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η=
γ
(1 + γ )
(1 − Qe0 p g d p ) . 0
Jzc
z
366
2016 IEEE 36th International Conference on Electronics and Nanotechnology (ELNANO)
dp – longitudinal dimension of anode plasma, l – longitudinal dimension of IV. SIMULATION OF PHYSICAL PROCESSES IN ANODE
discharge gap.
PLASMA AND ESTIMATION THE POWER OF ADDITIONAL
Taking into account, that all electrodes are heated to DISCHARGE
certain average temperature and cooled by the water [10, 11], Anode plasma in high voltage glow discharge is created as
and the gas temperature also can be considered as average a result of gas ionization by different groups of electrons. For
value of the gap volume, the equation system (7) can be convenience the fluxes of fast electrons of beam, reflected
rewritten as follows [8]: from the anode surface, and of slow electrons, which are for-
med as a result of gas ionization in anode plasma, are usually
J Rad =
(
βλ g τi Tad − Tg ); J =
(
βλ g τ i Tc − Tg ); (8)
considered [6]. In triode impulse HVGD electrodes systems
2 zc 2 from the anode of additional discharge under its’ bombard-
Ti d cp Ti d cp
ment by the ions generated the additional flow of slow elect-
J za =
(
βλ g τ i Tc − Tg ), ron, which also effectively ionized the gas in the plasma vo-
2 lume [4]. In such physical conditions for impulse regime of
Ti d cp
operation of HVGD electron guns the equation of balance of
where Tad – temperature of additional electrode, Tc – cathode charged particles in anode plasma can be written as [4]:
temperature, Tc – anode temperature, Tg – gas temperature in z f + z s + z dis = z dif , (12)
the discharge gap. with zf – efficiency of gas ionization by fast electrons of beam,
In the real HVGD electrodes’ systems taking into account zs – efficiency of gas ionization by slow electrons, emitted from
the transferring of heat energy, connected with flowing of gas the anode surface after its bombardment by fast electrons, zdis –
trough the length of gap, is also necessary. It is caused by efficiency of gas ionization in low-voltage discharge, zdif –
method of regulation of beam power in HVGD technological decreasing of ions concentration in anode plasma as a result of its
electron sources. During operation of such technological leaving by diffusion process. The equation for calculation the
sources stable value of discharge current maintained by values of efficiency of gas ionization and of diffusion dissipation
changing of input gas flow in the gap volume with its’ of electrons was considered and analyzed in papers [4].
uninterrupted pumping [9]. Therefore the gas, which flow The most important parameter of impulse HVGD
through the gap, heated from the hot electrodes, and the electrodes’ systems is the length of plasma boundary dp, pointed
electrodes’ system is cooled by this physical process. To out at Fig. 1. Volume of anode plasma is very important for
taking onto account this important convention process to estimation of ion current and the powers of main and additional
equation system (8) must be added additional relations [8]: discharge [4, 6]. Analytical solution of equation (12) relatively
IF =
(
βτ i c gv na Tg − Tg 0 )v vF =
2u
to parameter dp given such result [4]:
F; , (9)
2
Ti d cp Ca − ai
R1 = AiU ac (− ai
AiU ac +1 ) kTe + eU ad
2πme
−a
, R2 = fηi ηU i k e ,
where Tg 0 – the gas temperature in the place of inlet into
discharge gap, c gv – heat conductivity per unit volume, u – § ·
kTe + eU ad ¨ Ui ¸
velocity of pumping, vF – velocity of gas flux. Therefore the R3 = 3(kTe + eU ad )N 0 α i exp¨ − ¸,
heat flux defined by simple relation [8]: 2πme ¨ kTe ¸
¨ + U ad ¸
© e ¹
J = J Rad + J zc + J za − I F . (10) 2
§ π · § γRad ·
For using relations (8 – 10) the gases thermal conductivity R4 = μ i 0 (kTe + eU ad )¨¨ ¸ ¨1 +
¸ ¨
¸, (13)
λ g can be calculated as [8]: © pa 0 ¹ © λ e ¸¹
R + R3 + R1R2 R
R5 = R1R2 p a 0Qep 0 , ɋeq = − 1 , Deq = 4 ,
3kTg k R5 R5
λg = ⋅ , (11)
8m g πa g2 2
ɋ eq 3
2ɋ eq 3 2
§ p· §q·
where m g – mass of gas atoms, ag – average diameter of gas p=− , q= + Deq , D = ¨ ¸ + ¨ ¸ ,
3 27 ©3¹ © 2¹
atoms.
q q
The methods for estimation the values of discharge current u=3− + D , v = 3 − − D , y =u+v,
2 2
and the power of additional discharge Wc will be given in the
Section IV. 2.25kTe (eU d + kTe )2
λe = ,
§ ·
¨ kTe (eU d + kTe )3 ¸
πe 4 pa 0 ln¨1.5 − ¸¸
¨ πpa 0
© ¹
ɋɭ
d cp =l −dp , dp = y− ,
3
367
2016 IEEE 36th International Conference on Electronics and Nanotechnology (ELNANO)
where pa 0 – reduced pressure in the discharge gap, Și and ȘU – WΣ − Wel − Wad
η= . (19)
coefficients of electrons reflection from the anode by the current WΣ
and by the voltage correspondently, f – transparent coefficient
for anode plasma, Qep0 – cross-section of ions scattering at the V. OBTAINED SIMULATION RESULTS AND ITS’ DISCUSSION
residual gas molecules, ke – coefficient of electrons’ trajectories
longitude, Ui – potential of gas ionization, N0 – Loschmidt cons- Calculation with using equations system (1 – 19) was
tant, Įi , Ai and ai – empirical constant for given operation gas, provided for aluminum cathode and cooper anode, and the
ȝi0 – mobility of ions’ in anode plasma, Ȝe – free path of nitrogen was considered as operation gas. In conformity with
electrons in anode plasma, R1, R2, R3, R4, R5, p, q, u, v and y – this physical conditions such values of coefficients were choose:
additional variables, Ceq and Deq – coefficient of solved cubic U i = 18 V; Te = 800 K; a i = 0.343; α i = 1.452; η i = 0.7;
equation, obtained form (12), D – discriminant of this equation, m2
Te – temperature of slow electrons in anode plasma, ηU = 0.95; γ = 4.6; f = 0.99; μ i 0 = 1.27 ⋅10 −4 ;
k – Boltsman constant, e and me – electron’s charge and mass V⋅s
correspondently. Qep 0 = 5.3 ⋅10 −19 m −2 ; Ai = 3.8 ⋅10 −6. Considered range of
With known value dp, taking into account the equation of operation pressure was pa0 = 0.1 – 1 Pa, range of acceleration
HVGD self-consistent [6]: voltage Uac = 5 – 30 kV, and range of the voltage of additional
discharge is Ud = 100 – 300 V. At the same time the geometrical
kTe dimensions of simulated discharge gap was: l = 0.07 m,
jec
2me Rad = 0.035 m and rc = 0.025 m. The duty time of control
ni =
− ai
e AiU ac +1
,
( (14)
) T
impulse, defined as S = i , was choose in range 1 – 10, and
τi
concentration of ions in anode plasma ni can be calculated
from such analytical relations [4]: impulses frequency was from 500 Gz to 500 kGz. Obtained
simulation results for different values of duty factor S and
-ai
C1 = AiU ac ( -ai
1 + AiU ac )( (
1 + Și Șu-ai 1 − f 1 − d p pa 0Qep 0 ( ))) , voltage on additional electrode Uad are presented at Fig. 2.
Increasing of energetic efficiency with reducing the duty
e(kTe + eU ad ) factor of impulses can be simply explained by the more
C4 = 3N 0 α i , effective using the electron beam in the time, mathematically
2 ʌme
it is clear from equations (18, 19). Reducing of energetic
ʌ 2ȝ i 0 § ȖRad · efficiency with decreasing of voltage of additional discharge
C2 = ¨1 + ¸ − C4 , (15) Uad is explained by strong reducing the current of HVGD
(d p pa0 ) 2 ¨
© λe ¸
¹ relatively to the current of additional discharge.
§ · Mathematically this relation is explained by equations (16,
¨ U ¸ 17).
C3 = (kTe + eU ad ) exp¨ − i ¸C 2 , ni = C1 ,
¨ kTe ¸ C3 Ș, %
¨ + U ad ¸
© e ¹ 90
where jec – density of electron current at the cathode surface,
C1, C2, C3 and C4 is the additional variables. 1
Taking into account equations (13 – 15), relation for the
current of high voltage glow discharge can be written as [4]: 2
80
3
ʌed p (kTe + eU ad )
Id = rc2 ni (1 + -ai
AiU ac ) 2me
, (16)
368
2016 IEEE 36th International Conference on Electronics and Nanotechnology (ELNANO)
regulation constant [5] and high power density of electron electron sources for small value of impulse duty factor S is
beam during the action of impulse, such electron sources can nearly 90%, and for big value of duty factor it reduced to 75 –
be successfully used for realizing such complex technological 80%. The energetic efficiency of HVGD electron sources also
operations, as deposition of polymetal and ceramic films [1, 3] increased with increasing of voltage of additional discharge.
and refusing of refractory alloys [2].
Impulse electron sources with such high energetic
Obtained results of simulation were compared with expe- efficiency can be successfully used in different branches of
rimental data, and the disagreement between the measurement industry, for example, for deposition of complex polymetal
and calculation results was usually smaller, then 10%. coatings or for refusing of alloys. Therefore provided theore-
Corresponded calculated and experimental values for currents tical investigation and obtained results are very important to
of main and additional discharges are presented in table 1. the specialists, which elaborated the technological electron-
Simulation and experimental data was obtained for beam equipment. Elaboration and using of novel impulse
acceleration voltage 15 kV, voltage of additional discharge HVGD electron guns lead to creation of new generation of
300 V and for pressure in the discharge gap 0.5 Pa. modern electron-beam installations.
369