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Main Group OM Part 1 2005
Main Group OM Part 1 2005
M+ - C-
Stability – M-C is weak compared to M-N, M-O or M-Hal use for organometallics
in synthesis
-elimination
R2C CR2 R2C CR2
M H + R2C CR2
M H M H
Reactivity towards O2 and H2O – highest for organometallics with free electron pair,
low lying empty orbitals and/or high polarity of M-C
bond
Transmetallation M + RM’ RM + M’
Zn + (CH3)2Hg (CH3)2Zn + Hg
slow
Synthesis
Li Mg Al Zn Si B As P
Electronegativity: 0.98 1.31 1.61 1.65 1.90 2.04 2.18 2.19
Reverse of -elimination
Reaction Pattern
Oxidation - potential reducing agents; for electropositive elements very strong reducing
agents
- componds of electropositive metals have unfilled valence orbitals,
or readily dissociate to fragments with unfilled orbitals - pyrophoric
Protolysis Reaction
Et Et CH3 Et
CH3OH
Ga Et Ga O Ga OCH 3
Et Et - C2H6
Et H Et
Metal-Hal Exchange - BunLi + PhX BunX + PhLi (practicable only for ArX; competing
reaction Wurtz coupling)
CH3
Ether Cleavage
KOC2H5 + H2C=CH2
Organolithium Structures
Li Li Li C
CH3
CH 3
Li
CH 3 Li
Li
Li
Li
Li Li Li Li
CH3
Et2O.
Tendency to form Li
Ph
oligomers through Ph
multicentre bonds Li .OEt2
Li3 group Ph
C orbitals Li .OEt2
Et2O. Li
sp3 Ph
MeLi tetramer
thf monomer
N
C6H12
(n-C4H9Li)6 6 Li+ C4H9-
6 tmeda
N
H H
Li+
BunLi
+ BuH
NH2
BunLi
NHLi
+ BuH
R'Li
R' R' hydrolysis R'
hydrolysis
R C N C NLi C NH C O
R R R
O OLi O
RLi hydrolysis
H C R C NR'2 R C
H
NR'2 H
CO CO CO
OC CO OC CO OC CO
LiR [(CH 3)3O]BF 4
W W W
OC CO OC CO OC CO
CO C C
R O-Li+ R OCH3
Radical Anion Salts
(Me5C5)2SiBr2 K, anthracene
- 2 KBr
Si
Radical Anion Salts
K
2 C8H8 2 C8H8. C8H8 + C8H82-
- K+
2-
nonplanar
4n electrons planar planar
antiaromatic (4n+1) -electrons (4n+2) -electrons
aromatic
Organomagnesium Compounds
R. RMgX
RX
Formation
RX R. . MgX
Mg Mg Mg
Riecke magnesium:
K, thf
MgCl2 Mgactive
C8H17F
C8H17MgF 89%!
r.t., 3 h
Organomagnesium Compounds
Schlenk equilibrium
L X L R X L
Mg Mg 2 RMgX R2Mg + MgX2 Mg Mg
R X R R X L
III I II IV
Structure
Generally polymeric/oligomeric structures, where halide (2e2c) bridges are preferred
over 2e3c alkyl bridges
Mg
Al Al
CH3MgX
compared to LiR, RMgX reagents - less reactive (do not form ate complexes)
Et2O MeLi
MgMe2 + LiMe LiMgMe 3(Et2O)n
tmeda
lithium magnesiate
Organometallics of Calcium, Strontium and Barium
Synthesis
[Ca{CH(SiMe3)2}2(1,4-dioxane)2] Ca[C(SiMe3)3]2
CCaC 150
Properties
Alkyls are usually colourless liquids that react violently with air and water; short
chain lengths pyrophoric
Applications
Aufbau reaction (growth reaction) - multiple insertion of ethylene into the Al-C bond
e.g. AlC2H5 + C2H4 AlC4H10 etc (Ziegler)
- produces 1-alkenes and (after reaction with
dioxygen and hydrolysis) unbranched C 16 – C20
primary alcohols for detergent industry
CH2=CHCH3
Pr2AlH + CH2=CMeCH2CH2CH3
cracking
CH2=CMeCH=CH2 + CH4
isoprene
Organoaluminium Compounds
270 pm
-C6H5 = -C6H5 =
Organoaluminium Compounds
R
R R R
R R*
Al Al Al Al
R R
R* R R
R
a R = Me b R = Ph
Organoaluminium Compounds
Al-Me-M bridges also formed with other acidic metal centres, e.g.
AlMe3 + Cp2Yb
Organoaluminium Compounds
Reactivity
Organoaluminium compounds are hard acids and readily form adducts with bases
such as thf and amines
Mes3Al + thf
Carbalumination
+
CH2=CHR H2C CHR H2C CHR
1/2 (Et3Al)2 Et3Al
Et2Al Et Et2Al Et
Hydroalumination
H2 C CHR
Et2Al H
Organometallics of Ga, In and Tl
Synthesis
R3M may be prepared by same methods as for R 3Al – metathesis or RLi/MgX with MX3
Structure R3Ga and R3In monomeric Lewis acidity less than that of Al
Me3Ga very important ion semiconductor industry more inflammable
than dimeric Me3Al
Cl In
R X R
Ga Ga In Cl [Me2InCl]n
R X R
Cl In
In contrast to group 13 derivatives R4M derivatives show lower bond polarity of the E-C bond,
have an octet configuration and reactivity towards nucleophiles is diminished,
ie. ER4 species are usually water-stable and often air-stable
Chlorination of ER4 species: for E = C and Si chlorination of organic part but for
E = Ge, Sn or Pb cleavage of the E-C bond
+ -
E C Availability of empty nd orbitals at E renders associative
Mechanism of substitution possible by extending
Nu El the CN to 5
nucleophilic electrophilic
attack attack
Successive replacement of R by more EN groups X in
RnEX4-n increases affinity of E for attacking nucleophiles
Organosilanes - properties
R4Si are H2O and O2 stable because of low bond polarity, heterolytic cleavage does
not occur readily
Si-C bonds are thermally stable and do not decompose before ca. 700ºC
Leads to use in silicon polymers from hydrolysis of chlorosilanes – now a very mature
industry
O Si O Si
-H2O
R3SiOH
-NH3
R3SiR' R3SiNH2 (R3Si)2NH
H2O NH3
R'Li
Li R'OH
RSNa
R3Si-SiR3 R3SiOR'
R3SiSR
Organo(germanium), -tin and (-lead) derivatives, RnMX4-n
Preparation of R4M most commonly by metathesis of MX 4 with RLi, RMgX and R3Al
derivatives
other methods similar to those employed for organosilanes
(R3Sn)2O
R3SnOH
R3SiR' R3SnOR'
H2O
R'Li R'OH, R3N
LiAlH4 LiNR'2
R3SnH R3SnCl R3SnN'R 2
NaC5H5
Na
NaMn(CO)5
R3Sn-SnR 3 R3SnC5H5
R3SnMn(CO) 5
Compounds containing R3Sn are toxic and must be handled with great care
Organotin Hydrides
LiAlH4, Et2O
RnSnX4-n RnSnH4-n
Hydrostannation Sn H + A B Sn A B H
in absence of Lewis acids or radical forming reagents polar double bonds like C=O or
C=N are not attacked
well-suited for chemoselective hydrogenation of activated C=C bonds
1. cat. (Ph3P)4Pd,
H H O thf, 20 ºC H 2 H2 O
Ph C C C + Bun3SnH Ph C C C
H 2. H2O H
AIBN
Et3SnH + CH2=CH-CH=CH2 Et3SnCH2-CH=CH-CH3
Organotin Hydrides
Hydrostannolysis Sn H + X Y Sn Y + HX
R3SnH transfer
R3Sn-H + MeCOOH R3SnOOCMe + H2 H-
4 R3Sn-H + Ti(NR'2)4 (R3Sn)4Ti + 4 HNR'2 H+
2 R3Sn-H + R'2Hg (R3Sn)2Hg + 2 R'H H.
-Hg
R6Sn2
R = Me, -10 ºC
R = Ph, +100 ºC
low polarity of Sn-H bond R3SnH may act as a source of H-, H+ or H.,
depending on nature of attacking agent
Organotin Hydrides
But3SnH But3SnH
Br
h h
Me2 Br2 Me2 Me2 H2