R.A. Muhammad Rizwan, FMSE, GIK Institute, Topi, KPK.

EXPERIMENTAL PLAN 1: Self-healing micro/nano features of Shape memory alloys Motivation:

Fabrication of self-healing micro and nano features to improve lifetime of features and remove the defects.

Work Plan:
Thin films of shape memory alloys will be prepared by using either spin coating or sputtering on Stainless steel or silicon substrates. SMA powder may be applied in form of slurry by using spin coating and subsequent evaporation. Sputtering can be used where very thin film is required. Films will be patterned by using optical lithography and etching (?) techniques. Anodic Aluminum oxide (AAO) template or Polystyrene (PS) nanoparticles may also be purchased and used for the patterning of SMA thin films. Various types of features will be prepared including, pillers, gratings, channels, dots etc. A method will be devised to quantify the rate and extent of self-healing property of the micro/nano features. Micro and nano features will be characterized for self-healing property by using SEM. This work can be extended to apply the SMA based micro/nano features for sensors and for bionano applications.

EXPERIMENTAL PLAN 2: Scaling-down of micron features to nanometer range Motivation:

Fabrication of nano features without the use of costly nanolithography equipment.

Work Plan:
Conductive seed payer deposition on Si substrate [Ti(5nm)+Ni(10nm)] Photoresist micro patterning on Si substrate by using optical lithography. Ni electrodeposition from Ni sulphamate bath. This is very crucial step as the amount of electrodeposited layer on patterned PR will determine the gap between to neighboring micro features. Control of the electrodeposition by potentiostatic method will be done. After the electrodeposition, the underlying seed layer and the Si will be etched. Work can be further extended to fabricate metal nanostamps for injection molding.