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Introduction to Semiconductor
Devices
L-30: MOSFET
B. Mazhari
B M h i
Professor, Dept. of EE
p
IIT Kanpur
1G-Number
B. Mazhari, IITK
Transistors
Transistor
BipolarJunction FieldEffectTransistor
Transistor(BJT) (FET)
MetalOxidesemiconductor
field effect transistor
fieldeffecttransistor
(MOSFET)
Transistor
IO
+ +
VIN Vo
- -
C
Current
t IO is
i much
h more sensitive
iti tto VIN than
th VO
I O I O
Vin Vo
Field Effect Principle I O I
O
Vin Vo
-2V
5V
- - - - - - - - - -- - - - - - -
+ - + - + - + - + - + - + -
+ -
+ - + - + - + - + - + - + -
N-Type
+ - + - + - + - + - + - + -
Transconductance
N-Type
yp
Oxide
N-Type
Depletion-Mode Transistor
1V
-1V Gate
Source Drain
0V 5V
Oxide
n+ N-type n+
p type
p-type
0V
Body
In a depletion-mode
p transistor, a channel exists without any
y gate
g voltage
g being
g
applied and current flows when drain voltage is applied.
Negative gate voltage is applied to deplete the channel of carriers and cause
current to reduce.
Channel exists at zero gate voltage and is depleted by gate voltage
-1V
Gate
Source -3V -2V Drain
Oxide
n+ n+
p-type
Body
Channel is completely pinched off and current ~zero
NMOS Enhancement mode transistor: Inversion Mode
Transistor
S
Metal /Poly
/Poly-Si
Si D
SiO2
Al Al
+ +
N N
P-Silicon
B
Gate
S
Source Drain
0V 5V
Oxide
n+ n+
p-type
0V
Body
Gate
Source + + + + + + + + + + + + + + Drain
Oxide
-------------------
n+ n+
p-type
Body
Sheet of electrons
Depletion charge (inversion layer)
Conductivity modulation at the surface?
MOS capacitor constitutes the heart of a MOSFET
VG
Gate
Oxide
+ + + + + + +
+ + + + + + +
+ + + + + + +
p-type + + + + + +
3
Body
p N A 10 cm
16
ni2
n 104 cm 3 ns ps n 10 cm
2 20 3
NA 1
3
Field Effect ns ps n 10 cm
1
2 20
0V VT
VG
16 15 10 8 4
Ps: 10 10 10 10 10
4 5 10 12 16 17
ns: 10 10 10 10 10 10
Strong .
Inverted Inversion
Surface P-Type
Surface
Intrinsic N-Type
Surface carrier density can be changed from P-type to N-type
Surface Carrier Density
ps ns
NA
ps
ni
ns
VGB VT
Flat band condition VG VFB
VG
Gate
Oxide
+ + + + + + +
+ + + + + + +
+ + + + + + +
p-type + + + + + +
Body
VG = VFB ; Flat-band
Flat band condition meaning no NET voltage across the capacitor
capacitor.
Uniform hole density everywhere
MOS Capacitor: Energy band diagram
16 -3
Metal SiO2 10 cm
P-type
16 -3
SiO2 10 cm
P-type
yp
18
G-Number
B. Mazhari, IITK
16 -3
SiO2 10 cm
P-type
yp
EO
1
4.05
4.3
0.18
5.17
10
19
G-Number
B. Mazhari, IITK
EO
1
4 05
4.05
4.3
5
10 5.17
EC
EO
EF
EV
MS s m 0.7
0 7V s m ms
q VFB =- 0.7V
q q
20
G-Number
B. Mazhari, IITK
EC
Ei
Metal SiO2 P-type
EF
EV
Ei
const. Ei ( x ) Eib S B 0
q
( x)
q
E Ei E EF
n ni exp F p ni exp i
kT kT
ni2 q q
n exp p N A exp
NA kT kT
Metal SiO2 P-type qF
Eib EF kT NA
p N A ni exp F ln
q i
n
kT
ni2 q S q S
nS exp pS N A exp
S F kT
NA kT
ni ni
Depletion
VG VFB but VG VTHN
Gate
Oxide
+ + + + + + + Depletion region
+ + + + + + +
p-type + + + + + +
Body
ni2 q
nS exp
p S NA
NA kT
k
kT NA
F ln
q i
n
S 2F
Strong Inversion
VG VTHN
Gate
Oxide
-------------------------
Depletion region
+ + + + + + +
p-type + + + + + +
Body
Gate
Oxide
+
++ + ++ + + + + ++ + +
+ + + + + + + extra holes
+ + + + + + +
p-type + + + + + +
Body
Flatband EC
Ei
EF
EV
MS
VGS VFB
q
Metal SiO2 P-type
Depletion