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Electronic Transport
Jesper Nygrd
Niels Bohr Institute
University of Copenhagen
V
I
Rich on exciting physics and surprising phenomena
Key for interpreting wide range of experiments
Many possible variations over this theme:
- electrostatic gates
- contact materials (magnetic, superconducting)
- sensitive to environment (chemical, temperature...)
- interplay with nano-mechanics, optics, ...
Outline
Electronic structure (1D, 0D)
density of states
Charge -e
Wave function
Single-electron effects
Size quantization
nm
Electronic structure
Density of states (DOS)
1D:
semiconductor
quantum wires
conducting polymers
nanotubes
0D:
atoms
molecules
nanocrystals
metal nanoparticles
quantum dots
short nanotubes
Electronic transport
V=R.I
[]
L
R is additive
Nanoscale systems (coherent transport):
R is a global quantity, cannot be decomposed
into local resistivities (see why later)
Conductance G:
(Not conductivity )
G=1/R=I/V
[unit e2/h]
(k > 0)
2
eV
Chemical potential ~ EF
(Fermi level)
Channel: 1D, ballistic
(transport without scattering)
I
velocity
spin
V
1D density
k>0
electron
wavefunction
Landauer formula:
2e2/h
2D
2D
Finite temperature
T
2D
2D
R=1-T
Resonant transport
Two identical barriers in series:
t
Coherent transport;
complex transmission
and reflection amplitudes:
t = |t|eit
r = |r|eir
L
Total transmission:
Resonant transport, II
Two identical barriers in series:
t
t
r
r
L
Quasi-bound states:
(electron-in-a-box)
kL = n
Resonant transmission:
E
T
Spectrum
(0D system)
Transport measurement
...spectroscopy by transport...
(quantum dots, see later)
Incoherent transport
Separation L > phase coherence length L:
t1
r1
t2
r2
Electron phase
randomized
between barriers
L
Total transmission (no interference term):
Resistors in series:
Transport regimes
Length scales: F
Lm
L
L
(simplified)
Fermi wavelength
(only electrons close to Fermi level contribute to G)
momentum relaxation length (static scatterers)
phase relaxation length (fluctuating scatterers)
sample length
Diffusive, L > Lm
scattering, reduced transmission
Conductance of one-dimensional
ballistic wire is quantized:
With perfect contacts:
G = current / voltage
= 2*2e2/h
V
Quantum of resistance:
h/e2 = 25 kOhm
Outline
Electronic structure (1D, 0D)
density of states
Tutorial on
Electronic Transport
Metal
lead
sour
drain
ce
Au
SiO2
p++ Si gate
Vg
I
100 m
Catalyst islands
Lift-off
SiO
p + + Si
e-beam
CVD
SWNT
Lift off
PMMA
Development
Catalyst m aterial
Cr/Au c ontac ts
source
drain
gate
EFM
AFM
12 m
0.1 mm
SWNTs
Poster
T.S. Jespersen
Poster
drain
source
gate
EF
EF
OFF
Wire
(Naive
sketch)
Field-effect transistor
Seen first by Tans et al, Nature (1998)
Eg ~ 0.5-1 eV
(N, M) = (5, 5)
(N, M) = (10, 5)
First interpretation of
On
G (e2/h)
EF
Saturation due to
contact resistance,
~ e2/h
10,000 cm2/Vs
(For silicon 450)
Off at positive Vg
p type FET
(intrinsic p doping?)
Mobility: = vd / E
electric field E
drift velocity vd
Band structure
Schottky barrier
Different workfunctions
(eg due to O2 exposure)
Vg=-0.5 V
Vg=0
No change of gap
1D conductor
I0 ~ 25 A
Babic et al, AIP Conf. Proc. Vol. 723, 574-582 (2004); cond-mat
Outline
Electronic structure (1D, 0D)
density of states
20
129 K
G (S)
Conductance (S)
20
15
15
10
5
40 K
10
100
16 K
200
T (K)
300
8K
1.6 K
0
0.0
0.9
1.8
2.7
3.6
Typical T dependences
tunneling into end
of Luttinger liquid
G ~ T 0.6
10
= (g-1-1)/4
= 0.6 g ~ 0.29
b)
1
10
Bockrath et al,
Nature (1999)
g = Luttinger
parameter
T (K)
100
Predicted: Egger & Gogolin (1997), Kane, Balents & Fischer (1997)
Dilution refrigerator
20 mK
sample
G (e /h)
0.4
300 K
0.2
205 K
0.34 K
0.0
-10
-5
G (e /h)
0.3
0
Vg (V)
Gpeak ~ 1/T
4.5 K
0.3
1.7 KK
0.34 KK
1.7
4.2 K
-0.4
0.0
Vg (V)
0.2
10
0.1
0.0
-0.2
0.2
0.4
Coulomb blockade
Electrons can tunnel only
at Vg for which
E(N+1,Vg) = E(N,Vg) kT
Bias
V
N
electrons
gate
Vg
Quantum dots
(artificial atoms)
U
E
0.3
0.2
T ~ 300 m K
Add 1 e -
0.1
0.0
-7.5
-7.0
-6.5
-6.0
-5.5
N electrons
Non-linear characteristics
T = 4.2 K
Nonlinear I-V curve
(fixed gate volt.)
Coulomb
blockade peaks
(zero bias)
Differential
conductance
high
dI / dV
0
Appl. Phys. A 69, 297 (1999).
Bias spectroscopy,
Coulomb diamonds,
Ohmic resistor
Bias voltage V
Gate voltage Vg
Bias voltage V
B=0T
T = 100 mK
A
Vg (V)
E
eV
U+E
Confirmed
splitting:
EC
EC +E
EC+E by Zeeman
0.15
Vg (V)
Count
0.10
4
2
0
0.15
Vg (V)
0.3
T ~ 300 mK
0.2
Vg
G (e /h)
0.10
0.1
0.0
-7.5
-7.0
-6.5
Vg (V)
-6.0
-5.5
Level structure
Model
5 parameters:
- charging energy U
- level spacing
- subband mismatch <
(small) - exchange energy J
(small) - residual Coulomb energy dU
First hole
enters
Empty dot
First electron
enters
G
(e2/h)
Tunnel contacts
weak coupling limit
0.3 e2/h
1.7 e2/h
G
(e2/h)
G
(e2/h)
3.1 e2/h
1D quantum dot
V (mV)
dI/dV
1.0
G (e /h)
75 mK
G (e /h)
1.5
0.5
Y
1.0
X
0.5
780 mK
0.0
-3.6
-3.5
V g (V)
0.1 T (K)
-3.4
1) Alternations
2) Peaks in dI/dV
3) .G ~ -logT
- Key signatures of
the Kondo effect
1.
EC
Ground state
3.
E0
Virtual
Okay
Heisenberg: t ~ h/E0
Net result:
Co-tunneling due to
more open contacts
(higher order process)
- transport
- spin flip
| =
Coherent superposition
T < TK
T > TK
resonance
blockade
contact
coupling
| =
Coulomb blockade
EXPERIMENT
Even
Odd
Even
75 mK
I (a.u.)
2.0
Even N, S=0:
no correlated state,
suppression of conductance
740 mK
0.0
3 .0 6
3 .1 0
V g (V )
Odd N, S=1/2:
correlated state at really low T,
conductance restored!
Highly tuneable
system
...recent data...
Superconductor-SWCNT-Superconductor junction
Superconducting
leads
Bias (mV)
Normal (B=180mT)
SWCNT contacted to
Ti/Al/Ti 5/40/5 nm leads
(Tc = 760mK)
-0.25
0.00
0.25
0.50
-6.00
-5.75
-5.50
-5.25
-5.00
-4.75
Vgate (V)
Superconducting
Bias (mV)
-0.250
-2
-0.125
0.000
0.125
0.250
0.375
-6.00
-5.75
-5.50
-5.25
-5.00
-4.75
Vgate (V)
0.50
1.00
1.50
dI/dV (e^2/h)
2.00
Kasper Grove-Rasmussen et al
Poster
Ferromagnetic contacts
FM-N-FM system
FM
FM
Tunnel barriers
Difference between tunnel resistance for parallel (Rp) and antiparallel (Rap) magnetised contacts (Julliere, 1975):
2P2
R Rap R p
=
=
Rap
Rap
1 + P2
Diameter 30 nm
SiO2
Si
0.09
Spin-polarized
transport ?
FM
Au
Tube
FM
Micromagnet
electrodes,
single-walled
The simplified
picture
Sweep
directions:
0.08
G (e /h)
Current
(nA)
Au
T=4.2K
T = 4.2
K
0.07
0.06
0.05
0.04
0.03
AP
0.02
0.01
0.00
-0.4
Parallel (P)
source
0.2
drain
B
0.0
0.4
B (T)
External magnetic
field (T)
Fe
Fe
-0.2
Fe
Fe
Fe
drain
source
drain
Fe
source
Parallel (P)
Spin-tronics
Au
SiO2
C. Thelander et al,
APL 79, 2106 (2001).
Electrons in nanotubes
No
rm
al
m
et
al
Correlated states
rti
cle
co
nd
Na
no
pa
Su
pe
r
Fe
rro
m
ag
ne
uc
t
to
r
Magnetic contacts
- Spin transport, spin transistors?
Superconducting contacts
- supercurrents?
AFM manipulation of
nanoscale objects
- Gold particle transistor, 1D-0D-1D
Sp
i
Au
Tube
FM
Outline
Electronic structure (1D, 0D)
density of states
MM junctions:
R = 100-300k
= 0.02-0.06
60
40
I (nA)
20
0
-20
MM (4 probe)
SS (2 probe)
MS (2 probe)
MS (2 probe)
-40
-60
-80
-100
-100
-80
-60
-40
-20
20
V (mV)
40
60
80
100
SS junctions:
R = 400-2400k
T = 0.003-0.02
MS junctions:
R = 30-50M
T = 2 x 10-4
I (nA)
200
Junction A
Junction B
T=50K
Vg=-25V
-200
-400
-500
500
Forward
Reverse
ZeroBias
Bias
Eg/2 = 190-290meV
(expect: 250meV)
Nanotube logic
Proof of concept
(only 1% showed significant gate dependence)
J.R. Hauptmann et al
Poster
Single-electron
transistors
at low T
SiO2
ambipolar
nanotube
FET
moving
LET
Misewich et al,
Science 300, 783 (2003).
GATE
Au
Cr
SiO2
Si (gate)
Before
Vg~70mV
and after
Vg~160mV
Vg ~ e/Cg, gate capacitance decreases
Appl. Phys. Lett. 79, 4216 (2001)
Nanorelay
Switch based on nanotube beam suspended above gate and source
electrodes:
Electrostatic attraction to gate
Outline
Electronic structure (1D, 0D)
density of states
Anti-conclusion
- what we have not covered
Recommended reading
Acknowledgements
CNT (Copenhagen Nanotube Team,
Niels Bohr Institute 1998-)
David Cobden, Uni. Washington, Seattle
2000
2004