Professional Documents
Culture Documents
Polishing
The objective of polishing is to remove the disturbed metal and leave the surface optically flat.
One of the most important factor to remember during this stage is that contamination destroys
quality. This must be stressed all the time in the metallographic laboratory.
Rough Polishing
The first is rough polishing, which is used to remove the deep scratches from grinding.
Final Polishing
The second is final polishing, which remove scratches from rough polishing.
Standard polishing equipment consist of a horizontal rotating wheel covered with specific type of
cloth. The rotating wheel is wet with distilled water and loaded with an abrasive grit. The
abrasive size is regulated by the type of metal and whether the polishing stage is beginning or
finishing. The better quality finish is produced by holding the specimen flat against the wheel
and rotating it slowly in a direction opposite to the rotation of the wheel. Rotation of the
specimen like this during polishing will help to avoid directional polishing or comet tails.
Regulation of Water
Regulation of water is important if quality surfaces are to be developed. It is simple to determine
how much water to add. The correct amount is indicated by an inspection of the specimen
surface. Hold the specimen on the wheel firmly for a few seconds then lift it and observe the
evaporation time. The moisture should disappear in about 10 to 15 seconds. Too much moisture
will cause pitting around inclusions and soft phases. If the cloth is too dry the surface of metal
will be burnished or cold worked.
The metallographer should analyze each polishing sequence to look for signs that will indicate
completion. Continuation of work after the particular sequence is finished is a waste of time and
money. The final step should be considered completed when a 100X magnification reveals a
highly reflective surface and gray lines. A deep scratch will leave a wide black line.
List of typical polishing cloths.
Procedure
Make sure that specimen and hands have been thoroughly cleaned before polishing.
Begin with the 6-micron diamond paste (very small amount) applied on nylon cloth
polishing station and apply small amount of lubricant (one to two drops).
When polishing the specimen, apply moderate amount of pressure and rotate the
specimen in clockwise direction against the cloth until all the scratches from fine
grinding are removed.
Wash the specimen and the repeat the process for 1-micron diamond paste.
Types of abrasives for metallographic polishing.
Types of abrasives for metallographic polishing.
Etching
The objective of etching is to accent the structural characteristics of a specimen. Etching is used
in metallography primarily to reveal the microstructure of a specimen under the optical
microscope. It is procedure for achieving contrast in the microstructure.
Microscopic examination of properly polished, unetched specimen will reveal only a few
structural features such as inclusions, cracks or other imperfections. Etching is used to highlight
and sometimes identify, microstructural features or phases present.
Etchants are usually dilute acid or dilute alkalis in a water, alcohol or some other solvent.
Etching occurs when the acid or base is placed on the specimen surface because of the difference
in rate of attack of the various phases present and their orientation. The etching process is usually
accomplished by merely applying the appropriate solution to the specimen surface for several
seconds to several minutes.
Nital, a Nitric Acid - Alcohol mixture, is the etchant commonly utilized with common irons and
steels. Nital is dripped onto the specimen using an eye-dropper or cotton swab. Ten seconds to
one minute is usually sufficient for proper etching depending on sample and nital concentration.
The sample is immediately washed under running water, rinsed with alcohol and dried by air
dryer. Do not touch, wipe or swab the specimen following etching; dry off the rinsing alcohol on
the specimen with the air dryer and then move on to the microscopic examination stage!
References