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Question 1
Vapour
PC TC
LC
Feed
Steam
Liquid
Controlled variable 1: Liquid level in tank / volume (L)
Manipulated variable 1: Liquid flow rate (Fl)
The steam flow rate has a significant effect on the manipulated variables
temperature and pressure. Increased steam flow directly increases temperature,
producing more vapour and therefore increasing pressure. There will be a small
effect on the liquid level, as liquid will be lost to evaporation. The liquid and
vapour flow rates will have relatively little impact on the system outside of their
controlled variables (liquid level and pressure, respectively). These manipulated
variables can therefore be tightly tuned for a fast response, with the steam flow
rate tuned loosely.
1
Question 2
The absorber unit operates by passing the feed gas stream through the solvent
MEA at relatively mild temperature and pressure conditions. The CO2 is
absorbed into the solvent, leaving H2 to be captured in the gas phase. The
loaded solvent is fed to the stripper, where it is heated to release CO2. The
solvent is recycled, and blended with a make-up stream. The solvent is cooled
before being returned to the absorber.
The manipulated variables are identified as the H2 and CO2 flow rates from the
absorber and the stripper, the steam flow to the stripper, the flow of water cooling
the solvent stream, the flow rate of solvent from the absorber, and the flow rate of
the solvent make-up stream. This results in six manipulated variables.
We need to control the pressures, temperatures, and liquid levels in the absorber
and stripper units (this gives us our six controlled variables). In both units the
pressure is controlled by the flow rate of the gas stream (H2 in the absorber, CO2
in the stripper). The absorber liquid level is controlled by the flow rate of liquid
out. Temperature in the stripper is maintained by the flow rate of heating steam.
In the absorber, temperature is maintained by the flow rate of water used to cool
the solvent feed to the absorber.
In the stripper unit, the liquid level is controlled by the solvent make-up stream.
This feedback loop is rarely used, and in some plants would be monitored
manually. Neglecting solvent degradation and vaporization, the total solvent
volume in the system is conserved. Given correct starting levels, and with the
absorber solvent level on negative feedback control, the solvent level in the
stripper will be correct. Occasional addition of MEA to replace lost solvent is
required.
2
CO2
H2 Cooling
Water
PC Absorber PC Stripper
TC
Feed TC
Steam
LC
LC
Solvent (MEA)
Cooling
Water
3
Question 3
Flow rates of A and B into the reactor are set equal to the design values. The
reactor temperature is maintained at the desired level by the flow of cooling
water; because the reaction is exothermic, heat needs to be removed. Vapour
produced in the reactor is vented to avoid pressure build-up. The liquid level in
the reactor is controlled by the flow of product (C + D) to the feed heater. This
product provides the feed for the distillation column.
A relatively complete P&ID for this small chemical plant, based upon the above
control scheme, is shown on the following page.
4
PC
FC Cooling
AC Water
Feed Tank A
Reflux Drum LC
Distillation
FC Feed Heater Column
Feed Tank B LC
TC Product D
Reboiler
Cooling Water
Jacketed
Reactor LC Steam
TC
AC
Product Cooler
Cooling Water
TC
Product C