MICRO PRESSURE

TRANSDUCERS

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 CAPACITIVE PRESSURE SENSOR

In the normal operation mode

of a capacitive pressure sensor,
as shown in Figure (a), the
diaphragm does not contact the
substrate electrode. The output
capacitance is nonlinear due to
its inverse relationship with
the gap which is a function of
pressure P.

In the touch mode operation

of a capacitive pressure
sensor, the diaphragm is
designed to work in the
region where it touches the
substrate mechanically, 3
as shown in Figure (b).
I/O CHARACTERISTICS

The touched area is

nearly proportional to
the applied pressure,
and results in the nearly
linear C–P
characteristics of the
pressure sensor.

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The device is shown in Figure
with sensing plates A and C and
a stationary middle electrode B,
thus forming an isolated cavity.

Plates A and C are rigidly

attached to each other through a
series of periodic posts that
transmit force between A and C.
Thus, these two plates deflect as
a single compound plate.

The posts greatly stiffen the

structure for common-mode
pressures; hence, common-mode
pressure changes do not cause a
significant change in capacitance.
Significant deflection and
capacitance changes occurs only 5
when a pressure difference
develops between plates A and C.
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The figure schematically shows how one end of
the resonating beam is attached to the pressure-
sensitive rectangular-shaped diaphragm and the
other end is attached to the edge of the cavity.

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A torque, M, is developed at the beam to diaphragm attachment, as illustrated
in the above figure. The height of the attachment, d, acts as a lever and causes
a reactive force, F, on the beam. The beam is thus not only bent but also
lengthened by the distance ∆X.
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 DIAPHRAGMS

The most common type of pressure sensing elastic element is a diaphragm. The
diaphragm is essentially a thin plate stretched and fastened at its periphery.

The structure of the diaphragm may be flat or corrugated.

Diaphragms are rugged, have excellent stability and reliability, low hysteresis
and creep, high accuracy and good dynamic response.

Diaphragms are made from elastic metal alloys such as bronze, phosphor
bronze, beryllium copper and stainless steel or from proprietary alloys such as
Monel, Inconel and Nickle -Span-C .

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The pressure deflection characteristics of both flat and corrugated diaphragms
have been well investigated.

The available corrugated profile types include sinusoidal, saw-tooth, or

trapezoidal

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 FLAT CIRCULAR DIAPHRAGM

The deflection w at any point on the diaphragm is given by

3 P(1 -  2 ) 2 2 2
w(r)  R  r 
16 Et 3

Where
P= applied pressure
t=thickness of the diaphragm
R=radius of the diaphragm
E= modulus of elasticity 12
υ= Poisson’s ratio
 FLAT CIRCULAR DIAPHRAGM
The central deflection of the diaphragm wc is given by substituting r=0

3 P(1 - ν 2 )R 4
wc 
16 Et 3

The strain at any point on the diaphragm is given by

t d 2 w(r)
ε(r)  
2 dr 2

3 P(1 - ν 2 ) 2
ε(r)   R  3r 
2 2

8 Et 2

The strain at the centre of the diaphragm is given by

3 P(1 - ν 2 )R 2
εc  13
8 Et 2
The strain at the edge of the diaphragm is given by

- 3 P(1 - ν 2 )R 2
εe 
4 Et 2
The strain at the edge of the diaphragm is twice the strain at the centre.

Square diaphragm:

The deflection w at any point on the diaphragm is given by

P(1 -  2 ) 2
w(x, y)  0.2552  x  a 
2 2
 y 2
 a 
2 2

Et a
3 4

The central deflection of the diaphragm wc is given by substituting x=0 and

y=0
P(1 -  2 )a 4
wc  0.2552
Et 3
The stress at the edge of the diaphragm is maximum and given by.
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a2

σ max  P
h2
 DIAPHRAGM DESIGN
1) Fix the pressure range (P)
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wc P a
    0.1
h E(4.54)  h 

2
a
σ max  P   σ c
h
2) Choose a ratio of a/h which satisfies the above two conditions

2a
Wc
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2a
 DIAPHRAGM SIMULATION USING COMSOL
MULTIPHYSICS

1)Creating diaphragm geometry with dimensions (200x200x10 um)

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2) Specifying the material to be used for the diaphragm.(silicon)

3a) Specifying the necessary boundary conditions
(All the four diaphragm edges to be fixed in all directions). 17
3b) Specifying the loading surfaces
(Pressure load (1 bar or 105 Pascal) to be applied in Z direction from 18
bottom of the diaphragm).
4) Meshing the entire geometry
(In general a tetrahedron meshing is used with optimized mesh size). 19
 The centre of the diaphragm will deflect more and is approximately
0.507 um and it is close agreement with the analytical value.
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P a  4

wc   3   0.5um
E(4.54)  h 
 The stress developed at all the central edges of the diaphragm is high and
a perfect location to implant piezoresistors. 21
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 Wheat stone bridge configuration of piezo resistors

With no pressure applied R1=R2=R3=R4=R

With applied pressure the bridge is unbalanced and the output voltage is
given by
 R2 R3 
V0  Vs   
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R
 1  R2
R3
 R4 
 Relation between Stress and output voltage
The resistance change ΔR with respect to resistance R when it
experiences the stresses σl ,σt is given by
ΔR (1)
 Πl σ l  Πt σ t
R
σl and σt denote longitudinal and transverse stress experienced by the
piezoresistors respectively.
 πl and πt are piezoresistive constants dependent on the doping type,
concentration and the orientation of the resistor.
R1 and R3 resistors which are perpendicular to diaphragm edge which
experience longitudinal compressive and transverse tensile stresses given by

a2
σ t  νP 2
h R1  R3 (decrease in resistance)
a2
σ l  -P 2 24
h
 R a2
 π l P 2 (1  ν) (2)
R h
R2 and R4 resistors which are parallel to diaphragm edge experience
transverse compressive and longitudinal tensile stresses given by
a2
σ l  νP 2
h
R2  R4 (increase in resistance)
a2
σ t  -P 2
h

R a2
 π l P 2 (1  ν) (3)
R h

Now the output voltage is given by

V0  R2 R4  R1 R3  ΔR (4)
   25
Vs (R1  R2 )(R3  R4 )  R
V0 a2
 π l P 2 (1  ν) (5)
Vs h

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