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Design and Simulation of MEMS Differential Capacitive Accelerometer

Conference Paper · July 2014


DOI: 10.13140/2.1.1074.8809

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ISSS International Conference on Smart Materials, Structures and Systems
July 08-11, 2014, Bangalore, India

DESIGN AND SIMULATION OF MEMS DIFFERENTIAL


CAPACITIVE ACCELEROMETER

Soumendu Sinhaa,b, Snigdha Shakyaa, Ravindra Mukhiyaa,b, Ram Gopala,b, B.D. Panta,b
a
CSIR-Central Electronics Engineering Research Institute (CEERI), Pilani 333031, India
b
Academy of Scientific and Innovative Research (AcSIR), New Delhi 110001, India
Email: soumendu.sinha@gmail.com

Abstract: In this paper, a MEMS differential capacitive accelerometer is designed and simulated for an 8 µm UV-LIGA
technology. The in-plane (x-/y-axis) accelerometer works for an acceleration range of ± 10g, operating at 5 Volts. Simulation
results show a sensitivity of 3.83 fF/g with a cross-axis sensitivity of 0.47%. The device shows good linearity in the operating
bandwidth of DC-400 Hz with a quality factor of 10. Simulations of the device were carried out in CoventorWare® and MEMS+®
and their results are found to be closely matching with analytically calculated results. Using CoventorWare® modal analysis, the
lateral-axis mode is dominant at 1.45 kHz which is desirable to get high in-plane sensitivity.

Keywords: MEMS, Accelerometer, CoventorWare, MEMS+, UV-LIGA.

1. INTRODUCTION microfabrication processes enable the integration of these


mechanical transducers together with their readout circuitry on
Accelerometers are used to measure the acceleration of a
the same substrate resulting in more reliable and higher
moving object. They can measure tilt, shocks, vibrations and
performance accelerometers. These advantages have attracted
inertial acceleration. They find application in many areas such
several big players in the MEMS market to develop MEMS
as navigation and guidance systems, automobile air bag
accelerometers [1]. They are replacing the conventional
systems, biomedical applications, vibration monitoring
devices used for applications such as airbag deployment
systems etc., which lead their demand [1]. With the
systems in automobiles. One of the most successful products
advancement of Micro-Electro-Mechanical Systems (MEMS)
in the market is the ADXL series of the Analog Devices.
technology, MEMS accelerometers are now commercially
Analog Devices have a variety of accelerometers,
available and it is now possible to integrate them into cost
monolithically fabricated with its readout circuitry, which are
sensitive commercial devices such as smartphones, shock
surface micromachined polysilicon based [5].
monitoring equipment, robotics etc. [2]. Due to
miniaturization, they can be used for applications such as Accelerometers measure linear acceleration along their
active stabilization of pictures in cameras, in-vivo activity sensitive axis. The acceleration value can be extracted by
monitoring in biomedical applications, monitoring mechanical utilizing the movement of a proofmass, connected to anchor
shock and vibration of devices during transportation, etc. They via suspension beams. An external acceleration displaces the
can also have several military applications where high proofmass from its initial position. This displacement is
sensitivity accelerometers along with gyroscopes can act as proportional to the magnitude of acceleration. Hence, the
crucial components in navigation and guidance systems. Fig. applied acceleration input is converted to proofmass
1 shows some of the applications along with sensitivity and displacement in the sensor. By using appropriate readout
bandwidth requirements [3]. circuits, the magnitude of this displacement can be extracted.
Micromachined accelerometers have various sensing
mechanisms, and they are classified into several groups based
on the transduction technique used. Some of the most common
techniques are piezoresistive, piezoelectric, capacitive, and
thermal [2, 6]. We have designed a capacitive accelerometer
because they have several advantages, which make them very
attractive for numerous applications [2, 6]. They have a low
temperature dependency unlike piezoresistive accelerometers.
Moreover, they have very good DC response, high voltage
sensitivity, low noise floor, and low drift. Another important
property of the capacitive accelerometers is their low power
dissipation, as well as their simple structure. Capacitive
accelerometers convert the acceleration into a capacitance
change. When an external acceleration is applied to the
Figure 1: The application areas for accelerometers and the accelerometer, the seismic or proofmass deflects from its
bandwidth-resolution performances [3].
initial position and causes change in the capacitance between
MEMS accelerometers have low cost, small size, low power the proofmass and stationary electrodes. Fig. 2 shows a MEMS
consumption, repeatability, high sensitivity and enormous capacitive accelerometer with lateral sensing technique,
design flexibility [4]. IC (Integrated Circuit) compatible having single electrode. An electronic circuitry can easily
measure this capacitance change by detecting change in output
voltage. The sensing mechanism can be made differential as
well in order to increase the sensitivity [7].

Figure 2: Capacitive accelerometer with lateral sensing.


Figure 4: 3-D solid model of accelerometer created using
In the next section, we have discussed the basic theory and CoventorWare®.
working principle of MEMS differential capacitive
accelerometer. This is followed by the design of accelerometer The supporting beam is designed as fixed-guided end beam [8]
according to the specifications. The results obtained through as shown in Fig. 5.
simulations of accelerometer using CoventorWare® and
MEMS+® are presented and discussed in the following
section. Finally, the proposed process flow for fabrication of
accelerometer is discussed in the last section.

2. THEORETICAL BACKGROUND
A single-axis, in-plane differential capacitive accelerometer
with transverse (variable gap) sensing was designed and
simulated with the help of CoventorWare® and MEMS+®. The
schematic of the accelerometer is shown in Fig. 3.
Figure 5: Spring design for the accelerometer.
The spring constant of one section of the beam can be
expressed as

Ehw 3
kx  , (1)
L3
where, E is the Young’s modulus of Nickel, w is the width of
beam, L is the length of beam, and h is the thickness. The aim
of the design is to have parallelism of the free end with the
fixed end. The truss region is especially designed to be 4 times
wider than the beam width to preserve the rigidity of this
region which helps in maintaining the fixed-guided end beam
configuration [4]. The overall spring constant of the structure
can be calculated by series and parallel combination of these
beams. The final expression is
Figure 3: Schematic of MEMS differential capacitive accelerometer.
3
It consists of a proofmass with comb-like sensing fingers, 2 EhWb
fixed electrodes and suspension beams connected to anchors. kx  3
. (2)
Electrical connections are also illustrated in the Figure. The Lb
design consists of three masks created with the help of L-
From the simulations in CoventorWare® and MEMS+®, the
Edit® tool and then imported into CoventorWare® for FEM
spring constant is calculated using the equation
simulations. Fig. 4 shows the 3-D model of accelerometer
created in CoventorWare®. m.a
k , (3)
x
where, m is the mass of structure, a is applied acceleration on
the proofmass and x is the resultant displacement. Table 1
shows a comparison between calculated and simulated values
of the spring constant.
d2 d
Table 1: Comparison of the spring constant
m 2
x(t )  b x(t )  kx(t )  ma(t ) , (7)
dt dt
Evaluation method Value where, a(t) is acceleration of the proofmass.
Analytical calculation 6.08
CoventorWare® 6.08 Squeeze-film damping effect exists between the comb-fingers
MEMS+® 6.07 as shown in Fig. 7. Assuming Hagen-Poiseuille flow [9, 10],
squeeze-film damping coefficient between comb-fingers can
be written as:
As shown in Fig. 4, the proofmass is perforated. This is helpful
3
in releasing the large area structure of the proofmass by t
removal of sacrificial layer. The dimensions of the proofmass b  7.2 eff l   , (8)
are calculated on the basis of required natural frequency. The h
mass of accelerometer is found to be 87.4 µg using
CoventorWare®.
The sensitivity of the device is directly proportional to the
displacement of the proofmass from its mean position on
application of external acceleration. This is inversely
proportional to the resonant frequency of the device. The same
relation is given in Eq. (4). Therefore, to obtain higher
sensitivity, resonant frequency should be as less as possible
while the spring constant (k) and the mass (m) should be fixed
in order to obtain large displacement.
Figure 7: Squeeze-film damping between comb-fingers.
amax m
xmax   . (4)
r2 k where, l is the overlap length of fingers, t is the overlap area of
fingers, h is the gap between fingers and µeff is the effective
The supporting beam and mass dimensions are designed viscosity. Another air damping mechanism called Couette-
keeping in mind that the displacement of proofmass should not flow damping is also present in the system which occurs when
exceed one-third of the gap between two electrodes in order to two parallel plates move parallel to each other [9]. The total
avoid pull-in phenomenon [7]. damping coefficient of the accelerometer is the sum of the
damping coefficients of each mechanism, calculated
Accelerometer can be modeled by a second-order mass-
separately. However, the magnitude of Couette-flow damping
damper-spring system, as shown in Fig. 6. External
is much smaller than squeeze-film damping [11], and thus it is
acceleration displaces the proofmass relative to the supporting
ignored. The overall damping coefficient obtained through
frame, which is opposed by spring force and damper.
simulations in CoventorWare is 2.68E-06 N-sec/m at
atmospheric pressure 0.1023 MPa.
After calculating the total damping coefficient of the system,
quality factor, Q, of the accelerometer is calculated as

n m
Q , (9)
b
where, ωn is the natural frequency of the accelerometer, b is
the damping coefficient, and m is the seismic mass.
The fixed electrodes are arranged as a comb-drive, in order to
obtain differential capacitance, which increases the sensitivity
of the device and also helps in taking the electrical output in
Figure 6: Dynamic model of an accelerometer. terms of voltage as shown in Fig. 8. When the mass is
The inertial force equation is expressed as follows displaced from its mean position, the overall capacitance
differs from its nominal value, and based on the capacitance
Fnet  Fspring  Fdamping  Fexternal , (5) change an output voltage is obtained.

mx  bx  kx  Fexternal , (6)

where, m is the mass of the system, x is the displacement, b is


the damping coefficient and k is the spring constant.
Considering x-axis as the sensing direction, the dynamic
equation of the system is given by the differential equation
2 . N .l.h  x  x
C  C2  C1     2Co  
d d  d  (10)
 . N .l.h
where, Co  .
d
The sensitivity of the accelerometer is proportional to the
displacement of proofmass from its mean position and
inversely proportional to the gap between sensing electrodes,
given as

C x max
 . (11)
Figure 8: A close-view of differential sensing electrodes.
C d
The initial gap between electrodes plays a vital role in
Fig. 9(a) illustrates the comb finger structure with differential
determining the sensitivity of the device. The formation of
sensing. It also shows the capacitances formed between the
high aspect-ratio structure is a technological limitation and
stator and rotor fingers. Fig. 9(b) shows the change of gap
thus to the sensitivity.
when the rotor moves, where C1 increases and C2 decreases.
The total energy in the comb-drive capacitive structure is
calculated as given by Eq. (12). The force in the x-direction is
calculated by partial differentiation of the energy w.r.t. x.

1 Nεεl Vdc  Vac  1 Nεεl Vdc  Vac 


2 2
1
E  CV 2  
2 2 dx 2 dx
(12)

1 Nlh Vdc  Vac  1 Nlh Vdc  Vac 


2 2
dE
F   
dx 2 d  x  2
2 d  x 2
(a) (13)
where,
N = number of fingers
d = original gap between electrodes
x = displacement from mean position
l = length of finger
h = overlap thickness of fingers
Vdc = applied DC voltage
Vac = applied AC voltage

(b) Solving for the force, we obtain

NlhV dc2
2 xd   2 N2lhVdc2V2ac d 2  x 2 
Figure 9: Capacitance formation in comb-drive: (a) mean position
F
d  d 
(b) under acceleration.
2 2
Capacitances C1 and C2 are functions of gap between the
2
x x . (14)
electrodes. If the acceleration is zero, gap between the
Considering x<<d,
electrodes is equal and therefore, capacitances C1 and C2 are
equal. Under external acceleration, the proofmass gets 2 NlhV dc2  x  2 NlhV dcVac
displaced by x. Thus, the change in capacitance is calculated F  
as [12] d2 d  d2 . (15)
 . N .l.h  . N .l.h  . N .l.h  x Let,
C1    1  ,
dx  x d  d 2 NlhVdc2
d 1   Fdc  ;
 d d2
C2 
 . N .l.h  . N .l.h  . N .l.h  x 
  Vac  Vo sin t ;
1  ,
dx  x d  d 2 NlhVdcVo
d 1   Fac  .
 d d2
whereby, Thus,
x f ace  
  22  ~r2  1 sin ~ 2  2  
 
F  Fdc    Fac sin t X2  2 cos ~r2  2  
d  r  12  42
~ 2
 ~r2  2
r

. (16)

f ac

~ 2  1sin   2 cos  .
Now, considering the effect of acceleration in time domain, ~ 2  12  42 r
r
Eq. (6) is rewritten as
. (22)
mx  bx  kx  Fapplied , The final solution for transient response of the accelerometer
is given by X = X1+X2.
which in explicit form is expressed as
For the system to be underdamped, i.e.,
~   condition

x
r
d 2x dx
m 2  b  kx  ma  Fdc    Fac sin t . (17) is met. The displacement amplitude is given by aˆ ~ 2 . By
dt dt d   r
taking Laplace transform of Eq. (20), we obtain
Let,
( s 2  2s  ~r2 ) Xˆ ( s)  aˆ  f ac
k mn 1
n  ;Q  ;Q  ; Xˆ s 
~ 2  A  exp i  .
2 1
m b 
aˆ  f ac    i 2  
2
r
and then Normalizing the Eq. (17) in term of following factors,
where, the amplitude response is given by
x a F F
  n t ;   ; aˆ  ; f dc  dc2 ; f ac  ac2 ;
d dn2
dwn m dwn m A  
1
~ 
r   2  42 2
2
, (23)
where, Q = quality factor, ωn = natural frequency.
and, the phase response is given by
The same takes the form as
2
d2X     tan 1 ~ 2
 1  f dc X  aˆ  f ac sin 
dX r   2
 2
d 2
d . (18)
. (24)
The design specifications for the accelerometer are given in
~ 2 Table 2.
Let, 1  f dc  r
.
 2
n
Table 2: Specifications of the Accelerometer

~ 2   2 1  f   Resonance frequency .

Specification Desired value Simulated value
r n dc Acceleration range ± 10g ± 10g
Bandwidth DC-400 Hz DC-400 Hz
d2X dX ~ 2
 2   r X  aˆ  f ac sin  Sensitivity 10 fF/g 3.83 fF/g
d 2
d (19) Resolution 100 µg/√Hz 2.41 µg/√Hz
Quality factor 10 10
Let X = X1+X2, whereby Eq. (19) splits into following two Cross-axis sensitivity 1% 0.47%
differential equations: Operating voltage 5V 5V
d 2 X1 dX ~ 2 X  aˆ ,
 2 1   The physical dimensions and performance results achieved for
d d
2 r 1
(20) the optimized accelerometer design to meet the specifications
d2X2 dX 2 ~ 2 are given in Table 3.
 2  r X 2   f ac sin  .
d 2 d Table 3: Optimized design and performance of the accelerometer
Solving for X1 and X2, we have following equations: Parameter Symbol Value

aˆ 
   
 Width of supporting beam Wb 6 µm

X 1  ~ 2 1  e  cos ~r2  2   sin ~r2  2  , Length of supporting beam Lb 500 µm
r   ~r2  2 
 Number of turns 1
and (21) Width of the proof mass Wm 1000 µm
Length of the proof mass Lm 1300 µm
Device thickness t 8 µm
Size of the holes 10 µm x 10 µm
Gap between holes 10 µm
Movable finger width Wf 5 µm
Movable finger length Lf 40 µm
Total Number of sensing
Ns 94
fingers
Capacitance gap d 4 µm Table 4: Simulated resonant frequencies
Sensing mass Ms 87.4 µg
Modes Mode shape CoventorWare MEMS+
Nominal capacitance Co 100 fF
Mode 1 Along x-axis 1.45E+03 Hz 1.38E+03 Hz
Spring constant Kx 6.08 N/m
Mode 2 Along z-axis 1.80E+03 Hz 1.88E+03 Hz
Displacement sensitivity Sd 0.19 µm/g
Mode 3 Torsional across y-
Resonant frequency ωr 1448 Hz axis
3.26E+03 Hz 3.17E+03 Hz

3. SIMULATION RESULTS Frequency analysis of the device was performed in MEMS+ ®


and MATLAB®. The results are shown in Fig. 11. The
Based on the analytical equations the accelerometer performance is almost linear in the working range of DC to
dimensions were optimized to achieve the specifications. The 100 Hz. This is important to avoid non-linearity in the device.
design was implemented into the MEMS CAD tool This was verified in CoventorWare® through harmonic
COVENTOR®. First of all, Modal analysis of the structure was analysis. Fig. 12(a) and 12(b) show the amplitude and phase
carried out using CoventorWare® as well as MEMS+®. The response of the accelerometer respectively.
dominant mode is ensured along the x-axis, i.e., lateral
direction as shown in Fig. 10 (a). The second mode is in the
vertical direction as shown in Fig 10 (b). Table 4 shows the
comparison between natural frequencies for first three modes
obtained in CoventorWare® as well as MEMS+®.

Figure 11: Frequency response of accelerometer using MEMS+®.

(a)

(a)

(b)
Figure 10: Resonant modes of accelerometer: (a) Fundamental
mode in x-direction, (b) Secondary mode in z-direction.
(b) Acceleration (g)

Figure 12: Frequency response of accelerometer using Figure 13: Comparison of acceleration vs. displacement for
CoventorWare®: (a) Amplitude response, (b) Phase response. CoventorWare® and MEMS+®.

Fig. 13 shows a comparison of the displacement results for 1g


to 10g acceleration using CoventorWare® and MEMS+®. The
results showed an excellent matching for the two. On
increasing the magnitude of applied AC voltage, the sensitivity
of the accelerometer is enhanced as shown in Fig. 14.
Transient analysis of the device was performed using
MEMS+®. The turn-on and settling time of the device are
found to be 0.3 ms and 6 ms, respectively. The transient
response of the accelerometer on application of 1g acceleration
in x-direction using step signal is as shown in Fig. 15.
As the DC voltage on the proofmass increases, a pull-in
phenomenon is observed due to electrostatic forces exceeding
the mechanical spring force. The pull-in phenomenon is
expressed by Eq. (25). Acceleration (g)
Figure 14: Acceleration vs. displacement for different AC signal for
8 kd 3
V pullin  , (25) MEMS+®.
27 A
where, k is spring constant, d is spacing between the
electrodes, and A is overlap area.
The pull-in voltage of the accelerometer is obtained as 17.02V
which closely matches the analytically calculated value of
16.88V as shown in Fig. 16.

Figure 15: Transient response of the accelerometer.


5. CONCLUSIONS
In this paper, design and simulation of a MEMS differential
capacitive accelerometer using CoventorWare® and MEMS+®
have been presented for an 8 µm UV-LIGA technology. For
the designed accelerometer, a sensitivity of 3.83 fF/g is
achieved with a cross-axis sensitivity of 0.47%. Through
simulations, we verified the bandwidth of DC-400 Hz with a
quality factor of 10. The sensitivity of the device is enhanced
by increasing the applied AC signal. The fabrication process
flow for using UV-LIGA technique is also discussed.

ACKNOWLEDGEMENTS
The authors would like to acknowledge Director, CSIR-
Central Electronics Engineering Research Institute, Pilani for
Figure 16: Illustration of Pull-in phenomena for the accelerometer. his valuable guidance. They would like to thank all the
members of MEMS & Microsensors group for their co-
4. PROPOSED DEVICE FABRICATION operation and support. This financial support by CSIR, New
Delhi, India through project PSC-0201: MicroSenSys
The accelerometer device is designed to be fabricated using
(SUPRA Institutional Project) is gratefully acknowledged.
UV-LIGA technology, which is well-established at authors’
laboratory [13]. The process flow is shown in Fig. 17. It is a
three mask process. Gold is used as the seed layer and
chromium improves its adhesion to the substrate. Copper is REFERENCES
used for the sacrificial layer and Nickel is used as the structural
layer. The mould for structural layer is made up of negative [1] “Innovations and MEMS growth in 2013 and beyond”,
Yole Development, 2013.
photoresist SU-8. Firstly, the anchor and electrodes are formed
[2] Yazdi, Navid, Farrokh Ayazi, and Khalil Najafi.
using lift-off process. Seed layer for the sacrificial layer is
"Micromachined inertial sensors." Proceedings of the
sputtered and patterned to obtain the anchoring regions. After IEEE 86.8: 1640-1659 (1998).
protecting the anchors with photoresist, the sacrificial layer is [3] R. F. Yazıcıoğlu, “Surface Micromachined Capacitive
grown using electroplating. This is followed by the mould Accelerometers Using MEMS Technology,” M.S. Thesis,
formation of structural layer using SU-8. Finally, the structural Middle East Technical Univ., 2003.
layer is grown using Nickel electroplating and the structure is [4] Kannan, Akila. Design and modeling of a MEMS-based
released after sacrificial Cu layer etching. accelerometer with pull in analysis. Diss. University of
British Columbia, 2008.
[5] Devices, Analog. "ADXL50-monolithic accelerometer
with signal conditioning."Norwood, MA (1993).
[6] Krishnan, Girish, et al. "Micromachined high-resolution
accelerometers."Journal of the Indian Institute of
Science 87.3: 333 (2012).
[7] Stephen D. Senturia, "Microsystem Design", Kluwer
Academic Publishers, 2001.
[8] Benmessaoud, Mourad, and Mekkakia Maaza
Nasreddine. "Optimization of MEMS capacitive
accelerometer." Microsystem Technologies : 1-8 (2013).
[9] Chen, Jia Yu. "Single-and dual-axis lateral capacitive
accelerometers based on CMOS-MEMS technology."
(2010).
[10] Bao, Minhang, and Heng Yang. "Squeeze film air
damping in MEMS." Sensors and Actuators A:
Physical 136.1: 3-27 (2007).
[11] Gönenli, I. E., Zeynep Celik-Butler, and Donald P. Butler.
"MEMS accelerometers on polyimides for failure
assessment in aerospace systems."Sensors, 2010 IEEE.
IEEE, 2010.
[12] Sharma, Kanchan, et al. "Design optimization of MEMS
comb accelerometer." ASEE Zone 1 Conference 2008.
Figure 17: Proposed process flow for the accelerometer: (a) Silicon [13] Qu, Wenmin, Christian Wenzel, and Gerald Gerlach.
wafer; (b) Formation of anchor and electrodes by lift-off process; (c) "Fabrication of a 3D differential-capacitive acceleration
Ti/Cu sputtering (seed layer); (d) Photoresist coating and patterning sensor by UV-LIGA." Sensors and Actuators A:
for anchors and electrodes; (e) Electroplating of copper used as Physical 77.1: 14-20 (1999).
sacrificial layer; (f) SU-8 coating and patterning for structural layer;
(g) Electroplating of nickel; (h) Release of structure after sacrificial
etch.

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