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Article history:
Received 3 September 2012
Accepted 23 September 2012
Available online 29 September 2012
The present research explores the novel approach to achieve grain renement in NiTi shape memory
alloy thin lms by adding W in the matrix of NiTi. It involves production of NiTiW shape memory alloy
thin lms by Co-sputtering of NiTi and W targets. The grain size of B2-NiTi decreases with increasing W
content, due to the immiscible W layer obstructing its grain growth. Moreover addition of W induces
the B2R single step transformation by suppressing thermally induced martensite phase due to
grain size renement below 40 nm. With W content ranging from 2.6 at% to 4.5 at%, the lms are
strengthened and can reach highest hardness and elastic modulus of 32.8 72.7 GPa and 167.837
8.64 GPa, respectively. With further increase in W content, the mechanical properties of lms decrease
gradually. This behavior can be explained in terms HallPetch theory and lattice distortion of NiTi
crystals with increasing the W content.
& 2012 Elsevier B.V. All rights reserved.
Keywords:
Thin lms
Sputtering
Grain size
Elastic modulus
1. Introduction
Nanocrystalline materials have been the subject of considerable
research in recent years for their novel and enhanced properties
[1,2]. The nanocrystalline NiTi shape memory alloys were synthesized in their bulk form by severe plastic deformation (SPD),
including high pressure torsion (HPT), equal-channel angular pressing (ECAP), and multi-step SPD deformations [3]. Grain renement of
NiTi enhances its mechanical properties and modify the phase
transformation path to B2R having smaller hysteresis, low transformation strains and higher work output as compared to B2RB190
present in coase grained NiTi [4]. Because of the small hysteresis, a
quick response is expected in microactuators using such an R-phase
transformation. Thus the application of grain renement by various
techniques is a powerful tool to design microstructures with superior
properties and performance. However above mentioned mechanical
methods of grain renement are limited to bulk samples only. The
present research explores the novel approach to achieve grain
renement in NiTi thin lms by adding W in matrix of NiTi. Effect
of grain renement on structural, phase transformation and mechanical properties of NiTi was investigated.
2. Experimental procedure
NiTiW thin lms were deposited on Si substrates by magnetron sputtering using Dc magnetron Co-sputtering system (Excel
n
0167-577X/$ - see front matter & 2012 Elsevier B.V. All rights reserved.
http://dx.doi.org/10.1016/j.matlet.2012.09.073
203
Fig. 1. Inuence of W content on (a) unit cell volume change DV/V0, (b) lattice parameter and lattice distortion, (c) X-ray diffractograms and (d) AFM and FESEM images of
NiTiW sputtered thin lms.
204
Table 1
Various parameters of NiTi and NiTiW shape memory alloy thin lms.
Sample name
Structural properties
Grain size (nm)
Pure NiTi
NiTiW (2.6)
NiTiW (4.5)
NiTiW (9.1)
NiTiW (12.8)
NiTiW (33.6)
a
XRD
FESEM
AFM
25.2
7.16
6.23
4.16
3.34
2.76
80.4
24.1
20.1
13.8
11.1
9
87.9
24.9
21.7
14.3
11.4
9.6
Mechanical properties
Average
roughness (nm)
Total deptha
hmax (nm)
Residual deptha
hr (nm)
Elastic recovery
ratioa, d
Hardnessa
H (GPa)
Elastic modulusa
E (Gpa)
H3/E2a
r (GPa)
20.5
7.5
6.3
3.53
3.03
2.41
114.417 0.72
74.55 7 0.31
71.57 7 0.56
98.36 7 0.71
103.99 7 0.92
107.49 1.33
88.6 7 1.68
51.61 7 1.27
43.63 7 1.94
70.41 7 2.64
75.9 7 2.13
79.56 7 2.15
0.225 7 0.015
0.3087 0.017
0.39 7 0.029
0.284 7 0.026
0.27 7 0.021
0.259 7 0.022
8.05 70.29
23.44 71.14
32.8 72.76
12.59 70.97
10.8 70.64
9.86 70.38
85.67 1.98
162.977 5.94
167.837 8.64
100.947 3.76
93.27 6.01
89.47 5.98
0.0717 0.006
0.484 7 0.096
1.25 7 0.376
0.196 7 0.053
0.145 7 0.036
0.119 7 0.028
210
280
Temperature (K)
350
0.72
0.348
Resistance (ohm)
Resistance (ohm)
0.68
0.64
0.344
0.340
0.60
0.56
100
0.336
150
200
250
300
Temperature (K)
350
70
400
140
420
Fig. 2. Phase transformation behavior of pure NiTi and NiTiW sputtered thin lms.
hmax hr
hmax
(E r )
120
28
80
21
40
14
160
Hardness
35
7
0
10
15
20
25
30
35
W content (at.%)
40
4. Conclusions
1.2
30
0.9
20
0.6
H 3/E r 2
1.5
ER (%)
H 3/E r 2
0.3
10
0.0
0
-0.3
0
10
15
20
25
30
35
W content (at.%)
Fig. 3. (a) Hardness and elastic modulus, (b) elastic recovery ratio (ER%) and toughness
(H3/E2r ) vs. W content of various NiTiW thin lms.
205
Gb
p1usapp
Acknowledgment
The nancial support provided by Ministry of Communications
and Information Technology (MIT), India, under Nanotechnology
Initiative Program with Reference no. 20(11)/2007-VCND is
highly acknowledged.
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