive material by selective
exposure to a radiation source such as light. A
photosensitive material is a material that
experiences a change in its physical properties
when exposed to a radiation source. If we
selectively expose a photosensitive material to
radiation the pattern of the radiation on the
material is transferred to the material exposed,
as the properties of the exposed and unexposed
regions differs.
Focused Ion Beam (FIB)
Focused Ion Beam (FIB) involves using a beam of
ions for etching, milling, and deposition at the
nanoscale. This technique is highly precise and
can be used not only for imaging but also for
selective material removal or deposition with
sub-nanometer resolution.
Chemical Vapor Deposition (CVD)

CVD is a method used to deposit thin films

of material onto a substrate. It involves the
reaction of various precursors to produce a
solid material on the substrate surface.
This technique enables precise control
over layer thickness and composition and
is often used for creating thin films and
coatings in NEMS fabrication.
Atomic Layer Deposition (ALD)
(ALD) is a precise thin-film deposition
technique used in nanotechnology for the
controlled growth of uniform and
conformal layers at the atomic scale. ALD
operates through a series of self-limiting
surface reactions, employing alternating
pulses of gaseous precursors that react
with a substrate in a cyclical and sequential
manner. This results in highly accurate and
controlled layer-by-layer growth, making
ALD particularly advantageous in
applications requiring atomic-scale
precision, such as semiconductor device
fabrication and the production of
nanoscale devices.
 Advantages And Disadvantages Of Fabrication
Techniques

Aspect Bottom-Up Fabrication Top-Down Fabrication

More precise More scalable

Advantages
Better with complex designs Controlled and predictable results

Disadvantages Less scalable Less precise

Application Of NEMS
1. Biomedical Applications
NEMS technology holds significant
promise in revolutionizing various
facets of biomedical engineering:
▪ Drug Delivery Systems
▪ Biosensors
▪ Nanoscale Imaging Technologies
Application Of NEMS

2. Energy
NEMS devices hold promise in
energy-related applications,
contributing to more efficient energy
generation and harvesting:
▪ Nanogenerators
▪ Energy Harvesting Systems
Application Of NEMS

3. Emerging Applications in Various

Industries
NEMS technology extends its
transformative potential to diverse
sectors:
▪ Aerospace
▪ Automotive
▪ Consumer Electronics
 Challenges in NEMS Development

1 2 3
Fabrication Complexity: Materials and Cost and Accessibility:
NEMS fabrication demands Compatibility: Finding Specialized equipment and
precision and control at the suitable materials and resources for NEMS can be
atomic level, often posing ensuring compatibility costly, hindering
challenges in scalability and remains a challenge for widespread accessibility.
throughput. diverse NEMS applications.
Thank
You!