Professional Documents
Culture Documents
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NePhoS (Nano-electronic and Photonic Systems), Universitat Rovira i Virgili, Tarragona, Spain
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Departamento de Ingeniería Electrónica, Universidad Politécnica de Cataluna, UPC, Barcelona,
Spain
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OUTLINE
Introduction
Sample fabrication
Experimental setup
Data processing
Results
Conclusions
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INTRODUCTION
Basic concept of photonic crystals and photonic band gap
Classification: Band structure of 1D photonic crystal:
1D 2D
ck
(k )
Anechoic chamber
crystal
MOD MXR
Yablonovitch E. et al., Phys. Rew. Lett., Vol. 63, Issue 18, Oct. 1989, pp.(1950-1953)
4
INTRODUCTION
State of art - Transmission analyzis of photonic crystals
Transmission spectra analyzis using
emission from InGaAs quantum wells
Laser excitation
Photonic crystal
Cleaved facet
PL source
Labilloy D. et al., Phys. Rew. Lett., Vol. 79, Issue 21, Nov. 1997, pp.(4147-4150)
5
INTRODUCTION
State of art - Angular-dependent reflectivity
kinc= 2π/λ kinc// R(λ,θ)
θ θ
k//
kinc// =(2π/λ)·sinθ
Astratov V.N. et al.,Optoelectronics, IEE proc., Vol. 145, Issue 6, Dec. 1998, pp.(398-402)
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Astratov V.N. et al., Journal of lightwave technology, Vol. 17, NO. 11, Nov. 1999, pp.(2050-2056)
INTRODUCTION
State of art - Angle-resolved attenuated total reflectance ATR
ATR
kinc= 2π/λ kinc// prism ATR
θ θ
k//
Galli M. et al., IEEE Journal on Selected Areas in Communications, Vol. 23, Issue 7, July 2005, pp.(1402-1410)
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OUTLINE
Introduction
Sample fabrication
Experimental setup
Data processing
Results
Conclusions
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SAMPLE FABRICATION
Sample pre -patterning
Sample preparation
SiO2 N-type silicon (100) - thermal oxidation
resist - photolithography
-TMAH etching of
the silicon
Backside ohmic contact Patterned substrate with inverse pyramids –
basis for macroporous growth
- Ion implantation
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SAMPLE FABRICATION
Macropore formation in n-type silicon
aqueous HF solution
Etching conditions:
• electrolyte
• applied voltage
• current density
• etching time
• temperature
• illumination
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T. Trifonov, Phys. Stat. Sol. (c) 2, NO. 8, May 2005, pp. (3104-3107).
OUTLINE
Introduction
Sample fabrication
Experimental setup
Data processing
Results
Conclusions
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EXPERIMENTAL SETUP
Measurement conditions:
Angle of incidence θ: from 12º to 66º in steps of 2°
Reference: polished N-type silicon wafer
Interferometer Light polarization: natural (TE&TM)
Light source: halogen-tungsten lamp
Detector: nitrogen-cooled LN-MCT
Spectral range: 4000-400 cm-1 (MiD-IR)
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OUTLINE
Introduction
Sample fabrication
Experimental setup
Data processing
Results
Conclusions
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DATA PROCESSING
Angular-dependent reflectivity - manual bands recognition
2D Photonic crystal structure: air holes (r=1) etched in a dielectric host (b=12.096 Si)
M
4μm Γ X a cm 1
K mag sin
10 4
cm 1
norm a
10 4
Γ-X
R i 1 R i
R i
4μm
i 1 i
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DATA PROCESSING
Data processing – range restriction
4μm
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OUTLINE
Introduction
Sample fabrication
Experimental setup
Data processing
Results
Conclusions
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RESULTS
Square lattice structure with circular air holes
M
4μm Γ X
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RESULTS
Square lattice structure with circular air holes
ΓX lattice orientation ΓM lattice orientation
4μm
Γ X
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RESULTS
Triangular lattice structure
4μm
ГM
M
Z
Г
ГZ
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RESULTS
Honeycomb lattice structure
5μm
ΓM
M
Z
Г
ΓZ
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CONCLUSIONS