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Introduction
Organic Semiconductors
Dopants
Doping methods
Why OTE?
OTE usage
DOI: 10.1016/j.mser.2018.09.001
3 DOI: 10.1038/srep18805 Materials Physics and Technologies for Nanoelectronics
OTE properties
Nat. Rev. Mater., 2016, 1, 16050 ACS Appl. Mater. Interfaces, 2019, 11, 4942−4953
SIDE CHAINS
MELTING
( )
𝟐 /𝟑
𝝈𝑺 𝑻 𝟐
𝟏
𝒛𝑻 = 𝝈 =𝒒𝒏 𝝁 𝑺∝
𝜿 𝒏
PBTTT-8O
ACS Appl. Mater. Interfaces, 2019, 11, 4942−4953 Adv. Energy Mater., 2022, 12, 2103049
• Size/configuration
distortions
doping efficiency
volume in the microstructure
Neat
F4TCNQ
F2TCNQ
• Mixed doping
Mixing host materials and
dopants
• Sequential doping
diffusion of dopant to host
material thin film
• Electrochemical doping
Host materials are doped directly
through electrochemical reactions
Chem. Soc. Rev., 2020, 49, 7210
Vapor doping has higher σ and PF while solution doping has higher S
𝜎 =𝑞𝑛 𝜇
Solution Sequential
Solution doping doping
Chem. Soc. Rev., 2020, 49, 7210 Sci. Adv., 2017, 3, e1700434 Adv. Electron. Mater., 2022, 8, 2101142