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a) To Dope semiconductors.
b) To Deposit amorphous films on semiconductors.
c) To Deposit polycrystalline films on semiconductors.
d) To Grow crystalline films on semiconductors.
e) To Produce patterns in the films deposited on semiconductors.
a) To Dope semiconductors.
b) Optical
c) both
d) none
3. For nano and sub nano scale which lithographic technique is best.
a) Photolithography
a) Three
b) Two
c) One
d) None of the above
a) Sensitive
b) Photosensitive
c) Both
d) None of the above