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063504-2 Sarani, Nikiforov, and Leys Phys. Plasmas 17, 063504 共2010兲
FIG. 1. 共Color online兲 Experimental setup and visual view of the plasma jet.
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063504-3 Atmospheric pressure plasma jet in Ar and Ar/ H2O… Phys. Plasmas 17, 063504 共2010兲
FIG. 3. ICCD images of plasma afterglow in Ar gas at 12.2 kVp.p.. Time, presented in the left corners of the images, is related to moment where the current
of the discharge reaches maximum value.
J = n ee v e 冉冊
E
N
= neeeE, 共1兲
B. Optical emission spectroscopy
OES appears as a common technique used in determin-
where J is the current density, e is the elementary charge in ing discharge parameters,16 especially, in the UV/visible re-
I s−1, E is the electrical field in V m−1, and e is the mobility gion for determining neutral gas temperature. Axial OES of
of electron in argon gas. The experimental value of electron the jet with resolution of 0.7 nm has been applied for char-
mobility in argon 共e p = 0.23⫻ 106 cm2 Torr/ V s ⇒ e acterization of the afterglow. An overview of axial spectra is
= 0.03 m2 / V s兲 is obtained from Ref. 15. Using Eq. 共1兲, the shown in Fig. 4.
electron density in pure Ar jet in the filament is estimated as Most intensive emission lines are listed in Table I.
1.5⫻ 1013 cm−3. The discharge produces a significant UV radiation which be-
An increase in water content in plasma results to a de- longs to transitions of the OH band at 308 and 287 nm
crease in electron density due to a higher rate of electron 关A 2⌺+共v = 0 , 1兲 → X2⌸共v = 0兲兴. Apart from those lines the
collisions with molecular species. However, correct estima- other most important features correspond to the atomic oxy-
tion of this effect requires knowledge of electron mobility in gen and N2 species, which are located at 777.4 and 844 nm
Ar/ H2O mixtures. 共OI line兲 and 310–440 nm 共N2 bands兲.
FIG. 4. Axial emission spectra of the jet in Ar and Ar/ H2O mixtures with 0.05% and 0.76% H2O. The input power is fixed on 12.8 W. Spectra are shifted
for better representations.
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063504-4 Sarani, Nikiforov, and Leys Phys. Plasmas 17, 063504 共2010兲
TABLE I. Most intensive emission lines which detected in axial spectra of the jet.
E
Species 共nm兲 Transition 共eV兲 J-J⬘ g-g⬘
An increase in water content results from a decrease in optical emission profiles were recorded in whole afterglow
all atomic line emission in a whole spectral range 共Figs. 4 with space resolution of 1 mm. Figure 6 shows spatially
and 5兲. This can be correlated with a decrease in electron resolved optical emission intensities of Ar/ H2O with 0.76%
temperature at higher water content. As can be seen from of H2O.
Fig. 5, the emission of Ar lines at 696, 763, and 801 nm The result of space resolved OES shows that in both
decreases at almost the same rate but OI 共777 nm兲 emission Ar/ H2O mixtures there is an important drop in the intensity
decreases at a much faster rate. The required energy to pro- of the Ar lines when the water is injected in feed gas. This is
duce OI 共 5P兲 from H2O is 15.9 eV while the energy for Ar a well-known effect of the presence of molecular gases in
excitation is about 13.08–13.33 eV 共depending on the tran- noble gas plasma, and it has also been observed when other
sition兲. Hence, a decrease in Te with growth of water content molecular species are inserted into the plasma.16 An interest-
will affect the intensity of OI stronger than Ar lines, which is ing feature that can be seen from space resolved OES
in good agreement with our experimental results. This means Ar/ H2O mixtures is that in mixture with minimum amount
that the main mechanism of decreasing atomic line intensity of water, maximum emission of OH radicals is observed.
at higher water content is probably an increase in energy One of the possible explanations of this effect has been sug-
transfer between electrons and heavy species with addition of gested in our recent work.8
molecular species, such as H2O that causes a reduction in Te. The presence of different Ar lines in spectrum of the
A decrease in OH radical band emission in the discharge is afterglow allows us to estimate argon excitation temperature.
not linear. Maximum emission is observed when the water
content in the discharge was about 500 ppm. Furthermore, a
decrease in OH band intensity at higher water content is due
to high efficiency of radicals quenching with water vapor as
it was suggested in Refs. 17 and 18 and also by a decrease in
electron temperature in the system. Indirect evidence of high
efficiency of OH radicals quenched by H2O in Ar plasma can
be observed from the Boltzmann distribution of OH radicals
emission band 共A-X兲. Afterward it will be shown a strong
overpopulation of OH vibrational-rotational distribution at
high rotational levels with J ⬎ 13 is growing with an increase
in water content in the plasma. The enhancement of the over-
population of high excited levels of OH radicals with an
increase in H2O content is explained by the difference in
quenching rates for different rotational levels. It was found in
Ref. 19 that the quenching rate decreased by a factor of 1.5
with an increase in rotational excitation from J = 0 to J = 10.
As a result, such process leads to growth of the overpopula-
tion of rotational distribution with J ⬎ 13, which is because
of an increase in H2O in feed gas. FIG. 5. 共Color online兲 Peak emission intensity of excited species as a func-
In order to estimate gas temperature along the jet the tion of water content in the discharge 共fixed power of 12.8 W兲.
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063504-5 Atmospheric pressure plasma jet in Ar and Ar/ H2O… Phys. Plasmas 17, 063504 共2010兲
冋 册
Nj = , 共2兲
ZTe 4 ␦p 2
Pij共⌬兲 = , 共7兲
where kB is the Boltzmann constant, N is the total population ␦p 4共⌬ −  p兲
density, g j is the statistical weight of upper level, and the
where  p is a shift in central frequency in centimeters and ␦ p
denominator is the sum of the weighted Boltzmann functions
is FWHM in centimeters which can be evaluated from the
of all the discrete energy levels. Without self-absorption of
Lindholm–Foley theory,28
photons for atoms in the excited level j, which decay by
radiative transfer to ground level i, the plasma emissivity
ji共W cm−3兲 can be presented as ␦ p共cm兲 = 16.36 ⫻ 10−122共¯␣R̄2兲2/5 冉冊
T
3/10
N, 共8兲
hc
ji = N jA ji , 共3兲  p = 31 ␦ p , 共9兲
ji
where h is Planck’s constant, c is the velocity of light in where is the reduced mass of the emitter-perturber system,
vacuum, A ji is the probability of the transition j → i, and ji N is the number density of the perturbed particles in cm−3,
is the wavelength of the radiation. and ¯␣ is the average polarizability of perturber in cm−3
It should be noted that at atmospheric pressure plasmas, which can be taken together with R̄2 from Ref. 29. The in-
self-absorption of argon lines alter the line ratios for different tensity of irradiation 共measured in experiment value兲 corre-
transitions in range of order of magnitude or even bigger.24 It sponding to the plasma emissivity taking in to account ab-
is possible that due to self-absorption, the error in estimated sorption is defined by30
Texc reaches a very high value because of exponential depen-
dence of intensity ratio on Texc. In the present study, in order ⍀V
I ji/␥ ji = jiFc , 共10兲
to consider absorption of photons in Eq. 共3兲, we used the 4
method suggested by Schulze et al.25 In the case of reabsorp-
where Fc is the correction function for sensitivity of the de-
tion plasma emissivity should be corrected by escape factor
tector and V is the total plasma volume. Finally for the ratio
estimating the amount of the photons absorbed in plasma
of two emission lines 共wavelengths ji and kl兲 by coupling
volume. Absorption of the photons for transition i → j along
Eqs. 共2兲, 共3兲, and 共10兲 we obtain
an optical path can be expressed by the escape factor
␥ij = ⍀ijni ,
where ␥ij is the escape factor, ⍀ is the solid angle, and ij is
共4兲 I ji klA ji␥ijg j
=
Ikl jiAkl␥lkgk
exp − 冉
E j − Ek
k BT e
. 冊 共11兲
the escape probability which states the value of the photons Equation 共11兲 allows estimating the Texc of the emission
reduction due to self-absorption in plasma volume. The exact source from intensity ratio of the same atoms of neighboring
Author complimentary copy. Redistribution subject to AIP license or copyright, see http://php.aip.org/php/copyright.jsp
063504-6 Sarani, Nikiforov, and Leys Phys. Plasmas 17, 063504 共2010兲
Author complimentary copy. Redistribution subject to AIP license or copyright, see http://php.aip.org/php/copyright.jsp
063504-7 Atmospheric pressure plasma jet in Ar and Ar/ H2O… Phys. Plasmas 17, 063504 共2010兲
TABLE II. The space resolved OH rotational temperature for Ar and Ar/ H2O mixtures determined by the
Boltzmann plot technique. Error of the method is ⫾50 K.
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063504-8 Sarani, Nikiforov, and Leys Phys. Plasmas 17, 063504 共2010兲
8
derestimated in comparison with OH radical temperature, A.Yu. Nikiforov, A. Sarani, and C. Leys, “The influence of water vapor
content on electrical and spectral properties of an atmospheric pressure
which was measured using the Boltzmann plot method. The
plasma jet,” Plasma Sources Sci. Technol. 共unpublished兲.
explanation is two temperature distribution in the afterglow 9
P. Rajasekaran, P. Mertmann, N. Bibinov, D. Wandke, W. Viöl, and P.
which does not take into account the fitting method. The Awakowicz, J. Phys. D: Appl. Phys. 42, 225201 共2009兲.
10
smaller the rotational temperature the higher underestimation N. Balcon, A. Aanesland, and R. Boswell, Plasma Sources Sci. Technol.
16, 217 共2007兲.
by fitting procedure is observed. 11
H. R. Griem, Principal of Plasma Spectroscopy (Cambridge Monograph
on Plasma Physics) 共Cambridge University Press, Cambridge, 1997兲.
IV. CONCLUSION 12
J. L. Walsh and M. G. Kong, Appl. Phys. Lett. 93, 111501 共2008兲.
13
G. Herzberg, Molecular Spectra and Molecular Structure I 共Van Nostrand,
Atmospheric pressure plasma jet generated in Ar/water New York, 1950兲, p. 657.
14
mixtures is investigated and the effects of addition water on P. Bruggeman, D. Scharm, M. Á. González, R. Rego, M. G. Kong, and C.
plasma properties have been studied. Axial and spatially re- Leys, Plasma Sources Sci. Technol. 18, 025017 共2009兲.
15
K. K. Trusov, J. Phys. D: Appl. Phys. 40, 786 共2007兲.
solved OESs have been done. Plasma discharge is filamen- 16
A. Yanguas-Gil, K. Focke, J. Benedikt, and A. von Keudell, J. Appl. Phys.
tary with a lifetime of filament of 150 ns. Electron density 101, 103307 共2007兲.
17
has been estimated from current density and is of the order of P. Bruggeman, F. Iza, P. Guns, D. Lauwers, M. G. Kong, Y. A. Gonzalvo,
1.5⫻ 1013 cm−3. Argon excitation temperature for pure Ar C. Leys, and D. C. Schram, Plasma Sources Sci. Technol. 19, 015016
共2010兲.
discharge is estimated to be 0.965 eV. The gas temperature is 18
C. Hibert, I. Gaurand, O. Motret, and J. M. Pouvesle, J. Appl. Phys. 85,
obtained from rotational temperature of the OH共A − X兲 tran- 7070 共1999兲.
19
sition by two different methods: OH emission spectra fitting C. B. Cleveland and J. R. Wiesenfeld, Chem. Phys. Lett. 144, 479 共1988兲.
20
and the Boltzmann plot method. Using the first method is a Y. Yanguas-Gil, J. Cotrino, and A. R. Gonzalez-Elipe, J. Appl. Phys. 99,
033104 共2006兲.
matter of some difficulty due to bad fitting of the spectra. 21
X.-M. Zhu and Y.-K. Pu, Plasma Sources Sci. Technol. 17, 024002
The reason is that three regions with different slopes 共2008兲.
共temperatures兲 of radicals exist on the Boltzmann distribu- 22
A. A. Garamoon, A. Samir, F. F. Elakshar, A. Nosair, and E. F. Kopt,
tion due to different mechanisms of OH radical production. IEEE Trans. Plasma Sci. 35, 1 共2007兲.
23
A. Chingsungnoen, J. I. B. Wilson, V. Amornkitbamrung, C. Thomas, and
The Boltzmann plot technique shows that gas temperature T. Burinprakhon, Plasma Sources Sci. Technol. 16, 434 共2007兲.
increases with the addition of water to inlet argon from 625 24
S. O. Kastner and A. K. Bhatia, J. Quant. Spectrosc. Radiat. Transf. 58,
up to 1125 K 共contains 0.76% water兲. Finally, it has been 217 共1997兲.
25
found that the maximum intensity of OH radicals in the dis- M. Schulze, A. Yanguas-Gil, A. von Keudell, and P. Awakowicz, J. Phys.
D: Appl. Phys. 41, 065206 共2008兲.
charge is observed in the mixture of Ar/water vapor 共0.05% 26
R. Mewe, Z. Naturforsch. A 25A, 1798 共1970兲.
H2O兲. 27
T. Holstein, Phys. Rev. 83, 1159 共1951兲.
28
E. Lindholm, Ark. Mat., Astron. Fys. 32, 1 共1945兲.
29
ACKNOWLEDGMENTS C. W. Allen, Astrophysical Quantities, 3rd ed. 共Athlone, New York, 1973兲,
p. 92.
30
This work was financially supported by the Belgian Pro- H. Nassar, S. Pellerin, K. Musiol, O. Martinie, N. Pellerin, and J. M.
gram on Interuniversity Attraction Pole IAP-VI/08 共Project Cormier, J. Phys. D 37, 1904 共2004兲.
31
X. M. Zhu, W. C. Chen, and Y. Kang Pu, J. Phys. D: Appl. Phys. 41,
in Plasma Surface Interaction “PSI”-P6/08兲. 105212 共2008兲.
32
C. O. Laux, in Physico-Chemical Modeling of High Enthalpy and Plasma
1
S. Forster, C. Mohr, and W. Viol, Surf. Coat. Technol. 200, 827 共2005兲. Flows, von Karman Institute Lecture Series No. 2002-07, edited by D.
2
M. Laroussi, W. Hynes, T. Akan, X. Lu, and C. Tendero, IEEE Trans. Fletcher, J.-M. Charbonnier, G. S. R. Sarma, and T. Magin 共Rhode-Saint-
Plasma Sci. 36, 1298 共2008兲. Genèse, Belgium, 2002兲.
3 33
J. L. Walsh, J. J. Shi, and M. G. Kong, Appl. Phys. Lett. 88, 171501 K. P. Huber and G. Herzberg, Molecular Spectra and Molecular Structure
共2006兲. I 共Van Nostrand Reinhold, New York, 1979兲, Chap. V.
4
M. Laroussi and T. Akan, Plasma Processes Polym. 4, 777 共2007兲. 34
B. A. Cruden and M. Meyyappan, J. Appl. Phys. 97, 084311 共2005兲.
5 35
X. Li, L. Dong, N. Zhao, Z. Yin, T. Fang, and L. Wang, Appl. Phys. Lett. J. P. Pichamuthu, J. C. Hassler, and P. D. Coleman, J. Appl. Phys. 43,
91, 161507 共2007兲. 4562 共1972兲.
6 36
A. Broc, S. De Benedictis, and G. Dilecce, Plasma Sources Sci. Technol. T. Carrington, J. Chem. Phys. 41, 2012 共1964兲.
13, 504 共2004兲. 37
V. N. Ochkin, S. Yu. Savinov, and N. N. Sobolev, in Electronically Ex-
7
X. Tu, B. G. Chéron, J. H. Yan, L. Yu, and K. F. Ce, Phys. Plasmas 15, cited Molecules in Nonequilibrium Plasma, edited by N. N. Sobolev
053504 共2008兲. 共Nauka, Moscow, 1985兲, pp. 6–85 共in Russian兲.
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