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us: us) United States 2) Patent Application Publication co) Pub. No.: US 2021/0120848 A1 oy oy ~ ay @y (60) Keener et al. SYSTEMS AND ME GAS-BASED PRODUCT TREATMENT Applicant: Clean Crop Technologies, Arlington, VA (US) Inventors: Kevin M. Keener, Ames, 1A (US) Daniet White, Chesterfield, MA (US), Daniel Cavanaugh, Alexandria, VA (US), Yaqoot Shaharyar, Nodhampton, MA (US) Appl. Now 171081,837 Filed: Oat. 23 2020 Related US. Application Data Provisional application No. 62/926, 28, 2019, filed on Oct. 2021 20848, (43) Pub. Date: Apr. 29, 2021 Publication Classification (1) Inte ADSI. 326 (2006.01) ADSL 382 (200501) 238 9706 (2006.01), (2) USC cP A231. 3/26 (2013.01); 423V 2002700 (2013 01), 4238 9/06 (2013.01); A230. 932 01301) 6 ABSTRACT ‘Systems and methods disclosed herein provide a improved high voltage plasma-based product treatment by integrating the plasma reactor into the processing container. This unique device can deliver a high throughput rate of raw food, without adverse elfets on quality, The system is operation ally ecient, and is eapable of being scaled up or down to pravide lower or higher thronghpuat rates, depending on the radct manufacturer or processor's needs. In articular, the System obviates the need Tor further containerization oF packaging of product during pasteurization processing Patent Application Publication Apr. 29, 2021 Sheet 1 of 27 US 2021/0120848 AI 100 FIG. 1 120A 106 Patent Application Publication Apr. 29, 2021 Sheet 2 of 27. US 2021/0120848 AL FIG. 2A Patent Application Publication Apr. 29, 2021 Sheet 3 of 27 US 2021/0120848 Al FIG. 2B 3 3 US 2021/0120848 AI Apr. 29, 2021 Sheet 4 of 27 Patent Application Publication 32 ‘Old 92 * ‘ld 90090000000000000000000000000000000 9600006000000000000000000000000000 ©000000000000000000000000000000000 9000000000000 9009000000000 90000600000 0000000000 000000000 0000000 00000000 9000000 9000000 0000000 0000 oy al 2 al GooQ000 eccosves,. 20000000 209000000 0900000000 90000000000 9000000000000 ©000000000000000000000000000000000 9900000000000000000000000000000000 a2 ‘Old a ‘US 2021/0120848 AI Patent Application Publication Apr. 29, 2021 Sheet 5 of 27 dé ‘Old US 2021/0120848 AI Apr. 29, 2021 Sheet 6 of 27 Patent Application Publication € Old ate dequieyo Adw3 as UO!e1j}UBDU0D epancie Jou, OTE UoRRAUB.UCT os ore voneive 35 mun or t f L 906 soyorai ayeANoY f FOE 1equieyo jeg, f 20E Jequseyo ul yonpoud peoy 2 Patent Application Publication Apr. 29, 2021 Sheet 7 of 27. US 2021/0120848 AL 408C | a Patent Application Publication Apr. 29, 2021 Sheet 8 of 27. US 2021/0120848 AL 5200 520 FIG. 5 Patent Application Publication Apr. 29, 2021 Sheet 9 of 27. US 2021/0120848 AL a a rrr tt ep Pe ope : 8 eb ae | ae ee q ol \ ee ete = ae apres 4 Cope pe foe ee ee . | | oe ee ee a oy ae g 2 es ce oo 2 (4 Ae cy ae oe ap a eo oe eetl@tcis a oy Sancel al ‘US 2021/0120848 AI Apr. 29, 2021 Sheet 10 of 27 Patent Application Publication g9 “Old ea 04 Patent Application Publication Apr. 29, 2021 Sheet 11 of 27 US 2021/0120848 AL See ~~ “ a Mee : 702A << Diffusion FIG. 7B 702B 702A Diffusion FIG. 7A Patent Application Publication Apr. 29, 2021 Sheet 12 of 27 ay He 2a 8S as ‘US 2021/0120848 AI FIG. & ‘US 2021/0120848 AI Apr. 29, 2021 Sheet 13 of 27 Patent Application Publication 6 ‘Old ‘US 2021/0120848 AI Apr. 29, 2021 Sheet 14 of 27 Patent Application Publication Ol ‘Did yooor ‘US 2021/0120848 AI Apr. 29, 2021 Sheet 15 of 27 Patent Application Publication 2 AL ‘Old Patent Application Publication Apr. 29, 2021 Sheet 16 of 27. US 2021/0120848 AL FIG. 12B : i : i : i iv i | | i i : i : i : i iv t Patent Application Publication Apr. 29, 2021 Sheet 17 of 27. US 2021/0120848 AL FIG. 13 ‘US 2021/0120848 AI Apr. 29, 2021 Sheet 18 of 27 Patent Application Publication Vol ‘Old Es) uy, (audd) wonenuscu0g ‘US 2021/0120848 AI Apr. 29, 2021 Sheet 19 of 27 Patent Application Publication gpl ‘SIs (s) ouny, 0b 0004 (auida) oneueduey US 2021/0120848 AI Apr. 29, 2021 Sheet 20 of 27 Patent Application Publication ort “Old eed Patent Application Publication Apr. 29, 2021 Sheet 21 of 27 US 2021/0120848 Al 1520 FIG. 15A 108 1502 Patent Application Publication Apr. 29, 2021 Sheet 22 of 27. US 2021/0120848 AL St ‘Dld 50ST aa SQ eee BEET. a ——— see —_— Lr Lr SS ‘US 2021/0120848 AI Apr. 29, 2021 Sheet 23 of 27 Patent Application Publication a ast ‘Old OSE “Old zest eet Patent Application Publication Apr. 29, 2021 Sheet 24 of 27 US 2021/0120848 Al Seon Sessa D FIG. 15E be - == 1,8) — | Patent Application Publication Apr. 29, 2021 Sheet 25 of 27 US 2021/0120848 Al 1600 FIG. 16A Patent Application Publication Apr. 29, 2021 Sheet 26 of 27. US 2021/0120848 AL FIG. 16B Patent Application Publication 1620 Apr. 29, 2021 Sheet 27 of 27 US 2021/0120848 Al 2 FIG. 16C FIG. 16D a US 2021/0120848 Al SYSTEMS AND METHODS FOR REACTIVE ‘GAS-BASED PRODUCT TREATMENT RELATED APPLICATIONS 10001] The present application claims the benefit of and privity to U.S, Provisional Patent Application No, 62926, 933, enitled “Systems and Methods for Resetive Gas-Based Product Treatment.” filed Oct. 28, 2019, the entity of Which is incorporated by reference herein. ‘TECHNICAL FIELD [0002] The present disclosure relates generally to systems ‘and methods for cold plasma-based food oF biological oF medical or industrial product treatment BACKGROUND 10003) Products and in particular food produets suc as ruts, grains, liquids and perishble goods may be susceptible to contamination from pathogens, microbes, viruses and various toxigenic compounds such as mycotoxins. Treating or sterilizing these products to enhance safety Srequeatly involves the use of chemicals, intensive washing, physical segregation of contaminants and variows thermal (high tem- peratures) treatments. that may adversely affect the quality (the product. BRIBE DESCRIPTION OF THE DRAWINGS [0003] The patent or application file contains atleast one ‘drawing executed in color. Copies of this patent or patent ‘application publication with eolor drawing(s) will Be pro= vided by the Office upon request and payment of the necessary fee 10005] Various objects, aspects, features, and advantages ‘of the disclosure will become more apparent and better understood by referring to the detailed description taken in ‘conjuetion withthe accompanying drawings in which ike reference characters identify corresponding elements throughout. In the dnowings, like reference numbers gener ally indicate identical, functionally similar, andor structur- ally similar elements. [0006] FIG. 1 is an illustration of a process for testing product, acconting to some implementations; 10007] FIG. 24 is an exploded view of a cold plasma reactor, according to some implementations 0008) FIG. 28 is an isometric view of the cold plasma reactor of FIG. 2A, according to some implementations; [0009] FIG. 2C isa side view of the cold plasma reactor Of FIG. 2A, according to some implementations; [0010] FIG. 2D is top view of the cold plasma reactor of FIG. 2A, according to some implementations: [0011] FIG. 26 isa front view of the cold plasma reactor OFFIG. 2A, acconting to some implementations; 10012] "FIG. 2F is an exploded view of another: tation ofa cold plasma reactor, [0013] FIG. 3 is a low chart of an implementation of @ method for treating product 10014) FIG. 4 is an illsration of a system for testing product, acconding to some implementations: [0015] FIG. § is an illuseation of another system for treating product, according to some implementations, [0016] FIG. 64 isan illustration of still another system for ‘weating produet, according to some implemeatatios;, nplemen- Apr. 29, 2021 0017] FIG, 61 is aa illustration of another inplementa- tion of the system for treating product of FIG. 6A: [018]. FIGS, 7A and 7B are diagrams ilustrating imple- ‘entaions of systems without interior reactive gas species ‘zeneration and with interior reactive gas species generation, espoctvely [0019] FIG. 8 is a diagram of an implementation of « sravity-fed system for eating product; [0020] FIG. 9 is a diagram of an implementation of « ‘conveyor system for treating product: [021] FIG. 10 is an illustration of volume capacity during lrcutment, according to some inplementations (0022) FIG. 11 isan illustration of a system uatlizing an exterior feed gas supply, according to some implementa. sions; [023] FIG. 124s aside view of an implementation of a cold plasma reactor, according to some implementations; [024] FIG, 128 isa cross-section illustration of animple- ‘mentation of a system for teating produc, according 10 some implementations (0025) FIG, 13 isan illustration ofan implementation of the system of FIG, 9 ulizing a reactive pas species disper- sion fan [0026] “FIG. 144 is a graph illustrating kinetics of pas cies generated during #50 kilovolt (KV) treatment for 20 ies by one implementation of a system for treating product; [0027] "FIG. 140 is @ groph illustrating kinetics of yas species generated during a 70 kilovol (kV) reatment for 20 ‘minutes by one implementation of a system for tating product, [0028] "FIG. 14C is a color photograph comparing treated product of the implementations of IGS. MA and 14B with ‘control group, [029] FIG. 1SA is an illustration of another system for {eeating product, aevording to some implementations; [0030] FIGS. 183-1D are exploded. top, and side views ‘of a eold plasma reactor for use inthe system of FIG. 1SA, ‘according to some implementations [0031] FIG, 1SE is a top view ofan electrode and dielec- tric barrier for a cold plasma reactor, according to some ‘implementations; [032] FIG. 16A is an illustration of another system for treating product, acording to some implementations; and [0033] FIGS. 163-16D are exploded. top, and side views ‘of scold plasma reactor for use inthe system of FIG. 16A, ‘implementations ils of various embodiments ofthe methods And systems ae set forth in the accompanying drawings and the description below. DETAILED DESCRIPTION [0035] _Produets and in particular ood produets such as ruts and grins may be susceptible to contamination from ‘mycotoxins and microbes, Treating or sterilizing these prod- vets to enhance sifety froquently involves the use of high Temperatures that may adversely affect the quality of the product. For example, thermal processing of a raw food 10 Achieve pasteurization may cook the prod, altering flavor fand texture. For raw food products thermal teuiments are ‘undesirable in many grains, seeds and nus, [0036] Some efforts to mitigate this undesirable effect include pre-packaging the product such as vactm sealing the product ina container (eg. thin plastic bag) to prev US 2021/0120848 Al hot steam used for pasteurization from directly contacting the product, This sill results in heating of the product that ‘may’ be undesirable, and also ads expense to processing and Timits throughput, For example, some processing systems ‘may individually vacuum seal an amount of nuts a8 smal as ‘kilogram or less before pasteurzing the product, while processing shipments as lage as hundreds of kilograms 10037] High voltage plasmas may be used for product ‘reatment in some implementations, allowing processing at Jower temperames, including room temperature (eg. approximately 20 degrees Celsius). However, some imple ricntations may require sealing thera food product within ‘container, which may be limited in size and volume, Such ‘implementations may suffer from the throughput deficien- = noted above due to the size limitations ofthe container ‘enclosing the product and requirement to individually pack ‘age the produet or small groups of product. 10038] “The systoms and methods discussed herein are directed to a improved high vollage plasmacbased product treatment capable of processing product at a high thovghput rate, without changing the visual or chemical composition of the product. The teatment does not ereate any significant ‘change in the onganolepie properties of the product, shorten the shelf-life such as with heating (thermal) tre ments. The system design is modular which allows for variable throughput rates of treatment. Tie provides for Fexible scaling Of the technology’ in different processing ‘environments which might roqure larger or salle trough put (ex. Ibs hourto tons/hour ar more). The technology my be intograted into a containerized system where food prod- ‘ets are introduced in a coatiauous How of stagnant (bulk) arrangement. The teatment may also be operationally ef- ‘cient, and is capable of being scaled up or down to provide lower or higher throughput rates, depending on the product manufacturer or processor's needs. In particular, by inte- trating the plasma reactor into the processing container, dhe system obviates the need for futher eontanerization or packaging of product during processing. The system further allows for 0039] Adaptability: Implementations ofthe eactor are widely Hexile in temns of material aad geometry, and cean be adapted into any container wall or component, including igi sidewalls for palle-based totes; circular fr square sidewalls for grain bins; flexible bags or conveyor belts, et [0040] Modularity: Because ofthe wide range of mate- tials, flexibilities, and geometries to which the reactor can be conformed, implementations of the deseribed ‘stem are completely modular: adding more reactor cpacty can be scaled Tinearly with the treatment verse’contaner size itsel? [0041] Cosvmateriat efiiency: Integrating the resetor inside the contsiner wall streamlines device material uilization, reducing cost, and reducing system com- plexity, in many implementations, 0042} "Worker safety: By integrating the reactor int the ‘broader system materials, implementations ofthe sys- tem allow for greater distance between workers and high voltage eletrc generation, improving safety and reducing the risk of dangerous accidents. The device is also not restricted to plasma generation within 8 con tainer, The production of reactive gas species and treatment of products may occur in an open systema ot any environient which incIndes produets to be weated Apr. 29, 2021 ent ait, This is achieved through aay’ of the herein including con trolled was diffusion, in situ reactive gas species peo- ‘duction within gravity fe system, and variable geom- cities of plasma generation cells, 043] As discussed in more detail below; in ess, imple= tions of the described system reduced astoxin con- ‘amination in 200 grams of peanuts from 260 pats per billion (ppb) to 105 ppb, a 60% reduetion, generating plasma at 50 RV for one hour, and to 67 ppb, a 74% reduction, running. at 70 kV for one hour [044] Although discussed primarily in terms of food products, the systems and methods discussed herein may be ‘used for mieobial or mycotoxin mitigation of any product, including sterilization of medical devices, food processing equipment, and industrial produets without use of anibiot fr antifungal agents that may eventually Jeod to biologi ‘immunity and reduced elfieacy. [045] Referring fs to PIG. 1 illustrated is a provess 100 or teating product, according to some implementations. A container 102 may comprise a plurality of sidewalls, atop, and a bottom, enclosing a ehamber 106, One oF more ofthe sidewalls of the container may comprise plasma reactors 104g, 104 (ferred to generally as plasma reactors 104 or reactors 104). A product 108 may be loaded into the eon- ‘ainer ina first step 120A. The container may be sealed, and ‘high voliage plasma 110 generated by reactors 104 al sep 1208, The plasma 110 may be diffused through the chamber 106 aad product 108 at step 1208, The plasm 110 may be generated by the reactors at voltages of 10 kY, 20 KV, SO KY, ORY, 100 kV, 130 KV or any other such voltage, and may be allowed to difse through the chamber for any appro priate amount of time, such as 10 minutes, 20 minutes, 30 ‘minutes, one hour, or any other such period at step 120C ‘The plasma may be substantially at rom temperature, up to approximately 60 degrees Celsius. The plasma ionires a gas, sch as ai, generating over 75 unique reactive gas species (RGS) if genorated in ambient air, including O,, NO,, NOs, 1N,0y, N,O,,H,0;,N,O, OH or otber such species, includ ing but not limited to formic acid, peroxide fons, dinitrogen oxide, ec, The RGS have bacterieidal, sporieidal, and fon- aicidal properties, and may significantly reduce the concen- ‘rations of mycotoxins or bacteria contaminating product 108. After being tated for the predetermined period of | time, the chamber may be emptied of product at step 120D. ‘The RGS products may convert back to their original gas states (€ O,,N,,CO,, ef), leaving 90 chemical residues ‘The product may accordingly be tented without adverse effects from heating or chemical contamination. The product ‘may be discharged to ground, in many implementations, and the chamber may be evacuated of any remaining RGS (ex. via a vacua oF fan) 0046] ‘Te specific composition and proportions of each RGS may be determined by the treatment conditions and geometries of the plasma generation device. The specific composition of RGS generated may’ be changed oF deter mined by a wide range of variables, inchuding voltage, temperature, humidity, aie pressure, air velocity, feed gas ‘composition, prooet volume, treatment container volume, for oer such Variables [0047] Degradation, denaturation or inactivation of eifer= ent toxins, pathogens and other food contaminants may require different varictce and quantities of RGS. The sys- tems and methods discussed herein may employ treaties US 2021/0120848 Al ‘eyeles with different rates, ranges and parameters of each of the above variables to produce specific ‘cocktails’ of ROSs Jor each Food product and contamination issue [0043] In other doviews which leverage the biocidal eapa- bilities of “cold plasma’ without implementing the systems ‘and methods discussed herein, this distinction has not bees, fined or differentiated. The generation of different gas species is critical to the performance of the system as clhervise the contaminants will otherwise not be removed ‘or reduced. Accordingly in some implementations, the sys- tems discussed herein may be referred i a5 a multivariable as generation device, Depending on the type of contami- rant, the device and treatment coations (variables) can be adjusted to ensure the optimal amounts of RGSS ate pro> ‘duced and applied to each proc, 10049] "The exible generation of gases is also important to the market value and scalability ak a commercial food processing solution of the systems and methods discussed herein. In some instances, some RGSS may create a negative ‘or undesirable effect on food quality. The systems and methods discussed herein use specific geometries and treal- ‘ment parameters to ensure this docs not occur 10050] In many implementations, ozone may be used as 2 ‘eed gas in the treatment process. In some instances, ater the high voltage current is tured off, many RGSs continue to be generated while ozone (O,) gas rapidly deetines. Accord- ingly, ozone may be a catalyst for many of the other RGSs generated in the process. This distinction is unique to ‘implementations of the systems and methods discussed herein, as it allows for significantly more controlled gen- ‘ration of other RGSs. The integmtion of zone ws feed gas ‘may also substantially reduee the total energy consumption to generate a igh volume of other RGSs with trae, ate, and peroxide characteristics, [0051] FIG. 24 is an exploded view of a cold plasma reactor 1M, according to some implementations. The reactor 4104 may include a plurality of layers 200-212, including: 0052] Exterior Insulator 200 A suciently insulative ‘non-conductive material layer, which may be atleast 1A? of more thickness in some implementations. The insulator 200 may be of any suitable material, sueh as polypropylene, elon, thennoplastic, or any other such fhon-conkluctive material. [0053] tectrde 202: An electrode made of a condve- tive or non-conductive material capable of maintaining and distributing a high voltage electric field in excess of IOV, 20, 30 kV, SOV, 70 kV, 100 kV, 120k, 250 Y, of any other such value, in controlled manner in various implementations. 1a many’ implementations, the electrode may comprise a condictive material, such as aluminum or copper, although other materials and shapes may be wilized [0054] Dielecsic layer 204: A non-conductive material (elas, ceramic polymeric material, mica, natural or synthetic bers, etc). which may be at least Yic" or Beate thikness in some implementations. [0055] Frame 206a-206b (efered to generally as frame 206): A frame may support dielectric layer 204 and a Gioletrc layer 208, leaving an air gap, which may be ff at Teast '4" oF greater in some implementations Although shown in two parts, in some implements tions, frame 206 may comprise a single piece. The feame may be open on one or more sides as shown, and _may include interior supports in some implementations Apr. 29, 2021 [0056] _Dielectsc layer 208: A no weal (alas, ceramic, polymeric m: ral or synthe rubber et), which may be ofa east Ve" ox ‘Bester thickness in Some implementations. In many implementations, the diols layer 208 may be pet foraed as shown wo allow air to pass between the sie 1p provided by fame 206 and a chamber of the Sontsinr hounded hy reactor 104 In may implemen lations, a portion of the dilectsic layer 208 maybe solid, eg. 1o support an elecinde 200 and associated wiring a shown. {0087} "Eleotode 210: An eleorode mule of a condue- Vive oF non-conditive material capable of minting snd istbuting a high Volage elect fed in exces of TOKV, 20 kV, 30KV, 50 KV, TOKV; 100 KV, 130 kV, 250 of aay other seh valu, in various implemen tions. In many implementations, the eletrode may comprise 4 conductive material, such a alia, although other materials and shapes may be wilized. [00S8] Exterior insulator 212:-4 slicently insulative nonrconductive material layer of at lost" more thickoess. In many implementations, he ester nse lator 212 may be perforated shown 1 allow ae to pss Between the air gap provided by fame 206 and a ‘hamber of the contsiner bounded by reactor 104, In ‘many implementations «portion of the insulator 212 may be solid, eg. to support an electrode 210 and associated wing as shown. {0089} Flectrodes 202,210 may sometimes he referred t0 4s a high vollage elecirwle and ground electrode. For sample, electrode 202 may comprise a round electrode, aun elect 210 may compris high voltage electrode. A igh voltage generator (ot ilstated) may be attachd to the eletnodes 202,210. The various layers o the reactor 104 may be altace to each ther via non-conductive bots of Screws, adhesive epoxies, or ther suc steers. The edges Of the rector may be substantially sealed. exoepting open portions) of frame 206, 1 prevent gos lekage {0060} "FIG. 2B is anisomerc view of the assembled cold plasma reactor 104 of FIG. 2A, according to some inpe- ‘enfations Ax showa, when assembled, the layers 200-212 ae substantially adjacent, preventing gas leakage shee than ‘i the wap(s) formed by frames 2060-206 and the peor ‘ations (ea. in layers 208,212) [0061] FIGS. 2C-2E ar aside view, top view, and frost ew, respestivel, ofthe cold plasma reactor 104 of IG. 2A, according to some implementations. In the font view of FIG. 2K, Tocations of frames 2060-206b ao shown in dashed Tine, ati the loeation of elec 210, Varons dimeasions may he uilized forthe reactor 104, allowing scaling to Snr or larger sizes depending onthe eostainr 1 be sed Inone such implementation the dimensions include Dineson ihe US 2021/0120848 Al -continved 10062} The dimensions may be sealed to lager o smaller ‘ales while maintaining the same ratios, in many impe- mentions. In othe implementations, ater sizes may be ted (eg. the reactor may be square, or have diferent ‘spe ratio), For example, FIG. 2F is an exploded view of nother implementation of cold plasma reactor 104" The reactor 104 includes layers 200, 2021 208, 206, 208, 210, nd 212, similar to those discussed above, bt is a square ‘spe raio(e.20" by 20°, in one implementation) and bho diferent configuration of perortons in layers 208. 217 (ea, 1" diameter holes, in One implementation). 10063] The plasma generation device may’ aso be inte jnied into! “eactor or envionment which is aot fontaine The generator (or multiple generators) may be fntegrated ia am open system which is not hemlclly sealed or closed, but rather eons the specie deetion of ffl, velocity and difson of gas. In effet, the gen- ‘erator may be integrated into any deviee of system which ‘an contol the movement of gay adits contact with food prods 10068) FIG. isa fow chart of an implementation of a ‘ethod 300 for testing produc. At step 302, prodct may be loaded ino an interior chamber of container, with one ‘or more cold pesmi reacions on or forming walls of the ‘ontsinee The product may be any type of prt, sich as ‘medial plement, aust implement oe poet such as nus, grains, o other sich food products. The prodiet need not be placed i ay farther interoeconiance (6, vacuum sealed pouch or other sch container) in many implementa. 10065] At step 304, the chamber may be hemneticlly sealed. Sealing the chamber msy compese closing 2 door hatch, or other such opening dough which product is load. The chamber may include a gasket or other featre to prevent the esape of plasma and RGS, The chamber may contain a gas, sch a ateapherc seat oom temperature The chamber may also be upen or allow fo he fee Now of product using eanveyors ofa gravity fed system. ROSS a ‘pea ster may be contained by air cians, controlled ‘Esio out of te sytem bythe prdict wader treatment or simply by calculating the rate of dision of each specific sas species. 10066] At sep 306, the reactors) may be activated by applying « high voltage between the elctodes. The high ‘ellgge may be generate by an extemal power supply, and may be at 1OKV.20 KV, 30K, SO KV, TOAV, TOO, or any ther sch value suliien to wenerate a pasa and 0067] _Insome implementations, at step 308.2 timer may be initiated and may run fora predetermined period of ime to allow the RGS. generated by the reactors to difse through he chamber and prodt. The period o time may be predetermined based on the sizeof the chambsr, the RGS everaton rte, the density of the produc, et, In some Sroplementations the time may he 10 minis, 20 mites, 30 minutes, one hour, cr any her such value Apr. 29, 2021 some other implementations, at step 310, 2 ‘ofthe ROS or a particular gas (eg O.) within the chamber may be measured until it has reached & con- ‘eatration above a redetennined threshold (e above 7000 parts per million by volume (ppm). Measuring the gas concentration may be more accurate than using time in some ‘implementations in whieh difusion rate thongh the product ‘may be nkacwn or highly variable due to packing, In some ‘implementations, both timer and gas concentration may be measured. [0069] Upon the timer expiring andfor the concentration ‘exceeding the threshold, at step 312, the chamber may be ‘emptod of product. The reactors may be deactivated, andthe chamber evacuated of ROS and plasma (e via fan or vacuum). In some implementations, a hatch or port may be ‘opened in the elumber to allow the product to fall into an ‘tipat bin, The hatch may be eloged once the chamber is ‘emptied, and the process may be repeat for another batch of pradct, [0070] tn another implementation, step 306 may be per formed before step 302, For example, in some implenien- ‘ations, produet may be loaded into first pre-treatment bin that may be hermetically sealed. The reactors may be activated and RGS. generated. The product may then be Allowed to enter the chamber with the RGS, This may spocd ifsion of the RGS throughout the product and may faocelerate realment of the product, in some implemen sions. [0071] FIG. 4s. iwstation ofa system 400 for treating product, according to some implementation. Product 108 ‘may be loaded vis a hopper of pre-treatment bin 402 and allowed 1o flow onto loading conveyor 404, The conveyor may transport product into one oF more treatment Bins 4408-408 within a hermetically sealed enclosure 406, via conveyor gates 414 coresponding to each bin. Once’ fll (sich may be determined viaa bin scale 420 integrated into each bin 4084-408C, in some implementations), the bia ‘may be sealed via a bin seal 416. Bach bin 408A-408C may comprise one or more reactors 104, such as on side walls of the bin. The product may be treated within the bin as iscussed above, and once complete, may be discharged via tscharge gates 418 into an o-loading bin 410 and thence to an output conveyor 412. BY using three (or more) bins 408-408C as shown, one bin may be undergoing treatment (ex. at step 422A) while a second bin is loading in prepa- ration for teatmest (eg. at step 422B) and a third bia is emptying after treatment (¢, at step 422C), This may allow Tr throughput of hundreds of kilograms or several metic {ons of product per hour or more. In some implementations, RGS products generated by reactors in one bin may be evacuated into. second bin (eg. from a bin finishing ‘treatment into one loaded and ready for treatment), accel erating the diffusion process. 0072] FIG. Sis an illustration of another system 500 for treating product, according t© some implementations. Joading bin $02 may be stacked on top ofa treatment bin S02 comprising one or more reactors 104, andaceessed via a seal for gite 506. At siep 520A, product 108 may be loaded into loading bin $02, and reactors 104 may be activated 10 szenerste RGS within the teatment bin 504, Once loaded the Joading bin may be closed at step 5208. At step $20C, the gate S06 may be opened to allow prodict 108 to flow into {he treatment bin S04, In some implementations, the product itself’ may act as hermetic seal during this process, pre- US 2021/0120848 Al venting the RGS from escaping into the loading bin. Once the loading bin is empty, at step 520D, the gate 506 may be ‘closed and the product may undengo treatment within the treatment bin, Additonal product may be londed into the Joading bin at this time, increasing efficiency. By activating the reactors at step $204, this may allow the RGS to difluse through the empty chamber in advance, erating a more homogenous distribution within the chamber in a shorter petiod of time, This may allow for fester westment of the product at step $20C. [0073] FIG. 64 is an illustration of sll another system 600 for treating product, according to some implementa- tions. Multiple sections of the system of FIG. 8 may be Joined, forming a Tae pre-restment bin 604 and large treatment bin 606. These components may be modular, allowing for easy scalability. As discussed above, product 4108 may be transported via a loading conveyor 1 loading hatches in the pre-treatment bin sections. Once a predeter mined amount of the product has been loaded (ep. as determined by a bin scale 610, in some implementations), the product may pass through gates 608 into trestment bins 606 with integrated reactors 104. The gates may be closed ‘ad the product may be ieated wile the pre-treatment bins are reloaded for subsequent treatment rounds. Once treat- ‘ment is complete, the weatment bins may be emptied va bia seals 612 onto an output conveyor 614. In some implemen- tations, he pre-treatment and teatment hin sections may be ‘enclosed in'a hermetically sealed chamber 616, This cham- ber may also include an exhaust fan, in some implementa- tions, for removing RGS products after treatment, andlor for maintaining @ ow of gases through the products under [0074] FIG. 6B is an illustration of another implementa- tion of the system 600 for treating product of FIG. 6A, in which a single lager pre-reatment bin 604' and treatment bin 606° are utilized mer than moda sections, While such implementations may be less flexible in terns of reconfiguration for sealing, they may be less expensive 10 ‘manufacture. In some implementations, additional reactors 104 may be installed within the treatment chamber 606' (e.g. ‘on internal risers that do not extend fully tothe top andor sides ofthe bin, allowing product to pass around or over the reactors 106 during filing). This may. allow for faster diffusion of RGS through the produet under treatment com= pared to only having reactors on the sides of the bin (Which may be very lage, in some implementations). 10075] FIGS. 7A and 7B are diagrams illustrating imple- meniations of systems without interior reactive gas species ‘generation aad with interior reactive gas species generation, respectively; In some implementations, treatment systems ‘may include multiple RGS generation cells 104 inside of a ‘container or throughout a continuous low processing point. This interior generation provides a continuous and sustained ‘concentration of RGSs. For example, FIG. 7A illustrates an ‘implementation of a system 700A with a single plasma reactor 104 on an exterior wall of a chamber for trating product 108, The generated RGS produets diffise through the interior of the chamber with a highest concentration TH2A near the plasma reactor 104 (&~g. 5.000 ppm); 2 rmaderate concentration 7022 farther from the plasma reac- tor 104 (ep. 2,500 ppm): and a lower concentration 702C stil farther from the plasma reactor 104 (eg. less than 1,000 Such implementations may requite longer treatment Apr. 29, 2021 times to ensure tha the RGS products dillwse throughout the container, or may result in a non-homogenous treatment of product, [0076] Conversely, FIG. 7B illustates an implementation fof a system 700B with a plurality of plasma reactors 104 positioned within the chamber, In many implementations, {he interior plasma reactors 104 may nol extend to all sides of the container, suc that prodoet 108 and RGS products ‘may flow around, above, andar below each reactor 104 (for ‘example interior reators may be mounted on stall or thin standofls or risers, in some implementations, with open space below, tothe side of, and above each reactor). These interior generation points’ provide the unique ability to sustain RGS concentration without requising transporting or iusing of gases from one location to another (although some implementations may further incorporate fans or other implements to diffuse the gases, in addition to interior steneraton points). Such implementations may ensue that all products tated within the system have a’ more homo- ‘geneous treatment rater than the product closest o the RGS ‘deneration poinss contacting lager volumes of was o having Jonger exposure periods relative to the product futher from the generation points, [0077] In some implementations, dhe treatment of products ‘wing the device may also be within an open system. This ‘may oecur using a mechanical structure which controls the flow of precuct but isnot hermetically sealed or has specific control over the entry and ext of the produ. For example, FIG. 8 is « diagram of an implementation of a gravity-ed system 800 for treating product 108. A column 802 may ‘comprise a plurlity of bales 806 deployed within a treat ‘meat region 804, The bales may extend aeross the reat ‘ment region 804 with openings to allow a limited amount of product 108 1 flow through fo a next baflle overtime, This fay stall the low of product 108 through the system 800 resulting inthe product spending some amount of time (e.8 10 minutes) between each set of bailles, resulting ina total treatment time 28 8 multiple ofthe bafls (eg. 50 minutes for 5 ballles). In some implementations, plasma reactors ‘may be positioned on the sides of the ebamber of the ‘reatment region 804. In other implementations, plasma reactors may be deployed within baffles 806, For example, each bale 806 may include a solid top surface to suppo product above the bale; an integrated plasma reactor, and 8 perforated, slotted, or open bottom surface to allow RGS products produced by the reactor to difluse into the next chamber between the baflle and a subsequent (eg. lower) baflle 806. Advantageously: such implementations may not require contro valves or hatches atthe top and bottom ofthe system 800 to contain RGS products, asthe produc filling ‘openings within each baflle layer may provide a hemnetic seal as shosen. [0078] In another implementation, a conveyor may be placod within a containge which contains the gases gener {ors using the compaction ofthe prosuct on either end ofthe system fo provide a hermetic seal, or an air curtain whieh ensures all gases treating the products do not dissipate or move away Irom the product, FIG. 9 is diagram of such an ‘implementation of a conveyor system 900 for tating prod vet. A container 902 may include a conveyor 908 for transporting product 108 under treatment past one or more plasma generators 104, which may be deployed on the top ff the container in some implementations, and/or on the Sides ofthe contin of beneath the US 2021/0120848 Al implementations, entry hopper 904 and exit hopper 906 may imit the flow of product through the container such that collect product 108 in each hopper 904, 906 provides 3 hermetic seal for RGS products within the container 10079] In some implementations, a particular roduetto- is nitio may need to be maintained within treatment ‘containers. FIG. 10 is an illstration of volume capacity ‘during treatmeat, according to some implementations. Ia some implementation, the produet being treated may only ‘occupy between approximately 59% of the foal volume of ‘space within the container or treatment device, or the plasms enersors may not be able to sustain generation of the hecessary reactive gases in sulicient volumes or with sul- ficient dilfusion rates. For example, at left, FIG. 10 ilus- trates a container 1000 having large gas volume 10028 relative to an amount of produet 108; while at right, FIG. 10 ithastrates 2 container 1000B. having a small gas volume 10028 relative to an amount of product 108. In some implementations, the system at right may not be able 10 properly generate sulicient RGS. products and treat the product. Various methods may'be used to contol the amount ‘of product under treatment, including hatches, doors, valves, ‘or hoppers or similar structures having size-limited openings Jo the teatment container to limit the Now of product, 0080] In some implementations, rather than using ambi ‘ent air a8 a pre-reaction gs, implementations of the systems land methods diseussed herein may tse ozone (0) a feed as or substitute for ambient air. In these high voltage ‘conditions, ozone serves as a catalyst for other reactive gas Species sich as nitrates, nites and peroxides used for decontamination and sterilization of food products. FIG. 1 js am illustration of a system 1100 utilizing an exterior feed as supply 1102, according to some implementations. Gas supply 1102 may comprise any suitable source of azone, such as a pressured gas tank or an ozone generator, and my be connected vin a tube oF hose oa diffuser 1104 or opening ino the treatment container. [0081] FIG. 12A is. sie view of another implementation (of a cold plasma reactor 1200, according to some imple- entation. Similar to reaetor 104 etd plasma reaetor 1200 ‘may also be used for in ita ozone generation in the event ‘omone feed gas is not requited or available. A portion of reactor 1200 may include a low voltage dielectric barrier system. For example, outer portions 1204 may comprise & pair (or pairs) of elctrodes in the upper and lower port ‘of reactor 1200 to which lower voltages (eg. 2-10 RV in ‘many implementations, though higher vollages may be Possible in somie instances) are provided to generate ozone in epions 1206 from oxygen in ambient air or feed oxygen ‘or oxygen mixtures; center portion 1202 may comprise 3 pai (or pais) of electrodes in the upper and lower portions 1200 to which higher voltages (10-120 kV in ementations, or higher, as discussed above) are provided to generate RGS products 1208 from the generated ‘ozone, Such configurations may reduce energy consumption othenvise required 10 1” conver: oxygen to ozone (the ‘catalyst, then subsequently generate the more stable RGSS, [0082] In some implementations, the reactor 1200 may ‘comprise a multi-layered plasma generation dielectric bar- Fier discharge (DBD) system which uses different geom- ‘tries at different intervals to produce o7one in some areas land differnt RGS¢ in other locations. In some sch imple- ‘mentations, small peneration points may ensure that LO0®% Apr. 29, 2021 of the treatment environment has @ sustained gradient of RGSs (homogenous treatmen!). [0083] In some implementations and as discussed above, reactor 1200, 104 may be enclosed ina barir or bill, oF be equipped with a shield or cover, t be deployed within a container. FIG. 12B is a crossscetion illustration of an lementation of a system 1210 for treating. product, according to some implementations. A reactor 104, 1200 may be attached (0 or comprise a solid upper caver oF lop portion 1212; and a perforated, slated, or opon bottom portion 1214 to allow RGS products to flow through. A plumlity of such shielded reactors may be deployed within ‘ container 1216, such as in bales or columns extending cross the container (while allowing producto pass between neighboring reactors). Suel imp! siultiple points of RGS. generat 1216, speeding diffision and teatmeat of prodvet. [0084] Fans or blowers may also be used to diffise RGS products through a twatment area, FIG. 13 isan illustration ‘of another implementation 900” of the system of FIG. 9 uslizing an RGS dispersion fan 1302, One or more reactors 104, 1200 may be deployed within the container 902 (ex. on side walls, a top surface, and/or otiom surfiee). As a conveyor 908 maves product 108 through the container 902, ispersion fan 1302 blows RGS products generated by eactors 104, 1200 through the container, ensuring a homog- ‘enous treatment environment [0085] An implementation of the systems and methods siscussed herein Was tested for eficacy using whole roasted peanuts anificially contaminated with approximately 250 ppb of aflatoxin B 1. S mg pure aflatoxin was dissolved with ‘methanol, and I ml of aflatoxin solution was applied to each sample of 200 g peanuts. The samples were placed ina hood {or at lest 4 hours to allow the solvent methanol to fully evaporate, [0086] Te testing apparatus comprised a chamber with a 4s" electrode gap and «wo 14" polypropylene dielectric barriers. The electrodes comprised 15 em diameter spun ‘aluminom disks, driven by an external power supply 10 50 KV and 70 kV for the tests. The chamber was 50 emi ¢emxd.5 em, filled with approximately 4750 ml of room temperature air at (M6 humidity. The overall dimensions of the apparatus were 14.5 inchess1I-4 inchesx0.75 inches The test product was treated for one hour in plasma gener- ated in wom air (at 21 degrees Celsius, and 100 KPa pressure) in an indiret treatment at both SO KV and 70 KY. Power consumption for the tests were 73.3 W and 135 W, respectively. Optical absompion spectroscopy was used 10 ‘measure gis concentrations within the chamber during act vation ofthe reetor, and aflatoxin and peroxide values were ‘measured ater teatment and compared to conteol sample [0087] FIG. 14 is 9 graph i species generated during a 50 kV during the test, measured via optical absorption spectros- copy via two fber optic probes within the chamber with a path Jength of 21 mm, at 9 sample rating of 4 scans per second, averaged over one socondl. Similarly, FIG. 14B is a raph illustrating kineties of gs species venerated during a 0 kV treatment for 20 minutes during the test, Running cither at $0 0° 70 KY, the concentration of gas species (ozone land nitrogen species) generated by the reactors follow a Similar tread fnsly, roid inerease with reatment time, and then gradually decreasing after the gas species reached its peak. The deerese in concentrations is likely caused by US 2021/0120848 Al slight rise ia the temperature ofthe gases inside the package. ‘The maximal concentration of omine generated during the test at both 50 and 70 KV are approximately the same at ‘around 7000 ppm. Running at 70 kV, the treatment reached the peak ozone concenteation in only 9 min compared 1017 min running at SO KV. This indicates that ate of ozone eneration at 70 kV’ about two times more than at 0 KY, land also corresponds to its approximately two times greater power consumption. After running for 20 mins, the tem perature of gas inside the package reached 31 degrees ‘Celsius at 70 kV, compared t0 25 degrees Celsius at 50 kV 10088] "The OAS quantitation is time depenstent snd pro- vides a measure of RGS generation Higher NO, and NOs ‘concentrations may lead to preter detoxification, Overal, 3 higher RGS sum indicates grester chemical changes in the product (¢g., detoxification). This would be measured asthe ‘otal sum area of ionization during the plasma treatment (at the specified voltae and gap). The 70 kV indirect treatment may provide a higher NO, concentration (area under the ‘eurve) than the 50 KV indirect teatment. Post-treatment ‘concentration measurements are time dependent due to the formation of stable ions that cannot be quantfiod in the ‘OAS. Thus, the OAS provides a signature of the RGS. ‘reate, but does not provide a full quantitation. Specially, N,O, and —OH overlap in their absorbance signature so that a reduction in ozone concentration at longer times 0 orm these RGS will show up as an overall loss in the total GS due tothe difference in spectal eros-secton. tionally, OHOON (peritic acid) and —OOON (pernitrous id) may form, ut itis not visible in the OAS spectra window that is being measured [0089] The ROSA AFQ-PAST test (emanulactorod by ‘Charm Seience, Inc.) was selected to quantitatively detect ‘aflatoxin in the peanut samples. Each peanut sample 200 2) ‘was fist ground using a grinder Then 30 g sample were ‘weighed from the ground sample and was extracted with 150 mil of 84% Acctontril-16% water. The extract was centr- Tiged for 10s for clarification. The extract was then serially liluted (1:10) with the provided AEQ difution butter. Then 300 diluted extract was pipetted onio the absorbent pad of the test strips and incubated at 40 degrees Celsius for $ minutes. The test strips were read immediately alter ineu- bation using the Charm-M reader. This Rapid One Step Assay is a. quantitative lateral ow test that is read in & ROSA-M Reader, The ROSA AFQ-FAST test has been approved by USDA GIPSA (Grain Inspection, Packers and, Stockyards Administration) for comm, peanuts and 24 ether ‘commodities. This method will only measure pure toxins fd will not quantify allatoxin degrada. [0090] |The reduction of aflatoxin measured in the testis presented in the table below: ‘sample! Sample? Mean = Sul Retuton ‘Go ch As shown, allstoxin was significantly ratuce! by 60% at 50 KV and 74% at 70 KV through the treatment. [0091] The treated samples were similar in sppearance and ‘quality compared to a contol group. FIG. 14C is a calor photograph comparing treated product of the implementa- Apr. 29, 2021 sions of FIGS, 144 and 148 with a control group. After treatment at either $0 oF 70 KV, the color ofthe peat skin appeared to be brighter, as compared to mone reddish and ‘darker skin ofthe untreated peaaul samples, Because of is brighter colo, the peanut kemels after treatment were more aesthetically appealing [0092] To determine the effect of estment on peanut ol, peroxide and acid levels of each sample were measnred, as shown in the table below: Seople Pema vaue (mms) Aca abe (g KOM) Cont FAG AG GID EOAH OS nsDIOST DOH TURVEH _Rakeaaplain nnse) —Ostrnsernse wha {0093] The peroxide valu of te peanut ol as increased slighty afer treatment although ths increase isnot stat ‘ically significant In addition, the fal peroxide vale of the teeted peanuts was sill below $ mmol/kg, a6 commonly Found in fees ol. Acid value of peant oil was notated by the treatment {0094} While the shove example uscd small samples, the systems and methods discussed herein have also been tested With lange samples, and the reslls sale sppropritl {0095} _Insome fuer implementations cok plain weae- tors may he deployed with clectodes in close proximity to ‘where the product will he tated. For example, in some Jnsplementatons and with some gncs, a reactor muy gone erate short-lived RGS such #8 superoxides or hylexvl radicals that eypidly degrade (eg within microseconds) Even with fancasod distribution of the generated gasses, shelved components may not travel more than fee inches. These shrc-fived RGS may be parcully desirable for produet weatmeat: accordingly, it some inplements tions, efcacy may be increased by having the prodct treatment region in else proximity (0 where the psa is senertd (0096) FIG. 18A is as ikutrstion of system 1800 for ‘eating pect with close positioning of product treatment ‘eons, according o some implementations. Aa Spt hop- er 1502 may allow product to drop into treatment Container (3. Via a aeock or ater gas impemcable or Semi-impemeable cpening) and be erred by a conveyor 1804 (ep. bal, sre, et.) past a reactor 1820 though a region of high coneeatriions of generated RGS. 1816, belore Being depoited into a output hopper 1512 (having 3 similar arock or ater as impermeable or semi-impet- ‘cable opening). the ioplementation shown, the rector 1520 moy comprise a high vokage single dilecre barrier

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