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  • Bonding 4

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    Hamza Adeel
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    The document discusses different types of dental bonding systems including: 1. A 3-step etch and rinse system using phosphoric acid, a HEMA/polyalkenoic acid primer, and a bis-GMA/HEMA/tertiary amine bonding agent. 2. A 2-step etch and rinse system using phosphoric acid etching and a bonding agent containing dimethacrylates, HEMA, and silica fillers. 3. A two-step self-etching system with a self-etching primer and a bis-GMA bonding agent. 4. A one-step system containing ethanol, sodium benzoate, and sulfin

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    Bonding-4

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    The document discusses different types of dental bonding systems including: 1. A 3-step etch and rinse system using phosphoric acid, a HEMA/polyalkenoic acid primer, and a bis-GMA/HEMA/tertiary amine bonding agent. 2. A 2-step etch and rinse system using phosphoric acid etching and a bonding agent containing dimethacrylates, HEMA, and silica fillers. 3. A two-step self-etching system with a self-etching primer and a bis-GMA bonding agent. 4. A one-step system containing ethanol, sodium benzoate, and sulfin

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    © All Rights Reserved
    Download as PPTX, PDF, TXT or read online from Scribd
    Flag for inappropriate content
    4 views6 pages

    Bonding 4

    Uploaded by

    Hamza Adeel
    The document discusses different types of dental bonding systems including: 1. A 3-step etch and rinse system using phosphoric acid, a HEMA/polyalkenoic acid primer, and a bis-GMA/HEMA/tertiary amine bonding agent. 2. A 2-step etch and rinse system using phosphoric acid etching and a bonding agent containing dimethacrylates, HEMA, and silica fillers. 3. A two-step self-etching system with a self-etching primer and a bis-GMA bonding agent. 4. A one-step system containing ethanol, sodium benzoate, and sulfin

    Copyright:

    © All Rights Reserved
    Download as PPTX, PDF, TXT or read online from Scribd
    Flag for inappropriate content
    of 6

    Bonding-4

    chemistry
    3-step etch& rinse
    • Etch- 35% H3PO4
    • Primer- HEMA, polyalkenoic acid polymer,
    water
    • Bonding- bis-GMA, HEMA, tertiary amines,
    photoinitiator
    2-step etch & rinse
    • Etching – phosphric acid
    • Bonding- dimethacrylates, HEMA,
    polyalkenoic acid polymer, 5-nm silane-treated
    colloidal silica, ethanol, water, photoinitiator
    Two-step self-etching
    • Self-etching primer- acrylic ether phosphoric
    acid, bisacrylamide, water, camphoroquinone,
    stabilizers
    • Bonding bis-GMA, GDMA, HEMA, fumed silica,
    CQ, , tertiary amine, stabilizers
    One step
    • Part-I- ethanol, Na benzoate, sulfinate
    • Part-II- HEMA, BPDM, GPDM, bis GMA
    One step
    • UDMA, 4- META, glutaraldehyde, acetone,
    water, photoinitiators,stabilizers

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