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Author:
Wang, Yifang
Publication Date:
2023
DOI:
https://doi.org/10.26190/unsworks/24651
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https://creativecommons.org/licenses/by/4.0/
Link to license to see what you are allowed to do with this resource.
A thesis submitted to The University of New South Wales in partial fulfilment of the
By
Yifang Wang
September 2022
[This page was left intentionally blank]
Thesis/Dissertation Sheet
Abstract
The enigmatic surface of gallium-based liquid metals that is ultra-active and smooth, offering opportunities for
synthesising and templating two-dimensional (2D) films. When the reactive surface is in contact with an appropriate
aqueous solution, the built-in potential at the aqueous solution-liquid metal interface can induce an interfacial reaction
and lead to the deposition of desired 2D materials onto the liquid metal surface. In this thesis, the author is involved in
research on molybdenum-based 2D materials synthesis at an aqueous solution-liquid metal interface.
In the first stage of this Ph.D. research, the author develops a technique of 2D molybdenum sulfide synthesis at the
surface of liquid metals. Utilising an aqueous solution of ammonium tetrathiomolybdate as a precursor, 2D
molybdenum sulfide layers of large area are deposited on the surface of liquid metals, which are transferrable onto
silicon wafers with a touch-transfer technique. Upon annealing, the resultant 2D molybdenum sulfide is of unit-cell
thickness and highly crystalline.
In the second stage, this Ph.D. research extends this technique to the deposition of molybdenum oxide patterns.
Uniform layer of molybdenum oxides, which are hydrated and amorphous, are templated onto liquid metal droplets
and later transferred. The as-synthesised molybdenum oxide layers can be selectively dehydrated and crystalised via
laser exposure, transforming them into conductive molybdenum dioxide patterns. The resultant conductive patterns
show optical and electronic responses to bio-stimuli, which can be used for bio-sensing.
In the third stage of this thesis, the liquid metal-aqueous solution interfacial reactions are applied for surface decoration
and band structure modulation of liquid metal-based particles. Utilising the built-in potential at the interfaces, a
secondary layer of molybdenum-based semiconductor is deposited on the surface of liquid metal particles, leading to
core-shell structures with different optical properties and band structures.
Collectively, the author demonstrates a new method for synthesising 2D materials utilising aqueous solution-liquid
metal interfacial reactions, which potentially establishes a new route for the room temperature deposition of 2D
materials at large lateral dimensions. The outcomes of this Ph.D. research offer significant possibilities for future
industrial uptakes.
I hereby grant to the University of New South Wales or its agents a non-exclusive licence to archive and to make
available (including to members of the public) my thesis or dissertation in whole or in part in the University libraries in
all forms of media, now or here after known. I acknowledge that I retain all intellectual property rights which subsist in
my thesis or dissertation, such as copyright and patent rights, subject to applicable law. I also retain the right to use all
or part of my thesis or dissertation in future works (such as articles or books).
19/09/2022
……………………………………………………… …… ……………………...…….…
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and require the approval of the Dean of Graduate Research.
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STATEMENT
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INCLUSION OF PUBLICATIONS STATEMENT
[This page was left intentionally blank]
Abstract
The enigmatic surface of gallium-based liquid metals that is ultra-active and smooth,
offering opportunities for synthesising and templating two-dimensional (2D) films. When
the reactive surface is in contact with an appropriate aqueous solution, the built-in
potential at the aqueous solution-liquid metal interface can induce an interfacial reaction
and lead to the deposition of desired 2D materials onto the liquid metal surface. In this
In the first stage of this Ph.D. research, the author develops a technique of 2D
of large area are deposited on the surface of liquid metals, which are transferrable onto
In the second stage, this Ph.D. research extends this technique to the deposition of
molybdenum oxide patterns. Uniform layer of molybdenum oxides, which are hydrated
and amorphous, are templated onto liquid metal droplets and later transferred. The as-
synthesised molybdenum oxide layers can be selectively dehydrated and crystalised via
laser exposure, transforming them into conductive molybdenum dioxide patterns. The
resultant conductive patterns show optical and electronic responses to bio-stimuli, which
In the third stage of this thesis, the liquid metal-aqueous solution interfacial reactions are
applied for surface decoration and band structure modulation of liquid metal-based
leading to core-shell structures with different optical properties and band structures.
a new route for the room temperature deposition of 2D materials at large lateral
dimensions. The outcomes of this Ph.D. research offer significant possibilities for future
industrial uptakes.
ii
Acknowledgement
The journey of getting a Ph.D. is so far the most incredible experience in my life. During
this journey, I received tremendous help and support. I acknowledge the Australian
Research Council (ARC) Laureate Fellowship grant (FL180100053), and the ARC Center
for financially supporting the research projects included in this thesis. I acknowledge the
Australian Government Research Training Program (RTP) Scholarship and the Women
First and most importantly, I would like to convey a sincere gratitude to my supervisor
Prof. Kourosh Kalantar-Zadeh for offering me this great opportunity and providing
enormous support and supervision. I’m not the brightest student, but he has always been
I would like to express heartfelt thanks to secondary supervisors, Dr. Mohammad Bagher
Ghasemian, Dr. Mohannad Mayyas and Dr. Jiong Yang for their supervision. Mohammad
helped a lot with my review paper and my last project. Without his help, I would not be
able to finish the last year of my Ph.D. I would like to thank my collaborators from other
institutes for their input of my research projects. Prof. Richard B. Kaner from the
University of California, Los Angles (UCLA), Dr. Yin Yao from Electron Microscope
Unit, UNSW, Dr. David Cortie from the University of Wollongong, and Dr. Aaron
I would also like to thank my colleagues in the Centre for Advanced Solid and Liquid-
based Electronics and Optics (CASLEO) for their company and encouragement. We
iii
shared joy and laughter, as well as frustration when experiments failed. It was amazing
to work with you guys. This journey wouldn’t be the same without you.
I would like to thank my family, my father Mr. Jinghui Wang, my stepmother Ms. Li
Zeng, my little sister Ms. Lu Feng and my partner Dr. Aidong Tan. Although being
thousands of miles away, I can always feel the love and support you have for me. I want
to thank my late mother, Ms. Yafan Zhang, and my late grandfather Mr. Zhenxue Wang
for always having faith in me and being proud of me. I will carry you in my heart when I
I would also like to thank the Counselling and Psychological Services of UNSW and my
counsellor Dr. Juan Chen. Juan gave me enormous support and compassion that I
desperately need in those difficult times during this Ph.D., for which I’m truly grateful.
Juan, you are a real-life superhero because you are literally saving lives.
iv
List of publications
Band structure modulation of gallium-based liquid metal particles via coating with
Other publications by the author of this Ph.D. thesis with the theme of liquid metals
1656-1665 (2020)
v
Han, M. G. Saborio, J. Tang, R. Jalili, S. H. Lee, W. K. Seong, S. P. Russo, D. Esrafilzadeh,
2001997 (2020)
oxide piezoelectric layers for reduced environmental contamination using a liquid metal-
(2021).
liquid metal alloys: Test of NO2 selective sensing. Applied Materials Today, 22, 100954
(2021).
(2021)
vii
Table of Contents
Abstract ............................................................................................................................. i
Acknowledgement ..........................................................................................................iii
viii
2.4.4 Sensors ............................................................................................................ 57
ix
4.1 Introduction ......................................................................................................... 105
4.3.3 Laser annealing: A direct laser writing of conductive MoO2 patterns ......... 123
4.3.6 Peak-force tunnelling AFM measurement for conductivity assessment ...... 136
............................................................................................................................... 147
............................................................................................................................... 148
6.2.3 Other co-authored publications with the theme of liquid metals .................. 167
xi
Chapter 1 Introduction
1
1.1 Introduction
Several post-transition metals and their alloys offer low melting points at near room
temperature. The most well-known examples are EGaIn (eutectic alloy of gallium and
indium) and Galinstan (eutectic alloys of gallium, indium, and tin) with melting points at
15.4 and 13.2 °C, respectively.1 Such alloys are commonly referred to as liquid metals
since they take on a liquid state at room temperature. These liquids are fascinating alloys
as they offer fluidity, freely moving electrons and ions, as well as metallic thermal and
electrical conductivity.2-4 Additionally, gallium (Ga) is not as hazardous as its sister liquid
metal mercury.5 Other than these unique properties, liquid metals also extend intrinsic
characteristics that render them unique as reaction media for synthesising two-
dimensional (2D) materials.6-12 One of the key properties is that the surface of liquid metal
liquid metals is their non-polarized nature, which weakens the attractive forces between
the bulk metal and the interfacial 2D layers. Consequently, the synthesised 2D material
It was previously demonstrated that liquid metals can be used for synthesising self-
limiting oxide or sulfide metal compounds on their surface directly from the mother melt
adding a secondary metallic element into the liquid metal to make an alloy. If the
secondary metal wins the competition against the core metal, it emerges on the surface
process only works if the secondary metal is soluble in the host liquid metal at low
temperatures. This means that metallic elements such as tungsten (W) and molybdenum
(Mo), which are not soluble in Ga, cannot be obtained using this method. 1
2
The author of this thesis hypothesizes that in this case, by bringing a precursor of these
metals to the surface of liquid metal, a designed reaction can take place to form the desired
can be dissolved in a solvent to be brought onto this interface. The interfacial region
between the liquid metal and solvent can be destabilized to activate the precursors and
produce the target material, while the atomically smooth liquid metal surface serves as a
template.
bonding and weak inter-plane interaction.14, 15 When thinned down to nanometre or even
unit-cell thickness via mechanical exfoliating, these 2D MoS2 layers show intriguing
properties that are distinctively different from the bulk, which makes them valuable for
both fundamental research and practical applications.16, 17 Various methods for 2D MoS2
MoS2 at room temperature but with limited lateral dimensions (up to tens of micrometres)
and poor thickness-control.19 On the contrary, various deposition methods can also be
used for the deposition of 2D MoS2 while they still suffer from high-process temperatures
or poor morphology control.20 These deposition methods are also generally substrate
Another viable candidate for the interfacial gallium based liquid metal deposition process
is molybdenum oxide. Molybdenum oxide has been widely used in optics, electronics and
which offers metal-like conductivity.24, 25 Previous theoretical studies suggested that the
formation of the non-polar Mo−Mo metallic bonds in MoO 2 leads to a high conductivity
in this material.26 Therefore, MoO2 has been commonly used as a charge transport
2D MoS2 mentioned above, 2D molybdenum oxides also call for more effective synthesis
methods for large area deposition for electronic and other applications.
solution interfacial reaction could also be used for surface decoration and band structure
modulation of liquid metal particles. When liquid metals are broken down into micro- or
nano-sized droplets, the significantly increased surface to volume ratio enable them for
functionalization of the surface of liquid metal droplets could modulate their properties.
Taking advantage of the reactive surface of liquid metals, aqueous solution-liquid metal
interfacial deposition is an effective approach for such surface decorations. With careful
selection of the aqueous solution as the precursor, a layer of desired secondary material
can be deposited onto the surface of liquid metal droplets using a well-engineered
interfacial reaction. Upon surface deposition of materials with different bandgaps, the
band structure and optical properties of the liquid metal droplets can then be modulated.
Given the aforementioned research gaps, the author of this Ph.D. thesis endeavours to
metal-aqueous solution interfacial reactions, which is the core subject of this Ph.D.
research. The details of the research are presented in the chapters of this Ph.D. thesis as
follows.
4
Chapter 2 presents a comprehensive overview about liquid state of post-transition metals
for interfacial synthesis of 2D materials. The author discusses the key physical properties
of the liquid metals including the origin of their low melting points, and high thermal and
electrical conductivity. The author also illustrates their boundary induced layering and
oxidation, as essential traits for creating 2D films. Afterward, the interfacial synthesis of
2D materials is depicted with the discussing surface oxidation, reduction and exfoliation.
field effect transistors, optoelectronic devices, systems that use 2D dielectric and
The content of this chapter was published as review paper: Y. Wang, M Baharfar, J. Yang,
021306 (2022).
sheets on the surface of liquid metals. In this process, EGaIn is applied as the reducing
liquid metal-aqueous solution interface is sufficient to destabilize the precursor and leads
deposited layer onto any substrate. After a final annealing step, the obtained 2H MoS 2
The content of this chapter was published as a peer-reviewed paper: Y. Wang, M. Mayyas,
5
and K, Kalantar-Zadeh, Self-Deposition of 2D Molybdenum Sulfides on Liquid Metals.
molybdenum oxide sheet which can serve as a writing medium of conductive patterns.
Utilising the surface of liquid metal as an atomically smooth template and sodium
deposited on the surface of liquid metal. After transferring onto substrates, the hydrated
molybdenum dioxide via laser exposure. In this way, the transferred sheet can serve as a
writing medium that enables direct laser writing of conductive patterns. In addition, the
molybdenum dioxide patterns show optical and electrical response upon bio-stimuli,
The content of this chapter was published as a peer-reviewed scientific paper as Y. Wang,
demonstrated via coating with molybdenum oxide and sulfide. Utilising the surface of
EGaIn particles as a reactive medium, deposition of molybdenum oxide and sulfide shell
are induced, which leads to a core-shell structured microparticles with tunable band
structure and optical properties. The content of this chapter was included in a paper as M.
6
molybdenum oxide and oxysulfide. Submitted to Nanoscale, (2022).
Finally, Chapter 6 of this thesis concludes the outcomes achieved in this Ph.D. research
1.2 Reference
1. Massalski, T. B.; Okamoto, H.; Subramanian, P.; Kacprzak, L.; Scott, W. W.,
2. Allioux, F.-M.; Ghasemian, M. B.; Xie, W.; O'Mullane, A. P.; Daeneke, T.;
3. Sun, X.; Yuan, B.; Sheng, L.; Rao, W.; Liu, J., Liquid metal enabled injectable
biomedical technologies and applications. Appl. Mater. Today 2020, 20, 100722.
D.; Barrow, S.; Dickey, M.; Kalantar-Zadeh, K., Liquid metals: fundamentals
5. Ivanoff, C. S.; Ivanoff, A. E.; Hottel, T. L., Gallium poisoning: A rare case report.
6. Li, C.; Iqbal, M.; Lin, J.; Luo, X.; Jiang, B.; Malgras, V.; Wu, K. C.-W.; Kim,
(8), 1764-1773.
7. Li, C.; Tan, H.; Lin, J.; Luo, X.; Wang, S.; You, J.; Kang, Y.-M.; Bando, Y.;
Yamauchi, Y.; Kim, J., Emerging Pt-based electrocatalysts with highly open
7
nanoarchitectures for boosting oxygen reduction reaction. Nano Today 2018, 21,
91-105.
8. Jiang, B.; Guo, Y.; Kim, J.; Whitten, A. E.; Wood, K.; Kani, K.; Rowan, A.
E.; Henzie, J.; Yamauchi, Y., Mesoporous metallic iridium nanosheets. J. Am.
9. Li, C.; Iqbal, M.; Jiang, B.; Wang, Z.; Kim, J.; Nanjundan, A. K.; Whitten, A.
E.; Wood, K.; Yamauchi, Y., Pore-tuning to boost the electrocatalytic activity of
(14), 4054-4061.
10. Carey, B. J.; Ou, J. Z.; Clark, R. M.; Berean, K. J.; Zavabeti, A.; Chesman, A.
S.; Russo, S. P.; Lau, D. W.; Xu, Z.-Q.; Bao, Q., Wafer-scale two-dimensional
semiconductors from printed oxide skin of liquid metals. Nat. Comm. 2017, 8 (1),
14482.
11. Syed, N.; Zavabeti, A.; Messalea, K. A.; Della Gaspera, E.; Elbourne, A.;
Jannat, A.; Mohiuddin, M.; Zhang, B. Y.; Zheng, G.; Wang, L., Wafer-sized
ultrathin gallium and indium nitride nanosheets through the ammonolysis of liquid
metal derived oxides. J. Am. Chem. Soc. 2018, 141 (1), 104-108.
12. Wang, Y.; Baharfar, M.; Yang, J.; Mayyas, M.; Ghasemian, M. B.; Kalantar-
Zadeh, K., Liquid state of post-transition metals for interfacial synthesis of two-
13. Zavabeti, A.; Ou, J. Z.; Carey, B. J.; Syed, N.; Orrell-Trigg, R.; Mayes, E. L.
H.; Xu, C. L.; Kavehei, O.; O'Mullane, A. P.; Kaner, R. B.; Kalantar-Zadeh,
K.; Daeneke, T., A liquid metal reaction environment for the room-temperature
synthesis of atomically thin metal oxides. Science 2017, 358 (6361), 332-335.
8
14. Ghatak, S.; Pal, A. N.; Ghosh, A., Nature of electronic states in atomically thin
15. Radisavljevic, B.; Radenovic, A.; Brivio, J.; Giacometti, V.; Kis, A., Single-
16. Ganatra, R.; Zhang, Q., Few-layer MoS2: a promising layered semiconductor.
18. Sun, J.; Li, X.; Guo, W.; Zhao, M.; Fan, X.; Dong, Y.; Xu, C.; Deng, J.; Fu,
(7), 198.
19. Li, H.; Wu, J.; Yin, Z.; Zhang, H., Preparation and applications of mechanically
exfoliated single-layer and multilayer MoS2 and WSe2 nanosheets. Acc. Chem.
20. Liu, H.; Wong, S. L.; Chi, D., CVD growth of MoS2‐based two‐dimensional
21. Hou, S.; Zhang, G.; Zeng, W.; Zhu, J.; Gong, F.; Li, F.; Duan, H., Hierarchical
13564-13570.
22. Petnikota, S.; Teo, K. W.; Chen, L.; Sim, A.; Marka, S. K.; Reddy, M. V.;
(17), 10884-10896.
9
23. Alsaif, M. M.; Field, M. R.; Murdoch, B. J.; Daeneke, T.; Latham, K.; Chrimes,
24. De Castro, I. A.; Datta, R. S.; Ou, J. Z.; Castellanos‐Gomez, A.; Sriram, S.;
25. Xing, K.; Xiang, Y.; Jiang, M.; Creedon, D. L.; Akhgar, G.; Yianni, S. A.;
Xiao, H.; Ley, L.; Stacey, A.; McCallum, J. C., MoO3 induces p-type surface
conductivity by surface transfer doping in diamond. Appl. Surf. Sci. 2020, 509,
144890.
26. Scanlon, D. O.; Watson, G. W.; Payne, D.; Atkinson, G.; Egdell, R.; Law, D.,
27. Han, X.; Gerke, C. S.; Banerjee, S.; Zubair, M.; Jiang, J.; Bedford, N. M.;
28. Liu, C.; Luo, S.; Huang, H.; Zhai, Y.; Wang, Z., Direct growth of MoO2/reduced
29. Yang, J.-L.; Zhao, S.-X.; Lu, Y.-M.; Zeng, X.-T.; Lv, W.; Cao, G.-Z., In-situ
68, 104356.
10
30. Han, J. L.; Yang, J.; Tang, J. B.; Ghasemian, M. B.; Hubble, L. J.; Syed, N.;
Daeneke, T.; Kalantar-Zadeh, K., Liquid metals for tuning gas sensitive layers. J.
11
Chapter 2 Literature review
12
2.1 Introduction
In the periodic table of elements, the metallic elements located between transition metals
and non-metallic metalloids are known by different names such as post-transition metals,
p-block metals, poor metals, and chemically weak metals. Several arrangements have
been introduced for the post transitions metals depending on where transition metals and
metalloids begin and end in the periodic table. Usually, post-transition metals are the
group 13–15 metals in periods 4–6 and sometimes group 11 and group 12 metals are also
assumed as post transition metals1, which are otherwise considered to be transition metals
or metalloids. However, all proposals for post transition metals include gallium, indium,
tin, thallium, lead, and bismuth, which are considered as the core members of the post
transition metals.2
Being located at the metal-nonmetal border, the crystalline structures of post transition
metals show covalent or directional bonding effects with more complexity than other
metallic elements. The reduced metallic characteristics in post transition metals are
dominantly attributed to the increasing nuclear charge across the table from left to right.
The accumulating nuclear charges are partially offset by the increasing number of
electrons, but extra electrons are not able to fully screen each successive increase in
nuclear charge. Therefore, the nuclear charge dominates.3 As such, the atomic radii
compress, ionization energies increase, fewer electrons become accessible for metallic
bonding4, and ions shrink and become more prone to covalency.5 These trends are more
obvious for post transition metals in periods 4-6 due to less screening of nuclear charges
Due to their electron configurations, post transition metals show many distinguished
features. In addition to their weak mechanical strength and poor ductility and malleability,
13
the most distinguished characteristic of post transition metals is their low melting points. 7
One of the core members of the post transition metals family, gallium, exhibits a melting
point just lower than 30 ℃,8 meaning it can melt in one’s palm. Upon the formation of
eutectic alloys, the melting points of most post transition metals can drop even further.
which takes on liquid form at room temperature.9 Members of post transition metals form
many eutectic alloys with melting points lower than 330 ℃, which is practically
accessible and easy to handle in safe laboratory environments.7 Furthermore, unlike other
low-melting-point metals, like alkali metals that are super-reactive in the presence of air
and moisture, or mercury which is highly toxic, post transitions liquid metals are
reasonably stable and safer to handle. These characteristics make post transition liquid
metals suitable for various applications like synthesis of materials, catalysis, and
In addition to the intrinsic low melting points of post transition liquid metals, the interface
induced atomic layering renders them perfect media for facile synthesis of two-
extremely flat layer of free electrons at the surfaces of liquid metals.16, 17 This surface
electron layer acts as a hard wall suppressing positional fluctuations of the near surface
ion cores, which leads to their positional ordering. The electron density profiles normal
to the surface are predicted to exhibit characteristic oscillations at the interface, which
decay to the bulk electron density after a few atomic distances.18, 19 This prediction was
This surface layering phenomenon endows liquid metals with atomically flat surfaces,
which make perfect templates for 2D materials synthesis. Upon exposure to oxygen, a
14
thin layer of metal oxide emerges on the surface of liquid metal, which inherits its
atomically flat nature and has been proven to be ultrathin and uniform. 21 The surface
22
oxidation of liquid metals not only has significant effects on their physical properties,
but also provides routes for facile synthesis of 2D materials.23 Thermodynamic laws
govern the surface oxidation of liquid alloys, where the metal oxide with the lowest Gibbs
free energy dominates the surface. Thus, various metal oxide layers can be synthesised
on the surfaces of liquid metals with different compositions.24 The resultant surface oxide
layers are easily transferrable and could serve as precursors for other 2D metal
compounds upon post treatments.25-28 The surface layering phenomenon of liquid metals
was observed not only in vacuum or gaseous environments, but also when they are in
The ultra-smooth surface of liquid metal could also serve at a reactive medium for liquid
Liquid metal provides a super active surface for interfacial reactions that can take place
under catalytic or reductive conditions. In this case, precursors of certain materials can be
Due to the liquidity and non-polar nature of liquid metals, the synthesised surface layers
of 2D nature could be easily exfoliated from the bulk metal by mechanical or chemical
of 2D layers on various substrates.24, 32, 35, 38 When a surface layer comes to the vicinity
of a flat substrate of polar nature, the formation of van der Waals forces between the 2D
material and the substrate, and the minimal forces between the 2D layer and the liquid
core, allow for the transfer of the 2D material.28, 35 Various electronic and optical devices
15
have been developed using liquid metal process induced 2D materials as dielectric layers,
In this chapter, the author discusses the unique properties of post-transition metals based
liquid metals and comprehensively reviews the recent progress of 2D materials synthesis
via liquid metals processes. First, the author introduces the properties and features of these
liquid metals including their intrinsic low melting points, high thermal and electric
materials at the surface of liquid metals are introduced where liquid metals serve as either
precursor or reducing agents. Various extraction and transferring methods are introduced
which can deposit large area 2D materials. Then, applications of these 2D materials in
The content of this chapter was published as a peer-reviewed article in the Journal of
The melting points of metals are affected by several factors such as crystal structures at
solid state, degrees of ionization and the population of electrons involved in the bonding. 10
When the melting point of metals40 are plotted against the group numbers for the three
long periods, a similar volcanic shape emerges which indicate a periodic property of
metals that is in correspondence with their electron and band structures (Figure. 2.1). To
16
some degrees, similar behaviours are found in other properties such as boiling points,
The initial increases in the strength of metallic bonding, as we move from group 1 to 6,
can be explained by the number of valence electrons that the metal can contribute to the
electron sea. The more electrons an atom loses, the larger is the charge of the positive ion
embedded in the electron sea and the greater is the electron probability density of the
electron sea itself. However, this trend cannot continue indefinitely. The more electrons
removed from an atom, the more energy it takes to remove the next electron. Eventually,
more energy is needed to remove an electron from a metal nucleus than is liberated by
placing it in the electron sea. The strength of the metallic bonding thus begins to level off
and eventually drops. In the region where the strength of the metallic bonding drops, due
to the poor screening effect of the d and f orbitals over the nuclear charge, covalent bonds
begin to emerge. For the group 12 elements (Zn, Cd, and Hg), low melting and boiling
points are attributed to their pseudo noble gas electron configurations since electrons
completely fill s and d shells. Therefore, valence electrons of these elements are relatively
inert and present only weak interactions.1, 41 Post transition metals present low melting
points but relatively high boiling points with broad temperature ranges in liquid state. In
the electronic configuration of post transition metals, d and p shells are completely and
partially filled, respectively.42 The unpaired electrons in p shell can generate covalent or
metallic bonds with significant covalent feature for the lighter elements, hence the
contributions of the reactive p shell electrons increase boiling points in the post transition
metals.43
17
Figure 2.1 Melting point of metals of fourth, fifth and sixth periods graphed against
In addition, the degree of delocalization of the valence electrons and the crystal structure
of solid phase determines the melting temperature of metals. Metallic bond occurs in both
solid and liquid states due to the low dimensionality, especially if they do not possess a
Yu and Kaviany carried out ab initio molecular dynamics (AIMD) simulations to explore
the atomic structures of liquid Ga, EGaIn, and eutectic alloys of gallium-indium-tin
(EGaInSn) and the effect of Ga alloying with Sn and In on their electrical, thermal, and
species transport properties.44 Their structures were investigated through the pair
correlation function, g(r), which provided close estimations of the atomic distribution,
average distance, and medium-range order in those alloys. Figure 2.2A presents the
estimated pair-correlation functions g(r) for Ga at both 310 K and 500 K and EGaIn, and
EGaInSn at 310 K.
The average probability of atoms' location at a given distance r from the designated atom
is understood by the variations of g(r). A relatively strong peak followed by weaker peaks
18
are seen in Figure 2.2A as a function of distance, which suggests the existence of strong
interactions in the first shell and reduced long range order. However, alloying of Ga with
Sn and In leads to a height reduction in the first peak and the shift of the g(r) to the right,
indicating the further distribution of atoms in that coordination shells. The shift of the g(r)
also shows the change in the average distance between atoms. By increasing the
temperature to 500 K, the first peak at g(r) shifted to a smaller distance due to distance
reduction between atoms in the first shell. However, it was expected, similar to alloying
with Sn and In, to shift to larger distance because of thermal expansion. This abnormal
peak shift and decrease in the inter-atomic distance can be explained by the redistribution
of the polyhedral clusters, which is a general characteristic for the metallic melts
and alloying affect the first peak shifts in g(r) via different ways. Alloying, for instance
for EGaIn and EGaInSn productions, increases the average distance in the first shell due
to disordered structure, while the redistribution of the polyhedral clusters is the leading
factor at the high temperature. Displacing Ga atoms with larger In and Sn increases the
atomic volume and shifts the first peak positions to the right. Volume per atom
continuously increases to 19.01, 20.11, 20.99 Å3/atom for Ga, EGaIn, and EGaInSn,
respectively.
As shown in Figure 2.2B, in EGaInSn, the charge density is higher between Ga atoms
indicating a stronger force field among Ga atoms compared to In and Sn. Especially, the
charge density near the In atoms is significantly small which explains the dominant role
of In in reducing the electrical transport properties in Ga alloys containing In. In the case
of Hg, electrons in the low energy orbitals are strongly bound to the atom, which results
in a low melting temperature.41 Electrons distribution around the Sn and In atoms are
comparable to Hg. As such, EGaIn (288.65 K) and EGaInSn (283.65 K) show lower
19
melting points than Ga (303 K). The weak interactions of atoms induced by the In and Sn
in EGaInSn are more clearly illustrated in the isosurface charge density Figure 2.2C. The
study of partial pair distributions functions, gi(r) revealed that the inter-atomic distance
among Ga atoms in EGaInSn is similar to liquid Ga and smaller than those inter-atomic
distances involving the In and Sn atoms, as shown in Figure 2.2D. The larger atomic
volume of In and Sn leads to the disordered structure in EGaInSn by expanding the cell
Gallium in a liquid state renders a higher electrical conductivity than solid. The variation
metals is much higher than other liquids.46 Electrical and thermal conductivities in liquid
Ga-based alloys originate from their electron-rich bulk.47 AIMD simulations using Kubo-
Greenwood (K-G) and the Ziman-Faber (Z-F) formulations have been performed to
predict the electrical conductivity, σe, of liquid Ga, EGaIn, and EGaInSn as a function of
temperature. This decrease arises from the disordered structures and weak inter-atomic
interactions due to the incorporation of Sn and In in EGaIn and EGaInSn (Figure 2.2B
and C). The effect of alloying on the electrical conductivity reduction of pure liquid
metals can be explained by Matthiessen’s rule. A size mismatch occurs in alloyed metals.
This size mismatch leads to a higher degree of structural disorder and weaker interatomic
interactions 48, 49, as shown in Figure 2.2B for Ga alloying with In and Sn.
20
Interestingly, Hg shows a lower electrical conductivity than Ga at room temperature
(1.04 106 Ω-1m-1). The electrical conductivity of Hg increases by alloying with most
metallic elements, such as In, Tl, Zn, and Pb.50 In contrast, electrical conductivity of other
The electrical conductivity of pure liquid metals and alloys decreases with increasing
travelling electrons increase which leads to a less efficient charge transport due to the
scattering of the electrons out of their original paths.47 Electrical conductivity at a given
temperature coefficient of the electrical conductivity, σe and σeR are the electrical
conductivities at temperatures T and TR, respectively. Here R denotes the values for room
temperature.51
The solid-liquid phase transition has a significant effect on the electrical conductivity of
metals and alloys. The electrical conductivity exhibits a jump or discontinuity at the verge
of melting point and drops by a degree of ~1.5−2.3 for most of the normal metals just
below the melting point. This reduction at the transition stage is attributed to the more
disordered arrangement of the ions in the liquid state.52 However, certain abnormal metals
including Ga, Bi and Sb, which are rather poor conductors in the solid state, exhibit a different
trend and increase their conductivity upon melting.53 This anomalous behaviour is related
21
2.2.3 Thermal conductivity
The thermal and electrical conductivities of metals are closely related, and both involve
anisotropic in the solid state.55 In the case of liquid metal, the total thermal conductivity,
kt, in liquid metals can be defined as the sum of molecular liquid thermal conductivity, kf,
and the electronic thermal conductivity, ke, where ke takes a dominant role.56 Unlike
electronic thermal conductivity (ke) and electrical (σe) conductivities are linked
quantitatively through the Wiedemann−Franz (W-F) law, ke/ σe =LT, where L and T are
In contrast to liquid Hg with low thermal conductivity (8.5 W m-1K-1 at 292.15 K)59,liquid
temperature range of 293.3–348.3 K, which is higher than typical nonmetallic liquids due
to the low compressibility44 and high sound speeds24 in liquid metals kf is mostly
dominated by the Ga-Ga interactions, which is why the value of kf for liquid EGaIn and
EGaInSn is close to liquid Ga. Considering that ke is much larger than kf in liquid Ga and its
alloys, ke more strongly dictate kt variations in these liquid metals. The effect of Ga
alloying with In and Sn on kt follows the interpretation of the σe. As shown in Figure 2.2F,
the kt drops from that of Ga to lesser values for EGaIn and EGaInSn due to the more
disordered structures, which hinder the electrons transports and decrease electrical and
thermal conductivities. The thermal conductivity of Ga reduces upon alloying to 26.4 and
Cu–Al, Ag–Ga, Ag–Ge, Cu–Pb, In–Mn, Ga–Ge and Sn–Bi bimetallic alloys were
obtained using the electrical resistivity, thermoelectric power data, and the relations
between the transport coefficients simplified using W–F law. The calculations for the
pure metals presented a close match with the experimental results. In terms of alloys, the
thermal conductivities correlate with their composition. As shown in Figure 2.2H, those
liquid metal alloys showed either a monotonically decreasing thermal conductivity with
23
Figure 2.2 (A) Predicted pair correlation function for liquid Ga, EGaIn, and EGaInSn at
310 K and for Ga also at 500 K. (B) predicted partial radial distribution function, gi(r) for
liquid EGaInSn at 310 K. (C) Contours of charge densities for liquid EGaInSn at 310 K.
(D) Structure of the liquid EGaInSn at 310 K. (E) the variations of electrical conductivity
with respect to temperature obtained for liquid Ga, EGaIn, and EGaInSn through K-G
and the Z-F treatments compared to some experimental results. (F) The predicted
variations of the total thermal conductivity with temperature for liquid Ga, EGaIn, and
EGaInSn and comparison with the experimental results.62 "Reprinted with permission
from Yu et al., J. Chem. Phys. 140, 064303 (2014). Copyright 2014, AIP Publishing.44
(G) Temperature dependence of thermal conductivity for liquid Galinstan. Open circles
and dashed lines indicate the experimental data and values obtained by the W-F law,
respectively. Filled and open triangles are literature values60 for comparison. Reprinted
with permission from Plevachuk et al., J. Chem. Eng. Data 59, 757 (2014). Copyright
concentration for Sn–Bi, Ga–Ge, Ag–Ge, Cu–Al, In–Mn and Cu–Pb alloys . Reprint with
permission from Giordanengo et al., J. Non-Cryst. Solids 250, 377 (1999). Copyright 1999,
Although the bulk of liquid metal is generally not structured (shows no long-range or
tends to present on its surface, which is associated to ‘surface layering’ phenomenon. This
phenomenon in fact lays the very foundation that allows the implementation of liquid
metals, with their intrinsically atomically flat surfaces, for synthesising and templating
2D materials. The existence of these surface layers was first theoretically predicted in the
24
early 1980s.16, 17
The surface induced atomic layering of liquid metals was initially
observed in liquid gallium19 and mercury18 and was found later in other metals in liquid
states including In63 K64 Sn65, 66, as well as various liquid metal alloys.67 X-ray reflectivity
measurement and X-ray diffuse scattering was used for the characterization of the surface
schematically illustrated in Figure 2.3A. kin and kout are the wave vectors of the incident
and reflective beams, respectively, while q is the wave vector transfer that consists of the
incident angle and the reflection angle change simultaneously at the same rate. In
this case, the in-plain momentum transfer qxy remains zero, and the reflectivity can be
plotted against qz. However, in the X-ray diffuse scattering geometry, the incident angle
remains constant, while the detection angle varies within the y-z plane.
The X-ray reflectivity measurement is based on equation (2.1)68 which related the
reflectivity R( ) to the surface normal electron density profile e (z). In this expression,
RF ( ) is the theoretical Fresnel reflectivity of X-rays incident to an ideal flat surface, and
e
(∞) is the average electron density in the bulk. The local structure factor of the surface
Fourier transform. As shown in Figure 2.3B, the X-ray reflectivity measurement of liquid
gallium shows a distinct quasi-Bragg peak at qz=2.4 Å-1, which indicates a surface
induced atomic layering.20 The electron density profile inserted shows oscillations at the
gallium-vacuum interface decaying to the bulk, which agrees with the X-ray reflectivity
results. A similar phenomenon was observed in other liquid metals like Hg, Sn, and In.
25
∞ d〈 e (z)〉
1
R( ) ≈ RF ( ) dz eiqz z ≡ RF ( )| (𝑞 )| (2.1)
e
(∞) -∞ dz
18, 19
Surface layering was observed not only in liquid metals with high surface tension ,
but also in low-surface-tension liquid metals like potassium 64, whose surface tension is
around 100 N m-1 and comparable with that of water. The surface layering of liquid metal
could be attributed to the unique electronic structure of metallic liquids and the steep
Interestingly, surface layering of liquid metals was not only found when in contact with
vapor, but also with other liquids or flat solid surfaces. In 1997, surface structure of liquid
gallium was investigated by S. A. de Vries et al. when it is in contact with the (111)
surface of diamond.70 The measured X-ray reflectivity shows a broad oscillation which is
interface was also found to be layered. The X-ray reflectivity of liquid mercury (Hg) and
sodium fluoride (NaF) solution shows a peak at 2.2 Å−1 (Figure 2.3D), indicating a layered
structure of liquid Hg surface (Figure 2.3C).71 In addition, liquid metals’ surface structure
could be tuned by altering the composition and the concentration of the electrolyte or
applying bias upon the interface.29 This observation indicates that liquid metals exhibit
an atomically flat surface when in contact with other liquids, which lays the foundation
Other than surface layering, distinctive surface properties are observed in liquid alloys
like surface segregation72 and surface freezing.31 Surface segregation in liquid alloys
refers to the enrichment of one of the components at its surface, leading to different
chemical compositions between the surface and bulk. When the liquid metal is composed
with multiple components with different surface energies, Gibbs’ adsorption rule predicts
that the components with lower surface energy tend to segregate at the surface. In many
26
cases, the surface segregation coexists with surface layering in liquid alloys. For example,
in case of Ga–In,21 Ga–Sn,73Ga–Bi,74, 75 and Bi-Sn alloys76, the first surface layer is
dominated by the lower surface energy component (In, Sn or Bi) despite its low
concentration in bulk. In the following atomic layers, the bulk composition begins to
emerge. For other compositions of alloys, segregation into distinct crystal morphologies
can be observed during solidification. 77, 78 For some alloys, at a temperature slightly above
the melting point, the formation of a solid crystalline layer could be observed at their
surface, which is called surface freezing or surface crystallization. One of the examples
of surface freezing is seen in eutectic Au-Si alloys, which was verified by grazing
Figure 2.3 (A) Schematic illustration of the experimental geometry setup of X-ray
permission from Shpyrko et al., Phys. Rev. B 67, 115405 (2003). Copyright 2003,
27
American Physical Society.64 (B) The X-ray reflectivity measurement of liquid gallium,
with the inset surface-normal electron density profile. Reprinted with permission from
Pershan et al., J. Appl. Phys. 116, 222201 (2014). Copyright 2014, AIP Publishing.20 (C)
Schematically illustration of the layered surface structure and electron density profile
normal to the interface. (D) X-ray reflectivity measurement of the interface between
liquid Hg and 0.01 M NaF solution at a potential of 0.28 V relative to the potential of zero
charge. The peak at 2.2 Å−1 indicates Hg surface layering. Profiles of the reflected beam
at different qz positions (1.6, 1.8, and 2.2 Å−1) are displayed in the inset. Republished with
permission from Murphy, et al., Nanoscale 8, 13859 (2016). Copyright 2016, Royal
Society of Chemistry.71
Liquid metals are highly reactive and rapidly oxidized in the presence of ambient oxygen
which is widely used for the fabrication of 2D metal oxides.15 Many metals follow a
similar oxidation behaviour at sufficiently low temperature with an extremely rapid initial
oxidation rate which drops to low and negligible values after a short time. The formation
of stable oxide films at low temperature was explained by Mott et al.79 stating a strong
field across the oxide film resulted from different contact potentials between metal and
adsorbed oxygen. In such cases, the electrons of the metal move from the inner core
through the tunnel effect and are transferred to the adsorbed oxygen. As a result, the
between the oxide-metal and oxygen-oxide interfaces, as shown in Figure 2.4A.80 The
subsequently generated electric field significantly reduces the energy barrier for metal ion
diffusion through the oxide layer. As a result, the part of oxidation rate, determined by
28
the transfer of metal ions increases, promoting the growth of the oxide skin. Based on the
Cabrera-Mott model80, the equation 1/X = A B ln t (where X is the thickness of the oxide
film, t is the oxidation time, and A and B are the integration and rate constants,
respectively) holds the relation between the oxidation time and the thickness of the oxide
layer indicating that the oxide thickness increases with the oxidation time. The oxidation
rate drops with increasing oxide layer thickness and reaches a negligible rate at a critical
oxidation kinetics of liquid metals and liquid alloys. 81 It was described previously that the
reflectivity measurements give information about the laterally averaged electron density
profile along the surface normal. The finite jump in the electron density at the metal-oxide
layer interface drives reflectivity oscillations and the layer thickness can be determined through
fixed, indicating a constant thickness of oxide layers on liquid gallium. However, the
increasing intensity from the minimum oxygen dose to the maximum indicates the
expanding oxide coverage on the surface of liquid gallium. As Shown in Figure 2.4C, the
surface normal electron density profile, deduced from the X-ray reflectivity measurement
(bottom), agrees perfectly with the proposed atomic arrangement in the oxide layer. The
gallium oxide plane consists of alternating layers of Ga3+ and O2- ions, terminated by an
O2- layer, revealing a self-limiting oxide skin with a thickness of ~5 Å. In the absence of
any external perturbation, this dense and homogeneous shell perfectly isolates the bulk
where the oxide layer grows and thickens continuously as the formed oxide skin is
unstable, porous, and unable to prevent the liquid metal from further oxidation 83-86 The
oxidation kinetics and the change in the oxide thickness of Ga0.93Hg0.07 with time and
temperature were explored by in situ X-ray reflectivity technique and were compared
with Ga.81 It was found that the logarithmic growth behaviour can be observed for
ultrathin oxide films well below 40 Å. As shown in Figure 2.4D, the thicknesses of the
oxide layers grow with time at each temperature and are in agreement with the logarithmic
kinetics. The thickness of the oxide on liquid Ga exceeds that on Ga0.93 Hg0.07, (Figure
2.4E) due to a higher activation energy for the oxidation of the alloy.
In liquid metal alloys, selective oxidation occurs if the alloy is composed of metals with
different reactivities. In this case, the reactive metal preferentially oxidizes and dominates
the surface of the liquid alloy. According to the thermodynamic law, the surface of an
alloy is covered by metal oxides which cause the greatest decrease in the Gibbs free
energy.24 For example, the surfaces of gallium-based alloys such as EGaIn and Galinstan
are covered by Ga2O3 since gallium is the most reactive component in the alloy. In
contrast, competitive oxidation occurs if the metals are equally or similarly reactive, and
a mixed metal oxide is created on the surface of the liquid alloy, while the priority of the
surface oxidation may be determined by other factors such as surface energy. Therefore,
tuning the composition of liquid alloys regulates the composition of the formed oxide
30
Figure 2.4 (A) Two spherical configurations with different component layouts for the
Alexandre et al., Chem. Phys. Lett., 505, 47 (2011). Copyright 2011, from Elsevier.80 (B)
oxygen. At the oxygen dose of 800 L, the sample temperature was increased from 25 to
300 ˚C without an observable change in the reflectivity. (C) Real-space models for the
proposed atomic arrangement in the oxide layer of Ga (top), and the corresponding
electron density profile with its separate components (bottom). Reprinted with permission
from Regan et al., Phys. Rev. B 55, 10786 (1997). Copyright 1997, from American
Physical Society.82 (D) The thickness of the oxide layer on Ga0.93Hg0.07 plotted against
time. (E) The growth rate of oxide film on liquid Ga compared to Ga 0.93Hg0.07 at similar
temperatures. Reprinted with permission from Plech et al., J. Condens. Matter Phys. 10,
Surface oxidation of liquid metals offers unique opportunities for the synthesis of 2D
materials. When the surface oxide layer is stable and homogenous, it would passivate the
surface of liquid metals and hinder its further oxidation, which is described by the
Cabrera-Mott kinetics.79 When the surface oxidation does not follow the Cabrera-Mott
kinetics and the oxidation layer grows continuously, growth of the monolayer metal oxide
could be achieved by lowering the oxygen concentration in the ambient or shortening the
reaction time.87, 88 In the case of liquid alloys, competitive surface oxidation may occur,
and the alloy surface is then dominated by metal oxide whose formation is the most
(like hydrogen sulfide) in the ambient could expend this method to other 2D metal
compounds other than oxides. The resultant 2D material could be easily exfoliated due to
could transfer the uniform 2D materials at a large area on a secondary substrate, while
utilising bubbling or sonication could produce nanoflakes of the metal compound with
In many cases, the oxidation of liquid metals in air/oxygen follows the Cabrera-Mott
kinetics and exhibits fast initial oxidation rates, which rapidly decrease to negligible rates
due to the slow mass transfer through the dense metal oxide layer. Thus, the growth of
oxide layer is self-limiting, which results in ultrathin, uniform and smooth and
transferable metal oxides films at ease. The most typical example of Cabrera-Mott
oxidation is gallium, which was discussed in detail in the previous section. Liquid gallium
has been widely utilised for room temperature deposition of wide bandgap semiconductor
32
gallium oxide (Ga2O3).89, 90 (Figure 2.5A-C) Other than gallium oxide, the Cabrera-Mott
oxidation has been used for the synthesis of other metal oxides in a large area such as lead
Figure 2.5 Self-limiting growth of oxide surface layer on liquid metal for 2D-metal oxide
deposition (Ga2O3 and ZnO) (A) Large-area 2D Ga2O3 amorphous layer deposited on the
2-inch Si-SiO2 substrate. (B) Schematic diagram of the atomic model describing the
structural transformation of the 2D Ga2O3 amorphous layer to the 2D β-Ga2O3 crystal via
2D crystalline Ga2O3 crystal image. The selected area electron diffraction (SAED) pattern
is inserted. Reprinted with permission from Li et al., Chem. Mater. 33, 4568 (2021).
homogenous millimetre-scale ZnO sheet deposited on Si-SiO2 wafer (scale bar: 100 m).
33
(E) Atomic force microscope (AFM) image of a 0.6-nm-thick ZnO sheet (scale bar 500
nm) (F) AFM image of a 1.1-nm-thick ZnO sheet (scale bar: 4 m) (G) TEM image of a
ZnO sheet showing preferred growth direction in wurtzite phase of ZnO (scale bar: 1 nm).
Reprinted with permission from Mahmood et al., Mater. Today 44, 69 (2021). Copyright
2021, Elsevier.92
In other cases, such as the oxidation of liquid Sn, In and Bi, oxidation results in porous
or unstable oxide layer that’s unable to prevent further oxidation, and the surface oxide
layers grow continuously.87, 88, 93 In these cases, thickness and morphology of the planar
metal oxide vary with the reaction time and ambient oxygen concentration, while
monolayer and uniform metal oxide sheet could be achieved by precise control of these
reaction conditions. For example, when exposed to air, the surface of liquid tin goes
through a progressive colour change as the continuous oxidation process leads to surface
oxide colour due to optical reflections and absorption of different thicknesses and various
stoichiometries. Upon exposure to air, a monolayer tin oxide (SnO) sheet instantly forms
on the surface of molten tin, which goes through further oxidation into SnO 2, Sn2O3, and
Sn3O4 as the uniform sheet breaks into small islands. The breakage of the initial SnO
sheet results in exposure of molten tin surface underneath, and the oxidation process goes
on, leading to thicker films composed of tin oxide islands laying on top of each other.
Therefore, different reaction durations lead to tin oxide layers of different colours,
100 ppm) could significantly decrease the oxidation rate of molten tin and result in a
highly reproducible deposition of uniform and large area SnO (Figure 2.6F-I). 87 Similarly,
34
an atmosphere of reduced oxygen concentration (10-100 ppm) was utilised for the
Figure 2.6 Deposition of oxide tin oxide and bismuth oxide layer on liquid metal under
controlled oxygen concentration (e) (A) Schematics presentation of tin oxide layers of
different thickness, morphology and colour obtained by exposing molten tin to ambient
air at different times. (B-E) TEM images of fresh, yellow, pink, and grey tin oxides
obtained with different reaction times. Reprinted with permission from Atkin et al., Chem.
Commun. 54, 2102 (2018). Copyright 2018, Royal Society of Chemistry. 93 (F) TEM
and (H) High-resolution TEM image of a sample synthesised under reduced oxygen
conditions, inset features the Fast Fourier Transform (FFT) image of the High-resolution
TEM micrograph. The FFT image has been indexed to SnO. (I) AFM image of tin oxide
synthesised under reduced oxygen conditions. Step heights at the red and blue lines are
1.1 nm and 0.4 nm, respectively. Reprinted with permission from Daeneke et al., ACS
Nano 11, 10974 (2017). Copyright 2018, American Chemical Society. 87 (J) AFM
topography of touch printed Bi2O3 layer inside a controlled environment where oxygen
concentration is below 100 ppm. (K) TEM image of a Bi2O3 monolayer (synthesised
where oxygen concentration below 100 ppm) using a holey carbon TEM grid as a
substrate. (L) High-resolution TEM demonstrating the crystallinity of the ultrathin nano-
sheets of Bi2O3 with the planar spacing indicated. (M) The corresponding FFT image of
the area. Reprinted with permission from Messalea et al., Nanoscale 10, 15615 (2018).
For liquid metal alloys, selective oxidation occurs where the compound with higher
reactivity is preferentially oxidized, and its metal oxide dominates the surface of the liquid
alloy. It was governed by the thermodynamic law that the surface of an alloy is dominated
by metal oxide with the lowest Gibbs free energy. For example, the surfaces of the
gallium-based eutectic alloys such as EGaIn and Galinstan are covered by Ga2O3 since
its formation leads to a greater decrease in Gibbs free energy than indium or tin oxide.
Therefore, gallium-based eutectic alloys, such as EGaIn, could also be used for the
deposition of 2D-Ga2O3, and yield Ga2O3 with high purity and quality.90 Similarly, Al2O3,
Gd2O3 or HfO2 could be harnessed from the surface of gallium based alloys, even at bulk
materials that are not intrinsically layered, and therefore, cannot be produced as
In the case of indium-tin alloy, the surface oxidation leads to a ternary compound that
contains both indium and tin oxides, which enables low temperature deposition of indium
tin oxides (ITOs), a commonly used transparent conductive oxide.38 Due to the solubility
of tin ions in indium oxide, the formation of ternary ITOs is more thermodynamically
favourable than pure In2O3 or SnO2. Squeeze printing of indium-tin alloys at room
substrates including the flexible and heat-sensitive polymer substrates. The resultant ITO
sheets were highly transparent and remained in good conductivity upon elastic
deformation. It was also presented that multiple depositions of the ITO layers could be
achieved.
The surface oxidation of liquid metals offers highly versatile approaches for 2D materials
synthesis that are not limited to the original metal oxides. These as harvested 2D metal
oxide layers can be transformed via post treatments which expands this method to other
2D metal compounds.25 For example, touch printed gallium oxides were exposed to
Similarly, gallium oxide sheets can go through sulphuration or nitridation processes and
transform into 2D GaS94, Ga2S326 (Figure 2.8A-C) and GaN27 (Figure 2.8D-F),
37
respectively. Similarly, using liquid indium induced indium oxide (In 2O3) as precursor,
Figure 2.7 (A) Gibbs free energy of formation for selected metal oxides. Oxides to the
right of the red dashed line are expected to dominate the surface of gallium based liquid
metals. (B) A cross-sectional diagram of a liquid metal droplet, with possible crystal
structures of thin layers of HfO2, Al2O3, and Gd2O3 as indicated. (C) TEM images, high
resolution TEM images, and SAED patterns of liquid alloy induced Ga2O3, HfO2, Al2O3,
and Gd2O3 sheets. Reprinted with permission from Zavabeti et al., Science 358, 332
(2017). Copyright 2017, The American Association for the Advancement of Science.24
38
In addition to post treatment of the initial oxide skin of liquid metal, 2D metal compounds
could be directly synthesised via exposing liquid metal to reactive gases other than
oxygen such as hydrogen sulfide (H2S), which further expend the applicability of this
method. For instance, 2D tin sulfide (SnS) could be synthesised by exposing liquid tin to
H2S gas.96, 97 (Figure 2.8G and H) Concentration of H2S (even at parts per million levels),
flow rate and temperature were carefully controlled to ensure the purity and uniformity
It was discussed that surface oxidation of liquid metal provides a facile and versatile
approach for 2D materials synthesis. However, this route is limited to post transition metal
approach is to bring appropriate liquid precursors in contact with liquid metal surfaces.
In this case, with reactive liquid metals, as reducing agents, galvanic replacement
reactions occur at the interface, and deposit the desired materials on the surface of liquid
metal. Standard electrode potentials of redox couples can be used for designing the
interfacial redox system and predicting the possible interfacial products. In this way, a
39
Figure 2.8 Synthesis of metal sulfide and metal nitride via liquid metal processes. (A)
Schematic illustration of the sulphuration process of gallium oxide in a tube furnace. (B)
Optical microscopy image of gallium sulfide sheet on a Si-SiO2 wafer. (C) High-
resolution TEM image of the resultant Ga2S3 showing the d-spacing of 0.319 nm which
agrees with the (020) plane of 2D-Ga2S3. Reprinted with permission from Zavabeti et al.,
ACS Appl. Mater. Interfaces 2, 4665 (2019). Copyright 2019, American Chemical
Society.26 (D) Synthesis process of the 2D GaN nanosheet from 2D Ga 2O3 using
ammonolysis. (E) Optical microscopy image of the synthesised GaN on a Si-SiO 2 wafer.
(F) TEM micrograph of a GaN thin film. The top inserted represents the lattice fringes,
and the lower inserted shows the FFT patterns. Reprinted with permission from Syed et
al., J. Am. Chem. Soc. 141, 104 (2019). Copyright 2019, American Chemical Society.27
(G) Schematic depiction of the synthesis process, monolayer of SnS and its application
on a nanogenerator transducer. (H) The high-resolution TEM images of the SnS sheet
with the SAED pattern inserted. Reprinted with permission from Khan et al., Nat.
40
wider selection of materials could be templated at liquid metal surface, including
compounds of metals which are not soluble in Ga at low temperature 34, 35 or metals oxides
oxide,33 or even non-metal-based materials like carbon.32, 98, 99 Due to the existence of
native oxide skin, liquid metal droplets need to be washed with acid or alkaline solutions
to expose their fresh and reactive surface first. In terms of extraction and transfer of the
resultant materials, similar touch transfer techniques could be used for extraction of thin
layers of the deposited materials. Alternatively, in some reaction systems, the deposited
nanosheets could delaminate themselves from the liquid metal surface and be collected
directly from the solution around the liquid metal droplet. It is noteworthy that the
morphologies of the deposited materials on the surface vary greatly with the reaction
systems, as well as the reaction conditions (temperature, pH) and duration of the reactions.
In many cases, short reaction time leads to initial growth of a uniform layer of target
materials of a few nanometres thick templated on the ultra-smooth surface of liquid metal.
With longer reaction time, it results in either continuous growth and thicker smooth
could be used for deposition of manganese oxide film on the surface of EGaIn droplet
= 1.697 V versus standard hydrogen electrode (SHE). In contact with gallium based liquid
metal, the elemental gallium at the interface is oxidized into gallium cations and serves
into solid MnO2 at the interface. Due to the non-polar nature of liquid metal and the fact
that the produced hydroxide ion can dissolve gallium oxide and hydroxide, the resultant
41
the deposition of molybdenum dioxide (MoO2) on the surface of liquid metal with the
MoO2 layers on the surface of EGaIn droplets. In this system, the increased reaction time
leads to continuous growth and increased thickness of the resultant hydrated molybdenum
dioxide (H2MoO3) sheets that remain smooth and uniform. Utilising the touch-printing
process, the deposited sheets could be transferred onto various substrates. Here the
deposited amorphous molybdenum hydroxide sheets were dehydrated and crystallized via
Other than galvanic replacement, surface of liquid metals can serve as templates for non-
redox depositions as well. For example, when copper sulfate (CuSO4) solution is used as
precursor, possible deposition products on liquid metal surface are cuprous oxides (Cu 2O)
and cupric oxide (CuO), which are products of galvanic replacement and non-redox
deposition, respectively.33 Ratio of two products in the deposited film varies with reaction
conditions like pH and concentration of the precursor, and careful control of these
precursors. (A) TEM image (B) High-resolution TEM image and (C) AFM image of the
resultant MnO2 nanosheets. Reprinted with permission from Ghasemian et al., Adv. Funct.
Mater. 29, 1901649 (2019). Copyright 2020, John Wiley and Sons. 36
42
Other than utilising the intrinsic built-in potential at the surface of liquid metal, an
external voltage could be applied to induce interfacial redox reactions. For instance, 2D
graphitic sheets were templated on the surface of liquid alloy by the voltage-induced
metals.32
In addition to inducing redox reaction, an external voltage applied on the liquid metal
droplet can also induce changes in its surface tension according to Lippman’s equation
1
0
− = C (V − V0 )2 . where V is the applied potential, V0 in the intrinsic voltage at the
2
droplet immersed in electrolytic solution can initiate rhythmic pulses that mimic the
heartbeat, and be used for nano materials synthesis at the surface of liquid metal. (Figure
2.10A) For example, when rhythmic pulses were induced in a Ga-Zn droplet by a square
wave voltage signal, the oxidizing potential flattens the liquid metal droplet and helps
with the formation of zinc oxide materials on its surface, and the reducing potential
induces constriction of the liquid metal droplet and helps exfoliating zinc oxides from its
interface.100 In this way, the liquid metal droplet works as a continuous reaction medium
Most recently, Mayyas et al. has observed that the modulation of the interfacial tension
of the liquid-liquid interfaces of liquid alloys (e.g., gallium–bismuth binary liquid alloy)
can trigger phase separation in the alloy where solute metals (i.e., bismuth) precipitate as
solid nanoclusters from the interface.101 Here, the interfacial tension was modulated via
electrocapillary, and the bismuth precipitation was triggered at cathodic potentials more
negative than -2.2 V versus saturated calomel electrode (SCE). Adjusting the electrolyte
43
chemistry could obtain different types of bismuth-based nanostructures including bismuth
metal nanostructures and several bismuth oxides such as monoclinic (α), tetragonal (β),
and body-centered cubic (γ) Bi2O3. Several morphologies were obtained including
smooth γ-Bi2O3 nanosheets were produced in a 0.10 M NaOH-1.0 M KCl aqueous system
Figure 2.10 Synthesis of nanoflakes and nanosheets via external square wave potential-
induced pulsing of a liquid metal droplet. (A) GaSn droplet behaviour under a polarizing
voltage signal of ±5.0 V in 0.50 M NaOH. (B) Graphical representation of the ZnO
formation and its ejection from the surface of the Ga-Zn under a square wave potential.
(C) The high-resolution TEM image of the resultant ZnO nanoflakes obtained under a
square wave potential. Reprinted with permission from Mayyas et al., ACS Nano 14,
14070 (2020). Copyright 2020, American Chemical Society.100 (D, E) TEM images of
the lattice planes (220) and (200) of γ-Bi2O3 (scale bar: 1.0 nm). (G) FFT pattern showing
44
the main crystallographic planes of the γ-Bi2O3 (scale bar: 5 1/nm). (H) AFM analysis
and thickness profile of the 2D γ-Bi2O3 (scale bar: 0.5 µm). Reprinted with permission
from Mayyas et al., Adv. Funct. Mater. 32, 2108673 (2021). Copyright 2020, John Wiley
and Sons.101
In summary, galvanic replacement and deposition at the surface of liquid metals provide
considered that in some cases, the deposition on the liquid metal surface starts with crystal
nucleus and no uniform thin sheet forms.102 Although one could gain some degree of
morphology control via tunning the pH of precursor or other reaction conditions, the
control of the morphology of deposited films is yet to be achieved in most of the systems,
Due to the non-polar nature of liquid metals, the templated 2D materials on the surface
of liquid metals weakly adhere to the parent metal, which makes the exfoliation possible.
like metal oxide synthesised by exposing liquid metal to air, various exfoliation and
liquid metal droplets on the substrates can lead to centimetre scales deposition of 2D
layers on smooth substrates, while bubbling gas into liquid metals can yield 2D flakes at
or could be touch-transferred.
Touch transferring process is commonly used for large area transferring of the metal oxide
24
layers onto desired substrates, which was schematically illustrated in Figure 2.11A.
When the smooth substrate is brought into contact with the metal oxide layer, the liquid
metal underneath acts as a soft cushion, and an atomic-scale contact between the metal
oxide layer and the substrate could be realized. The close contact induces accumulative
van der Waal interactions between the permanent dipoles of metal oxide layer and the
substrate, which leads to adhesion between them. On the other hand, due to the non-
polarity nature of liquid metal, only weak forces are expected between the metal and its
interfacial oxide layer, which means the bulk liquid metal could easily separate from the
metal oxide layers upon lift-off with the metal oxide layers remains on the substrates. It
independent. As long as the substrates and surface layers are smooth, which is favourable
for an atomic-scale contact over a large area34 between them, large area extraction and
polydimethylsiloxane) and planar materials (Ga2O3, ZnO, PbO). For obtaining high
control and enhancing the quality of the harvested 2D layers, program-controlled piezo-
electric stages can be utilised for the touch-transfer process since they provide more
Similar to the previously discussed touch-printing method, rolling a liquid metal droplet
(Figure 2.11C) on a substrate or squeeze printing (Figure 2.11D) allows deposition of the
metal oxide layer at centimetre scales. Squeeze printing involves placing a small liquid
metal droplet in between the desired substrate and squeezing them to expend the liquid
metal droplet in the middle. When the Cabrera-Mott kinetics governs the oxidation of the
46
liquid metal, the initial oxidation layer grows fast as the liquid metal droplet expends
upon squeezing, which allows a large area deposition of uniform and ultrathin metal oxide
layer. Utilising this method, conductive ITO was deposited on various substrates. 38
The aforementioned transfer processes are versatile and not limited to monolayer metal
Additionally. Deposit one metal oxide sheet on the top of another can lead to 2D van der
deposition of metal oxides on selective areas is possible, which can be utilised for
electronic device fabrication. Functionalization of the substrates, which tunes the surface
energy, offers control of the surface adhesion and transferring process. For example,
selective area deposition of Ga2O3 can be achieved by functionalizing the Si-SiO2 wafer
decoration of Si-SiO2 wafer is known to decrease its surface energy and make it less
adhesive. In this way, Ga2O3 could be selectively deposited onto the non-functionalized
bubbling air. This method can be used in applications such as catalysis and energy
storage, where a high yield of the products is needed. As shown in Figure 2.11E, a solvent
is placed on top of liquid metal. As the air is injected into liquid metal, an oxide layer
rapidly forms at the liquid metal-air interface. The air bubbles raise in the bulk liquid
metal due to gravity gradient, carrying the oxide layers through the liquid metal-solvent
interface, bursting and leaving the metal oxide sheets as a colloidal suspension. 24
Interestingly, the morphology and composition of metal oxide sheets can be tuned by
47
In some cases, where a reactive metal compound is alloyed with a room temperature
liquid metal, aqueous solvent can serve as an oxidizer leading to the exfoliation of the 2D
aluminium reacts with water at the interface, producing aluminium hydroxide (Al(OH) 3)
and H2 gas.37 The resultant Al(OH)3 nanosheets are exfoliated from liquid metal surface
Figure 2.11 Various extraction and transfer process of the oxide skins of liquid metals:
brought into contact with the oxide surface-bearing liquid metal droplet. Reprinted with
permission from Zavabeti et al., Science 358, 332 (2017). Copyright 2017, The American
48
Association for the Advancement of Science.24 (B) touch-transfer technique conducted
et al., Adv. Mater. 32, 2001997 (2020). Copyright 2020, John Wiley and Sons.32 (C)
deposition of TeO2 by rolling a droplet of Te-Se alloy on the substrate. Reprinted with
permission from Zavabeti et al., Nat. Electron. 4, 277 (2021). Copyright 2017, Springer
Nature.106 (D) depositing ITO via squeeze-printing. Reprinted with permission from Datta
et al., Nat. Electron. 3, 51 (2020). Copyright 2020, Springer Nature.38 and (E) exfoliating
metal oxide layer via gas injection. (F) Photographs of the bubble carrying the metal oxide
surface bursting through the liquid metal-water interface. (G) An optical image of the
resultant metal-oxide sheets drop-casted onto a Si-SiO2 wafer (right). Reprinted with
permission from Zavabeti et al., Science 358, 332 (2017). Copyright 2017, The American
We learned that liquid metals provide new routes for low-temperature, facile synthesis of
uniform, large area, and ultrathin 2D materials. Using this approach, materials have been
synthesised in a stable 2D form that were otherwise considered challenging with other
2D semiconductors were used as channel materials for field effect transistors (FETs),
materials. Insulating and conductive 2D materials were also harnessed from the liquid
49
2.4.1 Optoelectronic devices
Post transition metal compounds harnessed from the surface of liquid metals are uniform,
large area, and easily transferable, making them suitable channel materials in thin-film
FETs. Those metal compounds include oxides that naturally form in ambient or controlled
provide the opportunity for both p- and n-type channel materials suitable for different
used for the fabrication of FETs that show on/off ratio exceeding 10 4 at 10 V back gate
voltage.107 (Figure 2.12A and B) Fu et al. reported a liquid gallium-induced 2D GaN with
high carrier mobility of 160 cm-2V-1s-1, based on which the FETs show an on/off ratio of
106.108
photodetectors. (Figure 2.12C and D) With bandgaps ranging from deep UV to near-IR,
photodetectors made from 2D materials offer light detectivity in a broad range. Liquid
50
2.4.2 Dielectric/ conducting units and bandgap manipulation
applications, dielectrics are generally necessary for gating and insulating purposes. The
pursuit of highly conductive and transparent layers lies in the core of fabricating displays
and touch screen appliances. Post transition liquid metals serve as reactive media for
diluting various metals and provide ultra-smooth interfaces for the formation of ultra-thin
The centimetre-scale synthesis of 2D ITO films was successfully reported using a liquid
metal-assisted process.38 (Figure 2.12E and F) For indium-tin liquid alloy, the formation
of ternary ITO is more thermodynamically favourable compared to pure In 2O3 and SnO2.
Squeeze printing indium-tin alloy allows centimetre-scale deposition of indium tin oxide
sheet on various substrates including the flexible polymer substrate. The deposited bilayer
ITO sheets offered 99.3% transparency and a sheet resistance as low as 5.4 kΩsq-1 and
provided high flexibility with minimal conductivity loss even after 1000 times cyclic
Liquid metal assisted deposition technique can also be utilised for deposition of ultrathin
dielectric layers. Ultrathin insulating sheets of HfO2 or Sb2O3 were synthesised via
gallium-based liquid alloy containing the Hf element was employed to deposit 0.5 nm
thick HfO2 sheets on desired substrates, which is the thinnest ever reported HfO2.24 A
peak force tunneling microscopy was utilised for conductivity measurement with Pt-
51
coated wafer as substrates. The deposited HfO2 sheet showed a high dielectric constant
of 39.
In another relevant work, Sb2O3 sheets were deposited by rolling an Sn-based liquid metal
droplet that contained a small amount of Sb element on the substrate. 109 The obtained α-
Sb2O3 exhibited high crystallinity and a wide band gap of ∼4.4 eV. The relative
electric field of ∼10 MVcm-1 was observed (Figure 2.12G and H).
Deposition of 2D materials using the surface oxidation of liquid metal is not only facile,
but also highly versatile and tuneable. The composition and properties of the resulting 2D
materials could be easily tuned by varying the mixture of liquid alloy or deposition
conditions. For example, Bi-Sn liquid alloy was used for the deposition of Bi2O3 doped
concentration was no more than approximately ~0.7 at% in the surface oxide layer even
when the Bi ratios in the bulk alloy were as high as 90%. By tunning the ratio of Bi in the
alloy, the doping concentration of Bi could be tunned between 0.02 at% to 0.73 at%, and
the bandgap of resultant metal oxide sheets varied between 4.2 to 2.7 eV.
52
Table 2.1 Summery of key features of electronic devices based on liquid-metal fabricated
Photo-
Band Carrier
Structure On/off responsivit Detectivity
Device Materials gap mobility
type ratio y D* (Jones)
(eV) (cm-2V-1s-1) -1
(R, AW )
104,
Max. 21.3
FET β‐Ga2O3 107 p-type 4.9 VG=10 - -
Ave. 5- 10
V
FET GaN 108 n-type NM 160 106 - -
Max. 232
106
FET β‐TeO2 p-type 3.7 Ave. 106 - -
146±42
102
FET Ga2S3 26 p-type 2.1 3.5 240 1010
VG=1V
Ave.
95
FET In2O3-xSx n-type 3.33 20.4±6.3 60 3.4×103 2.18×1013
Max. 44
Ave.
FET GaS 94 - 3.02 0.2 Ave. 6.4 -
170
FET SnO 87 p-type 4.2 0.7 20 - -
Two-terminal
Bi2O3 88 n-type 3.5 - - 400 1.1×1013
photodetector
Two-terminal Monolayer
p-type 1.81 35 - 9.2 × 102 1.09×109
photodetector SnS 97
Two-terminal Multilayer
p-type 1.41 35 - 3.51 × 103 6.83×1010
photodetector SnS 97
Heterostructure In2O3 103 n-type 3.65
37 - 1047 5×109
photodetector SnO 103
p-type 4.08
Heterostructure
Ga2O3 110 p-type 4.8 - - 44.6 3.4×1013
photodetector
53
2.4.3 Piezoelectric devices
piezoelectric materials. This feature in planar structures originates from the loss of
concentrations, and can also be tailored by surface modifications. 111 Out of the thirty-two
crystal sub-classes, in four main crystal classes of rectangular, cubic, hexagonal, and
oblique, the inversion symmetry can be broken by thinning down from that of bulk into
2D.112 Additionally, the broken inversion symmetry and piezoelectricity could exist in
layered materials with an odd number of layers due to the non-zero odd-rank tensor
Many 2D materials with piezoelectric properties can be prepared feasibly through the
liquid metal approaches, while are not accessible using conventional methods. 111 Some
but can be obtained in a two-step process of harvesting 2D Ga2O3 first and then
transforming it into GaPO4 via a vapor phase reaction. Employing piezoresponse force
microscopy (PFM) a vertical piezoelectric coefficient of 7.5 pm V −1 was measured for the
unit cell thick GaPO4 nanosheets.28 Liquid metal based synthesis has also been used for
applications such as SnS,96 PbO 91 and ZnO 92. As demonstrated by Ghasemian et al. 91,
the health hazard and environmental pollution of lead-based piezoelectric materials, such
liquid metal synthesis. PbO monolayers collected from the surface of molten Pb showed
vertical and lateral piezoresponses of 29.6 and 3.9 pmV-1, respectively, and a particular
device fabricated by this method is 104 times less than commercial PZT thin films of
The maximum piezoelectricity in ultra-thin sheets has been reported for ultra-thin ZnO
out of plane (d33) value of 80 pmV-1 which is approximately 8 times larger than that of
the value for bulk ZnO. These findings demonstrated that the post transition liquid metals
can be used feasibly for creating large piezo-responsive 2D materials as building blocks
55
Figure 2.12 Liquid metal-based fabrication of 2D materials for electronic and
(B) Ids–Vds output curves of β-Ga2O3 FET at different gate voltages (Vg). Reprinted with
permission from Lin et al., Phys. Status Solidi Rapid Res. Lett. 13, 1900271 (2019).
Copyright 2019, John Wiley and Sons.107 (C) Schematic illustration of the 2D touch-
SnO exhibits trigonal symmetry while In2O3 sheets exhibit cubic crystal structure. (D)
under dark condition and light illumination (280, 365, and 455 nm). Inset: schematic
from Alsaif et al., Adv. Mater. Interfaces 6, 1900007 (2019). Copyright 2020, John Wiley
and Sons.103 (E) Schematic of an ITO and polymer-based flexible two-terminal resistive
test device, with the inset showing the ITO/polymer interface. (F) Schematic of the
resultant device. Reprinted with permission from Datta et al., Nat. Electron. 3, 51 (2020).
Copyright 2020, Springer Nature.38 (G) Schematics of conductive AFM measurement. (H)
I-V curve measured through a point on the α-Sb2O3 layer. Inset: data fitted to the Schottky
emission model showing a calculated dielectric constant of around 84. Reprinted with
permission from Messalea et al., ACS Nano 15, 16067 (2021). Copyright 2020, Royal
Society of Chemistry.109 (I) The optical images of the two-electrode device in which PbO
monolayer is embedded between two Au electrodes. (J) The output voltage response of
the two-electrode PbO device. Reprinted with permission from Mahmood et al., J. Mater.
56
2.4.4 Sensors
A brief discussion is presented in this section on the development of sensors using the
liquid metal induced 2D processes. While full discussions regarding photoresistors and
for the synthesised 2D based devices, there are other possibilities that are offered for
biosensors, and gas sensors using 2D materials derived from liquid metals.
In one of the studies, Wang et al. have shown that 2D graphene oxide flakes can be
graphene oxide /liquid metal.114 Such a technique later was implemented by Baharfar et
al. to reduce graphene oxide flakes on liquid metal droplets for the development of
modified electrochemical interface for separating voltametric peaks of DA, uric acid
(UA), and ascorbic acid (AA). This selective peak separation was attributed to the
on coordinated Ga species. The method was practical, and they could establish the sensors
sensing application.116 In this case, 2D flakes h-MoO3 were deposited on liquid metal
formation of abundant oxygen vacancies. These induced events effectively increased the
concentration of charge carriers and provided a broad surface plasmon resonance (SPR)
materials have been exploited for designing gas sensors. The liquid metal derived 2D SnO
sheets with tuneable level of Bi2O3 dopant, altering the bandgap, were applied for
57
selectivity sensing of gaseous species. 76 Upon the adsorption of H2 and NO2 on SnO
sheets doped with different levels of Bi2O3, different patterns of selective conductivity
were obtained.
2.5 Conclusion
In this chapter, the author discussed the fundamentals behind the intrinsic properties of
liquid metal including their low melting point, high thermal and electrical conductivities.
The author also demonstrated the surface layering and surface oxidation phenomenon of
liquid metals, which are essential for templating 2D materials. Afterwards, the author
including the surface oxidation, reduction, and exfoliation of liquid metals. Finally,
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Chapter 3 Self-Deposition of 2D Molybdenum Sulfides on Liquid
Metals
74
3.1 Introduction
dependency. Liquid metals can offer effective solutions to meet these challenges due to
introducing a molybdenum precursor onto the surface of a eutectic alloy of gallium and
indium (EGaIn). A consecutive set of reactions and washing steps were carried out, using
on the surface of EGaIn. When the reactive species of the molybdenum sulfide precursor
are introduced onto the surface of EGaIn, they undergo a self-deposition process to
produce 2D molybdenum sulfide which are transferrable to any substrate. In this process,
EGaIn serves as an ultra-smooth template and reducing agent for the precursor to form
The content of this chapter was published as a peer-reviewed article in the journal of
3.2 Methods
3.2.1 Materials
All the chemicals were used as received without further purification. Gallium (round
shots, 99.9%), indium (beads, 99.9%) and tin (popcorn flakes, 99.9%) were purchased
75
from Rotometals, USA. Ammonium tetrathiomolybdate ((NH4)2MoS4, 99.97%) was
purchased from Sigma-Aldrich. Sodium hydroxide (NaOH, AR) pellets were obtained
from Chem-Supply Pty Ltd. Hydrochloric acid (HCl, 32%) was purchased from Chem-
Supply Pty Ltd. Potassium chloride (KCl, AR) was purchased from Chem-Supply Pty
Ltd. Gold wire (0.25 mm in diameter, 99.99%) was purchased from Sigma-Aldrich. Milli-
Eutectic gallium indium alloy (EGaIn) was prepared in-house in order to avoid any
unknown additives of commercial EGaIn. A gallium (75.5 wt%) and indium (24.5 wt%)
metal mixture was melted at 180 °C on a hot plate. This temperature was well above the
melting point of indium (156.5 °C). Upon melting, the liquid alloy was stirred with a glass
rod to ensure homogeneous fusion and then allowed to cool down at room-temperature.
The EGaIn alloy was transferred from/into the glass vial using a glass Pasteur pipette.
For the liquid metal-assisted synthesis of MoSx, an EGaIn liquid droplet (120 µL) was
placed in a plastic Petri dish (35 mm inner diameter, 36 mm outer diameter and 15 mm
height). The surface of the EGaIn liquid was cleaned from the passive oxide layer by
adding 5.0 mL of 5.0 M HCl directly onto the liquid metal droplet. The HCl instantly
removed the oxide layer and the liquid metal droplet turned from a dull and deformed
shape into a spherical and shiny ball. The HCl washing liquid was then removed and
replaced with 5.0 ml of a 1.92 mM (NH4)2MoS4 aqueous solution. The MoSx interfacial
76
layer formed immediately on the EGaIn droplet and the (NH4)2MoS4 solution was diluted
with 35 mL of Milli-Q water to halt the deposition process. The Petri dish was placed in
a larger container so that the overflow from the dilution step could be contained. The
solution in the vicinity of the MoSx-bearing EGaIn droplet was gently removed and
replaced with 5.0 mL of Milli-Q water. This was repeated another two times to ensure the
uniform and large interfacial layer, extra care was taken while washing the EGaIn droplet
as any disturbance of the droplet could introduce microtears into the interfacial layer.
Afterwards, the MoSx-bearing droplet was left to dry naturally at room-temperature under
an N2 inert atmosphere.
The interfacial MoSx was extracted from the surface of the EGaIn droplet and transferred
(PI) GmbH & Co. KG). Various substrates (Si, SiO2(285 nm)/Si, and sapphire substrates)
were utilised to demonstrate the substrate independency of the process. The substrates
were sonicated in acetone, isopropanol and Milli-Q water for 10 min each and stored in
isopropanol. Prior to use, the substrates were rinsed in Milli-Q water, blow-dried with
nitrogen gas, and further cleaned with a Tergeo plasma cleaner-Pie Scientific, USA (15
W, 2.0 min).
The pre-cleaned substrate (1.0 cm × 1.0 cm) was fixed upside-down on a holder (2.0 cm
above the stage), and the MoSx-bearing EGaIn droplet in the Petri dish was placed on the
peizoelectric stage under the substrate. The piezo-electric stage then lifted the droplet
77
towards the substrate with a speed of 0.20 mm s 1 until they were in contact. The contact
was held for 5.0 s before the stage was brought down at the same speed, leaving the MoSx
layer behind on the substrate. Due to the van der Waals forces between the MoSx layer
and the solid substrate, the transferred MoS x layer adhered strongly to the substrate. After
the transfer, the substrate was removed from the holder and washed using an ultrasonic
bath in ethanol to eliminate any residual liquid metal. To achieve a successful transfer, it
was essential to completely dry the surfaces of the liquid metal droplet and the substrate.
The wafer, carrying the transferred 2D materials, was immersed in 50 mM NaOH for 30
s, to wash away any oxidized gallium residues, rinsed with Milli-Q water and blow-dried
A three-step annealing process was adapted to further crystallize and sulfurize the
resultant material into 2H-MoS2. A tube furnace (Thermo Scientific, TF55030C-1) with
a quartz tube (22 mm inner diameter, 25 mm outer diameter and 1.0 m length) was utilised
for annealing. In step one, the sample was annealed in a 5% H2 (balanced in N2)
atmosphere at 500 ˚C for 60 min for initial crystallization. In step two, the sample was
annealed in a 5% H2 (balanced in N2) and sulfur vapor at 750 C for 20 min. In step three,
the sample was annealed in ultra-pure argon and sulfur vapor at 850 C for 20 min to
78
3.2.6 Electrochemical analysis
All the electrochemical processes were carried out using an electrochemical workstation
The reference cyclic voltammetry (CV) was performed in a standard three-electrode cell,
with a gold-coated Si wafer (1.0 cm × 4.0 cm) as the working electrode, a spiral gold wire
as the counter electrode, and a saturated calomel electrode (SCE) as the reference. A glass
cell (25 mm inner diameter and 40 mm height) was used, and the electrolyte was an
aqueous solution of 1.92 mM (NH4)2MoS4 and 0.10 M KCl as the supporting electrolyte.
Different scan rates (25, 50, and 100 mV/s) were used at a resolution of 1.0 mA/V, with
The open circuit voltage (Voc) analysis of the EGaIn droplet was performed in a standard
three-electrode system with EGaIn as the working electrode. A plastic Petri dish (35 mm
inner diameter, 36 mm outer diameter and 15 mm height) was used as the cell, 0.10 M
KCl solution as the electrolyte, SCE as the reference and a spiral gold wire as the counter
electrode. An EGaIn droplet (120 µL) was used as the working electrode, and a gold wire
(inside a glass tube) was connected to the droplet by immersing one end of it into the
EGaIn droplet. The EGaIn electrode was washed with 5.0 mL of 5.0 M HCl which was
then removed and replaced with 0.10 M KCl solution as the supporting electrolyte for the
measurement. Prior to the measurement, the electrolyte was adjusted to the same pH as
Electrochemical impedance spectroscopy (EIS) was carried out in the same three
electrode system as the Voc measurement, with 1.92 mM (NH4)2MoS4 and 0.10 M KCl as
the electrolyte. The frequency range was 1.0 Hz to 105 Hz, with 0.50 V used as the initial
voltage with a 5.0 mV amplitude. For the EIS measurement of the EGaIn droplet without
79
the self-deposited MoSx layer, 5.0 mL of 5.0 M HCl was used for cleaning the surface of
the EGaIn droplet before the measurement. The remnant of the HCl liquid was then
removed and replaced with the electrolyte. For the measurement of the MoS x-bearing
EGaIn droplet, MoSx was self-deposited onto an EGaIn electrode as described above, and
then the EIS measurement was performed. In order to make the deposition layer intact
during the measurement, a gold wire was connected to the droplet prior to the deposition.
runs (scan rate 50 mV/s, 10 cycles) using the same three-electrode cell as described in the
Atomic force microscopy (AFM) images were collected using a Bruker dimension icon
SPM (USA) with ScanAsyst-Air probe (Bruker AFM probes, USA). Each sample was
scanned as prepared without further processing using the PeakForce Tapping mode. A
1
scan rate of 0.50 Hz and a resolution of 250 samples line was applied. A vacuum was
Instrument, Asylum Research, Santa Barbara, CA, USA) in ambient room temperature
(NanoWorld, Switzerland, nominal spring constant kc = 6 N/m) were used for all images.
To minimize the imaging force, a setpoint ratio (Imaging Amplitude (A)/free amplitude
80
(A0)) of > 0.8 was maintained during imaging (unless otherwise stated). Cantilevers were
calibrated using the thermal spectrum method, in air, prior to use, and the lever sensitivity
was determined using force spectroscopy; the spring constant was resolved via the inverse
optical lever sensitivity (InVOLS) using force curve measurements on the hard surface.
A scanning electron microscopy (SEM, JEOL JSM-IT 500 HR) coupled with energy
dispersive X-ray spectroscopy (EDS, Bruker Silicon) was used for morphological and
(TEM) system equipped with a GATAN ORIUS camera was employed for atomic-
resolution morphological and lattice structure analysis. Thermally robust silicon nitride
(Si3N4) grids (Ted Pella, 2158710) were employed for the TEM samples.
X-ray photoelectron spectrometry (XPS) analysis was carried out using a Thermo
X-ray source (1486.68 eV), 2×10 9 mbar background vacuum, 90° photoelectron take-off
angle, 120 W power (13.8 KV × 8.7 mA), and 500 µm spot size.
nm laser and WiRETM was utilised for Raman spectra collection. One second exposure
time, 200 accumulations with 1% laser power and 100 times magnification were used for
single point spectral acquisition. Raman mapping was obtained by raster scanning at 100
times magnification with a step-size of 0.3 μm, where a spectrum at each point was
81
3.3 Results and discussions
The experimental process and mechanism by which the MoS x self-deposits on the surface
solution was used to wash the EGaIn droplet thereby removing the gallium oxide layer
and inducing intimate contact between the EGaIn and solvent for creating a reactive
molybdenum sulfide formed on the interface and subsequently the surface was washed to
hinder any further growth. It has been established that for these Ga-based liquid metals,
when exposed to an oxic environment, a passivating oxide layer of gallium forms on their
surface (Figure 3.1A), as gallium oxide has a lower Gibb’s free energy than that of indium
oxide.2 For removing the oxide surface layer and exposing the surface of the liquid metal,
the droplet was washed with HCl (Figure 3.1B). EGaIn as a metal offers excessive
electrons on its surface and this attracts the H+ ions after washing (Figure 3.1C). The
surface of the EGaIn becomes saturated with electrons and reaches an equilibrium, where
no oxidation occurs at the interface between the liquid metal and the acidic aqueous
solution. This phenomenon is known to induce a surface potential on metals (Φm). The
referred to as the electrical double-layer (EDL).3 Figure 3.1D features the different zones
of the EDL. In the inner Helmholtz layer, the H+ counter ions adhere directly to the surface
of the EGaIn droplet. The interfacial potential remains unbalanced in this region, and a
reach the equilibrium potential (Φi).4 When (NH4)2MoS4 is added onto the EGaIn droplet,
the anions in the outer Helmholtz layer are substituted by the [MoS4]2- (Figure 3.1E).
82
These ions, in turn, react with the H+ in the inner Helmholtz layer according to Equation
(3.1)5 forming MoS3. Further reduction can occur in the inner Helmholtz layer by the
product is collectively described here as MoSx. Weak interfacial forces hold the interfacial
MoSx film on the EGaIn surface as featured in Figure 3.1F. The EGaIn droplet provides
both the interfacial potential to destabilize the [MoS 4]2 and serves as an atomically flat
Figure 3.1 Schematic illustration of MoSx formation on EGaIn. (A) The formation of a
gallium oxide passivating layer on the surface of liquid metal under an oxic environment.
83
(B) The removal of the oxide interfacial layer. (C) The build-up of surface charge on the
liquid metal. Here electrons saturate the liquid metal surface and system equilibrium is
reached. (D) Electron confinement and the Helmholtz layer formation on the surface of
liquid metal. The blue line is a hypothetical representation of the interfacial potential
(potential drop = Φm Φi). (E) Anionic substitution by [MoS4]2 in the outer Helmholtz
layer and subsequent reaction with the H+ in the inner Helmholtz layer. (F) The formation
To further elucidate the mechanism by which MoSx deposits onto the EGaIn surface,
(NH4)2MoS4 aqueous system was explored using a three-electrode system with a gold
working electrode at different scan rates as presented in Figure 3.2A. The anodic region,
saturated MoS3 (Equation 3.3). In the potential range from 0.56 to 1.3 V, a cathodic
region is observed, corresponding to both [MoS 4]2 deposition onto the gold electrode
(Equation 3.2) and reduction of the MoS3 (Equation 3.4).6, 7 The onset voltage for the
during CV measurements was confirmed to be MoSx by SEM, EDS mapping, and XPS
(Figure 3.3 and 3.4). Optical microscopy images and Raman spectra of electrodeposited
and self-deposited MoSx are presented in Figure 3.5. It is observed that the self-deposited
MoSx layer on the EGaIn droplet is smooth and has no observable pinholes, while the
electrodeposited MoSx was collected directly from the MoSx-bearing gold-electrode after
84
the electrodeposition, and that of the self-deposited MoS x was collected directly from the
MoSx-bearing EGaIn droplet in order to avoid the effect of any signal from the underneath
1
substrates. The Raman peaks between 300 to 350 cm correspond to the Mo-S bond
vibrational modes, and the modes between 400 to 460 cm 1 are associated with the apical
sulfur atoms.8
As can be seen, the surface of the electrodeposited film onto gold is quite rough signifying
the importance of using the atomically smooth surface of EGaIn for avoiding such
nucleation formation.
In the second set of electrochemical experiments the working electrode was replace with
EGaIn to assess the Voc of a fresh EGaIn droplet, corresponding to the interfacial
destabilize [MoS4]2 at the interface of EGaIn. As a reference, the Voc was acquired in an
aqueous solution without [MoS4]2 ions, with the same pH as the initial precursor
solution, over 1000 s as presented in Figure 3.2B. This Voc is approximately 0.80 V vs.
SCE. This value is considerably more negative than the onset potential of [MoS 4]2
accumulation and the interfacial potential between the interface of EGaIn and the aqueous
solution is sufficient to reduce the [MoS 4]2 species into an MoSx layer.
To initially confirm that the produced MoSx layer on EGaIn was present and of high
integrity, potentiostatic EIS was performed on the droplet with and without the self-
deposited MoSx layer. The presence of a uniform interfacial semiconducting MoSx layer
85
on the metal surface induces changes in the impedance of the electrochemical system. As
shown in Figures 3.2C and D, the impedance was higher for the EGaIn-MoS x than EGaIn
only, at all frequencies. A capacitive double layer appears to develop on the EGaIn droplet
at frequencies of >10 Hz. This capacitive component is not present in the EGaIn-MoS x
due to the interfacial layer reducing the charge transfer and thus the formation of a double
layer capacitance. Only at frequencies of <10 Hz, the EGaIn-MoSx shows a capacitive
component due to the transpassive effect. The drop in the capacitive component of an
EGaIn droplet at a frequency of <10 Hz can be attributed to the rapid formation of the
The Nyquist plots, Figure 3.2E, feature a higher series resistance (Rs) for EGaIn-MoSx
(92.6 Ω) compared to that of the EGaIn droplet (10.2 Ω), further suggesting that the MoS x
layer on EGaIn is uniform and without any pores.9, 10 This provides further evidence for
electrochemical assessments, it was seen that the intrinsic EDL of EGaIn can be utilised
To achieve the accurate exfoliation and transfer of the self-deposited MoSx layers from
the EGaIn surface onto a desired substrate, a program-controlled piezo-electric stage was
utilised. This program-controlled stage of 0.5 nm spatial steps is utilised to carry out the
touch-printing process (Figure 3.2F). The high-resolution stage allows the transfer of
large area layers (as large as several mm - Figure 3.6) and increases the stability and
reproducibility of the process. The transfer was conducted onto a variety of substrates
including SiO2 (285 nm)/Si and sapphire wafers (Figures 3.6 and 3.7) to show that
in Figure 3.2 G. Due to the non-polar nature of EGaIn, interactions between the metal and
the synthesised 2D materials on its surface is weak.11 Additionally, the absence of a long-
86
range orderly arrangement of atoms in liquid metal minimizes the cumulative atomic
terminated substrates (such as SiO2 and sapphire) are stronger due to accumulative van
der Waals forces between the permanent dipoles.14 When the substrate is brought into
contact with the EGaIn, the 2D layer on its surface adheres to the substrate and separates
itself from the parent liquid metal. Residual liquid metal inclusions are sometimes found
schematic illustrations for the extraction of the MoSx layer. (A) CV profiles of
((NH4)2MoS4) aqueous solution acquired at different scan rates, scanned in the potential
window from 1.0 to 1.3 V (negative scan), Ei = 0.0 V and Ef = 0.0 V vs. SCE. (B) The
Voc measurement of the EGaIn droplet in an aqueous solution vs. time over 1000 s. (C
and D) A Bode plot of the EGaIn droplet with and without the MoS x interfacial layer;
scan conditions: 1.92 mM (NH4)2MoS4 and 0.10 M KCl as electrolyte, 0.50 V. (E) A
Nyquist plot of an EGaIn droplet with and without the MoS x interfacial layer, the recorded
87
values of series resistance (Rs) are 10.2 and 92.6 Ω, respectively; scan conditions: 1.92
experimental set up for the extraction of an MoSx layer from the EGaIn surface. (G) A
Figure 3.3 SEM image (top left) and EDS mapping results of Mo, S and O of the
88
Figure 3.4 High-resolution XPS spectra of the Mo 3d and S 2p regions of the
electrodeposited MoSx.
Figure 3.5 Optical microscopy images of: (A) electrodeposited MoS x film on a gold
wafer and (B) MoSx self-deposited layer on an EGaIn droplet. (C) Raman spectra of both
the electrodeposited MoSx film on gold (black spectrum), and MoS x self-deposited layer
89
Figure 3.6 Optical microscopy image of the transferred MoSx layer on a Si/SiO2 wafer
Figure 3.7 Optical microscopy images of transferred MoSx layers onto different
After being transferred onto the substrate, the material appears to be a uniform sheet with
that this sheet was MoSx. The high-resolution XPS spectra at the Mo 3d and S 2p regions
are shown in Figures 3.9. In the high-resolution XPS spectra of the S 2p region, one
90
doublet at 162 and 163.3 eV is observed, which corresponds to S 2 from molybdenum
sulfide.15 In the Mo 3d region, the peaks are fit to two doublets, representing two chemical
states of Mo and one single peak of S 2s at 226.2 eV. The doublet at 230.0 and 233.3 eV
can be attributed to Mo4+ 3d5/2 and Mo4+ 2d3/2 peaks, respectively. The doublet with higher
binding energies of 232.8 and 235.9 eV belongs to MoVI from MoO3, while the doublet
at 230.0 and 233.3 eV belongs to MoIV from molybdenum sulfide.15 Based on elemental
the presence of substantial S-vacancies in the synthesised material. The XPS peaks are
slightly broader than that of single-crystal MoS 2, which can be attributed to the presence
of convoluted peaks from multiple oxidation states of the material.16 Overall, the product
Figure 3.8 AFM image of the MoSx layer extracted from the surface of EGaIn onto a
SiO2/Si wafer. The height profile shows that the thickness is ~1.0 nm before annealing.
91
Figure 3.9 High-resolution XPS spectra of the Mo 3d and S 2p regions of the self-
deposited MoSx.
A TEM image and a selected area electron diffraction (SAED) pattern of a sample MoS x
sheet are shown in Figure 3.10. The translucent appearance of the sheet in the TEM image
suggests its thin nature in confirmation to AFM measurements, and the absence of any
diffraction dots or rings in the SAED pattern suggests low crystallinity of the product.
MoS2 sheets. Characteristic Raman peaks of MoS 2 show up after annealing (the full range
of Raman spectra for the layers after each step are shown Figure 3.11).
92
Figure 3.10 TEM analysis of the self-deposited MoSx layer. (A) Optical microscopy
image of the transferred MoSx layer on a Si3N4 grid. (B) TEM image and (C) SAED
Figure 3.11 Raman analysis of the EGaIn-extracted MoSx layer on a SiO2/Si wafer at
different annealing stages. The folding of the layer created different thicknesses: one-
layer, few-layers and multilayer (thicker) 2H-MoS 2. In the optical microscopy image, the
regions. The doublet in Mo 3d region corresponds to the 3d 5/2 and 2d3/2 orbital of MoVI,
and the single peak is attributed to the 2s peak of divalent sulfide ions (S 2−). The doublet
in S2p region corresponds to the 2p1/2 and 2p3/2 orbital of S2−. The ratio of MoIV to S is 1:
2.03. As such, the XPS results confirm to be MoS2 sheets.16 AFM image (Figure 3.12C)
shows a smooth and uniform sheet. A line scan across the edge of the sheet presents a
reduced step height of ~0.7 nm after annealing, which is in line with the reported thickness
repeated hexagonal pattern, which indicates a high crystallinity of the resultant sheets. In
order to gain further insight into the atomic structure of the synthesised nanosheets, high-
resolution TEM was conducted as presented in Figure 3.12D and F (presented at different
resolutions). Thermally robust silicon nitride (Si 3N4) grid was utilised here since copper
grid with lacy carbon could not sustain the high temperature annealing process. The hig-
resolution TEM image clearly reveals a honeycomb atomic arrangement with 2H-MoS 2.
The d-spacing of [1010] plane is 2.76 Å, and the d-spacing of [1120] plane is 1.59 Å,
which agrees with the reported structure of 2H-MoS2 crystal,19 as is shown in Figure
3.12G. The fast Fourier transform (FFT) pattern (Figure 3.12H) displays perfect
crystals. TEM image of the folded edge of the MoS2 layer is presented in Figure 3.13.
The spacing between layers is ~0.66 nm, which is in agreement with the thickness of
monolayer MoS2.19
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Figure 3.12 The high-resolution XPS of the crystalline MoS 2 sheets at Mo 3d (A) and S
2p (B) region. AFM and TEM characterizations of the 2D MoS2. (C) AFM image with
the inset representing the thickness of ~0.7 nm. (E) High-resolution AFM image. (D) and
(F) high resolution TEM image. (G) The representation of the crystal structure. (H) The
FFT pattern.
Figure 3.13 TEM image of a folded edge of a 2H-MoS2 thick layer after annealing.
95
3.3.4 Thickness dependent optical properties of 2D MoS2 sheet
of different thicknesses were collected and are presented in Figure 3.14. An optical
has been established that for few-layer MoS2 the frequency difference between the E12g
and A1g mode can be used for determining the number of layers.20 As shown in Figure
3.14B, Raman spectra of 2D-MoS2 present characteristic E12g and A1g modes, which
correspond to the in-plane optical vibrations of the Mo and S atoms and the out-of-plane
optical vibrations of the S atoms, respectively. With the number of layers increasing from
1 layer to 5, the E12g mode goes through a redshift from 388.1 to 385.3 cm 1
and the A1g
1
mode goes through a blueshift from 408.2 to 409.6 cm (Figure 3.14C). The difference
between the A1g and E12g modes increased from 20.1 cm 1 for the monolayer 2H-MoS2 to
1
24.2 cm for multi-layer 2H-MoS2 (Figure 3.14D), which is in agreement with the
reported value of chemical vapor deposited MoS 221-23 and indicates the highly crystalline
quality of the resultant 2D sheets. PL spectra of 2H-MoS2 have been reported to also be
presents two excitation peaks at 620 nm and 656 nm, which correspond to the B and A
excitations modes of MoS2.25 As the thickness increases, both PL peaks go through slight
blueshifts and these PL shifts agree well with that of past observations 25 and further
proved the ability of the liquid metal process in obtaining high quality 2H-MoS 2 from one
to several layers.
96
Figure 3.14 Raman spectroscopy and PL characterizations of the 2D-MoS 2: (A) Optical
microscopy image of the 2D MoS2. (B) Raman spectra of 2D MoS2 of different number
of layers. (C) A1g and E12g peak locations at different number of layers. (D) The difference
between peak locations of the A1g and E12g peaks for different number of layers. (E) PL
Raman mapping was carried out. An example is presented in Figure 3.15. The optical
microscopy image of a sample mapping region is shown in Figure 3.15A with the spatial
distribution of the Raman peak intensities of this image depicted in Figure 3.15B. As can
1
be seen in Figure 3.15B, the spatial map of peak intensity at 409 cm (the approximate
location of the A1g peak) matches perfectly with the optical microscopy image contrast of
the MoS2 sheet. The majority of the 2D sheet shows a similar distribution of intensity,
97
which indicts a high uniformity of the MoS2 over a large area. The folded area of the
The spatial maps of the peak location of the E12g and A1g modes are presented in Figures
3.15C and D, respectively, for which single point spectra collected from the marked
points are presented in Figure 3.16 as an example. The peak locations difference of the
E12g and A1g modes is approximately 20 cm 1, which indicates monolayer MoS2 over this
area. The Raman mapping, with homogeneous colour distribution on the images and
relatively invariant peak intensities, further demonstrate the quality and uniformity of the
large area 2H-MoS2 monolayers that can be obtained using the developed liquid metal-
based method.
Figure 3.15 Raman mapping of a 2H-MoS2 sheet. A single-point spectrum was collected
at the point marked by a cross and shown in the Figure 3.16. (A) Optical microscopy
image of the mapped region. (B) Intensity mapping at 409 cm 1. (C) E12g peak location
98
Figure 3.16 Single point spectrum collected from the marked point in the Raman
3.5 Conclusion
on the surface of EGaIn. The EGaIn interface acted as a reactive and a templating media
reactions that constitute the formation of the interfacial 2D molybdenum compound. The
layer was readily exfoliated and transferred onto a desired substrate using a piezo stage
of nm resolution. The annealing steps were included to complete the process for obtaining
procedure for the deposition of any 2D TMDs of large spatial dimensions that can be
99
3.6 References
1. Wang, Y.; Mayyas, M.; Yang, J.; Tang, J.; Ghasemian, M. B.; Han, J.;
2005866.
2. Zavabeti, A.; Ou, J. Z.; Carey, B. J.; Syed, N.; Orrell-Trigg, R.; Mayes, E. L.;
Xu, C.; Kavehei, O.; O’Mullane, A. P.; Kaner, R. B., A liquid metal reaction
5. Quagraine, E.; Georgakaki, I.; Coucouvanis, D., Reactivity and kinetic studies of
function of the MoS42- ligand. J. Inorg. Biochem. 2009, 103 (1), 143-155.
8. Daeneke, T.; Dahr, N.; Atkin, P.; Clark, R. M.; Harrison, C. J.; Brkljaca, R.;
Pillai, N.; Zhang, B. Y.; Zavabeti, A.; Ippolito, S. J., Surface water dependent
100
properties of sulfur-rich molybdenum sulfides: electrolyteless gas phase water
properties: A new understanding of carbon activation. Chem. Eng. Sci. 2019, 358,
980-991.
10. Lyu, J.; Mayyas, M.; Salim, O.; Zhu, H.; Chu, D.; Joshi, R., Electrochemical
11. Ghasemian, M. B.; Mayyas, M.; Idrus‐Saidi, S. A.; Jamal, M. A.; Yang, J.;
Mofarah, S. S.; Adabifiroozjaei, E.; Tang, J.; Syed, N.; O'Mullane, A. P., Self-
12. Pitzer, K. S., Corresponding states for perfect liquids. J. Chem. Phys. 1939, 7 (8),
583-590.
13. Rah, K.; Eu, B. C., The generic van der Waals equation of state and self-diffusion
14. DelRio, F. W.; de Boer, M. P.; Knapp, J. A.; Reedy, E. D.; Clews, P. J.; Dunn,
M. L., The role of van der Waals forces in adhesion of micromachined surfaces.
15. Liu, Z.; Zhang, X.; Wang, B.; Xia, M.; Gao, S.; Liu, X.; Zavabeti, A.; Ou, J.
16. Lee, Y. H.; Zhang, X. Q.; Zhang, W.; Chang, M. T.; Lin, C. T.; Chang, K. D.;
Yu, Y. C.; Wang, J. T. W.; Chang, C. S.; Li, L. J., Synthesis of large‐area MoS 2
101
atomic layers with chemical vapor deposition. Adv. Mater. 2012, 24 (17), 2320-
2325.
17. Ghatak, S.; Pal, A. N.; Ghosh, A., Nature of electronic states in atomically thin
18. Radisavljevic, B.; Radenovic, A.; Brivio, J.; Giacometti, V.; Kis, A., Single-
20. Li, H.; Zhang, Q.; Yap, C. C. R.; Tay, B. K.; Edwin, T. H. T.; Olivier, A.;
21. Liu, H.; Chi, D., Dispersive growth and laser-induced rippling of large-area
2015, 5, 11756.
22. Jeon, J.; Jang, S. K.; Jeon, S. M.; Yoo, G.; Jang, Y. H.; Park, J.-H.; Lee, S.,
23. Najmaei, S.; Liu, Z.; Zhou, W.; Zou, X.; Shi, G.; Lei, S.; Yakobson, B. I.;
Idrobo, J.-C.; Ajayan, P. M.; Lou, J., Vapour phase growth and grain boundary
structure of molybdenum disulphide atomic layers. Nat. Mater. 2013, 12 (8), 754-
759.
24. Eda, G.; Yamaguchi, H.; Voiry, D.; Fujita, T.; Chen, M.; Chhowalla, M.,
5111-5116.
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25. Dhakal, K. P.; Duong, D. L.; Lee, J.; Nam, H.; Kim, M.; Kan, M.; Lee, Y. H.;
103
Chapter 4 Liquid-Metal-Assisted Deposition and Patterning of
104
4.1 Introduction
plasmonic properties, is a great material for electronics, energy storage devices and bio-
sensing. Yet to this day, room temperature synthesis of large area MoO 2 that allows
due to their reactive interfaces and specific solubility conditions, offer unique
In this chapter, the author presents a substrate-independent liquid metal-based method for
liquid state, a uniform layer of hydrated molybdenum oxide (H2MoO3) was achieved at
the interface. This layer was then transferred onto the desired substrate. Utilising this
transforms this H2MoO3 into crystalline MoO2 and produces electrically conductive
MoO2 patterns at room temperature. The electrical conductivity and plasmonic properties
The content of this chapter was published as an article in the Journal of ACS Applied
4.2 Methods
4.2.1 Materials
Gallium (round shots, 99.9%) and indium (beads, 99.9%) were purchased from
Rotometals, USA. Sodium molybdate dihydrate (Na 2MoO4·2H2O, 99.97%) and bovine
105
serum albumin (BSA, ≥ 98%) was purchased from Sigma-Aldrich. All other chemicals
were purchased from commercial vendors and used as received unless otherwise noted.
Eutectic gallium–indium alloy (EGaIn) was prepared by grinding 75.5 wt% of gallium
with 24.5 wt% of indium using porcelain mortar and pestle until they are thoroughly
mixed. In order to ensure complete alloying, the metal mixture was heated at 180 °C and
stirred with a glass rod and then cooled down at room temperature. The EGaIn alloy was
then transferred into a glass vial using a glass Pasteur pipette and stored in a nitrogen-
EGaIn droplet was placed in a plastic Petri dish (35 mm inner diameter, 36 mm outer
diameter and 15 mm height). The passive oxide layer on the surface of EGaIn droplet was
removed by washing with hydrochloric acid (HCl) solution (5.0 mL, 5M). The HCl
instantly removed the oxide layer from the EGaIn droplet and exposed its shiny metallic
surface. The HCl washing liquid was removed with a glass Pasteur pipette and replaced
with the aqueous solution of sodium molybdate (7.0 mL, 0.20 M). The light-yellow
interfacial layer of H2MoO3 gradually formed on the EGaIn droplet. During the reaction,
any disturbance of the droplet was avoided to ensure the formation of a smooth and
uniform H2MoO3 layer. After the desired thickness of deposition layer was reached, the
surrounding solution was gently removed and replaced with 7.0 mL Milli-Q water. This
was repeated three times to remove any residual sodium molybdate from the H2MoO3-
bearing EGaIn droplet. Afterward, the Milli-Q water was removed and the EGaIn droplet
106
An intact H2MoO3-bearing EGaIn droplet free from track and deformation is crucial for
the touch-transfer process. Therefore, extra care was taken during the reaction and
washing steps to avoid disturbance of the droplet. It is noteworthy that although larger
EGaIn droplets produce H2MoO3 of larger areas on their surfaces, they become disturbed
and deform more easily compared to the smaller droplets, which makes the touch-transfer
process more challenging with larger liquid metal droplets.. In general, touch-transferring
from EGaIn droplets of around 120 μL yields repeatable and reasonably large area and
The extraction and transfer of the H2MoO3 layers were conducted utilising a program
25 N push/pull force, Physik Instrumente (PI) GmbH & Co. KG), which was reported in
our previous work.22 The detail of the process is described as follows. Substrates (Si wafer
or quartz) were cleaned in ultrasonic bath of acetone, ethanol, and Milli-Q water (10 mins
each, sequentially). Sonicated substrates were rinsed with Milli-Q water, and then blow-
dried with nitrogen. Prior to use, substrates were further cleaned with a Tergeo plasma
cleaner (Pie Scientific, USA) at 15 W for 2.0 min to eliminate any possible organic
contaminant and improve the adhesion of the substrate surface. For touch-transfer, the
substrate was fixed upside down on a holder above the H2MoO3-bearing droplet, and the
droplet in Petri dish was placed on a program controlled piezo-electric stage. The stage
lifted the droplet up at a speed of 0.05 mm s -1 until it was in contact with the substrate.
The contact was held for 600 s before the droplet was brought down at the same speed.
The H2MoO3 layer adhered onto the substrate due to the accumulation of van der Waals'
107
forces between them. After the transfer, the substrate was removed from the holder and
sonicated in ethanol to remove any residuary EGaIn. Upon sonication in ethanol, more
than 95% of the EgaIn could be removed. The substrate, with the transferred materials on
it, was then blow-dried with nitrogen and stored in a nitrogen-filled glove box for future
process, the droplet needs to be completely dry prior to the transferring onto substrates,
the substrate used should be freshly plasma-treated, and there needs to be sufficient
contact time between the substrate and the droplet before the lift-off. In the case of
flexible substrate like polydimethylsiloxane (PDMS), freshly made PDMS film was
applied with the same touch-transferring process, and no plasma-treatment was applied
The annealing process was conducted in a Linkam’s HFS probe stage (HFS600E-PB4,
Linkam Scientific Instruments Ltd.) Prior to annealing, the Linkam stage was purged with
ultra-pure argon for 10 mins. During the annealing process, a constant argon flow to the
Linkam stage was maintained. Samples were annealed non-isothermally at heating rate
10 ⁰C min-1. For thermal transformation investigations, the H2MoO3 layer was held at 50,
100, 150, 200 , 250, 300, 350, 400, and 450 ⁰C for 200 seconds, during which a single
108
4.2.5 Laser Annealing Process
Patterning conductive molybdenum oxide was carried out by scanning selective areas on
the H2MoO3 layer with a laser (λ = 532 nm, 36 mW, spot size around 1 μm) sourced by
annealed using a step size of 0.40 μm and monitored through 50 times magnification
objective lens. The exposure dose was controlled by adjusting the incident laser power
and the exposure time. For large areas, 100% laser power and 0.01 s exposure time were
applied, and a focus tracking mode was utilised to ensure a constant laser focus over time.
electrode, a gold wire (0.25 mm diameter) as the counter electrode, saturated calomel
electrode (SCE) electrode as the reference electrode, and a plastic Petri dish (35 mm inner
diameter, 36 mm outer diameter and 15 mm height) as the cell. The electrolyte was an
aqueous solution of sodium molybdate (Na2MoO4, 0.20 M) and potassium chloride (KCl,
0.10 M). The pH value of the electrolyte was adjusted to 4.0 using HCl. Initial and final
voltages were both set to 0.0 V, and the scan rate varied from 20 mV s -1 to 80 mV s-1. The
open-circuit voltage (Voc) measurement over time was conducted in the same cell with
0.10 M KCl solution (pH adjusted to 4.0 using HCl) as the electrolyte. For V oc
measurement, an EGaIn droplet (120 µL) was placed as working electrode. The EGaIn
droplet was connected to the potentiostat using a gold wire (0.25 mm diameter)
109
encapsulated in a glass tube with its end exposed and immersed into the EGaIn droplet.
Prior to measure the Voc, the EGaIn droplet was washed with 5.0 M HCl solution.
Atomic force microscopy (AFM) images were collected using a Bruker dimension icon
SPM (USA) with a ScanAsyst-Air probe (Spring constant: 0.40 N m -1, Bruker AFM
probes, USA). PeakForce tapping mode was applied with a scan rate of 0.50 Hz and a
resolution of 512 sample per line. Auto control of feedback gain and peak-force setpoint
was utilised for an optimized tracking of the surface. Specimens were stabilized on the
AFM stage with vacuum. Roughness and depth distribution profiles were obtained with
(TEM) system equipped with energy-dispersive X-ray spectroscopy (EDS, Bruker SDD-
EDS) was employed for high-resolution TEM image acquisition and chemical
compositions analysis. Digital FEI Nova NanoLab 200 scanning electron microscopy
(SEM) system equipped with a high-resolution Focused Ion Beam (FIB) workstation was
Cyclic X-ray photoelectron spectroscopy (XPS) analysis was carried out using a Thermo
X-ray source (1486.68 eV). For spectral acquisition, 120 W power (13.8 kV × 8.7 mA),
2×10−9 mbar background vacuum, 90° photoelectron take-off angle, and 500 µm spot size
were applied. As a reference for calibration, C1s = 284.8 eV for adventitious hydrocarbon
110
was used. Avantage XPS software (from Avantage Software Ltd, United Kingdom) was
nm laser was utilised for obtaining Raman spectra. Spectra were collected with standard
confocality and recorded at static grating scan type with 1800 lines mm -1 grating, which
provided the spectral resolution of ~1.5 cm-1. One second exposure time, and 50 times
magnification were used for all single-point Raman measurements. To avoid laser-
induced modification of the sample property, 1.0% laser power (0.36 mW on sample),
For surface plasmonic measurements, transparent quartz substrates were utilised and the
same touch transferring, and laser annealing methods were applied. BAS solution (0.1 mg
mL-1) was prepared in phosphate-buffered saline buffer solution (0.1 M, pH=7.4). For
BSA treatment, the sample was soaked in freshly prepared BAS solution for 15 mins
before it was rinsed in Milli-Q water and blow dried with nitrogen. The optical absorption
For preparing specimens for conductivity measurement, Si-SiO2 wafer with micro sized
gold pattern was used as the substrate to provide contact for the measurements. Gold
patterns were fabricated using conventional ultraviolet (UV, 365 nm) lithography, by
photoresist (AZ1505) that was patterned using a maskless writing system (Heidelburg
111
Instrument Inc.). H2MoO3 layer was transferred onto the substrate using the same touch-
transfer process, and then MoO2 pattern was made using the same laser annealing process.
carried out using a Bruker dimension icon SPM (USA) with platinum coated conductive
tip (SCM-PIT-V2, Bruker AFM probes, USA). Sample was fixed on a metal disk with a
stick tap, and copper tape was used for providing the contact between the gold lead and
metal disk. Metal disk was stabilized on the AFM stage with vacuum during the
measurement. PeakForce tapping mode was applied with a scan rate of 0.50 Hz and a
resolution of 512 sample per line. Auto control of feedback gain and peak-force setpoint
was implied for optimized tracking of the surface. For open loop PF-TUNA measurement,
DC sample bias was 0.50 V, Current sensitivity is 20 pA V-1. For closed loop PF-TUNA
measurements, the feedback bias was turned on, and feedback setpoint was set to 10 pA,
feedback IGain was 15, and bias limit was between 0.0 and 2.0 V. For acquiring I-V
curves for points of interest, continuous ramp at each point was applied until the tip was
on the surface, and then I-V curve was collected at a scan rate of 0.20 V s -1.
theory (DFT) in the Vienna Ab Initio Simulation Package (VASP) version 5.4.4 68-70. The
augmented-wave method was used to represent the ionic cores, 68-70 and the number of
electrons treated as valence was 14 for Mo and 6 for O. Wave functions were represented
in a plane-wave basis and the cut-off energy was 400 eV. To treat the electronic
112
correlations in the Mo 3d orbital, the calculations included an additional Hubbard term
using the simplified scheme proposed by Dudarev et al.71 with a value of Ueff= 6.3 eV
chosen to reproduce the α-MoO3 bulk band-gap and be consistent with past work72 For
the crystalline 2D and 3D models, we used a dense q-point grid of 8×8×8 for the first
Brillouin zone sampling centred on the Γ-point. To simulate an oxygen vacancy, 2×1×2
supercells were constructed and a single oxygen was removed, initially at the O2 position
which has the lowest formation energy (in bulk). 72 For the 2D models, a 15 Å vacuum
slab was introduced to break the periodic boundary conditions in one direction, and 2D
layers were formed by cleaving at the van-der Waals gap of the bulk α-MoO3 crystal
structure which occurs at a specific (010) plane. Structures were relaxed until forces were
converged to better than 0.02 eV/Å and the total energy convergence threshold was 10 -6
eV. To simulate the polycrystalline nature of the 2D α-MoO3 surface layer, a grain
boundary model was constructed by matching the [100]||[001] directions of the 2D layer,
as this was indicated to be the best lattice match available for a coherent interface, and
then performing ionic relaxation using the same convergence criteria outlined above,
The deposition process of the H2MoO3 was achieved as schematically illustrated in Figure
4.1. Before adding the precursor solution, the EGaIn droplet was treated with 5.0 M HCl
solution to remove the gallium oxide passivating layer and to activate the EGaIn surface.
After the precursor solution of 0.20 M Na2MoO4 was added onto the EGaIn droplet, the
113
deposition process begins and a layer of H2MoO3 gradually forms on EGaIn surface as
schematically illustrated in Figure 4.2A. Upon the acid treatment, the EGaIn droplet
generates a galvanic surface potential that leads to the accumulation of electrons at the
interface which attracts cations (mostly H+), forming the electrical double layer (EDL).
The interfacial autogenous potential and excess electrons create an ideal environment to
drive reduction reactions. The MoO42- species, when introduced into the EDL, undergo a
reduction reaction at the interface as described by Equation 4.1, with the gallium at the
reduction product, a uniform layer of H2MoO3 is then templated onto the atomically
smooth liquid-liquid interface between the EGaIn droplet and the precursor solution.
To verify this reaction, cyclic voltammograms of the Na2MoO4 precursor solution were
acquired as shown in Figure 4.2B. In the cathodic region, the reduction peak at -0.24 V
114
is attributed to the reduction of the MoO42- species into H2MoO3.2 The onset potential for
available on the acid activated EGaIn droplet was assessed with an V oc measurement in
an aqueous solution that simulates the same acidity of the precursor solution (Figure
4.2C). The measured surface potential of -0.4 V is significantly larger than that -0.08 V
which is the potential needed to trigger the reduction of MoO 42- species as determined
from the cyclic voltammograms in Figure 4.2A. This means that the surface potential of
EGaIn droplet is sufficient to reduce the MoO42- spontaneously and induce the template
Figure 4.2 (A) Schematic illustration of H2MoO3 layer formation on EGaIn surface. (B)
rates, scanned in the potential window from 0.80 to -0.40 V (negative scan), initial and
final voltages were both set to 0.0 V vs. SCE. (C) The galvanic surface potential of the
EGaIn droplet was measured over time in 0.10 M KCl (solution pH was adjusted to 4.0
using HCl).
115
The extraction and transfer of the deposited layer were conducted using a touch-transfer
technique as schematically presented in Figure 4.3 and detailed in Section 4.2.3. In order
to improve the reproducibility and stability of the transfer, a program controlled piezo-
electric stage with a nanometre spatial resolution was utilised. Without using a highly
controlled and high-resolution piezoelectric stage, the chance of failure to obtain high
quality and large area films, without any cracks or holes, would increase. In brief, a pre-
cleaned smooth substrate was brought into contact with the H2MoO3-bearing EGaIn
droplet. Atomic scale contact at large area could be achieved due to the ultra-smooth
surface of the H2MoO3 layer and the liquidity of the EGaIn underneath which acted as a
soft cushion. The non-polar nature of the EGaIn surface results in a weak interaction
between the surface layer and the parent metal. On the other hand, the cumulative van der
Waals forces between the smooth substrate and the layer on the surface of liquid metal
enabled the layer extraction onto the substrate upon lifting-off with the piezo-electric
long as the surface of both the deposited material and the substrate is smooth enough for
the formation of the van der Waals force between them. Residual materials from EGaIn
that adhered on the transferred layer were removed by a sonication bath in ethanol later.
positioning device.
116
As shown in the optical images (Figure 4.4), the exfoliated and transferred layers feature
a uniform sheet of large area that is free of residual EGaIn. Various substrates including
a SiO2/Si rigid substrate and a flexible PDMS substrate are applied to prove the substrate-
substrates.
AFM analysis further verified the transferred layer to be smooth and uniform (Figure 4.5).
It is noteworthy that the thickness of the layer can be controlled by the reaction duration
in a wide range from a few nanometres to ~100 nm (as per Figure 4.6 and 4.7).
117
Figure 4.5. An AFM image of H2MoO3 films.
118
Figure 4.7 The box chart presenting the thickness distribution of materials yield at
The chemical composition of the resultant H2MoO3 layer was analysed by XPS and
Raman spectroscopy. As shown in the high-resolution XPS depth profile of the as-
transferred H2MoO3 layer at Mo 3d region (Figure 4.8A), one doublet with the binding
energies of 229.4 and 232.9 eV could be observed, corresponding to Mo 4+ 3d5/2 and Mo4+
3d3/2 peaks, respectively.3 The peak locations show negligible changes over depth, which
means that the chemical state of molybdenum is identical at the surface and bulk of the
H2MoO3 layer in Figure 4.8B was collected directly from a H2MoO3-bearing EGaIn
droplet (before the material was touch-transferred). The broad peak at 775 cm -1
Mo3). The small peak at 850 cm-1 corresponds to the stretching mode of a doubly
Figure 4.8 Chemical characterization of the as-deposited H2MoO3 sheet. (A) High-
resolution XPS depth profile of the as-transferred H2MoO3 layer at Mo 3d region and (B)
Raman spectrum of the H2MoO3 layer collected while on liquid metal droplet.
The thermal transformation of the H2MoO3 was investigated via annealing the material
in an ambient controlled stage (Linkam, UK) under an inert atmosphere (Argon gas). As
can be seen in the optical microscopy images (Figure 4.9A), during the annealing, a few
blue dots started to emerge in the jade green H2MoO3 layer, which gradually expanded
throughout the entire layer. Such an observation could be associated with a phase
transformation and/or thickness change process that have been initiated at 350 ⁰C. To
verify this hypothesis, Raman spectra of the material were acquired before and after
thermal annealing. The Raman spectra of the H2MoO3 layer on SiO2/Si substrate before
and after annealing are presented in Figure 4.9B, black and red lines, respectively. To
investigate the temperature at which the thermal transformation occurs, in situ Raman
measurements were carried out during the thermal annealing process. As presented in
120
Figure 4.9C, the intensities of the two peak groups of the H2MoO3 gradually vanish in the
temperature range of 150 ⁰C to 350 ⁰C. When the sample is heated from 350 ⁰C to 400 ⁰C
(highlighted by the grey dashed rectangle), however, an abrupt change can be observed
in the Raman spectra, with three new peaks at 200, 355 and 735 cm -1 emerging. These
new peaks are in alignment with the characteristic peaks of MoO2, suggesting a phase
transformation process from H2MoO3 to MoO2 which starts at 350 ⁰C. The produced
Figure 4.9 Thermal transformation of H2MoO3 layer. (A) Optical microscopy images of
between 350 ºC and 400 ºC. (B) Raman spectra of the amorphous H 2MoO3 layer before
annealing and the crystalline MoO2 after annealing (on SiO2/Si substrate) and (C) in situ
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The cross-section of the thermally annealed product was obtained using FIB milling
(Figure 4.10). A Pt protective layer was coated on the sample prior to the milling process.
The EDS mapping of the sample’s cross section shows a consistent distribution of Mo
and O sandwiched between the Si-SiO2 substrate and the Pt (Figure 4.11). The high-
resolution TEM in Figure 4.12 suggests a polycrystalline sample with a d-spacing of 3.4
Figure 4.10 SEM-FIB process and the resultant sample for cross-sectional TEM analysis.
Figure 4.11 EDS mapping of the TEM sample (scale bar: 100 nm).
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Figure 4.12 High-resolution TEM images of the thermo-annealed MoO2.
Other than thermal annealing, the transformation of H2MoO3 into MoO2 could also be
induced via high-power laser exposure. This approach has the advantage of annealing
selective regions on the H2MoO3 at room temperature and creates conductive patterns of
scanning laser (λ = 532 nm, beam size of 1 µm) was utilised for transforming selected
regions of H2MoO3 layer into MoO2. The laser annealing at different powers and exposure
times were conducted for parameter optimization. As shown in Figure 4.14, laser power
of 18 mW led to the best results with strong MoO2 Raman signals. A higher laser power
the material. It’s noteworthy that variation in exposure time resulted in no significant
difference in the annealing outcomes, which indicated that 1 ms exposure time was
The chemical composition of the laser-patterned material was assessed with the high-
resolution XPS. Figure 4.13B presents the XPS depth profile of the laser-annealed
materials at the Mo 3d region. At the surface of the material (depth=0), two peaks at 232.9
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eV and 236.1 eV are attributed to the Mo6+ 3d5/2 and Mo6+ 3d3/2 peaks are observed,9
suggesting the presence of a very thin layer of MoO3 on the surface. According to the
peak deconvolution results (Figure 4.15), the XPS signal also consists of two small peaks
at 235.2 and 231.1 eV, which correlates to a small amount of Mo with lower oxidation
state induced by oxygen vacancies. Beneath the MoO3 layer with high oxygen vacancy,
a significant shift toward lower binding energies, i.e., lower oxidation state of Mo, is
observed with increasing depth. At a depth from 5 to 85 nm, the Mo 3d 5/2 peak gradually
shifts from 229.5 to 229 eV, and the peak Mo4+ 3d3/2 gradually shifts from 232.7 to 232.3
eV, indicating the materials at this range to be slightly nonstoichiometric MoO 2. From
the XPS depth profile analysis, it is concluded that the produced material consists of
nonstoichiometric MoO2 covered by a thin layer of MoO3 with oxygen vacancies at the
surface.
Figure 4.13 (A) Schematic illustration of the laser-patterning process utilising Raman
laser (532 nm). (B) High-resolution XPS depth profile of the laser annealed molybdenum
oxide layer at Mo 3d region. The black dashed rectangle highlights the Mo6+ on the
surface, while the white dashed rectangles highlight the Mo4+ corresponding to MoO2
underneath.
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Figure 4.14 Optical images and Raman spectra of materials annealed at different laser
powers and exposure times. (A-C) Optical images of materials acquired at 10%, 50%,
and 100 % laser powers, respectively. (D-F) Raman spectra of materials acquired at 10%,
50%, and 100 % laser powers, respectively. Characteristic peaks of MoO2 were marked
with stars.
Figure 4.15 Peak fitting of the high-resolution XPS of the surface of the laser-annealed
the laser annealing process, the sample colour transforms from jade green into a dark blue
as a result of change in both the thickness and chemical composition. The colour change
is in agreement with the colour change induced by the thermal transformation in Figure
4.9A (for comparable thicknesses). Raman analysis was utilised to further investigate the
chemical composition of the laser annealed sample. Raman spectra of the pristine
H2MoO3 layer (red spectrum) and the laser-annealed material (black spectrum) are
presented in Figure 4.16B. After laser annealing, the broad peaks of H2MoO3 (centred at
300 and 770 cm-1) film disappears, and new peaks of MoO2 at 200, 355 and 735 cm-1
emerge instead. The emerged Raman peaks observed in the annealed area are consistent
with those obtained by thermal annealing (Figure 4.9C). This further confirms that the
proposed here. It is noteworthy that due to the ultrathin nature of the surface MoO 3 layer,
no Raman signal from it is observed. 10, 11 It is well established that the most stable phase
of MoO3 is the α-MoO3. The other phases of MoO3 such as (β-phase, ε-phase) are
metastable.37 Hence, it is fair to deduce that the surface layer of MoO3 is likely to be alpha
phase.
Raman mapping of the diamond-shaped pattern was obtained to verify the compositional
distribution and uniformity. Raman intensities at 200, 355, 735 cm-1 (characteristic peaks
of MoO2) and 773 cm-1 (characteristic peak of H2MoO3) are highlighted using dotted lines
in Figure 4.16B and their spatial distributions are presented in Figure 4.16C-F,
respectively. The purple, green, and blue maps (Figure 4.16C-E) correspond to the spatial
distribution of MoO2 while the red map (Figure 4.16F) represents the distribution of
H2MoO3. The Raman maps at 200, 355 and 735 cm -1 feature strong intensity in the
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that the laser annealing technique can selectively anneal desired areas without affecting
Figure 4.16 (A) Optical microscopy image of molybdenum oxide sheet transferred onto
SiO2 substrate and annealed by exposure to a high-power laser. The darker diamond-
shaped area is the annealed material. (B) The Raman spectra of the molybdenum oxide
layer collected from non-annealed (red) and annealed (black) areas. Characteristic Raman
peaks of MoO2 at 200, 355 and 735 cm-1, marked by purple, green and blue dashed lines,
respectively, and the stretching mode of triply coordinated oxygen in the amorphous
H2MoO3 at 773 cm-1, marked by a red dashed line. Raman signals of Si substrate are
marked with yellow triangles. (C-F) Raman intensity mapping at 200, 355, 735, and 773
cm-1, respectively.
To further investigate the optical properties, the H2MoO3 layer was printed onto
transparent quartz substrates. Optical images and UV-Vis absorption spectra of the
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printed H2MoO3 layer and MoO2 on these substrates were obtained. As can be seen in
Figure 4.17A, the optical images of the as transferred H2MoO3 layer features a pale-
yellow colour, which transforms into a dark blue colour upon laser annealing. As shown
in the UV-Vis absorption spectra in Figure 4.17B, the H2MoO3 layer shows little
absorption in the visible range. However, after laser annealing, a broad absorption band
at visible to near-infrared (NIR) region emerges, which could be attributed to the surface
electrons.12 It is known that BSA could be immobilized and adsorbed onto the
molybdenum oxide surface due to the electrostatic interactions and the collective van der
Waals’ forces between them. 13, 14 The negatively charged BSA repels the free electrons
on the surface and decreases its surface free electron intensity, which leads to the
plasmonic properties of the laser annealed material, samples were treated with BSA and
the variation in its UV-vis absorption behaviour and electronic property was assessed. As
shown in Figure 4.17C, the plasmonic resonance peak at visible to NIR region
4.18 that the material conductivity decreases due to the adsorption of BSA on the surface
of the film, which consequently reduced the thickness of the conductive channel and thus
increased the resistivity in response. Such observation suggests that the MoO 2 produced
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Figure 4.17 (A) Optical images of the pale yellow H2MoO3 layer and the dark blue laser
annealed molybdenum dioxide layer. (B) The UV-Vis absorption spectra of H 2MoO3
(yellow spectrum) and laser annealed molybdenum dioxide (black spectrum). A broad
absorption band centered at around 800 nm emerged upon laser annealing as highlighted
by a black arrow. (C) The UV-Vis spectra of the laser annealed molybdenum oxide before
Figure 4.18 I-V curves of the MoO2 based device before and after the BSA treatment.
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4.3.4 Morphology properties of the MoO2 patterns
To investigate the morphology variation induced by the laser annealing process, AFM
and SEM were employed. Figure 4.19A presents the AFM analysis of the laser annealed
area. As shown in the AFM height profile, the layer experiences a decrease in thickness
by 45 nm upon the laser exposure. High resolution AFM image of the laser annealed area
in Figure 4.20 shows a grainy feature. According to the roughness calculation and the
depth distribution profile (Figure 4.21), average roughness (Ra) of the material increases
about one order of magnitude (from 0.922 nm to 8.81 nm). The AFM analysis suggests
that the laser exposure process thins and roughens the layer. The SEM image of the laser
annealed area is presented in Figure 4.19B, and the zoomed-in images of the material
before and after laser annealing are shown in Figure 4.19C and D, respectively. The layer
before annealing appears to be smooth and uniform, while the annealed material presents
a rough and grainy surface. This observation is in alignment with the AFM results. High-
resolution TEM was utilised to assess the crystallinity and structure of the laser annealed
samples. As shown in Figure 4.19E, the laser annealed area is polycrystalline with distinct
crystallites and grain boundaries as highlighted by yellow dashed lines. In Figure 4.19F
and G, lattice spacings of 0.34 nm are highlighted, which correspond to the (1 11) and
(111) crystal planes of the monoclinic MoO2.8 Figure 4.19H presents the crystal structure
Figure 4.19F and G. It is concluded from the chemical and morphological analysis that
MoO2 in the bulk, and ultra-thin α-MoO3 on the surface, which is schematically presented
in Figure 4.19I.
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Figure 4.19 Topological and structural characterization of the laser-annealed
molybdenum oxide. (A) The AFM image of the laser-annealed area. The inset is the
topography profile showing the thinning of the sample by 45 nm after laser annealing.
annealing. (C) SEM image of the non-annealed amorphous molybdenum hydroxide. (D)
SEM image of the laser-annealed molybdenum dioxide. (E) High-resolution TEM image
by yellow dashed lines. The inset is the selected area electron diffraction (SAED) pattern
of the laser-annealed molybdenum oxide. (F, G) High-resolution TEM image of the laser-
annealed molybdenum dioxide layer, showing the d-spacing of the (1, 1, 1) and (1, 1, 1)
dioxide. (I) Schematic representation of the composition and grainy structure of the laser-
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Figure 4.20 High resolution AFM topography of the laser annealed sample.
Figure 4.21 Roughness calculations based on AFM imaging of a sample (A) before and
DFT calculations were carried out to assess the electronic structure of the laser produced
orbitals, with the U parameter adopted from past work, with further details given in
section 4.2.10.18, 19 Figure 4.22A and B shows the unit cell structure and the electronic
band structure of bulk MoO2 which is semi metallic, and has a zero-gap feature between
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conducting and valence bands at the Fermi level. The bulk, stoichiometric α-MoO3, on
the other hand, is a wide band gap insulator as concluded from the electronic band
structure calculations (Figure 4.23A and B). Pristine 2D α-MoO 3 as shown in Figure
4.22C, also presents a similar wide band gap structure as the bulk α-MoO3 (Figure 4.22D).
On the contrary, our DFT calculations show that oxygen vacancies (incorporated into the
O1/O2/O3 positions as highlighted in Figure 4.23C) in the 3D α-MoO3-x unit cell can
introduce defect states in the band structure (Figure 4.23D). Similar defect states were
observed in the band structure calculations for 2D MoO3-x with the oxygen vacancy in the
O3 position which is the energetically preferred site in 2D (Figure 4.22E and F). For any
type of oxygen vacancy, the defects lead to in-gap states in the calculations explaining
the finite conductivity20 in the laser-induced MoO3 surface layer. The presence of oxygen
vacancies in the thin MoO3 layer was also experimentally confirmed from the XPS
Since the laser processed sample features a grainy structure and XPS showed that α-
MoO3 appears on the surface of the grains, the density of states (DOS) of the grain
boundaries of α-MoO3 were assessed. As observed from the DOS diagram in Figure
4.22G, the grain boundaries of α-MoO3 (the boundary structure in Figure 4.24A) can have
a narrower band gap owing to structural disorder, compared to the pristine bulk and 2D
α-MoO3. The band-tails from disorder can potentially provide conductive boundary states
between the grains. Furthermore, adding a vacancy in bridging O position of the coherent
[100]||[001] boundary (Figure 4.24B) increases the DOS at the Fermi level as presented
in Figure 4.23H, leading to more conductive boundaries. The DFT calculation results
suggest that the laser patterned molybdenum oxide is conductive in the bulk via the
underlying MoO2 and also conductive on the surface, at the grain boundaries, through the
boundary states and oxygen vacancies of the α-MoO 3-x surface layer.
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Figure 4.22 First principal calculation results. (A) Crystal structure of monoclinic MoO 2
(B) Band structure of MoO2. (C) Crystal structure of 3D-MoO3 (D) Band structure of 2D-
MoO3 (E) Crystal structure of 2D-MoO3-x with an oxygen vacancy. (F) Band structure of
2D-MoO3-x with an oxygen vacancy. (G) DOS diagram of the grain boundary of 2D
MoO3. (H) DOS diagram of the grain boundary of 2D MoO3-x with an oxygen vacancy at
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Figure 4.23 (A and B) Crystal structure and band structure of 3D MoO 3. (C and D)
Figure 4.24 (A) Structure of the modelled grain boundary of 2D MoO3. (B) Structure of
the modelled grain boundary of the 2D MoO3 with oxygen vacancy at bridging oxygen
position.
135
4.3.6 Peak-force tunnelling AFM measurement for conductivity assessment
To verify our hypothesis and the outcomes of the DFT calculations, the conductivity of
the MoO2 pattern was assessed. In this regard, peak force tunneling AFM (PF-TUNA)
was used for obtaining the conductivity of the patterned samples. In this case, the
specimens were fabricated by printing the H2MoO3 layer onto a gold-patterned Si/SiO2
molybdenum dioxide were then written by laser exposure between and on the gold
patterns. The gold pattern was connected to the AFM chuck to close the circuit. A constant
bias was applied between the sample and the conductive AFM tip, as schematically
presented in Figure 4.25B, and the current through the tip was measured as it scanned the
sample surface.
As shown in Figure 4.25C, a diamond shape pattern of molybdenum dioxide was written
on gold using a laser exposure time of 10 ms point -1. The corresponding AFM and PF-
TUNA measurements are presented in Figure 4.25D and E. The AFM topography
analysis presented in Figure 4.25D shows a thickness decrease by ~40 nm after annealing
(thickness profile is provided in Figure 4.26A). The TUNA current mapping (Figure
the pattern. As shown in the TUNA current profile (Figure 4.26B), multiple sharp peaks
of current signal can be clearly observed. No current signal was observed from the
surrounding non-annealed area, reflecting the insulating nature of the H 2MoO3 layer.
Single point I-V curves were collected from the laser-annealed area and non-laser-
annealed area as presented in Figure 4.25F. The I-V curve from laser-annealed area shows
a linear I-V characteristic, which proves the material to be conductive. The I-V curve
from non-laser-annealed areas, on the other hand, show insignificant current at the voltage
of 5V, which indicate the poor conductivity of the non-annealed H 2MoO3 layer.
136
Linear patterns (Figure 4.25G) were also written by laser annealing at different laser
exposure times (1, 10 and 100 ms point-1) between the gold patterns. As shown in Figure
4.25H, no significant morphological variations are observed except that the higher
exposure time at 100 ms point-1 leads to wider valleys compared to those of 1.0 and 10
ms point-1, which can also be observed in the thickness profile provided in Figure 4.26C.
The corresponding PF-TUNA current image (Figure 4.25I) and the current profile (Figure
4.26D) show that those patterns obtained at laser exposure time of 1 and 10 ms point -1 are
similar in terms of current magnitude and homogeneity, while the higher exposure time
of 100 ms point-1 led to a slightly higher current but less homogeneity due to laser
overexposure. In addition, given that the PF-TUNA measurement was carried out on the
materials in between the gold pattern, contact was provided entirely by the MoO2,
Despite the MoO2 is covered with a wide band gap material (α-MoO3), the conductivity
measurement suggests that the surface of the annealed material has conductive regions.
This can be a result of either boundary states, as a result of the increased DOS around the
Fermi level. This is induced by oxygen vacancies of α-MoO3 as predicted earlier by the
conducting patterns that are consistent with the grain boundaries of the surface layer of
the α-MoO3 (as presented in Figure 4.25L, the overlapped image of the high-resolution
These results explain the discontinuous current signal in the PF-TUNA measurement in
Figure 4.25E where the discontinuous current signal originates from the grain boundaries
of the α-MoO3 due to boundary states and/or oxygen vacancies at the boundaries as
addition, the laser patterning and conductivity measurement were carried out on the
flexible PDMS substrate. In Figure 4.28, the I-V curve of the MoO 2 pattern on PDMS
shows a linear characteristic with good conductivity. This verified the compatibility of
Figure 4.25 The conductivity assessments of the laser-annealed patterns. (A) Schematic
illustration of the laser-patterning process utilising a focused beam laser at 532 nm. (B)
Schematic illustration of the open loop PF-TUNA measurement. (C) Optical microscopy
image of a diamond shaped MoO2 pattern made by laser annealing. (D) The AFM image
of the laser annealed pattern. (E) TUNA current channel of the open loop PF-TUNA
measurement of the laser annealed pattern. (F) I-V curve measured from points 1 and 2
respectively. (G) Optical microscopy image of the linear MoO 2 pattern made by laser
annealing. (H) The AFM image of the linear MoO2 pattern. (I) TUNA current channel of
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the open loop PF-TUNA measurement of the linear MoO 2 pattern. (J) High resolution
AFM image of the laser-annealed area, where grains of various sizes can be observed.
(K) TUNA current channel of the open loop PF-TUNA measurement (high resolution).
(L) The overlapped image of the high-resolution topography and TUNA current channel.
Figure 4.26 (A) Height profile of Figure 4.25D. (B) Current profile of Figure 4.25E. (C)
139
Figure 4.27 Further high-resolution PF-TUNA measurements. Left column: height
profiles. Middle column: current profiles. Right column: the overlapped images of
140
Figure 4.28 The I-V curve of the laser annealed MoO2 on PDMS, with the optical
4.5 Conclusions
The author demonstrated the deposition of large area and uniform H2MoO3 layers on
EGaIn droplet, where Na2MoO4 aqueous solution as the precursor and the built-in
potential at the EGaIn surface served as the driving force of the reaction and the smooth
surface templating. Due to the liquidity and non-polarity of EGaIn, the resultant H 2MoO3
layer could be transferred onto any desired substrate via a room temperature touch-
molybdenum oxide layer could go through the dehydration and crystallization process by
both thermal annealing and also laser exposure at room temperature. These processes
optically focused laser beam, the H2MoO3 layer could be patterned into conductive MoO2
at selective areas, which was verified by Raman mapping and PF-TUNA. An atomically
141
thin surface layer of conductive MoO3-x could also be detected on the laser processed
edges and boundaries of the grains, which according to the XPS analysis and DFT
the band-tails along the grain boundaries from disordered structures. Additionally, the
MoO2 layer was shown to have plasmonic effects, and was employed for a proof-of-
principle biosensing demonstration. The results reported here establish a future protocol
for creating conductive patterns for electronic applications that can be all processed at
room temperature which can be incorporated onto any substrate with no limitation.
4.6 References
1. Wang, Y.; Mayyas, M.; Yang, J.; Ghasemian, M. B.; Tang, J.; Mousavi, M.;
Han, J.; Ahmed, M.; Baharfar, M.; Mao, G., Liquid-metal-assisted deposition
2. Li, W.; Tian, L. P.; Huang, Q.; Li, H.; Chen, H.; Lian, X., Catalytic oxidation
molybdenum oxide thin films. 1. Calcination and reduction studies. J. Phy. Chem.
4. Ajito, K.; Nagahara, L.; Tryk, D.; Hashimoto, K.; Fujishima, A., Study of the
142
5. Eda, K., Raman spectra of hydrogen molybdenum bronze, H 0.30MoO3. J. Solid
molybdenum oxide using a focused laser beam. J. Mater. Chem. C 2017, 5 (8),
2090-2097.
S.; Sygellou, L.; Soultati, A.; Kostis, I.; Papadimitropoulos, G.; Davazoglou,
work function and gap states for application in organic optoelectronics. J. Am.
9. Fleisch, T.; Mains, G., An XPS study of the UV reduction and photochromism of
10. Kalantar-Zadeh, K.; Tang, J. S.; Wang, M. S.; Wang, K. L.; Shailos, A.;
Galatsis, K.; Kojima, R.; Strong, V.; Lech, A.; Wlodarski, W.; Kaner, R. B.,
11. de Castro, I. A.; Datta, R. S.; Ou, J. Z.; Castellanos-Gomez, A.; Sriram, S.;
12. Zhu, Y. P.; El-Demellawi, J. K.; Yin, J.; Lopatin, S.; Lei, Y. J.; Liu, Z. X.;
1908392.
143
13. Alsaif, M. M. Y. A.; Latham, K.; Field, M. R.; Yao, D. D.; Medhekar, N. V.;
Beane, G. A.; Kaner, R. B.; Russo, S. P.; Ou, J. Z.; Kalantar-zadeh, K., Tunable
14. Alsaif, M. M. Y. A.; Field, M. R.; Murdoch, B. J.; Daeneke, T.; Latham, K.;
Chrimes, A. F.; Zoolfakar, A. S.; Russo, S. P.; Ou, J. Z.; Kalantar-Zadeh, K.,
15. Kresse, G.; Furthmüller, J., Efficient iterative schemes for ab initio total-energy
calculations using a plane-wave basis set. Phys. Rev. B 1996, 54 (16), 11169.
16. Kresse, G.; Furthmüller, J., Efficiency of ab-initio total energy calculations for
metals and semiconductors using a plane-wave basis set. Comput. Mater. Sci.
17. Kresse, G., Ab initio molecular dynamics for liquid metals. Journal of Non-
18. Dudarev, S.; Botton, G.; Savrasov, S.; Humphreys, C.; Sutton, A., Electron-
19. Lei, Y.-H.; Chen, Z.-X., DFT+ U study of properties of MoO3 and hydrogen
20. Peelaers, H.; Chabinyc, M.; Van de Walle, C., Controlling n-type doping in
144
Chapter 5 Band structure modulation of gallium-based liquid metal
145
5.1 Introduction
Gallium-based liquid metals hold intriguing properties and can be utilised in various
applications. Upon micronizing and breaking down the liquid metal bulk into small
droplets, these droplets can be used for making flexible compounds with ideal electrical
properties and expand their applications into desired directions. Utilising the super active
surface of liquid metals, deposition of the secondary materials on their surfaces, induced
by interfacial reactions, is a viable way for surface decoration. By exposing the liquid
which can lead to depositions of secondary materials on the surface of the EGaIn droplets
In this chapter, the author demonstrates the manipulation of the band structure of liquid
examples to show the possibility of surface decoration of liquid metal particles with thin
as, after the synthesis, they remain on the surface of gallium-based alloy and do not
dissolve into the core of the droplets. The band structures of the liquid metal particles
The content of this chapter was included in a paper titled ‘Band structure modulation of
gallium-based liquid metal particles via coating with molybdenum oxide and oxysulfide’,
146
5.2 Methods
5.2.1 Materials
All the chemicals were purchased from commercial sources and used as received without
further purification. Milli-Q water (18.2 MΩ·cm at 25 °C) was used in all experiments.
Eutectic gallium indium alloy (EGaIn) was prepared in-house by melting gallium (75.5
wt%) and indium (24.5 wt%) metal mixture at 100 °C on a hot plate and while stirring
with a glass rod until thoroughly mixed. The liquid alloy was then naturally cooled down
at room temperature, transferred from/into the glass vial, and stored for further use.
15 mins with a probe sonicator (VCX 750, Sonics & Materials, Inc.) with a 5 mm diameter
probe to create EGaIn particles. After sonication, the suspension of EGaIn particles was
centrifuged (CR4000 centrifuge, Thermoline Scientic) at 10000 rpm for 12 min, and the
clear supernatant was removed. The remaining suspension of EGaIn particles was ready
(EGaIn@MoOxSy)
aqueous solution of hydrochloric acid (HCl, 5M, 200 uL) was added to the solution to
accelerate the reaction. The mixture was magnetically stirred for 12 hours while the
147
molybdenum sulfide layer grows on the surface of EGaIn particles to form a core-shell
structure. The (NH4)2MoS4 solution slowly decomposes over time and such a process
slightly accelerates under light radiation.2 Therefore, freshly prepared precursor solutions
were applied, and the reaction was kept in dark. After the reaction, the resultant
EGaIn@MoOxSy particles were centrifuged and washed with water 3 times to remove
(5M, 2.0 mL) by bath sonication. The mixture was magnetically stirred for 48 hours due
to its slower reaction rate while the molybdenum oxide layer grows on the surface of
EGaIn particles to form a core-shell structure. After the reaction, the resultant
EGaIn@MoOx particles were centrifuged and washed with water 3 times to remove any
system (JEOL JSM-IT500) were utilised to investigate the morphological features and
elemental distribution of the particles. The specimens were prepared by dispersing the
148
particles in water and drop-casting the suspension on conductive Si wafers. The electron
acceleration voltage was 15 V, and the images were captured at a speed of 20 seconds per
frame.
X-ray photoelectron spectroscopy (XPS) analysis was carried out using a Thermo
X-ray source (1486.68 eV). For spectral acquisition, 120 W power (13.8 kV × 8.7 mA),
2 × 10−9 mbar background vacuum, 90° photoelectron takeoff angle, and 500 μm spot
size were applied. C 1s = 284.8 eV for adventitious hydrocarbon was used as a reference
for calibration. Avantage XPS software (from Avantage Software Ltd., U.K.) was
nm laser was utilised for obtaining Raman spectra. Spectra were collected with standard
confocality and recorded at a static grating scan type with 1800 lines mm −1 grating
(spectral resolution of ∼1.5 cm−1 per point) One second exposure time, and 50 times
magnification 1.0% laser power (0.36 mW on the sample), and 600 accumulations were
(UV−vis, Agilent Cary5000). The specimens were prepared by drop-casting the particles
suspension on transparent quartz substrates. A blank quartz substrate was used for the
baseline correction.
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5.3 Results and discussion
Stoichiometric MoO3 and MoS2 and both are n-type semiconductors with bandgap of 3.2
eV1 and 1.1 eV, 2 respectively. The differences in bandgaps make them good choices for
observing the bandgap variations after the decorations. Aqueous solutions of ammonium
[(NH4)2MoS4] were applied as precursors for MoOx and MoOxSy decoration layers,
respectively. Surface decoration of EGaIn particles was achieved via interfacial reaction
between liquid metal and aqueous precursors. The reactive and smooth surface of EGaIn
particles serves as a reaction media and deposition template, and the build-in potential at
the liquid metal-aqueous solution interface acts as a driving force that leads to the
deposition of a layer of secondary materials (in this case MoOxSy and MoOx) on the
EGaIn@MoOx
As shown in the SEM images in Figure 5.1A and B, the as-prepared EGaIn particles take
on a spherical shape with a smooth surface. EDS measurements and elemental mappings
(Figure 5.1C) show a uniform distribution of gallium and indium on the particles’ surface.
As shown in the SEM image in Figure 5.1D and E, the EGaIn@MoO xSy particles inherit
the spherical shape of EGaIn particles with a shell-like structure covering the liquid metal
single particle in Figure 5.1F, uniform distribution of Mo and S were observed on the
150
shell of the particle, while gallium and indium were observed throughout the particle. In
particular, the particle shows a breakage of the shell and some leakage of the core
materials at its top-right corner. The leaked core materials show gallium and indium
elements but little Mo and S distribution, which verified that the particles consist of EGaIn
cores and MoOxSy -containing shells. Spherical structures with a somehow rougher
5.1G and H), however, as shown in Figure 5.1I, EGaIn@MoOx particles rendered uniform
histogram (Figure 5.2), the average diameter of the EGaIn particles is ~ 470 nm, which
increased to ~ 700 nm and ~ 650 nm after MoOxSy and MoOx decoration, respectively.
These results indicates that the thickness of the deposited layers is ~100 nm in both cases.
oxygen, and sulfur (Figure 5.3A). The peak centered at 20.9 eV (red line) is assigned to
3d orbitals of Ga3+, indicating the oxidization of metallic gallium during the deposition
process that led to Ga2O3 or GaOOH in the shell. The peak with a binding energy of 18.7
eV (blue solid line) corresponds to gallium in the metallic state (Ga0) indicating a small
amount of the exposed liquid metal cores due to broken shells. The peak at 24.1 eV
to the oxygen atoms in the surface absorbed ambient H2O molecules, which is consistent
with previous reports.4 The major peak centered at 531.7 eV agrees with the previously
reported data of metal hydroxide (Me-OH), attributed to GaOOH.5 The small peak located
at 530.9 eV agrees with the value of metal oxide, which in this case could be assigned to
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Figure 5.1 SEM and EDS analysis that show the droplets’ morphologies and the special
distribution of Ga, In, Mo, O and Si elements. (A) SEM image of EGaIn particles (scale
bar 1 mm) (B, C) EDS mapping of EGaIn particles (scale bar 100 nm) (D) SEM image
of EGaIn@MoOxSy particles (scale bar 1 mm) (E, F) EDS mapping of EGaIn@MoO xSy
particles (scale bar 500 nm) (G) SEM image of EGaIn particles (scale bar 1 mm) (H, I)
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Figure 5.2 Histogram of size distributions of the EGaIn, EGaIn@MoOxSy, and
EGaIn@MoOx particles.
In addition to Ga and O, the XPS surface analysis for EGaIn@MoOxSy also showed the
with a peak area ratio of roughly 3:2, and one single peak. The doublet peaks at 228.6 eV
and 231.9 eV (red lines) correspond to the 3d5/2 and 3d3/2 orbitals of Mo4+, respectively.
The doublet peaks at 229.6 eV and 232.8 eV (green solid lines) correspond to the 3d 5/2
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and 3d3/2 orbitals of Mo5+, respectively. The single peak at 226.5 eV (blue solid line) is
attributed to the 2s orbitals of sulfur. These values are in agreement with the previous
tetrathiomolybdate precursor.6 Two doublets with a peak area ratio of ~ 2:1 are related to
S 2p. The doublet at 163.2 eV and 164.5 eV (pink lines) is assigned to bridging S 22− and
apical S2−, while the doublet located at 162.3 eV and 163.5 eV (dark-yellow lines)
corresponds to unsaturated S2− and terminal S22−. The single peak centered at 161 eV
2.07:1 was found for S to Mo elements through the quantitative XPS elemental analysis,
indicating that there are substantial S-vacancies. Based on the XPS results, the observed
The XPS analysis and peak deconvolutions of EGaIn@MoOx at Ga 3d, O 1s, Mo 3d, S2p
peaks of metal hydroxide were observed at 20.9 eV and 531.7 eV, respectively, indicating
process of gallium. The peak centered at 530.9 eV agrees with that of metal oxide and
belongs to molybdenum oxide. The XPS spectrum at the Mo 3d region also rendered two
3d doublets. The doublet at 235.1 eV and 231.9 eV (red lines) corresponds to the 3d 3/2
and 3d5/2 orbitals of Mo (VI), respectively,8 whilst the doublet at 233.3 eV and 230.0 eV
(green lines) stands for the 3d3/2 and 3d5/2 orbitals of Mo(V). These results confirmed that
the generated shell contains Mo6+ and Mo5+, and the obtained molybdenum oxides can be
described as MoOx. The single peak centered at 161 eV (purple line) in S 2p region is
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Figure 5.3 XPS and peak deconvolution of Ga 3d, O1s, Mo 3d, and S 2p regions for (A)
Raman spectroscopy was applied to further verify the chemical composition of the
resulting materials. Figure 5.4 presents the Raman spectra of EGaIn, EGaIn@MoOx and
around 710 cm-1, which is associated with gallium oxide.9 In the Raman spectrum of
EGaIn@MoOx particles, the signals between 750 and 1000 cm-1 belong to the Mo-O
bonds,10 which are attributed to the molybdenum oxide in EGaIn@MoOx particles. Peaks
in this region are broad and cannot be deconvoluted, which indicates the molybdenum
oxide to be highly amorphous. A distinctive GaOOH peak at around 710 cm -1 was also
observed in this spectrum due to the long deposition time of MoO x in the aqueous
solution. In the Raman spectrum of EGaIn@MoOxSy, the peaks between 150 cm-1 to 240
cm-1 are assigned to the vibration mode of Mo-Mo bonds (Mo-Mo).11,12 The peak group
between 280 cm-1 to 350 cm-1 belongs to the vibration mode of molybdenum sulfide
bonds (Mo-S). The broad peak at around 450 cm-1 is associated with the apical sulfur
atoms [ (Mo3- 3S)]. Peaks between 510-550 cm-1 belong to disulfide ligands.13 These
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peaks indicate the presence of amorphous molybdenum sulfide in EGaIn@MoOxSy
particles. The small amount of molybdenum oxide compound can be understood by the
peaks between 750-1000 cm-1 that belong to Mo-O bonds, as verified earlier by the XPS
analysis. The absence of any distinctive sharp peak in this spectrum indicated the
to the relatively short reaction time in the aqueous media, no distinctive GaOOH signal
was observed.
In order to establish the electronic band structure of the liquid metal particles, ultraviolet
absorption spectroscopy were conducted (Figure 5.5, 5.6, and 5.7). The work function (F)
for the particles’ surface can be determined through the equation F = h - (EF - Ecutoff) 14,
where h is the energy of the photon, EF is the Fermi energy level which was calibrated
to zero by a clean gold surface, and the Ecutoff is the secondary electron cutoff energy at
the high binding energy region of the UPS spectra., The close work functions of 5.1, 5.1,
and 5.2 eV were estimated for EGaIn, EGaIn@MoOxSy, and EGaIn@MoOx particles,
Locations of valance band maximum (EVBM) were determined by the linear extrapolation
of the measured valance band onsets subtracted to the Fermi level. As shown in Figure
5.5A, the distance between EVBM and the Fermi level of EGaIn particles is 3.2 eV prior
to surface decoration, which remains relatively unchanged upon MoO x decoration and
EGaIn@MoOxSy particles were determined -8.3, -8.4, and -7.5 eV, respectively, as
UV-vis absorption spectroscopy was applied to investigate the optical properties of the
particles (Figure 5.5B). The optical band gap was calculated via Tauc analysis.15 Based
on the (ahv) = A (hv- Eg)1/2 equation, the square of the product between the absorption
coefficient, a, and the photon energy, hv, was plotted against the photon energy hv, and
the band gap (Eg) can be derived from the extrapolation of a linear fitting of the absorption
edge. As shown in Figure 5.7, the band gap of EGaIn particles was calculated to be around
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4.0 eV, which agrees with the previous report.3 Upon the surface deposition of MoOx, an
enhanced absorption was observed from the 200 nm to 650 nm region in Figure 5.5B, and
the optical bandgap decreased to 3.4 eV. When the surface was decorated with MoO xSy,
the absorption of UV-Vis light was further enhanced throughout the spectrum, and the
optical bandgap dropped to 2.7 eV. Since the bandgap of semiconductors is defined as
the distance between the EVBM and ECBM (conductive band minimum), the ECBM locations
of EGaIn, EGaIn@MoOx, and EGaIn@MoOxSy particles are thereby 4.3, 5.0, and 4.8 eV
below the vacuum, respectively, as shown in Figure 5.5C. As demonstrated, the optical
properties and band structure of the EGaIn particles were modulated by surface
Figure 5.5 (A) XPS valance band, (B) UV-vis absorption spectroscopy, and (C) band
diagram of EGaIn, EGaIn@MoOx, and EGaIn@ MoOxSy particles deduced from the
Figure 5.7 Tauc Plot of EGaIn, EGaIn@MoOx, and EGaIn@MoOxSy particles for
bandgap calculation.
5.4 Conclusions
In conclusion, EGaIn droplets were synthesised via sonication of EGaIn bulk in DI water,
and aqueous solution of [(NH4)2MoS4] and [(NH4)6Mo7O24] were used as precursors for
and XPS analysis of the droplet confirmed the chemical composition of the deposition
layer, and SEM images verified its core-shell structure. Upon surface decoration of
MoOxSy and MoOx, the band structures of the liquid metal-based droplets were modulated.
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This work demonstrates that the interfacial reaction between liquid metal and an
appropriate precursor solution was a feasible way to construct core-shell structures, and
the band structure of liquid metal droplets could be modulated by altering the composition
5.5 References
1. De Castro, I. A.; Datta, R. S.; Ou, J. Z.; Castellanos‐Gomez, A.; Sriram, S.;
2. Wang, Q. H.; Kalantar-Zadeh, K.; Kis, A.; Coleman, J. N.; Strano, M. S.,
3. Han, J. L.; Yang, J.; Tang, J. B.; Ghasemian, M. B.; Hubble, L. J.; Syed, N.;
Daeneke, T.; Kalantar-Zadeh, K., Liquid metals for tuning gas sensitive layers. J.
4. Junta-Rosso, J. L.; Hochella Jr, M. F., The chemistry of hematite 001 surfaces.
5. Shakir, I.; Shahid, M.; Kang, D. J., MoO3 and Cu0.33MoO3 nanorods for
4324-4326.
6. Zhang, L.; Wu, L.; Li, J.; Lei, J., Electrodeposition of amorphous molybdenum
sulfide thin film for electrochemical hydrogen evolution reaction. BMC Chem.
160
7. Liu, Z.; Zhang, X.; Wang, B.; Xia, M.; Gao, S.; Liu, X.; Zavabeti, A.; Ou, J.
8. Xiang, D.; Han, C.; Zhang, J.; Chen, W., Gap states assisted MoO3 nanobelt
9. Han, J.; Tang, J.; Idrus-Saidi, S. A.; Christoe, M. J.; O’Mullane, A. P.; Kalantar-
Zadeh, K., Exploring electrochemical extrusion of wires from liquid metals. ACS
10. Gong, L.; Haur, S. C., On demand rapid patterning of colored amorphous
molybdenum oxide using a focused laser beam. J. Mater. Chem. C 2017, 5 (8),
2090-2097.
11. Escalera‐López, D.; Lou, Z.; Rees, N. V., Benchmarking the activity, stability,
12. Fominski, V.; Demin, M.; Nevolin, V.; Fominski, D.; Romanov, R.;
MoSx (x~ 2, 3, and 4) films and their solid lubricant properties at low temperature.
13. Daeneke, T.; Dahr, N.; Atkin, P.; Clark, R. M.; Harrison, C. J.; Brkljaca, R.;
Pillai, N.; Zhang, B. Y.; Zavabeti, A.; Ippolito, S. J., Surface water dependent
161
14. Pansri, S.; Supruangnet, R.; Nakajima, H.; Rattanasuporn, S.; Noothongkaew,
15. Tauc, J.; Grigorovici, R.; Vancu, A., Optical properties and electronic structure
162
Chapter 6 Conclusions
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6.1 Summary of the work
synthesis via gallium-based liquid metal processes. The surface of liquid metal, due to its
intrinsic ultra-smooth and reactive nature, makes a perfect template for 2D materials
potential at the liquid metal-aqueous solution interface can serve as a driving force of the
materials at the interface. In this way, with appropriate selections of aqueous solutions as
possible on the surface of liquid metal. In particular, this approach is applicable for
compounds of metals that are not dissolvable in gallium-based liquid metals at low
temperatures, which cannot be easily harnessed from the oxidation layer of liquid metals.
This synthetic route is highly feasible, since the chemical composition, morphology and
thickness of the deposited layers could be modulated with the chemical environment at
the interface.
In this thesis, molybdenum sulfide and molybdenum oxide were chosen as examples to
In chapter 2, the author presented a literature review about 2D materials synthesis via
liquid metal-based processes. First, the author discussed the intriguing properties and
which endows them with an intrinsically ultra-flat surface and lays the very foundation
of this research. Then, the author gave a comprehensive review of recent progress
regarding the synthesis and exfoliation of 2D materials on the surface of liquid metals. At
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In chapter 3, the author demonstrated the room-temperature synthesis of molybdenum
interface. (NH4)2MoS4 solution was applied as an aqueous precursor and the surface of
assessments that the built-in potential at the interface is sufficient to destabilize the
precursor and lead to the interfacial deposition of molybdenum sulfide sheets. The
deposited 2D sheets were shown to be extracted and transferred onto desired substrates
In chapter 4, the author expended the aforementioned synthetic route and used it for the
insulting and hydrated molybdenum oxide sheets, which, under laser exposure, went
through a dehydration process and transformed into grains of crystalline MoO 2, a semi-
metal with good conductivity. As such, the as-deposited molybdenum oxide sheets could
serve as a writing medium that enables instant laser writing of conductive MoO 2 patterns.
showed high conductivity at the boundaries of the grains, which according to the density
defect states, and the band-tails along the grain boundaries from disordered structures.
In chapter 5, the author demonstrated band structure modulation of liquid metal particles
via surface decoration. As semiconductors with different band gaps, molybdenum oxide
and molybdenum sulfide were chosen as deposition materials to demonstrate the band
modulation. The liquid metal-aqueous solution interfacial reaction was applied for the
surface decoration of EGaIn particles, which led to core-shell structured liquid metal
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particles. Upon decoration, the EGaIn particles showed significant changes in their
6.2 Publications
The work presented in this thesis results in 3 first-authored and one co-first-authored peer-
reviewed journal papers. Additionally, the author of this thesis contributed and co-
authored another 8 journal papers during the course of her Ph.D. program.
Band structure modulation of gallium-based liquid metal particles via coating with
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6.2.3 Other co-authored publications with the theme of liquid metals
1656-1665 (2020)
2001997 (2020)
oxide piezoelectric layers for reduced environmental contamination using a liquid metal-
(2021).
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[6] M. Mousavi, M. B. Ghasemian, J. Han, Y. Wang, R. Abbasi, Y. Jiong, J. Tang, S. A.
liquid metal alloys: Test of NO2 selective sensing. Applied Materials Today, 22, 100954
(2021).
(2021)
synthesis via liquid metals. Despite numerous research in this field, this concept is still
facing many challenges while holding great potential. In many cases, the deposited 2D
materials are mixtures of different products and/or hydrated products, that require post-
assessment offers some insight into these interfacial reactions, mechanisms behind the
interfacial reaction and deposition of products still call for further investigations, and
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precise control of the chemical compositions and morphologies of the resulting materials
The touch transfer process in aqueous or other solutions is still a challenge. Consecutive
reaction and transfer methods like squeeze printing and roll printing for centimetre-scale
In addition, most of the existing research uses aqueous solutions, which limits the
operating temperature window to below 100 ℃. Organic solutions or ionic solutions with
higher boiling points can be used for expanding the applicable temperature window to
higher values. This also allows more choices in terms of liquid metals that can expand the
reaction system to more metals including In, Bi, and Sn as the base for the process.
169