Professional Documents
Culture Documents
Introduction to VLSI
Chapter 3
The Metal Layers
Bond Pad
Design and Layout
Parasitics
DRC
Cross Talk, Ground Bounce
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
Bond Pad
Introduction to VLSI
DESCRIPTION
NECESSARY
MORE DETAILS LATER
BOND PAD
ETEST PAD
LOCATION
BOND PAD
ETEST PAD
MICRO PAD
MICRO PAD
PASSIVATION
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
Introduction to VLSI
DESCRIPTION
CONNECTIVITY
RULES
CONNECTIVITY
METAL1
METAL2
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
Parasitics
DESCRIPTION
VIA RESISTANCE
CAPACITANCE
RESISTANCE
Introduction to VLSI
DISTRIBUTIONS
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor
ELECTOMIGRATION, DRC
DESCRIPTION
ELECTROMIGRATION
0.6um
0.7um
0.225um
0.35um
0.8um
0.6um
Introduction to VLSI
DRC RULES
LIMITS Imax
DUE TO BAMBOO FORMATION
SEPARATION, FAILURE
TERMINOLOGY
ENCLOSURE
SPACING
WIDTH
OVERLAP
1.0um
Introduction to VLSI
DESCRIPTION
CONDUCTORS INTERACT
CROSS TALK
AC, DC SIGNALS
V=IR
AC SIGNALS
Imutual=Cmutual dVsignal/dt
GROUND BOUNCE
DECOUPLING CAP
Joseph A. Elias, Ph.D. Adjunct Professor, University of Kentucky; Modeling Principal, Cypress Semiconductor