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Electrochemical Design of Nanostructured ZnO Charge Carrier Layers For Effi Cient Solid-State Perovskite-Sensitized Solar Cells
Electrochemical Design of Nanostructured ZnO Charge Carrier Layers For Effi Cient Solid-State Perovskite-Sensitized Solar Cells
de
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The preparation of ZnO structured films designed to act as electron transport layers in efficient ZnO/perovskite CH3NH3PbI3/spirobifluorene (spiroOMeTAD) solid-state solar cells by electrochemical deposition is reported.
Well-conducting ZnO layers are deposited in chloride medium and grown
with tailored (nano)structures ranging from arrays of nanowires to a compact,
well-covering film. Moreover, the effect of a thin intermediate overlayer of
ZnO conformally electrodeposited in nitrate medium and with a low n-type
doping (i-ZnO) is discussed. The results show higher power conversion
efficiencies for the nanostructured oxide layers compared to the dense one.
Moreover, the presence of the i-ZnO layer is shown to markedly improve the
cell short-circuit current and the open-circuit voltage due to charge recombination reduction. For the best cells, the active layers efficiently absorb light
over a large spectral range from near-UV to near infrared region and exhibit
excellent charge collection efficiencies. Solar cells based on an optimized
design generate a very large photocurrent and the power conversion efficiency at one sun is as high as 10.28%.
1. Introduction
Solution-processed organic and hybrid organicinorganic solar
cells, such as dye-sensitized solar cells (DSSC), quantumdot-sensitized solar cells (QD-SSC) and bulk heterojunction
organic solar cells, have been intensely developed during the
last two decades.[1] A major breakthrough was achieved recently
by the use of lead halide perovskites as the light absorber material in the cells. The perovskite polycrystalline structure is composed of CH3NH3PbX3, where X is a halogen atom (I, Cl, Br, or
a combination of some of them). This light harvester was first
proposed by Miyasaka et al. who used it as replacement of dye
in the DSSC configuration.[2] Subsequently, to avoid the dissolution of the light harvester material, the liquid electrolyte was
replaced by solid hole transport materials (HTM) and remarkable improvements in performance could be achieved.[313] The
singular properties of the lead halide perovskites lie in their
bandgap being close to the ideal one, in the position of their
J. Zhang, Prof. P. Barboux, Dr. T. Pauport
Institut de Recherche de Chimie Paris (IRCP)
CNRS-Chimie ParisTech-Paris Sciences et Lettres
PSL UMR8247, 11 rue Pierre et Marie Curie
75005, Paris, France
E-mail: thierry.pauporte@chimie-paristech.fr
DOI: 10.1002/aenm.201400932
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Table 1. Morphological parameters of electrodeposited ZnO layer structures. L is the wire length or layer thickness, D is the wire/rod diameter
and is the layer roughness.
layer
i-ZnO
Z02
Z02i
Z05
Z05i
Z50
Z50i
L
[nm]
D
[nm]
600
7075
740
155
1000
150
1100
NW density
[m2]
32
30
12
27
15
27
18
4042
120
175
1315
100
800870
200250
900950
80100
12
Figure 2. SEM images of ZnO layers with i-ZnO: a) Z02i, b) Z05i, and
c) Z50i.
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3. Conclusions
We have used electrochemical deposition
techniques to design nanostructured ZnO
scaffold layers for perovskite solar cell
applications. The results show the beneficial effect of nanostructuring the oxide
Figure 4. a) Absorbance spectra of the electrodeposited ZnO layers after sensitization by lead layer and of producing this layer in a chloiodide perovskite. b) Room temperature photoluminescence spectrum of the lead iodide per- ride deposition bath. The NW/NR nanoovskite sensitized Z05 layer (dashed line) and Z05i layer (full line) (excitation at 600 nm).
structure favors the perovskite loading
and the confinement of the CH3NH3PbI3
phase, which reduces the path length of
the photogenerated charge carriers before their collection
were efficiently collected because of the well-designed nanoby the oxide ETM. Moreover, we have shown the beneficial
structures and stacked layers.
effect of covering these structures by a thin intermediate
The very large performance difference between the Z05
conformal overlayer of low n-type doped ZnO. This layer has
and Z05i cells is very surprising (Table 2). However, it can
been electrodeposited from a zinc nitrate bath at high overbe understood from the layer arrangement disclosed in
voltage. It increases both the Jsc and Voc of the cells. ImpedFigure 3a. We have noted the presence of white spots that are
the top of ZnO wires uncovered by the perovskite layer. These
ance spectroscopy measurements have shown that this layer
top ends are in direct contact with the spiro-OMeTAD layer.
reduces the recombination of charge carriers. The presented
Therefore, they should act as recombination area between
cells, which are solution-processed at a low temperature
holes and electrons and then lead to an unwanted reduction
(<150 C), exhibit a very large Jsc close to 22 mA cm2 and a
of Jsc and of the Voc. However, this effect is not observed in
remarkable conversion efficiency of 10.28%. We suggest that
the i-ZnO overlayer improves the perovskite-ZnO interface
Z05i cells. In this case, it could be linked to the thick poorly
and reduces the side recombination reactions. The present
conducting i-ZnO layer that is present between the ETM and
work shows that electrochemical techniques are very promthe HTM.
ising for preparing oxide layers for PSSC and the interest
Impedance spectroscopy (IS) measurements were performed
of the overlayer deposition approach that differs from the
to get further insights into the effects of the i-ZnO layer on the
underlayer one, classically used in the solid-state PSSC
cell functioning. Figure 7a presents typical spectra with and
technology.
without i-ZnO. Two main arcs of circle are observed. The low
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Figure 5. a) Schematic drawing and cross-sectional SEM view of the Z05i cell. b,c) JV curves of perovskite solar cells with electrodeposited ZnO
ETM, measured under AM1.5G filtered 100 mW cm2 illumination (full lines) and in the dark (dashed lines): b) without i-ZnO overlayer and c) with
i-ZnO. Z02, Z05, and Z50 stand for the various concentrations of ZnCl2 used upon the deposition of the initial ZnO layer. i is added when the i-ZnO
layer is present.
4. Experimental Section
ZnO Layer Electrodeposition: The ZnO films were prepared directly on
F-doped SnO2 (FTO) coated glass substrates (TEC-10) without the use
of a seed layer. The substrates were carefully cleaned with soap, rinsed
with deionized water prior to be sonicated 5 min in ethanol, 5 min in
acetone and 2 min in 45% nitric acid. The electrochemical depositions
were carried out in a three-electrode cell. The counter-electrode was a zinc
wire and the reference electrode was a saturated calomel electrode (SCE)
(with a potential at +0.25V vs NHE) placed in a separate compartment
maintained at room temperature. To ensure a deposition as homogeneous
as possible, the substrate was fixed and contacted to a rotating electrode
and the deposition was performed at a constant rotation speed.
Fundamentally, the deposition bath contained a zinc precursor (zinc
chloride or zinc nitrate) and a hydroxide ion precursor (molecular oxygen
or nitrate ions). For the initial layer deposition, the baths were prepared
using MilliQ quality water (18.2 M.cm), the supporting electrolyte was
KCl at 0.1 M and the applied voltage was 1.0 V/SCE. The electrode was
rotated at 300 rotations per min (rpm). The bath was bubbled 40 min
with molecular oxygen prior to start the deposition and the bubbling was
maintained upon the deposition process.
The deposited structures have been tailored by playing on the ZnCl2
precursor concentration and on the deposition temperature.[30,31]
Increasing the deposition temperature and decreasing the Zn(II)
precursor concentration favor the growth of nanowires with high aspect
ratio.[31] The nanowires are single crystals and have a high structural
quality.[19] Several deposition times (layer thicknesses) have been tested
and the retained ones in the paper are those that yield to the best final
solar cell performances. Three different conditions were selected. i) A
0.2 mM ZnCl2 bath, a deposition temperature of 85 C and a deposition
time of 30 min (samples denoted Z02). The mean electrical charge
exchanged upon the ZnO deposition, noted Qd, was 2.2 C cm2. ii) A
0.5 mM ZnCl2 bath, a deposition temperature of 85 C and a deposition
time of 20 min (samples denoted Z05). Qd was 0.90 C cm2. iii) A ZnCl2
Cell
Z02
Z02i
0.5 mM
Jsc
[mA cm2]
FF
[%]
1.30
0.65
17.7
33.2
3.81
1.23
0.90
20.8
34.4
6.48
1.19
0.24
13.3
29.5
0.95
1.20
0.99
21.9
47.3
10.28
1.05
0.89
11.4
36.4
3.69
1.00
0.96
9.09
39.7
3.45
16.6b)
45.5b)
7.19b)
Z50
Z50i
Voc
[V]
Z05
Z05i
5 mM
i-ZnO Absorbancea)
b)
0.95
a)Mean absorbance calculated between 500 and 600 nm; b)Cell performances
achieved by reducing the i-ZnO deposition time from 20 s to 10 s.
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Figure 7. a) Exemples of Nyquist plots under illumination of solar cells with and without i-ZnO layer, recorded at 0.5V; b) variation of Rct with Vcor, the
applied voltage corrected for the Ohmic drop. () Z02; () Z02i; ()Z05; and ()Z05i solar cells.
bath at 5 mM, a deposition temperature of 70 C and a deposition time
of 20 min. Qd was equal to 0.85 C cm2 (samples denoted Z50).
Moreover, the effect of a thin intermediate layer of ZnO (denoted
i-ZnO), conformaly deposited on the ZnO nanostructures and substrate
was investigated. This secondary layer was deposited at 1.15V/SCE
using a 0.08M Zn(NO3)2 bath solution maintained at 60 C without gas
bubbling. The electrode was rotated at 145 rpm. 20 s of deposition time
was found to yield optimized cell performances. The mean electrical
charge exchanged upon the i-ZnO layer deposition is noted Qi and it
was measured at 0.14, 0.13 and 0.12 C cm2 for deposition on ZnO films
prepared with 0.2 mM, 0.5 mM and 5 mM of ZnCl2, respectively. The
cells with a i-ZnO layer are denoted ZXXi with XX = 02, 05 or 50 (see
Table 1).
Solar Cell Preparation and Characterizations: The ZnO layers were dried
at 150 C for 30 min. The organic-inorganic perovskite CH3NH3PbI3
was deposited by a sequential method inspired from the literature.[10]
70 L of PbI2 solution at 70 C (dissolved in N,N-dimethylformamide at a
concentration of 460 mg mL1) was spin-coated on top of the ZnO layer
at 3000 rpm for 15 s. This step was repeated once. After drying at 70 C
for 30 min in air, the substrate was dipped into a solution of CH3NH3I in
2-propanol (10 mg mL1) for 30 s (optimized duration), then dried at 70 C
for 30 min. CH3NH3I was prepared according to ref. [46]. Subsequently,
the spiro-OMeTAD-based hole-transport layer was deposited. 170 mM
spiro-OMeTAD, 180 mM tert-butylpyridine, 60 mM LiTFSI were dissolved
in chlorobenzene and acetonitrile (19:1/v:v). 40 L of solution was spin
coated on the CH3NH3PbI3/ZnO structures at 2000 rpm for 15 s. Finally,
a 150-nm-thick silver layer was deposited by thermal evaporation on the
Spiro-OMeTAD layer as a back contact. The JV curves were measured
after several days of storage in a dry place at room temperature. They
were recorded by a Keithley 2400 digital sourcemeter, using a 0.01 V s1
voltage sweep rate. The solar cells were illuminated with a solar simulator
(Abet Technology Sun 2000) filtered to mimic AM 1.5G conditions. The
illuminated surface was delimited by a black mask with an aperture
diameter of 3 mm. The power density was calibrated to 100 mW cm2
by the use of a reference silicon solar cell. The reproducibility of the
performances was checked on several cells prepared from different
batches. The IPCE curves were recorded at short circuit with a homemade system using a Jobin-Yvon monochromator and a calibrated
powermeter. The impedance spectra were measured under 0.2 sun
illumination provided by a Schott lamp, between 250 KHz and 0.1 Hz,
using a Solartron FRA1255 frequency response analyzer coupled with a
PAR273 EGG potentiostat. The AC signal was 10 mV. The applied voltage
was corrected for the Ohmic drop as described in ref. [20].
The film thicknesses were measured with a Dektak 6M stylus
profilometer. The sample morphologies were examined with a high
resolution Ultra 55 Zeiss FEG scanning electron microscope (FE-SEM)
at an acceleration voltage of 10 kV. The film structure was characterized
by a Phillips X-pert high-resolution X-ray diffractometer operated at
40 kV and 45 mA and using the CuK radiation with = 1.5406 . The
film total transmissions and total reflections were measured with a
Supporting Information
Supporting Information is available from the Wiley Online Library or
from the author.
Acknowledgements
J.Z. acknowledges the Guangzhou Government for scholarship (Oversea
Study Program of the Guangzhou Elite Project). Bruno Viana and
Patrick Aschehoug (IRCP_Paris, France) are thanked for PL spectrum
measurements.
Received: June 5, 2014
Revised: August 15, 2014
Published online:
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