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metal
oxide
substrate
● Transistor Structure
The gate, oxide, and p-type
substrate are the same as
those of a MOS capacitor.
There are two n-regions,
called the source and drain
terminal.
The current in a MOSFET is
the result of the flow of charge
in the inversion layer, called A simplified cross section
the channel region, adjacent of a MOSFET with
to the oxide-semiconductor channel length L and
interface. channel width W
S - VGS + G D
-------------------------
VGS = VG – VS
VGD = VG – VD
But VGD = VGS – VDS
= VG – VS – VD +VS
So, if VDS is small, VGD VGS, we have
approximately equal distribution of channel
inversion layer
, Kn = conduction parameter
where
μn = mobility of electrons.
and
Cox = oxide capacitance
per unit area. Can be written in the form:
where k′n = μnCox
SATURATION REGION
Where
μn = mobility of electrons and
or Cox = oxide capacitance per
unit area.
or