Professional Documents
Culture Documents
TSMC
FAB14
張永政
Jonathan_chang@tsmc.com
ADSL
Powerful
Computing
Power
e-Manufacturing 2
哪裡有IC的存在
New IT
e-Manufacturing 3
IC 製造的演進
真空管 (1895-1947)
電晶體 (William Shockley, John
Bardeen, Walter Brattain –
1947-1958 - Ge)
IC (Jack Kilby –1958 - Silison)
e-Manufacturing 4
What is IC
S (Source) D (Drain)
Si
e-Manufacturing 5
Moore Law (1965)
The observation made in 1965 by Gordon Moore, co-
founder of Intel, that the number of transistors per
square inch on integrated circuits had doubled every year
since the integrated circuit was invented. Moore
predicted that this trend would continue for the
foreseeable future. In subsequent years, the pace slowed
down a bit, but data density has doubled approximately
every 18 months (1975), and this is the current definition
of Moore's Law, which Moore himself has blessed.
e-Manufacturing 6
What is IC size
100 um
e-Manufacturing 7
IC gate size
1 um = 10-6 m
1 nm = 10-3 um
頭髮直徑 = 50-100 um
Current minimum gate width = 14 nm
Minimum gate size = 2.35 * 10–10 m
e-Manufacturing 8
Foundry Growth Forecast
40% 45
35% 40
30%
30
25%
25
20%
2002-2010 CAGR 20
15% WW IC = 10%
15
Foundry = 20%
10% 10
5% 5
0% 0
1993 1995 1997 1999 2001 2003 2005 2007 2009
e-Manufacturing 9
Sales Trend
5,000
4,000
1H 03
$2.57 B
3,000 11.2% YoY
2,000
1,000
0
'92 '93 '94 '95 '96 '97 '98 '99 '00 '01 '02 ‘
03
e-Manufacturing 10
TSMC Market Share Growth
Worldwide Dedicated Foundry Industry by Revenue
e-Manufacturing 11
Sales Breakdown by Technology
100% 1 1
5 8 11 17
0.13u-
30 29 20
24 21
75% 0.15u
21
23
22 22 21 21 0.18u
50% 24
0.25u
23 27
25 25 24
25%
20 0.35u
14 13 11 12
13 9 0.50u+
9 11 12 11 11 9
0%
1Q02 2Q02 3Q02 4Q02 1Q03 2Q03
Sales
35.8 44.2 39.8 41.2 39.3 49.9
(NT$Bn)
e-Manufacturing 12
TSMC Provides Broad Leading-edge
Technologies
Logic Processes to 90-nm
Mixed Signal Processes to 90-nm
SiGe BiCMOS Processes to 0.18-micron
Embedded High Density Memory to 90-nm
Embedded Non-Volatile Memory to 0.18-
micron
Image Sensor Technology to 0.18-micron
High Voltage Processes to 0.25-micron
Copper and Low-k Dielectric Processes
e-Manufacturing 13
The R&D Investment Leader
US $ M
350 R&D
300
%
250 ~ 32
G R
CA
200
150
100
50
0
1992 1993 1994 1995 1996 1997 1998 1999 2000 2001 2002
R&D expense between 1992 and 1997 have not been restated under the current definition
e-Manufacturing 14
Roadmap Leads ITRS
250
Technology Generation(nm)
99 ITRS (International Technology Roadmap
for Semiconductors)
180
130
00 ITRS
TSMC
01 ITRS
100
90
65
97 99 01 03 05 07 09
Year
e-Manufacturing 15
How much semiconductor revenue
e-Manufacturing 16
What is IC industry
e-Manufacturing 17
TSMC changes game rule
IDM Fabless Foundry Assembly
Design House service Service
Design Design
Manufacturing TSMC
Assembly Assembly
Test Test
Sales Sales
e-Manufacturing 18
台積公司客戶
無晶圓廠之 自有晶圓廠之
專業設計公司 整合元件製造商 系統公司
e-Manufacturing 19
What is Foundry Service Industry
e-Manufacturing 20
Global FABless Industry
Framework is necessary
e-Manufacturing 21
Global FABless Industry
e-Manufacturing 22
IC industry
IDM
Design House
Foundry
Assembly
Test
System Integration
e-Manufacturing 23
IC fabrication
Mask
Litho
Etch
Diff
CMP
TFE
e-Manufacturing 24
C013 Cu process
introduction
Metal-2
W W W W
IMD-1
Metal-1
W ILD W
W W
Poly
Poly
P SD P SD P SD NSD NSD NSD
Trench oxide
VTP
NAPT
PAPT
Nwell Pwell
國立臺南大學 數位學習科技系
P Substrate 黃國禎 25
晶圓的尺寸 所代表的意義
1 um = 0.000001 m = 1000 nm
微米 柰米
0.13 um = 130 nm
100 um = 頭髮的寬度
(1) 相同圖形 距離 vs 電阻
S 時間 vs 速度
(2) 相同尺寸(面積), Die數
0.25um 0.13um 儲存容量
單位面積電容
e-Manufacturing 27
IC process 基本製程
流程 說明 圖釋
薄膜 薄膜(Thin_film) Wafer
1.化學氣相沉積(CVD) FILM
2.金屬濺鍍(PVD) Wafer
3.擴散(Diffusion)
FILM
黃光 黃光(PHOTO) Wafer
1.光罩(MASK)
2.光阻(Coater)
3.曝光(Exposure) 光罩
4.顯影(Development) 光阻 光阻
FILM FILM
Wafer Wafer
蝕刻(ETCH)
植入 蝕刻 1.濕蝕刻(Wet-ETCH)
2.乾蝕刻(DRY-ETCH)
光阻去除(PR remove)
將光阻去除後就是我們所需的
光阻去除 圖形(PATTERN)
e-Manufacturing 28
What is IC
e-Manufacturing 29
IC 的製程就如同人類建造高樓一樣 , 一層一層慢慢的搭建起來,首先在晶
堆壘在晶片上為止 , 通常一般的
蓋高樓 W
W W
Poly
NSD NSD NSD
Trench oxide
NAPT
打地基
Pwell
e-Manufacturing 30
Dual Damascene Process
C013 Copper process
MECU1_DP ECP
MEOX5_PH
VACU1_PH
MEOX5_PH1 PR Coating
TRCH
MEOX5_ET2
MEOX5_ET1 LRM
VACU1_ET
MECU1CMPTRCH
MEOX5_DP PE-SION
MEOX5_ET SEED
MECU1SPU PEB MEOX4_DP PE-FSG
MEOX3_DP PE-SN
MEOX2_DP PE-FSG
MEOX1_DP PE-SN
e-Manufacturing 31
C013 Cu-FSG AlCu 12KA
PESiN 6KA 4KA
PEOX 4KA
SiN 750A
SiN 500A
STI
e-Manufacturing 32
C013 FSG-Cu 8M Stacked Via
e-Manufacturing 33
IT system in IC fabrication
EEC
Internet
EC
Inter-Company
e-Manufacturing
Intra-Company
SC
Manufacturing Equipment
Execution System Engineering System
(MES) (EES)
e-Manufacturing 34
產業活動
策略規劃
行 銷 行
政
品
工程與研發 生產規劃 支
援
質
與
廠區控制
管
工
理
(生產)工廠自動化
程
配 送
維修與服務
e-Manufacturing
產業電子化活動
供應商之 顧客之
供應商
供應商 主企業 顧客 顧客
營業 營業 營業
採購 生產 配銷 採購 生產 配銷 採購 生產 配銷
e-Manufacturing
電子化應用系統 (I)
供應商之 顧客之
供應商
供應商 主企業 顧客 顧客
e-Manufacturing
電子化應用系統 (II)
Knowledge Management
Quick
Quick
Response
Enterprise Resource Planning Response
(QR) Supply Chain Management (SCM)
(ERP) (QR)
e-Commerce
e-Commerce
(EC)
(EC)
Enterprise Information Management (PIM)
Procurement Component &
Customer Execution Product Data 。 Enterprise
Supplier Customer
Relation Document
System Management Management Relation
Management Management
(PES) (PDM) (CSM) Management
(CRM) (EDM)
(CRM)
Engineering Manufacturing
e-Manufacturing
電子化應用系統 (III)
基礎發展環境
企業智財BIC / 知識管理KM
供應面 需求面
電子商務平台/網站應用程式伺服軟體/應用程式伺服軟體
EC Platform / WEB Application Server/ Application Server
e-Manufacturing 39