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Chapter 11
11.1 11.3
(a) 2 1016
V fp 0.0259 ln 0.3653 V
10
I D 10 15 exp GS 1.5 10
2.1Vt
We find that
For VGS 0.5 V, 2 s
211.7 8.85 10 14
15
I D 10 exp
0.5
eN a 1.6 10 19 2 1016
2.10.0259 2.544 10 cm/V 1 / 2 5
(a) L 2.544 10 5 2 s
211.7 8.85 10 14
0.3653 3 0.3653 1.6 eN a
1.6 10 19 4 1016
5
L 1.10 10 cm 0.110 m 1.799 10 cm/V 1 / 2 5
Now
L
L
0.10
0.110
L
(a) L
2 s
eN a
fp V DS sat V DS
L 1.10 m
(b) L 2.544 10 5 fp V DS sat
0.3653 5 0.3653 1.6
(i) L 1.799 10 5
L 2.326 10 5 cm 0.2326 m
0.3832 0.655 1 0.3832 0.655
L 0.2326 L 7.35 10 cm 0.0735 m
6
Now
L
0.10
L
(ii) L 1.799 10 5
L 2.326 m
_______________________________________
0.3832 0.655 2 0.3832 0.655
L 1.303 10 cm 0.1303 m 5
11.5
(iii) L 1.799 10 5
C ox
ox
3.9 8.85 10 14
0.3832 0.655 4 0.3832 0.655
t ox 120 10 8
L 2.205 10 cm 0.2205 m 5
x dT
411.7 8.85 10 0.3832 14
1/ 2
k W
I D n VGS VT
2
1.6 10 19 4 10 16
2 L
0.05 15
1.0 0.4
2
1.575 10 5 cm
2 0.80
max
QSD
0.16875 mA
1.6 10 19 4 1016 1.575 10 5 (i) V DS sat 1.0 0.4 0.6 V
1.008 10 C/cm 7 2
L 2.077 10 5
So
1.008 10 7
0.3758 2 0.3758 0.6
VT 0.5223 20.3832 1.150 10 cm 0.115 m
5
2.876 10 7
0.595 V L
I D ID
V DS sat VGS VT 1.25 0.595 0.655 V L L
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
11.7
0.16875
0.80
(a)
0.80 0.115
k n W
0.19708 mA (i) I D VGS VT
2
(ii) L 2.077 10 5 2 L
0.075
100.8 0.35
2
0.3758 4 0.3758 0.6 2
2.293 10 cm 0.2293 m
5
0.07594 mA 75.94 A
L (ii) I D I D 1 V DS
I D ID
L L 75.93751 0.021.5
78.22 A
0.16875
0.80
0.80 0.2293 1 1
(iii) ro
0.23655 mA I D 0.02 75.94
(b) 0.658 M 658 k
0.23655 0.19708 10 3
1 1
I D (b)
ro
0.075
V DS 42 (i) I D 101.25 0.35
2
2
ro 5.07 10 4 50.7 k
0.30375 mA
(c) V DS sat VGS VT 2.0 0.4 1.6 V (ii) I D 0.303751 0.021.5
(i) L 2.077 10 5 0.3129 mA
0.3758 2 0.3758 1.6 (iii) ro
1
165 k
6
2.819 10 cm 0.02819 m 0.020.30375
_______________________________________
L
I D ID
L L 11.8
Plot
0.16875
0.80
_______________________________________
0.80 0.02819
0.17491 mA 11.9
(ii) L 2.077 10 5 (a) Assume V DS sat 1 V. Then
0.3758 4 0.3758 0.6 sat
V DS sat
1.425 10 5 cm 0.1425 m L
We find
L L ( m) sat (V/cm)
I D ID
L L 3 3.33 10 3
0.16875
0.80 110 4
1
0.80 0.1425 0.5 210 4
0.20532 mA
1
0.25 410 4
I D 0.13 7.69 10 4
ro
V DS (b)
0.20532 0.17491 10 3
1 Assume n 500 cm 2 /V-s, we have
n sat
42
Then
ro 6.577 10 4 65.77 k
For L 3 m, 1.67 10 6 cm/s
_______________________________________
For L 1 m, 510 6 cm/s
For L 0.5 m, 10 7 cm/s
_______________________________________
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
11.10 (a)
n ox 1 IDL L
k n n C ox
t ox ro L L 2 V DS
4253.98.85 10 14 0.1362 10 1.2 10 6.290 10
3 4
6
110 10 8
1.2 0.16610 4 2
2 L (b)
0.1334 20
0.8 0.45
2 1
0.1362 10 3 0.8 10 4
6.290 10 6
2 1.2 ro
0.8 0.16610 4 2
0.1362 mA
1.705 10 5
1 I D L
ID ro 5.865 10 4 58.65 k
ro V DS V DS L L _______________________________________
IDL L L1
V DS 11.11
(a)
2 L
I D L 1L L
I D sat
W n C ox
VGS VT 2
V DS 2L
L 10
IDL
500 6.9 10 8 VGS 1
2
L L V DS
2
2
Now or
I D sat 0.173VGS 1
2 s
2
(mA)
L fp V DS fp V DS sat
eN a and
0.3758 0.35
5
1.660 10 cm 0.166 m
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
1 -- -- 0 1.25
2 410 5 397 0.370 3.2 10 6 cm/s
3 6 10 5 347 0.692
I D 3.452 10 7 3.2 10 6
4 8 10 5
315 0.989 1.10 mA
5 10 10 5 292 1.27 (iii) For V DS 1.25 V, ds 410 6 cm/s
I D 3.452 10 7 4 10 6
(c) The slope of the variable mobility curve is
1.38 mA
not constant, but is continually decreasing.
_______________________________________ (iv) For V DS 2 V, ds 410 6 cm/s
I D 1.38 mA
11.12 (c) For part (a), V DS sat 2 V
Plot
_______________________________________ For part (b), V DS sat 1.25 V
_______________________________________
11.13
(a) C ox
3.98.85 10 14 11.14
Plot
200 10 8 _______________________________________
1.726 10 7 F/cm 2
C W 11.15
K n n ox (a) Non-saturation region
2L
475 1.726 10 7 10 1 W
I D n C ox 2VGS VT V DS V DS
2
21.0 2 L
4.10 10 4 A/V 2 0.410 mA/V 2 We have
For VGS VT 2 V, V DS sat 2 V
C
C ox ox ox
(i) I D 0.410 220.5 0.5
2
and
t ox k
0.7175 mA W kW , L kL
(ii) I D 0.410 221.0 1.0
2
also
1.23 mA VGS kVGS , V DS kVDS
(iii) I D 0.410 221.25 1.25
2
So
1.409 mA 1 C kW
I D n ox
(iv) I D 0.410 222 2
2
2 k kL
1.64 mA
2kVGS VT kVDS kVDS
2
(b) I D WC ox VGS VT ds Then
10 3 1.726 10 7 2 ds I D kI D
3.452 10 A 10 In the saturation region,
1 C kW
ds
eN a x dT r j
11.16
I D sat WC ox VGS VT sat
2x
VT 1 dT 1
C ox L rj
C
kW ox kVGS VT sat
k
1.6 10 19
5 10 1.419 10 5
16
or 2.876 10 7
I D sat kI D sat
1 20.1419 1
0.25
0.80
_______________________________________ 0.25
11.17 VT 0.0569 V
(a) _______________________________________
k n W
(i) I D max VGS VT
2
2 L 11.19
0.15 6 3.98.85 10 14
3 0.45 C ox
2
2 1.2 80 10 8
2.438 mA 4.314 10 7 F/cm 2
(ii) Scaled device: 2 1016
V D VGS k 3 0.653 1.95 V fp 0.0259 ln 0.3653 V
10
1.5 10
0.15 0.15
k n 0.2308 mA/V 2
x dT
411.7 8.85 10 14 0.3653
1/ 2
k 0.65
L k 1.2 0.651.2 0.78 m
1.6 10 19 2 10 16
5
W k 6 0.656 3.90 m 2.174 10 cm
Then VT
1.6 10 19 2 1016 2.174 10 5
0.2308 3.9 4.314 10 7
I D max 1.95 0.45
2
1 20.2174 1
2 0.78 0.30
1.298 mA
0.70 0.30
(b) (i) Pmax I D max V D 2.4383 VT 0.0391 V
7.314 mW
VT VTO VT
(ii) Pmax 1.2981.95
0.35 VTO 0.0391
2.531 mW
_______________________________________ VTO 0.389 V
_______________________________________
11.18
ox 3.9 8.85 10 14 11.20
C ox
t ox
120 10 8 C ox
3.98.85 10 14
200 10 8
2.876 10 7 F/cm 2
1.726 10 7 F/cm 2
5 1016
fp 0.0259 ln 0.3890 V
10
3 1016
1.5 10 fp 0.0259 ln 0.3758 V
10
1.5 10
x dT
411.7 8.85 10 14 0.3890
1/ 2
411.7 8.85 10 14 0.3758
1/ 2
1.6 10 19 5 10 16
x dT
1.6 10 19 3 10 16
1.419 10 5 cm
1.80 10 5 cm
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
1.6 10 3 10 1.80 10
19 16 5 unit area) is
L L
1.726 10 7 QB L eN a x dT
2
1 20.18 1
0.30
or
L 0.30
L L
QB eN a x dT
0.30 2L
0.15 0.5006 0.4832
L We can write
L 0.484 m L L 1 L 1 1
L a b
_______________________________________ 2L 2 2L 2 2L
which is
11.21 L L ab
1
We have 2L 2L
L L a b
Now, Q B replaces QSD max in the
and from the geometry threshold equation. Then
(1) a r j x dT r j x dS max
2 2 2
Q B Q SD
and VT
C ox C ox
(2) b r j x dT r j x dD
2 2 2
eN a x dT a b eN a x dT
From (1) 1 2L C
C ox
a r j 2 r j x dS 2 x dT2 or
ox
so that eN a x dT a b
VT
a r j x dS
2
x 2
dT rj C ox 2L
which can be written as Then substituting, we obtain
2 2 eN x rj
2 x dS
x dS x dT VT a dT 1 2 1
a r j 1 1 C ox 2 L rj
r j r j
2x
or 1 dD 2 1
2 2 rj
2 x dS x dS x dT
a rj 1 1 Note that if x dS x dD x dT , then 0
rj rj rj
and the expression for VT reduces to that
Define given in the text.
x2 x2 _______________________________________
2 dS 2 dT
rj 11.22
We can then write We have L 0 , so Equation (11.27)
2x becomes
a r j 1 dS 2 1 L L L 1
rj
2L 2L 2
Similarly from (2), we will have
rj 2x
2x 1 1 dT 1
b r j 1 dD 2 1 L rj
rj
or
where
rj 2x 1
x2 x2 1 dT 1
2 dD 2 dT L rj 2
rj
Then Equation (11.28) is
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
1 eN a x dT x dT
Q B eN a x dT VT
2 C ox W
or VT 0.0257 V
1 2eN a x dT eN a x dT
VT _______________________________________
C ox C ox
which becomes 11.27
1 eN x
C ox
3.98.85 10 14
VT a dT
2 C ox 120 10 8
_______________________________________ 2.876 10 7 F/cm 2
1016
11.23 fp 0.0259 ln 0.3473 V
10
Plot 1.5 10
_______________________________________
411.7 8.85 10 14 0.3473
x dT
1/ 2
11.24
Plot
1.6 10 19 10 16
5
_______________________________________ 3.0 10 cm
eN a x dT x dT
11.25 VT
C ox W
eN a x dT
rj 2x
VT 1 dT 1 In this case, 1
C ox
L rj
So
N
e a kxdT 0.045
1.6 10 10 1.0310
19 16 5 2
k krj
1
2kxdT
1
2.876 10 W 7
C ox kL kr j W 1.11 m
k _______________________________________
or
VT kVT 11.28
Plot
_______________________________________ _______________________________________
11.26
3.98.85 10 14
11.29
C ox eN a x dT x dT
VT
80 10 8 C ox W
4.314 10 7 F/cm 2 Assume that is a constant, then
3 1016
fp 0.0259 ln 0.3758 V
10
N
e a kxdT
1.5 10 k kxdT
VT
x dT
411.7 8.85 10 0.3758
14
1/ 2
C ox
kW
1.6 10 19 3 10 16
k
5
1.80 10 cm or
VT kVT
_______________________________________
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
11.30 Now
(a) ID VCE
V
(i) ox G 10 8
0.0941 14.5
t ox 7
10 0.274 13.5
VG
6 10 6
10 6
0.454 12.3
200 10 8 5
10 0.634 10.7
VG 12 V
10 4 0.814 8.6
12
(ii) VG 4V 10 3
0.994 2.7
3
(b)
_______________________________________
VG
(i) 6 10 6
80 10 8 11.33
VG 4.8 V One Debye length is
kT e
1/ 2
4.8
(ii) VG 1.6 V LD s
3 eN a
_______________________________________
11.7 8.85 10 14 0.0259
1/ 2
11.31
1.6 10 19 10 16
(a) VG 83 24 ox t ox 6 10 6 t ox or
t ox 4 10 6 cm LD 4.09 10 6 cm
o Six Debye lengths is then
or t ox 40 nm 400 A
6L D 0.246 10 4 cm 0.246 m
(b) VG 123 36 ox t ox 6 10 6 t ox From Example 11.5, we have
t ox 6 10 cm 6
x dO 0.336 m, which is the zero-biased
o source-substrate junction width.
or t ox 60 nm 600 A At near punch-through, we will have
_______________________________________ x dO 6 L D x d L
where x d is the reverse-biased drain-
11.32
Snapback breakdown means M 1 , where substrate junction width. Now
0.336 0.246 x d 1.2
IO
0.18 log 10
9 or
3 10
x d 0.618 m
and
Then, at near punch-through we have
1
M m 2 V V DS
1/ 2
V x d s bi
1 CE eN a
V BO
or
Let V BO 15 V and m 3 . Now when
x d2 eN a
Vbi V DS
M 1 3
2 s
V
1 CE
0.618 10 1.6 10 10
4 2 19 16
211.78.85 10
15 14
we can write this as
3 which yields
V Vbi V DS 2.95 V
1 CE VCE 15 3 1
15
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
_______________________________________
1.6 10 19 3 10 16
or
11.34 x dO 0.354 10 4 cm 0.354 m
Vbi 0.0259 ln
10 3 10 19
0.902 V
16
We have 6 L D 0.142 m from the previous
1.5 1010
2
problem.
The zero-biased source-substrate junction Now
2 V V DS V SB
1/ 2
width is given by
1/ 2 x d s bi
2 V eN a
x dO s bi
eN a
211.7 8.85 10 14 0.902 5 2
1/ 2
211.7 8.85 10 14 0.902
1/ 2
1.6 10 19 3 10 16
1.6 10 19 3 10 16
or
or x d 0.584 10 4 cm 0.584 m
x dO 0.197 10 4 cm 0.197 m Then
The Debye length is L x dO 6 L D x d
kT e
1/ 2 0.354 0.142 0.584
LD s or
eN a L 1.08 m
11.7 8.85 10 14 0.0259 1/ 2
_______________________________________
1.6 10 19 3 10 16
11.36
or
6 C ox
3.98.85 10 14 2.876 10 7 F/cm 2
LD 2.36 10 cm
120 10 8
so that eD I
6L D 0.142 10 4 cm 0.142 m VT
C ox
Now Implant acceptor ions for a positive threshold
x dO 6 L D x d L voltage shift.
We have for V DS 5 V,
DI
VT C ox 0.80 2.876 10 7
2 V V DS 1.6 10 19
1/ 2
e
x d s bi 2
eN a 1.438 10 cm
12
_______________________________________
211.7 8.85 10 14 0.902 5
1/ 2
1.6 10 19 3 10 16
11.37
or C ox
3.98.85 10 14
x d 0.505 10 4 cm 0.505 m 180 10 8
Then 1.9175 10 7 F/cm 2
L 0.197 0.142 0.505 eD I
VT
or C ox
L 0.844 m Implant donor ions for a negative threshold
_______________________________________ voltage shift.
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
DI
VT C ox
0.601.9175 10 7 V FB ms
Q ss
19
e 1.6 10 C ox
7.19 10 cm 11 2
1.08
10 1.6 10
11 19
7
_______________________________________ 1.9175 10
0.9966 V
11.38
2 1016
(a) ms 1.08 V fn 0.0259 ln 0.3653 V
10
3.98.85 10 14
1.5 10
C ox
150 10 8
411.7 8.85 10 14 0.3653 1/ 2
x dT
2.30110 7 F/cm 2 1.6 10 19 2 10 16
Q 2.1744 10 cm 5
V FB ms ss
C ox max
QSD
1.08
5 10 1.6 10
10 19
1.6 10 19 2 1016 2.1744 10 5
7
2.30110 8
6.958 10 C/cm 2
1.115 V
max
Q SD
6 1015 V FB 2 fn
fp 0.0259 ln
VTO
0.3341 V
10 C ox
1.5 10
6.958 10 8
411.7 8.85 10 14 0.3341 1/ 2
0.9966 20.3653
1.9175 10 7
x dT
1.6 10 19 6 10 15 VTO 0.0969 V
3.797 10 5 cm (b) For a negative threshold voltage shift,
max
QSD add donor ions.
VT VT VTO 0.40 0.0969
1.6 10 19 6 1015 3.797 10 5 0.3031 V
8
3.645 10 C/cm 2
VT C ox
max
Q SD Then D I
VTO V FB 2 fp e
C ox
0.3031 1.9175 10 7
8
3.645 10 1.6 10 19
1.115 20.3341
2.30110 7 3.63 1011 cm 2
VTO 0.2884 V _______________________________________
(b) For a positive threshold voltage shift, add
acceptor ions. 11.40
VT VT VTO 0.50 0.2884 4 1015
(a) fp 0.0259 ln 0.3236 V
10
0.788 V 1.5 10
Then
3.9 8.85 10 14
DI
VT C ox 0.788 2.30110 7
C ox
80 10 8
e 1.6 10 19
2
4.314 10 7 F/cm 2
1.13 10 cm
12
_______________________________________ x dT
411.7 8.85 10 14 0.3236 1/ 2
1.6 10 19 4 10 15
11.39
4.576 10 5 cm
(a) ms 1.08 V
max
3.98.85 10 14
QSD
C ox
180 10 8
1.6 10 19 4 1015 4.576 10 5
8
1.9175 10 7 F/cm 2 2.929 10 C/cm 2
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
max
Q SD Then
VTO V FB 2 fp V SB (V) VT (V)
C ox
1 0.0443
2.929 10 8
1.25 20.3236 3 0.0987
4.314 10 7 5 0.1385
0.5349 V _______________________________________
(b) For a positive threshold voltage shift, add
acceptor ions. 11.42
VT VT VTO 0.40 0.5349 (a)
0.9349 V 1017
fn 0.0259 ln 0.407 V
VT C ox 10
1.5 10
Then D I
e and
0.9349 4.314 10 7
411.7 8.85 10 14 0.407 1/ 2
1.6 10 19 x dT
1.6 10 19 10 17
2.52 1012 cm 2 5
(c) Add acceptor ions. 1.026 10 cm
VT VT VTO 0.40 0.5349 n poly on n-type ms 0.32 V
0.1349 V We have
0.1349 4.314 10 7
max 1.6 10 19 1017 1.026 10 5
Q SD
Then D I
1.6 10 19 1.64 10 7 C/cm 2
3.64 1011 cm 2 Now
_______________________________________
VTP 1.64 10 7 1.6 10 19 5 1010
8
80 10
0.32 20.407
3.98.85 10 14
11.41
The total space charge width is greater than
xi , so from Chapter 10 or
VTP 1.53 V (Enhancement PMOS)
VT
2e s N a
C ox
2 fp V SB 2 fp (b) For VT 0 , shift threshold voltage in
positive direction, so implant acceptor ions.
Now eD I VT C ox
1014 VT DI
fp 0.0259 ln 0.228 V
10
C ox e
1.5 10 so
and 1.533.9 8.85 10 14
C ox
3.98.85 10 14 DI
80 10 8 1.6 10 19
500 10 8 or
6.90 10 8 F/cm 2 DI 4.13 1012 cm 2
Then _______________________________________
VT
21.6 10 11.78.85 10 10
19 14 14 1 / 2
6.90 10 8
20.228 VSB 20.228
or
VT 0.0834 0.456 VSB 0.456
Semiconductor Physics and Devices: Basic Principles, 4th edition Chapter 11
By D. A. Neamen Problem Solutions
______________________________________________________________________________________
11.43 11.45
The areal density of generated holes is We have the areal density of generated holes
8 1012 10 5 750 10 8 6 1012 cm 2 as
The equivalent surface charge trapped is g t ox
0.10 6 1012 6 1011 cm 2 where g is the generation rate and is the
Then radiation dose. The equivalent charge trapped
is
Q
VT ss xg t ox
C ox
where x is the fraction of generated holes
6 10 1.6 10 750 10
11 19 8
trapped.
3.98.85 10
14 Then
Q exg t ox exg
or
VT ss t 2
VT 2.09 V C ox ox t ox ox ox
_______________________________________ or
VT t ox
2
11.44
The areal density of generated holes is _______________________________________
61012 cm 2 . Now
C ox ox
3.9 8.85 10 14
t ox 750 10 8
4.6 10 8 F/cm 2
Then
VT
Qss
6 1012 x 1.6 10 19
C ox 4.6 10 8
where x is the fraction of holes that may be
trapped. For VT 0.50 V we find
x 0.024 x 2.4%
_______________________________________