‘US 2009) cu») United States cz) Patent Application Publication Sharma oy 0s) 03) ey @ METHOD OF MAKING AN ANTIREBLECTIVE SILICA COATING, SULTING PRODUCT, AND PHOTOVOLTAIC DEVICE COMPRISING SAME Inventor: Pramod K, Sharma, Ann Arbor, MI(US) Correspondence Address NIXON & VANDERUYE, PC 901 NORTH GLEBE ROAD, 11TH FLOOR ARLINGTON, VA 22203 (US) Assignee: Guardian Industries Corp. Auburn Hills, MI (US) Appl.No: 111976,320 Filed: Oct. 23,2007 01203A1 ao) Pub. No.: US 2009/0101203 Al (43) Pub, Date Apr. 23, 2009 ication Classification Gl) Incl. HOLL 3100 200501) BosD 02 (200501) BOSD S/12 (2006.01) B32 17706 (2006.01), (82) US.Cb sus 1367286; 427/397.7; 427/74; 428/428 on ABSTRACT A low-index silica cating may be madeby forming silica sol including of ofa silane andioe a colloidal silica, The silica precursor may be deposited on a substrate (eg, glass sub- Sate) 1o form a coating layer. The coating layer may then he ‘cured andlor fred using temperatures) of from about $50 10 "700° C, The costing lver includes a stping-reducing agent to inhibit the appearance of striping in the coating ayer. The Jow-indexsiica based coating may be wed as an antirelee tive (AR) film on a front glass substrate of a photovoltaic sevice (@, solar cell) oF any other suitable application in ‘certain example instances. Incident light AR coating TCO-electrode Thin film solar cell layer Reflection enhancement oxide and/or EVA Back metallic contactPatent Application Publication Apr. 23, 2009 Sheet 1 of 2 US 2009/0101203 AI 3b 3 3a Fig. 1 Incident light TCO-electrode Thin film solar cell layer Reflection enhancement oxide and/or EVA Back metallic contact Fig. 2ZZ | YP ——— L mw SQ \ S yUS 2009/0101203 AI METHOD OF MAKING AN ANTIREFLECTIVE SILICA COATING, RESULTING PRODUCT, AND. PHOTOVOLTAIC DEVICE COMPRISING SAME, [0001] Certain example embodiments of this invention relate toa method of making a lw-index silica coating. The ‘coating may comprise an. antrefletive (AR) costing saps ported by a lass substrate for use ina photovoliic device or the like in certain example embodiments. The AR coating ‘may include organs, such a aleohols), ethers), and oleate (s)- These organics may reduce o even eliminate striping that ‘may’ appear in the AR coating fer heal tewtment BACKGROUND OF THE INVENTION 0002} Glass is desirable for mumerous properties and applications, including optical clarity and overall Visual appearance. For sone example applications, eran optical properts (eight wansmssion, election anor absorp tion) are desired to be optimized. For example, in een ‘example instances, reduction of ight reflection Irom the = faee of a glass substrate may be desirable for toreont win- dws, display eases, photovoltaic devices (eg, solar ell) picture frames, other types of windows, greenhouses, and so fort {0003} Photovoltaic devices suchas solar eels (and mod es therefor) ae known in heart. Glass isan integral part of tos! common commercial phoovolie modules, including baxh erystallne and hin film types. solar eelinodle may include, forexample photoelectric wanser lm made up of ‘one oF mor layers located betwen 2 par of substrates. One ‘ormore ofthe substrates may be of glass, and the phooelee- trie transfer film ypically semiconductor) is for convening solar ener to eleveiy. Example soar els are disclosed nS. Pat Nos. 4.510.344, 4,806,436 6,506,622, 597.477, ‘and JP 07-122764, he disclosures of which are hereby 000 porated herein hy reference {W008) Substrate) in a solar cellmodule are sometimes made ofalass. Incoming edition passes throug the indent jas substrate of the solar cell before reaching the active layer) (ea. phowelecie unser film such asa semicon tion costing provided on the glass substrate; wherein the antireflection coating comprises at least layer provided slreetly on and contacting the glass substrate the layer pro- ‘duced using a method comprising the steps of: forming a silica precursor comprising silica sol comprising silane andor colloidal silica, wherein the silica sol comprises 8 ‘eping-reducing agent comprising a high-molecular weight solvent and an etheroleate-based organi ora low-motecular ‘weight solvent; depositing the silica precursor an glass substrate fo forma coating layer, and euring andor fring the ‘coating layer in an oven ata temperature of Irom about 5500 700. foradurationof from about Ito TO minutes; wherein the striping reducing agent minimizes a visible amount of striping on the coating after curing andor fring, BRIEF DESCRIPTION OF THE DRAWINGS. [0017] FIG. 1 is across sectional view ofa coated article ‘including an antreflective (AR) coating made in aevordance ith an example embodiment ofthis invention (this coated article of FIG. 1 may be used in connection with a photovol- fe device or in any other stitable application in eilferent nbodliments ofthis invention). Apr. 23, 2009 0018] FIG. 2 is a cross sectional view of a photovolts Sevice that may use the AR eoating of FIG. 1 [0019] FIG. 3 illustates striping in an AR coating DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS OF THE INVENTION 0020] In exemplary embodiments, certain aspoets ofthis inventionmay relate tothe use of organs, such aaleoho(s), ethers) and oleate(s) in the formulation of an AR coating These organics may minimize or even eliminate the appear ance of striping in an AR coating on glats that oocurs aller the Det treatment. Such a coating could be deposited on glass used as a supersrate for the production of photovoltaic evives, These coatings may also be temperable. In some ‘embodiments, there may be an unusually high wet thickness ofthe coating that may be achieved through the use of mixture of alcohols andor etheroleate based organics inthe form Jation without shoving striping. [021] Referring now more particularly tothe accompany ing drawings in which ike reference numerals indicate like paris throughout the several views. {0022} This invention relates to antirelloctive (AR) coat- ings that may he provided for in coated articles used ia Geviees such as photovoltaic devices, storefont windows, display eases, picture frames, greenhouses, other types of ‘windows, andthe Ike In certain example embodiments (eB. inphofovoltaie devices), the AR coating may be provided on either the light ineident side or the other side ofa substrate (ea, plas substrate), sul as a front glass substrate of photovoltaic device. In ther example embodiments the AR ‘coatings described herein may be used inthe context of sport And stadium Fighting (as an AR coating on such lights) andlor street and highway lighting (as an AR coating om such light). [0023] In certain example embodiments of this invention ‘an improved anti-reflection (AR) coating is provided on an incident glass substrate of a solar cell or the lke. This AR coating may function to reduce reflection of light from the alass substrate, thereby allowing more light within the solar Spectrum to pass through the ineident glass substrate and ‘each the photovoltaic semiconductors thatthe solaresll ean be more efficient, In other example embodiments of this invention, such an AR coating is used in applications other than photovoltaie devices (ea, solar cells, such as in stone front windows, display eases, picture frames, greenhouse alasstwindows, solariums, other types of windows, and the like. The glace substrate may be @ glans superstrate or any ‘other type of glass substrate in dierent instances [0024] FIG. 1 isa cross sectional view of a coated article According to an example embodiment of this iaventoa, The coated atcle of FIG. 1 includes a glass substrate Land an AR coating 3. The AR coating includes a first layer 3a and aa ‘optional overcoat layer 34, [0025] Inthe FIG. 1 embodiment, the antireflective coating $ nludes fis ayer 3a comp ne andlor acooidal silica. The first layer 3 may be any suitable thickness in ‘certain example embodiments of this invention. However, ia certain example embodinient, the frst layer 3a of the AR coating 3 has a thicknese of approximately 500 to 4000 A afer fring [0026] The AR coating 3 may also ineude an surfoee teat ‘ment layer 30 of or including a surface treatment compos tion, whieh is provided over the fist layer 3a in certain ‘example embodiments ofthis invention as shown i FIG. 1.Tt is possible t form other layer(s) between layers 3u and 36,US 2009/0101203 AI ‘and/or between glass substrate 1 and layer 3a, indifferent ‘example embodiments ofthis invention [0027] In certain example embodiments of this invention, high transmission low-ion glass may be use for glass sub- strate 1 in order to further increase the tansmission of rdia- tion (eg, photons) to the active layer of the solar eell or the Tike. Por example and without limitation, the glass substrate 1 may be of any ofthe glasses described in any of US. patent ‘application Ser. Nos. 11/049,292 andor 11/122.218, the dis closures of which are hereby incorporated herein by refer ‘ence. Furthermore, additional suitable glasses include, for ‘example (ie, and without limitation): standard clear glass, and/or Jowriron glass, such as Guardian's ExtraClear, ‘UliaWhite, or Solar. No matter the composition ofthe glass substrate, certain embodiments of anti-reflective coatings produced in accordance with the present invention may Increase transmission of light to the active semiconductor {lm ofthe photovoltaic device, 10028] | Certain glasses for glass substrate 1 (which o may not be patterned in dffereat instances) according o example ubodiments of this iavention utilize soda-limesilien Hat last as their base composition’glass. In addition to base ‘composition/glass, a colorant portion may be provided in ‘onde to achieve a glass tht i fairly clear in color andlor has 2 high visible transmission. An exemplary sods-lime-slicn base glass acconting to certain embodiments of this inven- tion, on a weight percentage bass, includes the following basic ingredients: SiO, 67-75% by weight, Na,O, 10-20% by weight; CaO, 5-15% by weight, MeO, 0.79 by weight: ALO4, 0:58 by weight; K:0, 0.5% by weight; Li,0, 041.3% by weight: and Ba, 0-19, by weight 10029] Other minor ingredients, including various conven- tional refining aids, suchas SO,, carbon, and the like may also be included in the base plas. In certain embodiments, for ‘example, glass herein may be made fom batch raw materials silica sand, soda ash, dolomite, limestone, with the use of sulfate salts such as salt cake (Na,SO,) and/or Epsom salt (MgSO.xH,0) andor gypsum (ei, about 1:1 combing tion of any) as fining agents. In certain example embodi- ments, soda-imesilica based glasses herein include by ‘weight from about 10-15% Na,O and from about 6-12% CaO, by weight 10030] Inaction tothe base lass above, in making glass ‘acconting to certain example embodiments of the iasant invention the glass hatch includes materials (including colo- rants and/or oxidizers) which cause the resulting glass to be fainly neutral in eofor (slightly yellow in ceriain example ‘embodiments, indiated by a positive b® value) andor havea high visible fight transmission. These materials may either be present inthe raw materials (small amounts of ion), oF may be added to the base glass materials in the batch (¢ 2. ‘cerium, erbium andéor the like). In certain example embod mens ofthis invention, the resulting plas hos visible trans- mission of at least 75%, more preferably atleast 80%, eve more preferably of at least 85%, and most preferably of at Feast about 90% (Lt D65). In certain example non-limiting instances, such high transmissions may be achieved a rel- ‘erence glass thickness of about 3404 mm I certain embod ‘ments ofthis invention, in addition tothe base glass, the glass and/or glas butch comprises or consists essentially of mate~ Fins as Se forth in Table I below (in terms of weight pecent- age of the total lass composition Apr. 23, 2009 TABLE Huan Adin Masi nl ‘Sales (opened Omron omsRRE OOF Galt ie oa —oa-aiz% on-00r% [0031] tn certain example embodiments, the total iron con- teat of the glass more preferably from 0.0110 0.06%, more preferably fom0.01 100, 04%, and most preferably from 0.01 10 0.03%, In certain example embodiments of his inveation, the colorant portion is substantially fee of other colorants (other than potentially trace amounts). However, it should be Appreciated that amounts of other materials (eg, refining aids, melting aids, colorants and/or impurities) may be present in the glass in certain other embodiments of this invention without taking away from the purpose(s) andor sgoal(s) of the instant invention. For instanee, in certain ‘example embodiments of this invention, the glass compos tion s substantially fee of, or fee of, one, two, tree, four ar all of: erbium oxide, nickel oxide, cobalt oxide, neodymium ‘oxide, chromium oxide, and selenium. The pase “substan- ore than 2 pp a possibly slow 28 O ppm of the element or material. It is noted that while the presence of eerium oxide is preferred in many embodiments ‘of this invention, itis not required in all embodiments and indeed is intentionally omitted in many instances. However, jn certain example embodiments of this invention, small amounts of erbium oxide may be added tothe glass in the colorant portion (eg. fom about 0. 4 0.5% erbium oxide). 0032} ‘The total amount of iron present in the glass batch ‘and in the resulting glass, ie ia the colorant portion thereof, is expressed herein in terms of Fe,0, in accordance with standard practice. This, however, does not imply that ul ion js actually in the form of Fe,0; (see discussion above in this reganl). Likewise, the amount of iron in the ferrous state (Ge?) isreported herein ss FeO, eventhough al errs state ironin the glass batch or lass may not be in the form of FeO. ‘As mentioned above, ion in the ferrous state (Fe; FeO) sa blue-green colorant, while irom in the fete save (Fe) i a yellow-green colorant; and the blue-green colorantof ferous Jron is of particular concer, since as a sicong colorant it introduces significant color into the glass which ean some- times be undesirable when seeking to achieve a neutral oF clear coor. [0033] Ics note thatthe tight-incident surface ofthe glass substrate 1 maybe flat or pattemed in different example embodiments of this invention. [0034) FIG. 2 is a cross-sectional view of a photovolt device (eg. solar cell), for converting light 10 electiciy according to an example emtbodiment ofthis invention. The ‘solar cell of FIG. 2 uses the AR coating 3 and plas substrate 1 shown in FIG. 1 in certain example embodiments ofthis invention In his example embodiment, the incoming or in dent light from the stn othe like is first incident on the surlace of the AR coating 3, passes therethrough and then through glass substrate 1 and front transparent electrode 4 before reaching the photovoltaic semiconductor (active flm) Softhe solarcell, Note thatthe solar cell may also include, but {doesnot require, a reflection enhancement oxide andlor EVAUS 2009/0101203 AI film 6, andor a back metallic contact andlor reflector 7 as shown in example FIG. 2, Other types of photovoltaic devices may of course be used, and the FIG. 2 device is merely provided for purposes of example and understanding. As ‘explained above, the AR coating 3 reduces reflections ofthe Jnckdent light and permits more light to reach the thin fm semiconductor film 8 ofthe photovoltaic deviee thereby per- iting the device to act more ficiently 10035] _ While certain ofthe AR coatings 3 discussed above ‘used in the context ofthe photovoltaic deviees/maduls, this inveationis not so limited, AR coatings according t this Jnvention may heused inother applications such as for picture James, fireplace doors, preenhouses andthe ike. Also, other layers) may be provided on the glass substrate nder the AR ‘coating so that the AR coating is considered on the glass Substrate even if ther ayers are provided therebeween. Also, while the firs layer 3a is diretly on and contsetng the ‘lass substrate Lin the FIG. | embodiment, itis possible to provide other layers) between the glass substrate andthe fst layer in altemative embodiments ofthis invention, [0036] FIG. illusieates striping in the AR coating that may bepresent in priorart coated substrates. Thestripes [maybe Visible when coated substrate 108 viewed alter fring 10037] _ Exemplary embodiments ofthis invention provide a few method to precive low index silica coating for use ae the AR coating 3, with appropriate light transmission and abrasion resistance properties. Exemplary embodiments of this inveation provide a method of making a eoating contain- ing a stabilized colloidal silica for use ia coating 3 In certain ‘example embodiments ofthis invention, the coating may be based, at least in part ona silica sol comprising two diferent siliea precursors, namely (a) stabilized colloidal sities including of consisting essentially of particulate silica in @ solvent and (b) a polymeric solution including or eonssting essentially of silica chains. 10038) In making the polymeric silica solution, a silane may be mixed wit a catalyst, solvent and water After agi- tating, the colloidal silica solution (a is added! 1 the poly- meri silica solution (b), optionally witha solvent, The sol gel ‘coating slution is then deposited ona suitable substrate such _asahighly transmissive clear glass substrate, Then, te sol gel ‘costing solution onthe glass I sbstate i cured and/or fr, preferably from about 100 to 750° C., and all subranges therebeteen, thereby forming the sold AR coating 3 on the las substrate 1 The final thickness of the AR coating ¥ may, though not necessarily, be approximately a quarter wave thickness in certain example embodiments ofthis invention. has been found that an AR coating made in such a manner may have adequate durability 10039] Incertain embodiments of the present inveation, dhe silica so further comprises ongatcs, sich as alcohols) ether ()- and oleate(s) These organies may reduce or even eli nate striping that may appear in the AR coating after heat treatment. In some embodiments this AR coating has beea ‘formulated using solvent mixture and an ether/leate-based ‘organic such as polyoxyethylene(4) lauryl ether (PLE), poly ‘oxyetiylene 20) sorbitan mongoleate (PSM), and polyoxy~ ‘ediylene(10) isooctylpheny] ether (PPE), In further exem- plary embodiments, the striping agent comprises @ polyoxyethylene ether of butyl alcohol; a polyoxyethylene ‘ther of amy aleohol; a polyoxyethylene ether af octyl alco hol: polyoxyethylene ether of decyl alcohol; a polyoxyeth- ‘ylene ether of nony!alechol; a polyoxyethylene alvle ether 3 polyoxyethylene thioether of oleylaleobol; a polyoxyethyl- Apr. 23, 2009 ene dithionoleate a monooleate of ethylene glyeol:a doleste ‘of Polyethylene glyco; monoolese of diethylene glycol; a ‘mono oleate of gleycerols; oF a polyoxyethylene glyeory ole- ates, These solvent-onzanie mixtures may minimize or ein ‘ate the appearance of striping alter heat reatment 10 220° C and 625°C. 0040} Incerisin embodiments the silica sol may comprise Up to 10% (and all lesser included amounts, eg., 5% and 2.5%) by weight ofthe etheroleate-basod ompanic. [0041] In accordance with certain embodiments of the resent invention, stable solvents may include, ferexampl, opano, isopropanol, other Well-known alcohols (e.g. ethanol), and other well-known organic solvents (tol. ene), In certain embodiments, the siliea sol may comprise a Jow-molecular weight solvent, such as ethanol, to reduce, ‘minimize or eliminate the appearance of striping after heat treatment. In some embodiments, the low-molecular weight solvent comprises greater than S0% (eg, greater than 75%) than! by wight. [0042] Suitable catalysts may include, for example, well- ‘known acids, suchas hydrochloric acid, sulfuric acid, et. The colloidal silica may comprise, for example, sli ad meth] ‘thy! ketone, The curing may occur at a temperature between 100 and 150° C. for upc 2 minutes, nd the heat treating may ‘cur at temperature between 600 and 750° C. Tor up to S ‘minutes, Shorter and longer times with higher and lower Temperatures are contemplated within exemplary embod- :menls ofthe present invention. [0043] In exemplary embodiments, silica precursor mate- rials may be optionally combined with solvents, anti-Foaming agents, surfactants, et. to adjust seological characteristics And other properties as desired. In a preferred embodiment, use of reactive diluents may be used to produce formulations containing no volatile onganie matter. Some embodiments ‘may comprise colloidal silica dispersed in monomers oF ‘organic solvents. Depending on the particular embodiment, the Weight ratio of colloidal silica and other silica precursor materials may be varied. Similarly (and depending on the embodiment), the weight percentage of solids in the coating {ormulation may be varied [044]. Several examples were prepared, so as to iluseate ‘exemplary embodiments of the present invention. Although the examples describe the use ofthe draw dovsn bar method. the uncured coating may be deposited in any stable manner, including, for example, spin-coating method, rolle-coating. sprey-coating, and any other method of depositing, the “uncured coating ona subsea, [0048] In certain exemplary embodimeats, the fring may ccurinanoven ata temperature ranging preferably from 550 0 700" C.(andall subranges therebetween), more preferably trom 575 10 675° C, (and all subranges therobeteea), and {even more preferably from 600 to 680° C. (and all subranges therebetween). The firing may occur for suitable length of time, such as between 1 and 10 minute (and al subranges therebetween) or between 3 and 7 minutes (and all sobranges therebetween) [0046] Set forth below isadescriptionofhow AR coating? ray be made acconling to ceraia example noa-limiting ‘embodiments of this invention, Except where noted other: ‘wise, the supplier for components in the fllowing examples are available fom Aldrich Example #1 [0047] ‘The silica sol was prepared as follows. A polymeric ‘vomponen of silica was prepared by using 64% w of -pro-US 2009/0101203 AI panol, 24% wt_ of glyeydoxylpropyliimethoxysilane (Glymo), 7% of water and 59% wt of hydrochloric acid. These ingredients were used and mixed for 24 hrs. The coat- ing solution was prepared by using 21% wt of polymeric solution, 7% wt colloidal silica in methyl ethyl ketone sup- pliod by Nissan Chemicals Ine, and 72% wt n-propanol. This ‘was stim for 2 rs to give a silica sol. The final soltion is referred toa siliea so 10048] The silica coating was fabricated using the dew ‘down har method. The coating ws dried at room temperate Yor? minutes then cured in oven st 220°C. for 2.5 minutesand tempered in belt fumace at 625° C. for 10 minutes, The striping does not appear at a wet thickness of 10 jum when heated 10220" C. and 625°C. Example #2 10049] The silica sol was prepared as follows. A polymeric ‘component of silica was prepared by using 64% wt of solvent mixture containing 90% wt of n-propanl and 10% wt of ethanol, 24% wi of lyeydonylpropyltrimethonysilane (Giymo), 7% wt of water and 5% wt of hydrochloric acid. These ingredients were used and mixed for 24 hs. The coat- ing solution was prepared by using 219% wt of polymeric solution, 7% w colloidal silica in methyl ethyl Ketone sup- pliod by Nissan Chemicals Ine, and 72% wt of solvent mix- ture containing 90% wt of n-propanol and 102% wt of ethanol. This was sted for2 hes to give silica sol The final solution is refered to a silica sol 10050] The silica coating was fabricated using the draw ‘down bar method. The coatings were dred and heat reated as ‘mentioned in the example #1. The striping does not appear at Wet thickness of 10 um when heated t 220° C. and 625°C, Example #3 [0081] The example #3 is same as example #2 except the solvent mixture contained 50%6 wt of n-propanol and 50% wt ‘of ethanol, The silica coating was fabricated sing the draw ‘down har method. The coatings were dried and eat treated as ‘mentioned inthe example. The striping does not appear at a Wet thickness of 10 jum when heated to 220° C, and 625°C, Example #4 [0082] ‘The example #4 is same as example #2 except the solvent mixture contained 25% wt of propanol and 75% wt ‘of ethanol. The silica coating was fabricated using the draw ‘down bar method. The coatings were dried and eat treated as ‘mentioned inthe example #1. The striping does not appear at ‘wet thickness of 50 um when heated to 220°C. and 30 um when heated to 625°C Example #5 [0053] The example # is same as example #2 except the solvent mixture contained 10%6 wt of n-propanol and 90% wt ‘of ethanol. The silica coating was fabricated sing the draw ‘down harmethod. The coatings were dred and eat treated as ‘mentioned in the example #1. coating was dry at room tem- perature for 2 minutes and then cured in oven at 220°C. for Apr. 23, 2009 2.5 minutes, The striping does aot appear at awet thickness of ‘SO when heated to 220°C. and 80 yum when heated to 625° ©. Example #6 [054] ‘The example #6 is same as example it except the solvent taken was 100% ethanol The siliea coating wa fab- ‘cated using the draw dawn bar method, Te coatings were ried and heat teated as mentioned in the example #1. The striping does not appear ata wet thickness of 70 jum when peated v0 220° C. and $0 ym when heated to 625°C. Example #7 [055] In example #7, the silica sol (prepared as in example 141) was taken 975% wt and mixed with 2.5% wt of polyoxy- ethylene(4) lauryl ether (PLE), The solution was mixed for 30 ‘minutes. The silica coating was fabricated using the draw ‘down bar method. The coatings Were dried and heat treated as ‘mentioned inthe example #1. The striping does not appear at wet thickness of 10 um when heated at 220° C. and 625°C. Example #8 [0056] The example #8 is same as example #7 except the silica sl was taken 95% wt and mixed with 5¥ wt of poly ‘oxyetiglene($) lauryl ether (PLE). The solution was mixed {or 30 minutes. The silica coating was fabricated using the daw down bar method. The coatings were dried and heat {ecated us mentioned inthe example #1. The striping does not appearata we thickness of 10 um when heated at 220°C. and 628°C, Example #9 [0057] ‘The example #9 is same as example #7 except the silica tol was taken 97.5% wt and mixed with 2.5% wt of polyoxyethylene(20) sorbitan monooleate (PSM), The sol tion was mixed for 30 minutes, The silica coating was fabe- cated using the draw down bar method. The coatings were tried and heat treated as mentioned in the example #1. The striping doos not appear ata wet thickness of 10 jum when heated at 220° C. and 625° C. Example #10 [0058] The example #10 is same as example #7 except the silica sl wa taken 95% wt and mixed with 5Y wt of poly- ‘oxyetislene(20) sorbitan monooleate (PSM), The solution ‘Was mixed for 30 minutes. The silica eoating was fabricated using the draw dawn bar method, The coatings were dried and heat tented as mentionedin the example #1. The striping does ‘ot appear ata Wet thickness of 30 um when heated st 220°C. and 625°C. Example #11 [0059] The example #11 is same as example #7 except the sili sol was taken 97.5% we and mixed with 2.5% wt of polyoxyethiylene(10) isooctylpheny] ether (PPE). The solu- tion was mixed for 30 minutes, The silica coating was fabei- cated using the draw dowa bar method. The coatings wereUS 2009/0101203 AI ried and heat treated as mentioned Striping does aot appear hate at 220° C. aad 625° C, the example #1. The Example #12 [0060] The example #10 is same as example 47 except the silica sol was taken 95% wt and mixed with 5% wt of poly= ‘oxyeliylene(10) isooetyphenyl ether (PPE), The solution vas mixed for 30 minutes. The silica coating was fabricated using the daw dowa burmethod, The coatings Weredried and heat reat as mentioned inthe example #1. The striping des not appear ata Wet thickness of 50 um whe heated at 220°C. and 30 jm wen heated at 625°C TABLE ‘Appetnce of pant cos Seed on die aves, Wella gun Socal Soest? No No Pregl “Hh Organic Stpiag String ExpleXo _‘OovN) GW Chena ae, wee Eumplew2 9 eee) ue a 10061] Theexamples show thts coating derived from high ‘molecular weight solvent such as propanol which contains ‘oleates such as polyoxyethylene(20) sorbitan monooleate, may be striping fe afterheating st 220°C and 625°C. atthe Wet thickness of 30 jum, [0062] "The examples further show that a coating derived from high molecular weight solvent suchas propane which ‘contains ether such as polyoxyethylene (10) isooctylpbenyl ‘ether, maybe striping fever heating at 220" Cand 625°C, ‘atthe wet thickness of $0 jm and 30 jum respectively. 10063] The examples also show that a coating @ dived from a mixture of propanol and ethanol may’ be striping free aller heating at 220° Cand 625°C. at the wet thickness of $0 um. 10063) In addition, the examples show that a solvent with low molecular weight, such as ethancl, may eliminate the striping in the coatings ata higher wet thickness up to 70 jm 220° C, and SO pm at 625°C 10065] All described and claimed numerical values and ranges are approximate and include at least some degree of [0066] » While the invention has been described in eonnee- tion with whats presently considered tobe the most practical and preferred embodiment, itis to be understood that the inventionisnot tobe linitedto the diselosed embodiment, but Apr. 23, 2009 ‘onthe contrary, intended to cover various modifications and ‘equivalent arrangements included within the spirit and scope of the appended claims 1, A method of making « low-index silica based coating ‘having minimally visible siping, the method comprising: Torming a silica precursor comprising a silica sol compris ing a silane andior a colloidal sles, whersin the sol comprises a strping-reducing agent comprising a high-molecular weight solvent and an etherioleate- based onganic o a low-molecular weight solvent, depositing the silica precursor on a glas substrate Form ‘a coating layer and ‘curing andor fring the coating layer in an oven at a tem perature of atleast about 550 degrees C. fora duration of from about 1 to 10 minutes: ‘wherein the striping reducing agent reduces «visible ‘amount of siping on the coating alter curing andlor firing. 2. The method of claim 1, wherein the striping reducing ‘agent comprises an etheroleate-hased organic. '3. The method of claim 2, wherein the etherioleate-hased ‘organic comprises polyoxyethylene(4) lauryl ether, polyaxy- ethylene (20) sorbitan monooleate, and polyoxyethylene( 10) ‘sooctyipheny] ether 4. The mettod of claim 1, wherein the striping reducing ‘agent comprises atleast 50% ethanol by weigh 'S. The method of claim 1, wherein the law molscular weight solvent comprises ethanol ‘6. The method of claim 1, wherein the silica so eomprises| 1p10 10% by weight ofthe etheroleate-based organic 7.The method of claim 1, wherein the siliea sol eomprises up to 5% by weight of the ether/olete-based organic. ‘8. The method of claim 1, wherein the silica sol comprises ‘up to 2.5% by weight of the etherioleate-hased organic 9..A method of making photovoltaic deviee comprising photooletric transfer film, at east one electrode, and the Jow-index coating, wherein the method of making the photo- voltaic deviee comprises making the low-index coating cording to claim 1, and wherein the los-index coating is provided ona ight incident side ofa front glass substrate oF the photovoltaic device, 10, A metliod of making 4 photovoltaic deviee including & Jow-index silica based coating used in an antreective co sng, the method comprising ‘orming a silica precursor compeisinga silica sol compris ing a silane andor a colloidal silica, wherein the silica sol comprises a strping-reducing agent comprising a high-molecular weight solvent and an etherioleate- ‘based organic ora low-molecular weight solvent, depositing the sliea precursor on a glas substrate form ‘coating layer, and ‘curing andor fring the coating layer in an oven at a tem perature of from about $50 to 700° C. fora duration of from about 110 10 minutes: ‘wherein the striping redueing agent minimizes a visible amount of stiping on the coating after curing andor firing; and ‘using the glass substrate with the low index silica based ‘coating thercon asa font glass subsirate of the paoto- ‘oltaie device so that the low-index silica based coating is provided ona light incident side of the glass substrate. 11, The method of claim 10, wherein the stnping reducing ‘agent comprises an etheroleate-based organic.US 2009/0101203 AI 12, The method of claim 11, wherein the etherfleste- based onzanie comprises polyoxyethylene) lauryl ether, polyoxyethylene (20) sorbitan monooleate, and polyoxyet- ‘ylene(10) isooetylphenyl ether. 18, The methed of claim 10, wherein the sping reducing ‘agent comprises a east $0% ethanol by weight, 14, The method of claim 10, wherein the low moleculae ‘weight solvent comprises ethan 15. The method of claim 10, wherein the silica sol com prises upto 5% by weight of the eher/oleate-based ongatic 16. A phoiovoliaie device comprising: photovoltaic flm, and ot least glass substrate on light ‘incident sie ofthe photovolisi fa: ‘an antireflection coating provided on the glass substrate: ‘wherein the antnelection coating comprises at leasta layer ‘provided deely on and contacting the glass substrate, the layer produced using a method comprising the steps fof; forming a silica precursor comprising a silica sol ccomprisinga silane andr acolloida silica wherein the silica sol comprises a striping-reducing agent compris- ‘ng high-molecular eight solvent and an etherioleste- based onzani ora low-molevular weight solveat: depos- iting the siliea precursor on a glass substrate to form & coating layer; and euring and/or ring the coating layer {nan oven ata temperature of fom about $50 to 700°C. fora duration of from about | to 10miates; wherein the sMriping reducing agent minimizes a visible amount of steping oa the cating alter curing andor fring 17. Thephotovoliic deviee of elaim 16, wherein the strip- ing reducing agent comprises an eteroleate-based onzanie 18. The photovoltaic device of claim 17, wherein the eter! ‘oleate-based organic comprises polyoxyethylene(4) lauryl ether, polyoxyethylene (20) sorbitan oxyetislene(i0) isooctylphenyl ether 19, The photovoltaic devie of elaim 16, wherein the stip- ing reducing agent comprises at lest 0% ethanol by weight. 20. 4 coated article comprising: lass substrate ‘an antireflection coating provided on the lass substrate; ‘wherein the antireflection coating omprisesat last layer ‘provided directly on and coatacting the glass substrate, the layer produced using. a method comprising the steps ‘of: forming a silica precursor comprising a silica sol ‘comprising silane andra colloidal silica, wherein the silea sol comprise a striping-reducing agent compe ings high-molecular weight solvent and an etheroleate- ‘based onzanic or tlow-moleculae weight solvent; depos- iting the silica precursor on a glass substrate wo form a ‘coating layer; and curing andor firing the coating layer inanoven at temperature of fom about $50 10 700° C fora duration of from about Ito 10 minutes; wherein the Striping reducing agent minimizes a visible amount of striping on the coating alter curing and/or fring. 21, The coated article of claim 20, wherein the siciping redcing agent comprises an etheroleate-hased organic. 22, Thecoatedanicleof claim 21, wherein theetherfoleate- based organic comprises polyoryethylene(4) laury ether, polyoxyethylene (20) sorbitan monooleste, and polyoxyeth- Ylene(10) isooctylpheny] ether 23. The coated article of claim 20, wherein the striping seducing agent comprises at least S0% ethanol by weight