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CTA: 177659
ranges of application
Nanoindentation with ZHN The contact depth hc is determined with the help of a
model from the maximum depth and the contact stiff‐
During depth sensing nanoindentation measurements ness S at maximum load. This corresponds to the slope
for the determination if the indentation hardness HIT of the tangent to the unloading curve (blue line). There‐
according to DIN EN ISO 14577, the load-displacement fore, indentation hardness and modulus can only be
curve F(h) is measured with a certain maximum load. determined if the contact stiffness is measured.
The hardness can only be given for the maximum depth
which is reached in this measurement. A hardness
CTA: 177660
All data at ambient temperature. We reserve the right to make technical changes in the course of ongoing
development.
Application Note
Depth-dependent measurements with the QCSM module
The CSM as well as the QCSM method allow a depth-
CTA: 177519
resolved measurement of hardness and modulus at one
and the same position. Therefore much more
information can be generated than with normal
indentation measurements. The default value for the
force step number in a QCSM application is 30. This
corresponds to measurements with 30 different forces.
Further the accuracy of QCSM measurements is higher
at very small forces. With the 2 N measuring had it is
therefore possible to measure accurate data at only 100
µN or 10 nm depth.
The results of the QCSM method are independent on
the frequency up to about 75 Hz (in dependence on
material and indenter shape). This is demonstrated in
fig. 4 for fused silica measurements. The curves for the Detail from figure 4 as comparison of CSM and QCSM measurements
depth-dependent modulus have been obtained by with the same frequency of 40 Hz. These are average curves from 6
averaging 6 single measurements. The error bars show single measurements. Error bars give the statistical error. The smaller
error for the QCSM method can be recognized.
the statistical error. A more resolved comparison
between CSM und QCSM method in fig. 5 shows that A separate application allows a frequency sweep for the
the error of the CSM is clearly larger for the same determination of the frequency dependent e-modulus of
frequency of 40 Hz. viscous materials. Fig. 6 demonstrates this for the
measurement of an elastomer with the name Affinity. In
CTA: 177520
All data at ambient temperature. We reserve the right to make technical changes in the course of ongoing
development.
Application Note
Depth-dependent measurements with the QCSM module
Abb. 7 zeigt eine Schwingung des Indenters gegen Luft
mit einer Frequenz von 10 Hz und einer Abtastrate von
512 Hz mit der Oscilloscope Funktion der
Gerätesoftware. Es werden immer 512 Punkte im Bild
dargestellt. Da die Werte durchlaufend erneuert werden,
ist immer an einer Stelle der Grafik ein Sprung zu
erkennen (hier bei 0,9 s), der jedoch keine
Beeinträchtigung der Funktion darstellt.
CTA: 177088
All data at ambient temperature. We reserve the right to make technical changes in the course of ongoing
development.
Application Note
Depth-dependent measurements with the QCSM module
02 Solutions available from the ZwickRoell
CTA: 98980
Group
The Universal Nanomechanical Tester is designed for
the determination of hardness and Young's Modulus on
materials and coating systems. The nano and micro
ranges are compliant to the standard EN ISO 14577
(instrumented indentation method for determining
hardness and other material parameters of metallic
materials and coatings). The Nanonmechanical Tester
can also perform cyclic indentation tests and
indentation tests with superimposed oscillation.
Due to its high level of modularity it is more than a
nanoindenter or hardness tester. It can be used with a The ZHN nanoindenter
measuring head (NFU) as a:
Advantages and features
• Nanoindenter / hardness tester for measurements • Modern software, with clearly structured design
between 0.05 mN - 20000 mN depending on the • Stiff frame design with indenter axis exactly in the
measuring head used movement axis (no tilting moment)
• Micro tensile testing instrument in the same force • High degree of modularity provided by:
range ‒ interchangeable measuring heads in normal (20 N /
• Fatigue tester up to 2 Hz quasi-static or up to 300 Hz 2 N / 0.2 N) and lateral directions, allowing realistic
with dynamic module modeling of loading conditions
• Dynamic mechanical tester (DMA) up to approx ‒ unique tandem optics (developed for space travel)
100 Hz with dynamic module with 2 cameras; can be expanded for up to 4
• Profilometer and with dynamic module also stiffness/ different magnifications
modulus mapping ‒ software structure features function / application
• Scratch tests modules for hardness and Young's modulus tests,
With a second measuring head for lateral force scratch test, cyclic indentation test and indentation
displacement curve (LFU) it can be used as: test with superimposed oscillation
• Various specimen holders available, including holders
• Scratch test with measurement of the frictional force
with insulated specimen carriers for tip – specimen
• Oscillating scratch test (oscillation of the specimen
contact resistance measurement
vertically in the scratch direction)
• Ample room in all directions, with precise step size
• Micro wear tester for reversing wear
and high resolution:
• Micro fretting tester (lateral oscillation) with dynamic
‒ X-direction: 100 mm
module
‒ Y-direction: 200 mm
• Measuring device for elastic lateral deformations The
‒ Z-direction: 70 mm
following can be derived:
• New enclosure design with improved thermal and
‒ Lateral contact stiffness
acoustic insulation
‒ Poisson's ratio
‒ Lateral failure mechanisms
NOTE
This Application Note has been produced to
the best of our technical knowledge and with
all due care. It is nevertheless possible that, for
material or application-related reasons, test
results may have to be obtained using altered
methods In this regard our Application Notes
are guidelines to performing tests.
All data at ambient temperature. We reserve the right to make technical changes in the course of ongoing
development.