Europaisches Patentamt

(19) European Patent Office

Office europeen
opeen des brevets
brevets EP 0 568 920 B1

(12) EUROPEAN PATENT S P E C I F I C A T I O N

(45) Date of publication and mention (51) intci.6: H05H 1/30, H05H 1 / 3 6
of the grant of the patent:
27.03.1996 Bulletin 1996/13

(21) Application number: 93106923.1

(22) Date of filing: 28.04.1993

(54) Inductively coupled plasma g e n e r a t o r

Induktiv gekoppelte Plasmaquelle
Generateur de plasma a couplage inductif

(84) Designated Contracting States: (74) Representative: Griinecker, Kinkeldey,

DE FR GB IT Stockmair & Schwanhausser Anwaltssozietat
Maximilianstrasse 58
(30) Priority: 07.05.1992 US 879678 D-80538 Miinchen (DE)

(43) Date of publication of application: (56) References cited:

10.11.1993 Bulletin 1993/45 EP-A- 0 155 496 EP-A- 0 281 158
GB-A- 1 109 602 US-A- 3 909 664
(73) Proprietor: THE PERKIN-ELMER US-A- 4 500 408
CORPORATION
Norwalk Connecticut 06859-0181 (US) PATENT ABSTRACTS OF JAPAN vol. 6, no. 169
(C-122J2 September 1982 & JP-A-57 084 743
(72) Inventor: Gagne, Peter H. PATENT ABSTRACTS OF JAPAN vol. 10, no.
Brookfield, CT 06804 (US) 135 (P-457)(2192) 20 May 1986 & JP-A-60 256
819

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lO Note: Within nine months from the publication of the mention of the grant of the European patent, any person may give
o notice to the European Patent Office of opposition to the European patent granted. Notice of opposition shall be filed in
a written reasoned statement. It shall not be deemed to have been filed until the opposition fee has been paid. (Art.
a. 99(1) European Patent Convention).
LU
Printed by Jouve, 75001 PARIS (FR)
 1 EP 0 568 920 B1
Description
The present invention relates to plasma emission
sources for use in analytical instruments such as spec-
trometers. Plasma emission sources provide photons 5
and ions which are used to excite a sample to cause
emission of light at wavelengths representative of the at-
oms of the sample. The emitted light is then detected by
a spectrometer to identify the sample.
Apparatus which is used to generate or create plas- 10
ma emission sources generally comprise radio frequen-
cy (RF) generators the output of which is inductively cou-
pled to a load such as a plasma torch. Such systems are
generally described in U.S. Patent. Nos. 4,629,940 and
4,935,596 issued to the inventor of the present invention. 15
A problem associated with all such prior systems lies
in their inability to adjust and control output power ade-
quately for use in present day systems. The present in-
vention substantially eliminates this problem.
In such systems, the efficient transfer of power from 20
the RF generator to the load is an important feature.
Since RF generators are inductively coupled to the load,
impedance mismatch between the load and RF genera-
tor is a serious problem to be overcome. This is so since
impedance mismatch may result in extremely poortrans- 25
fer of power as well as cause power to be reflected back
which can damage or destroy the generator circuit.
In fixed frequency RF systems such as described in
U.S. Patent No. 4,629,940, above mentioned, the prob-
lem of mismatch is remedied by a rather elaborate elec- so
tronic-mechanical hybrid arrangement for continuously
matching the impedance between the RF generator and
the plasma torch or load.
The present invention solves the mismatch problem
without the need of such cumbersome arrangements.
Among other innovations and improvements, the
present invention eliminated the need for such elaborate
and cumbersome arrangements. Since impedance and
frequency are functionally interrelated, the present in-
vention overcomes the mismatch problem by permitting 40 tively coupled plasma generator 10 of the present inven-
the RF frequency to vary to automatically adjust for im-
pedance mismatch. At more fully set forth in the descrip-
tion, a signal representative of deviation of actual RF
power from desired RF power is used to control the RF
generator.
Previous inductively coupled RF plasma generators
were used without regard to plasma potential. Thus, in
these prior systems, plasma potential may be high rela-
tive to ground which often results in destructive parasitic
discharge to the glass torch in atomic emission spectrog- so circuit 13.
raphy, or erosive damage to the sampler cone in mass
spectrography. The present invention overcomes this
problem by maintaining the plasma at or near ground po-
tential during operation.
The present invention also includes means for mon- 55 nant circuit 16 is shown in schematic detail in Fig. 2. Ar-
itoring the parameters of the generator during operation
and provides means for closing down operation to pre-
vent damage to the circuitry, e.g., in inductively coupled
2
plasma generators, non-ignition or bad ignition of the
plasma can be a serious problem since such conditions
may cause damage to circuitry or the glass torch. The
present invention solves this problem by continuously
monitoring generator parameters to detect such ignition
problems and shut down the system before damage is
incurred.
The present invention relates to an inductively cou-
pled plasma generator for generating plasma for use in
analytical instruments, e.g., atomic emission or mass
spectrometers. It comprises circuitry including a vacuum
triode tube adapted to be used as a radio frequency os-
cillator for generating a plasma. The primary purpose of
the present invention is the accurate adjustment and sta-
ble control of RF power to the load coil. To this end, the
present invention comprises a closed loop feed back cir-
cuit wherein actual power generated is used to control
oscillator output power. To accomplish this, means are
provided for measuring and multiplying RF voltage and
current to provide an output representative of actual RF
output power. This output is compared to commanded
power to produce an error signal for application to the
grid of the oscillator to control its output. This is accom-
plished in a manner which varies efficiency of the gen-
erator as well as eliminates the need for dynamic imped-
ance matching. The present invention also includes
means for maintaining the plasma at or near zero poten-
tial as well as means for monitoring the running condi-
tions of the generator. The condition of the plasma is con-
tinuously monitored by sensing the condition of circuit
parameter in order to present damage caused by non-ig-
nition or bad ignition of the plasma.
Fig. 1 is a block diagram illustration of the inductively
35 coupled plasma generator present invention; and
Fig. 2 is a schematic representation of the oscillator
of the present invention.
Referring now to Fig. 1, there is shown the induc-
tion. It comprises a triode vacuum tube 11 designed to
operate as an oscillator, e.g., a Colpitts oscillator as
shown in Fig. 2 in the radio frequency RF range. Plate
voltage is supplied to generator 10 by means of a high
45 voltage power supply 12. High voltage power supply 12
has the capability of supplying voltage at several discrete
levels, e.g., four discrete values which correspond to low,
medium, high, and ignite power ranges. Grid bias voltage
is supplied to the generator 10 by means of grid control
Oscillator or generator 11 is connected to plasma
load coil 17 which is disposed about glass torch 18. Out-
put power to the load coil 17 is delivered via oscillator
resonant circuit 16 of which load coil 17 is a part. Reso-
gon or a similar gas is introduced through glass torch 18
via, e.g., an opening 18a is ionized by the electromag-
netic field caused by RF power circulating through reso-
2
 3 EP 0 568 920 B1 4

nant output circuit 16 of which load coil 17 is the inductive back to the grid control circuit 13 and maintains RF power
part thereof. The generated plasma is symbolically to the load coil 17 constant accurately adjusted and sta-
shown as aflame 18b. It should be noted, however, that ble at the commanded power.
the plasma which comprises photons and ions is used Grid control circuit contains a power transistor, e.g.,
differently depending on its use in atomic emission spec- 5 an FET transistor, to which the error signal is fed. The
trometry or mass spectrometry. transistor controls the grid bias of triode vacuum tube 11
The capacitance of the oscillator resonant circuit 16 in accordance with the error signal.
is split as shown in Fig. 2 to act as a voltage divider to In order to extend the range of vacuum tube 11 of
cause a virtual ground to appear at the center of load coil an oscillator, its efficiency may be varied between ap-
17. This permits the plasma to be operated at zero or 10 proximately between 40% to 60% by varying grid current
near zero potential with its attendant advantage of elim- of vacuum tube 11 in accordance with actual output pow-
inating parasitic discharges when used in an atomic er, e.g., low efficiency for low grid current and high effi-
emission spectrometer and discharges that erode the or- ciency for high grid current.
ifice of the sampler when used in a mass spectrometer. A meter circuit 25 has an input from generator 11.
A capacitive voltage divider circuit 14 and a current is The meter circuit 25 has an output connected to compa-
transformer circuit 15 are connected between generator rator circuit 26 and analog to digital converter circuit 29
11 and radio frequency multiplier circuit 19. Radio fre- which, itself, provides an input to microprocessor 23. A
quency multiplier circuit 19 provides an input to compa- monitor circuit 27 provides a second input to comparator
rator circuit 19. Capacitive voltage divider circuit 14 pro- circuit 26 whose output is provided as an input to protec-
vides an output representative of the RF voltage output 20 tion circuit. The output of protection circuit 28 is connect-
of generator 11 to RF multiplier circuit 19 while current ed to high voltage power supply.
transformer 15 provides a signal representative of the One purpose of this arrangement is to monitor the
RF current output of generator 11 to RF multiplier circuit operating parameters of the generator 11 such as plate
19. Voltage divider circuit 14 and current transformer cir- voltage, plate current, and grid current. Thus, if one of
cuit 15 are connected so as to not interfere with the RF 25 the parameters exceeds a critical value set by monitor
power delivered to the load. circuit 27, protective circuit 28 will cause high voltage
RF voltage and current are in effect multiplied in RF power supply 12 to shut down. This feature is particularly
multiplier circuit 19 to give an output signal representa- important when determining the operating conditions of
tive of the RF power actually being delivered to the plas- the plasma by monitoring grid current. Prior to ignition of
ma 18b through the load coil 17. In one embodiment of 30 the plasma discharge, grid current is extremely high.
the present invention, RF multiplier circuit 19 contains This is so since very little power is being absorbed from
identical logarithmic response amplifiers and a summa- the load coil and most of the power provided by RF gen-
tion circuit similar to the AD834 four-quadrant multiplier erator 11 is fed back to the grid of the generator which,
as shown and described on page 6-65 of Analog Devic- as aforesaid, is essentially a triode vacuum tube. If the
es, Inc., "Linear Products Databook" 1990/91 Edition. 35 grid current remains high beyond a predetermined time,
Since the RF voltage signal and the RF current signal it may be indicative of an ignition problem. To prevent
are logarithmically amplified and then added together, damage to the circuitry and/or glass torch 18, protective
they are arithmetically equivalent to being multiplied to- circuit 28 shuts off high voltage from power supply 12 to
gether. Since the arithmetic product of RF voltage and generator 11. Similarly, the grid current may be indicative
RF current is RF power, the output signal from RF mul- 40 of a good ignition by reverting from a high pre-ignition
tiplier circuit 19 is representative of the RF power being value to a stable lower running condition. Variation in grid
delivered to the plasma through the load coil 17. current may also be indicative of a "bad" plasma that is
The signal representative of RF power is continu- one that comprises a destructive discharge. This is also
ously applied to comparator circuit 21 . A microprocessor detectable in time to shut off high voltage to the generator
23 provides a second input to comparator circuit 21 in- 45 11 before damage is incurred.
dicative of desired or commanded RF power. A digital to Dependent on the required RF power range, e.g.,
analog converter is interposed between microprocessor ignite or various running ranges, microprocessor 23 con-
23 and comparator circuit 22 to convert the digital data trols the power level output of the generator 11 by ad-
from microprocessor to analog form to be compatible justing amount of power provided by the power source
with the analog signal from RF multiplier circuit 19. so 12. This may be accomplished, e.g., by turning on one
The comparator circuit 21 provides an error signal of four triacs or similar devices that control the level of
to grid control circuit 13. This error signal is representa- actual high voltage to the plate of triode vacuum tube 11.
tive of the positive or negative deviation of actual RF Referring more particularly to Fig. 2, there is shown
power going to the load coil 17 from desired or com- the oscillator of the present invention. As can be seen, it
manded power provided by microprocessor 23. This val- 55 comprises triode vacuum tube 11 connected as a some-
ue among others is provided by a host computer having what modified Colpitts oscillator. Resonant output circuit
a keyboard entry system or the like and a display and/or 16 essentially comprises the load coil 17 connected in
printer. The signal from the comparator circuit 21 fed parallel to capacitors C-, and C2 whose juncture is con-

3
 5 EP 0 568 920 B1
nected to the grounded cathode. The present Colpitts os-
cillator circuit differs from the conventional circuit in that
in the present arrangement C-, and C2 are made equal
in value to each other and reverse connected whereas
in the conventional arrangement they are not equal. In
the present arrangement, the ratio of C2 to C3 controls
grid drive power whereas in the conventional setup, the
ratio of C-| to C2 performs this function.
By having capacitances C-, and C2 equal in reac-
tances and reverse connected, the voltages across load
coil 17 are equal in magnitude but opposite in phase with
respect to ground. The effect of this arrangement is to
produce a virtual ground at the electrical midpoint of load
coil 17 which enables the plasma to operate with no in-
direct d.c. potential, i.e., at ground potential with the at-
tendant advantage of eliminating damage to the glass
torch in atomic emission spectrography or erosive dam-
age to the sampler cone in mass spectrography.
The microprocessor 23 obtains information on the
required or commanded RF power and other operational
parameter, e.g., level of plate voltage from high voltage
power supply 12 from host computer 24.
The commanded RF power signal is provided to
comparator circuit 22 via digital to analog converter 22
while the high voltage (low, medium, high or ignite) at
which the oscillator is to be operated is provided via to
high voltage power supply 12 via digital input output cir-
cuit 31.
There has above been described an inductively cou-
pled plasma generator which provides novel means for
the accurate adjustment and stable control of RF output
power. Since the circuit measures true RMS power, it
takes into account the phase shift of the RF current and
RF voltage due to a change in the load impedance
caused by different plasma operating conditions and the
tube plate impedance charge due to varying the grid bi-
as.
In addition to maintaining the plasma at ground volt-
age, the grid current of the vacuum tube is constantly
monitored to prevent the above-mentioned damage
problems.
Finally, as aforesaid, the power adjustment range of
the generator is expanded by varying the efficiency of
the RF generator's vacuum tube oscillator.
Claims
1. An inductively coupled plasma generator, compris-
ing oscillator means for generating RF power,
load means connected to said oscillator for gen-
erating a plasma,
detector means for measuring actual RF power
delivered to said load means,
circuit means connected between said load
6
means and said oscillator means for maintain-
ing said RF power at a commanded level.
2. An inductively coupled plasma generator in accord-
5 ance with claim 1, wherein said detector means
comprises
first means connected to the output side of said
oscillator means providing a voltage represent-
ee1 ative of the RF voltage output of said oscillator
means,
second means connected to the output side of
said oscillator means providing a current repre-
ss sentative of the RF current output of said oscil-
lator means,
third means connected to said first and second
means for effectively multiplying the outputs of
20 said first and second means providing an output
voltage representative of actual RF power deliv-
ered by said oscillator means to said inductive
load means.
25 3. An inductively coupled plasma generator according
to claim 2 wherein said circuit means comprises
comparator circuit means connected to said
third means for receiving said voltage repre-
30 sentative of said actual RF power,
fourth means connected to said comparator cir-
cuit means for providing an input to said com-
parator circuit means representative of said
35 commanded RF power,
said comparator circuit means providing an
error signal output representative of the differ-
ence between said actual RF power and said
40 commanded RF power,
control circuit means connected to said oscilla-
tor means and to said comparator circuit means
for controlling the RF output power of said oscil-
45 lator means in accordance with said error sig-
nal.
4. An inductively coupled plasma generator in accord-
ance with claim 3, wherein said oscillator means
so comprises
a triode vacuum tube having a plate, cathode
and grid.
55 5. An inductively coupled plasma generator in accord-
ance with claim 4 wherein said control circuit means
comprises
4
 7 EP 0 568 920 B1
a grid control circuit connected to the grid of said
triode vacuum tube for applying said error signal
to said grid for maintaining RF output power at
said commanded RF power.
6. An inductively coupled plasma generator in accord-
ance with claim 5 wherein said grid control circuit
includes
power transistor means which controls grid cur-
rent to vary the efficiency of said oscillator
means between limits determined by com-
manded RF output power.
7. An inductively coupled plasma generator in accord-
ance with claim 6 wherein said load means com-
prises
a glass torch,
a load coil disposed about said glass torch,
first and second series connected capacitors
connected in parallel to said load coil to form a
resonant circuit therewith connected between
said plate and cathode of said triode.
8. An inductively coupled plasma generator in accord-
ance with claim 7 wherein
said capacitors are of equal value and con-
nected at their juncture to ground whereby
plasma voltage is held a zero potential.
9. An inductively coupled plasma generator in accord-
ance with claim 8 wherein said fourth means is a
microprocessor programmed to provide said com-
manded RF power.
10. An inductively coupled plasma generator according
to claim 9 further comprising
plate voltage supply means connected between
said plate of said triode vacuum tube and said
microprocessor for changing plate voltage in
accordance with said commanded RF power.
11. An inductively coupled plasma generator according
to claim 10 wherein said first means and second
means each comprise logarithmic response ampli-
tiers and said third means comprises a summation
circuit.
12. An inductively coupled plasma generator according
to claim 11 further comprising
protective circuit means response to significant
changes in grid current of said triode vacuum
8
tube for disconnecting said power supply from
said triode vacuum tube to prevent damage to
said glass torch.
5
Patentanspriiche
1. Ein induktiv gekoppelter Plasmagenerator,
umfaBend
10
eine Oszillatoreinrichtung zum Erzeugen von
HF-Leistung,
eine Lasteinrichtung, die mit dem genannten
15 Oszillator zum Erzeugen eines Plasmas ver-
bunden ist,
eine Erfassungseinrichtung zum Messen der
gegenwartigen HF-Leistung, die an die
20 genannte Lasteinrichtung geliefert wird,
eine Schaltungseinrichtung, die zwischen die
genannte Lasteinrichtung und die genannte
Oszillatoreinrichtung zum Aufrechterhalten der
25 genannten HF-Leistung auf einem verlangten
Wert verbindet.
2. Ein induktiv gekoppelter Plasmagenerator gemaBt
Anspruch 1, in dem die genannte Erfassungsein-
30 richtung umfaBt
eine erste Einrichtung, die mit der Ausgangs-
seite der genannten Oszillatoreinrichtung ver-
bunden ist und eine fur den HF-Spannungsaus-
35 gang der genannten Oszillatoreinrichtung
representative Spannung bereitstellt,
eine zweite Einrichtung, die mit der Ausgangs-
seite der genannten Oszillatoreinrichtung ver-
40 bunden ist und einen fur den HF-Stromausgang
der genannten Oszillatoreinrichtung reprasen-
tativen Strom bereitstellt,
eine dritte Einrichtung, die mit der genannten
45 ersten und der zweiten Einrichtung gekoppelt
ist, urn wirksam die Ausgange der genannten
ersten und zweiten Einrichtung zu multiplizie-
ren, wodurch eine Ausgangsspannung bereit-
gestellt wird, die fur die gegenwartige HF-Lei-
so stung reprasentativ ist, die von der genannten
Oszillatoreinrichtung an die genannte induktive
Lasteinrichtung geliefert wird.
3. Ein induktiv gekoppelter Plasmagenerator gemaB
55 Anspruch 2, in dem die genannte Schaltungseinrich-
tung umfaBt
eine Komparatorschaltungseinrichtung, die mit
5
 9 EP 0 568 920 B1
der genannten Einrichtung verbunden ist, um
die genannte Spannung zu erhalten, die fur die
genannte gegenwartige HF-Leistung reprasen-
tativ ist,
eine vierte Einrichtung, die mit der genannten
Komparatorschaltungseinrichtung verbunden
ist, um einen Eingang an die genannte Kompa-
ratorschaltungseinrichtungzu liefern, derfurdie
genannte verlangte HF-Leistung reprasentativ
ist,
die genannte Komparatorschaltungseinrich-
tung einen Fehlersignalausgang liefert, der fur
die Differenz zwischen der genannten gegen-
wartigen HF-Leistung und der genannten ver-
langten HF-Leistung reprasentativ ist,
eine Steuerungsschaltungseinrichtung, die mit
der genannten Oszillatoreinrichtung und der
genannten Komparatorschaltungseinrichtung
verbunden ist, um die HF-Ausgangsleistung der
genannten Oszillatoreinrichtung nach
MaBgabe des genannten Fehlersignals zu steu-
ern.
4. Ein induktiv gekoppelter Plasmagenerator gemaB
Anspruch 3, in dem die genannte Oszillatoreinrich-
tung umfaBt
eine Trioden-Vakuumrohre mit einer Anode,
einer Kathode und einem Gitter.
5. Ein induktiv gekoppelter Plasmagenerator gemaB
Anspruch 4, in dem die genannte Steuerungsschal-
tungseinrichtung umfaBt
eine Gittersteuerungsschaltung, die mit dem
Gitter der genannten Trioden-Vakuumrohre ver-
bunden ist, um das genannte Fehlersignal an
das genannte Gitter zum Aufrechterhalten der
HF-Ausgangsleistung bei der verlangten
HF-Leistung anzulegen.
6. Ein induktiv gekoppelter Plasmagenerator gemaB
Anspruch 5, in dem die genannte Gittersteuerungs-
schaltung einschlieBt
eine Leistungstransistoreinrichtung, die den
Gitterstrom steuert, um den Wirkungsgrad der
genannten Oszillatoreinrichtung zwischen
Grenzen zu verandern, die durch die verlangte
HF-Ausgangsleistung bestimmt sind.
7. Ein induktiv gekoppelter Plasmagenerator gemaB
Anspruch 6, in dem die genannte Lasteinrichtung
umfaBt
10
einen Glasbrenner,
eine um den genannten Glasbrenner herum
angeordnete Lastspule,
5
einen ersten und zweiten, in Reihe verbunde-
nen Kondensator, die parallel zu der genannten
Lastspule geschaltet sind, um damit eine Reso-
nanzschaltung zu bilden, die zwischen der
10 genannten Anode und der Kathode der genann-
ten Triode geschaltet ist.
8. Ein induktiv gekoppelter Plasmagenerator gemaB
Anspruch 7, in dem die genannten Kondensatoren
15 gleiche Werte haben und an ihrer Verbindungsstelle
mit Masse verbunden sind, wodurch die Plasma-
spannung auf einem Nullpotential gehalten wird.
9. Ein induktiv gekoppelter Plasmagenerator gemaB
20 Anspruch 8, in dem die genannte vierte Einrichtung
ein Mikroprozessor ist, der programmiert ist, die
genannte verlangte HF-Leistung bereitzustellen.
10. Ein induktiv gekoppelter Plasmagenerator gemaB
25 Anspruch 9, ferner umfassend
eine Anodenspannungs-Versorgungseinrich-
tung, die zwischen der genannten Anode der
genannten Trioden-Vakuumrohre und dem
30 genannten Mikroprozessor zum Andern der
Anodenspannung nach MaBgabe der genann-
ten verlangten HF-Leistung verbunden ist.
11. Ein induktiv gekoppelter Plasmagenerator gemaB
35 Anspruch 10, in dem die genannte erste Einrichtung
und zweite Einrichtung jeweils logarithmisch reagie-
rende Verstarker umfassen und die genannte dritte
Einrichtung eine Addierschaltung umfaBt.
40 12. Ein induktiv gekoppelter Plasmagenerator gemaB
Anspruch 11, ferner umfassend
eine Schutzschaltungseinrichtung, die auf
merkliche Anderungen beim Gitterstrom der
45 genannten Trioden-Vakuumrohre reagiert, um
die genannte Stromversorgung von der
genannten Trioden-Vakuumrohre abzuschal-
ten, um eine Beschadigung des genannten
Glasbrenners zu verhindern.
50
Revendications
1. Generateur de plasma a couplage inductif , compre-
ss nant
un moyen oscillateur, pour generer de I'energie
RF,
6
 11 EP 0 568 920 B1
un moyen de charge connecte audit oscillateur,
pour generer un plasma,
un moyen detecteur, pour mesurer la puissance
RF reelle delivree audit moyen de charge,
un moyen de circuit connecte entre ledit moyen
de charge et ledit moyen oscillateur, pour main-
tenir ladite energie RF a une valeur comman-
dee.
2. Generateur de plasma a couplage inductif selon la
revendication 1, dans lequel ledit moyen detecteur
comprend
un premier moyen connecte a la sortie dudit
moyen oscillateur, fournissant une tension
representant la tension de sortie RF dudit
moyen oscillateur,
un deuxieme moyen connecte a la sortie dudit
moyen oscillateur, fournissant un courant repre-
sentant le courant de sortie RF dudit moyen
oscillateur,
un troisieme moyen connecte auxdits premier
et deuxieme moyens, pour multiplier effective-
ment les sorties desdits premier et deuxieme
moyens, en fournissant une tension de sortie
representant la puissance RF reelle delivree par
ledit moyen oscillateur audit moyen de charge
inductive.
3. Generateur de plasma a couplage inductif selon la
revendication 2, dans lequel ledit moyen de circuit
comprend
un moyen de circuit comparateur connecte
audit troisieme moyen, pour recevoir ladite ten-
sion representant ladite tension RF reelle,
un quatrieme moyen connecte audit moyen de
circuit comparateur, pour fournir une entree
audit moyen de circuit comparateur, represen-
tant ladite puissance RF commandee,
ledit moyen de circuit comparateur fournissant
un signal d'erreur de sortie, representant la dif-
ference entre ladite puissance RF reelle et
ladite puissance RF commandee,
un moyen de circuit de commande connecte
audit moyen oscillateur et audit moyen de circuit
comparateur, pour commander la puissance de
sortie RF dudit moyen oscillateur, en fonction
dudit signal d'erreur.
4. Generateur de plasma a couplage inductif selon la
revendication 3, dans lequel ledit moyen oscillateur
comprend
un tube triode a vide ayant une plaque, une
cathode et une grille.
5. Generateur de plasma a couplage inductif selon la
12
revendication 4, dans lequel ledit moyen de circuit
de commande comprend
un circuit de commande de grille connecte a la
s grille dudit tube triode a vide, pour appliquer
ledit signal d'erreur a ladite grille, pour maintenir
la puissance de sortie RF a ladite puissance RF
commandee.
10 6. Generateur de plasma a couplage inductif selon la
revendication 5, dans lequel ledit circuit de com-
mande de grille comporte
un moyen de transistor de puissance qui com-
is mande le courant de grille pour faire varier le
rendement dudit moyen oscillateur entre des
limites determinees par ladite puissance de sor-
tie RF commandee.
20 7. Generateur de plasma a couplage inductif selon la
revendication 6, dans lequel ledit moyen de charge
comprend
une lampe en verre,
25 une bobine de charge placee autour de ladite
lampe en verre,
un premier et un second condensateurs con-
nected en serie, connectes en parallele avec
ladite bobine de charge, pour former un circuit
30 resonant avec celle-ci, connecte entre lesdites
plaque et cathode de ladite triode.
8. Generateur de plasma a couplage inductif selon la
revendication 7, dans lequel
35
lesdits condensateurs sont de valeurs egales et
sont connectes a la masse a leur jonction, de
facon a ce que la tension de plasma soit main-
tenue a un potentiel nul.
40
9. Generateur de plasma a couplage inductif selon la
revendication 8, dans lequel ledit quatrieme moyen
est un microprocesseur programme pour fournir
ladite puissance RF commandee.
45
10. Generateur de plasma a couplage inductif selon la
revendication 9, comprenant en outre
un moyen d'alimentation de tension de plaque,
50 connecte entre ladite plaque dudit tube triode a
vide et ledit microprocesseur, pour faire varier
la tension de plaque en fonction de ladite puis-
sance RF commandee.
55 11. Generateur de plasma a couplage inductif selon la
revendication 10, dans lequel ledit premier moyen
et ledit second moyen comprennent chacun des
amplificateurs a reponse logarithmique, et ledit troi-
7
 13 EP 0 568 920 B1 14

sieme moyen comprend un circuit de sommation.

12. Generateur de plasma a couplage inductif selon la

revendication 11, comprenant en outre
5
un moyen de circuit protecteur sensible a des
variations importantes du courant de grille dudit
tube triode a vide, pour deconnecter ladite ali-
mentation dudit tube triode a vide, pour eviter la
deterioration de ladite lampe en verre. 10

15

20

25

30

35

40

45

50

8
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