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Outline
• Construction and I-V characteristics
• Physical operation
• Switching characteristics
• Limitations and safe operating area
• PSPICE simulation models
gate
oxide
gate
width
N
+ N+ N+ N
+
P P
N-
buffer layer
N+ (not essential)
+
P collector
metallization
gate
conductor
boddy-source short
Oxide
N+ N+
Gate
Channel
• Non-punch-thru IGBT
P conductor P
length
Parasitic
I N- ID
SCR D
+
P
Collector
Emitter
boddy-source short
Oxide
N+ N+
Gate
Channel
P conductor P
length • Punch-thru IGBT
Parasitic
I N- I
SCR D D
N+
+
P
Collector
drain collector
gate
gate • N-channel IGBT circuit symbols
source
emitter
• Blocking state operation - V GE < V GE(th) • With N+ buffer layer, junction J 1 has
• J unction J 2 is blocking junction - n+ drift small breakdownvoltage and thus IGBT
region holds depletion layer of blocking has little reverse blocking capability -
junction. anti-symmetric IGBT
+ +
N N
+ + + + + + + + +
P
gate
V J 1 + Vdrift + ICRchannel
emitter
+ +
N N
collector
gate
I R gate
C channel
Principal
(desired) Body region
path of spreading
resistance
• Approximate equivalent circuit for collector
IGBT valid for normal operating current emitter
conditions.
• IGBT equivalent circuit showing
• V CE(on) = VJ 1 + V drift + IC Rchannel transistors comprising the parasitic
thyristor.
Copyright © by John Wiley & Sons 2003 IGBTs - 8
Static Latchup of IGBTs
lateral (spreading)
resistance gate
J emitter
3
+ +
N N
J2 N-
+
N
J 1
+ + + P+ + + + +
collector
Conduction paths causing lateral voltage drops and turn-on
of parasitic thyristor if current in this path is too large
• Lateral voltage drops, if too large, will forward bias junction J3.
• Parasitic npn BJT will be turned on, thus completing turn-on of parasitic thyristor.
• Large power dissipation in latchup will destroy IGBT unless terminated quickly.
External circuit must terminate latchup - no gate control in latchup.
+ +
N N
J
2 P
lateral
(spreading) expansion of
resistance N- depletion region
+
N
J 1
P+
collector
• MOSFET section turns off rapidly and depletion layer of junction J2 expands rapidly into
N- layer, the base region of the pnp BJT.
• Expansion of depletion layer reduces base width of pnp BJT and its a increases.
• More injected holes survive traversal of drift region and become “collected” at junction J2.
• Increased pnp BJT collector current increases lateral voltage drop in p-base of npn BJT and
latchup soon occurs.
• Manufacturers usually specify maximum allowable drain current on basis of dynamic
latchup.
C gc C
bridge
G C
+V -
C ge Cce b
E C gc
Bridge balanced (Vb=0) Cbridge = C gc = C res
G C
G C
Cies
E
C oes
Cies = C ge + C gc E
C oes = C gc + Cce
v (t) V
GE GG+
• Turn-on waveforms for
IGBT embedded in a t
stepdown converter.
• Maximum collector-emitter
i voltages set by breakdown
C
voltage of pnp transistor -
2500 v devices available.
-5
10 sec
Coxd
+ +
N N
Cgdj
P
Ccer Cdsj
-
Drain-body or N
+ Rb
base-collector N
Cebj + Cebd
depletion layer +
P
drain
• Nonlinear capacitors Cdsj and Ccer due to N-P junction depletion layer. • Reference - "An
Experimentally Verified
• Nonlinear capacitor Cebj + Cebd due to P+N+ junction IGBT Model
Implemented in the
• MOSFET and PNP BJT are intrinsic (no parasitics) devices SABER Circuit
Simulator", Allen R.
• Nonlinear resistor Rb due to conductivity modulation of N - drain drift region of Hefner, Jr. and Daniel
MOSFET portion. M. Diebolt, IEEE Trans.
on Power Electronics,
• Nonlinear capacitor Cgdj due to depletion region of drain-body junction (N -P junction). Vol. 9, No. 5, pp. 532-
542, (Sept., 1994)
• Circuit model assumes that latchup does not occur and parasitic thyristor does not turn.
Cebj +
Cgdj Cebd • Built-in model does not model
Ccer ultrafast IGBTs with buffer
Coxd Rb
layers (punch-through IGBTs) or
Gate Cdsj
reverse free-wheeling diodes
Cm +
Coxs
Source
Copyright © by John Wiley & Sons 2003 IGBTs - 16
PSpice IGBT - Simulation Vs Experiment
0V 5V 10 V 15 V 20 V 25 V
1
nF
Data from IXGH40N60 spec sheet
V =0V
GE
0.5
nF
0.25
nF
0
100 V 200 V 300 V 400 V 500 V
Collector - emitter Voltage