Professional Documents
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Engineering College
ASSIGNMENT OF MMM
Metrology
Metrology is divided into three basic overlapping activities.[6][7] The first being
the definition of units of measurement, second the realisation of these units of
measurement in practice, and last traceability, which is linking measurements
made in practice to the reference standards. These overlapping activities are
used in varying degrees by the three basic sub-fields of Metrology. The sub-
fields are scientific or fundamental metrology, which is concerned with the
establishment of units of measurement, Applied, technical or industrial
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Fields of Metrology
Metrology is defined by the International Bureau of Weights and
Measures (BIPM) as "the science of measurement, embracing both
experimental and theoretical determinations at any level of
uncertainty in any field of science and technology". It establishes a
common understanding of units, crucial to human activity.Metrology
is a wide reaching field, but can be summarized through three basic
activities: the definition of internationally accepted units of
measurement, the realisation of these units of measurement in
practice, and the application of chains of traceability (linking
measurements to reference standards). These concepts apply in
different degrees to metrology's three main fields: scientific
metrology; applied, technical or industrial metrology, and legal
metrology.
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Scientific metrology
Legal metrology
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Legal metrology "concerns activities which result from statutory requirements and concern
measurement, units of measurement, measuring instruments and methods of measurement
and which are performed by competent bodies". [21] Such statutory requirements may arise
from the need for protection of health, public safety, the environment, enabling taxation,
protection of consumers and fair trade. The International Organization for Legal Metrology
(OIML) was established to assist in harmonising regulations across national boundaries to
ensure that legal requirements do not inhibit trade. [22] This harmonisation ensures that
certification of measuring devices in one country is compatible with another countries
certification process, allowing the trade of the measuring devices and the products that rely
on them. WELMEC was established in 1990 to promote cooperation in the field of legal
metrology in the European Union and among European Free Trade Association (EFTA)
member states.[23] In the United States legal metrology is under the authority of the Office
of Weights and Measures of National Institute of Standards and
Technology(NIST), enforced by the individual states.
ADVANCES IN
METROLOGY
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Abstract:
Precision mechatronics are essential for the future manufacturing of nano devices
and systems. Without accurate means to pattern, assemble, image and measure
nano structures, we will be unable to meet the challenges of the next decade. In this
paper we discuss the current state-of-theart in metrology used for motion control
systems and make suggestions regarding possible future technologies that might
improve the situation. What is required is a method to reduce the errors in stage
position measurement which is currently interferometric on most production
machines. The limitations of this technology are discussed as well as an alternative of
using nano gratings to replace the interferometry.
Keywords: heterodyne, interferometry, lithography, nano grids, nanotechnology
INTRODUCTION
Due, in a large part, to the National Nanotechnology Initiative in the U.S., there are a
number of new and interesting results in nano scale science and engineering. We
should note, however, that the government’s primary interest in nanotechnology is
the creation of jobs and other economic benefits, not new scientific results. It is our
opinion that many of these results are unlikely to reach the factory floor unless there
are advances in metrology and instrumentation for nanomanufacturing. One of us
(Hocken) recently cochaired a study effort that has led to a major publication on the
needs and requirements for metrology and instrumentation in nanotechnology [1].
Of course, the nanotechnology era is really already upon us. Biological systems,
catalysts, carbon nano tubes, etc., have been in the nanometer domain for decades.
What has actually changed is our ability to engineer, image, and manipulate systems
on the nano scale. There are really two approaches that are rapidly converging. The
convergence is coming from the top and from the bottom simultaneously. As we
learn to manipulate these atomic structures the semiconductor and optoelectronic
and information technology-related industries are relentlessly shrinking devices. It is
expected that this push will terminate near the 10 nm level in several decades. At the
other end of the scale our ability to image, manipulate, and assemble individual
atoms, molecules, and nano particles is moving from the old scales of organic and
inorganic chemistry to scales in the 10- to 100-nm regime. There is really a large
number of new initiatives in industry, government, and academia around the world,
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and researchers are reporting many potentially useful devices and systems. For
example, see Likharev [2]. Those of us who have been involved in manufacturing
recognize that in order to successfully move these discoveries to the factory,
manufacturing and metrological infrastructure needs to be developed. We argue that
a metrology infrastructure underpins all industrial revolutions and that
nanotechnology is no exception [3]. For example, the industrial revolution, which
began in the 19th century and led to our modern mechanized society, required an
easy to use system of accurate, interchangeable dimensional measurements. This
primarily was provided by the gage block coupled with the micrometer and the
verniercaliper [4]. Similarly, microelectronics, which began in the 1950s and is based
around precision lithography, would not have been possible without a much more
accurate length scale. This new length scale was based on a polarizationencoded,
heterodyne laser interferometer system that allowed the transfer accuracy from
masks to substrates to approach today’s limits [5]. In several papers it has been
pointed out that nanotechnology will require us to go well beyond the limits of
current optical metrology. One of the earliest ones was by Teague [6] who pointed
out the dimensional metrology in the picometer range would be essential for
nanotechnology. This was also pointed out by Hocken [7]. Further, as will be
discussed more later, in a paper entitled, “State-of-the-art and Ultimate Physical
Limitations of Dimensional Metrology,” Kunzmann [8] addressed the issues of
dimensional metrology as they apply to manufacturing.
CURRENT METROLOGY
LIMITATIONS
Modern ultra-precision manufacturing machines, such as lithography and metrology
equipment, scanning electron microscopes, atomic force microscopes, nano imprint
machines, CMMs, etc., depend on laser interferometers for measuring and
controlling the relative motion of the stage supporting the sample or workpiece with
respect to the probe or the image (see Fig. 1). For nanotechnology to succeed, these
mechatronics tools will need significantly increased accuracy.
The best documented case is in the semiconductor manufacturing industry. Their
transistor gate structures are well under 50 nm today and are predicted to shrink to 7
nm by 2018 [9]. Also, many other types of nano devices, such as quantum dots, etc.,
have even more stringent tolerance than the CMOS devices of the semiconductor
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standards is related to the size of the periodicity which can be used for counting
purposes, namely, the wavelength of visible red light which is around 633 nm. For
realizing the high accuracy that will be required for the devices of the future, that is,
say 0.1 nm or smaller, this involves, in conventional interferometric configurations,
splitting a fringe into many thousand parts. Such interpolation is error prone and
often requires averaging, taking considerable time. What is really desired for the new
length scales is some well-defined scale whose basic periodicity is many times smaller
than that of visible light. Teague mentions two alternatives (see Ref. [6]), both of
which have been explored for some years. The first is the x-ray interferometer (or
diffractometer) originally proposed and demonstrated by Bonse and Hart [19]. Such
instruments use the silicon lattice to provide a grating spacing and have periodicities
near 0.2 nm. They have been used successfully in many experiments to determine
crystal lattice spacings in terms of the optical wavelength and also to put the x-ray
wavelength scale on the optical scale [20,21]. X-ray interferometers, however, are
still very short range, though they have been used successfully to provide the length
scale for scanning tunneling microscopes [22,23]. The second alternative suggested
by Teague was a frequencytracking Fabry-Pérot. Such instruments have been used
for years for measuring the stability of materials (for example, see Patterson [24]). In
recent years advances have been made at NIST in Fabry-Pérot interferometry. There
a Fabry-Pérot interferometer for displacements up to 50 mm was developed [25]. In
this instrument two adjacent modes of a Fabry-Pérot are used. The absolute optical
frequencies of these modes and their difference are used to determine
displacements as the cavity length is changed. This instrument, however, is also far
from being commercialized and works in a vacuum. This may not be a problem for
lithography in the extreme ultraviolet, where the working components of the
lithography machine are in vacuum. Such a machine has been built by ASML and was
described at a recent meeting of euspen [26]. It is difficult, however, for the authors
to envision large numbers of machines working in vacuum because of the many
problems such construction engenders.
GRATING DIMENSIONAL
METROLOGY
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Gratings of various sorts have long been rivals of laser interferometers for measurements of
displacement on many types of precision inspection and manufacturing instruments.
Although various manufacturers’ scales work on slightly different physical principles, they
have some features in common. Most grating-based measurement systems, also called
optical encoders, consist of three parts: one, a finepitched grating or grid; two, a read-out
sensor; and three, electronics. Such a system is schematicized in Fig. 4. The resolution of an
encoder is dependent on the pitch of the grating and the interpolation provided by the
sensor and electronics. While read-out electronics can easily achieve sub-nanometer
resolution, accuracy is naturally quite different. High-frequency jitter and line position, noisy
electronics, and just grating inaccuracy and distortion can degrade accuracy.
The main benefit of using gratings over lasers is that these systems can eliminate the effects
of the atmosphere and other errors due to diffraction and optical non-linearity. Imagine, if
you will, that gratings could be used on a modern lithography scanner, scanners that
typically have between six and 12 interferometers to provide metrology. Converting such a
tool to a grating-based encoder could eliminate the errors due to the atmosphere and laser
frequency stability. It would also have the additional benefit of allowing the removal of the
heavy stage mirrors. The encoder gratings would be stationary and attach to the “metrology
frame”
CONCLUSIONS
Taking nanotechnology to the factory floor will require that we advance the displacement measuring
capability of mechatronic systems considerably over what is currently commercially available. Major
efforts are being made to improve interferometry and, at the same time, other researchers are
attempting to improve measurements based upon grating scales. Considering the breadth of the
nanotechnology advances, we expect that applications will be found for systems where both types will
be used either concurrently or separately. In any event, the research in these areas is definitely
advancing the state-of-the-art in modern dimensional metrology.
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Advances in
Optical Metrology
Abstract
This article reviews selected topics representative of advancements in the optical
measurement of shape, texture, geometric dimensions, and position of objects, with
applicationsranging fromstage metrology to surface texture analysis.The unifying
theme of this update is the confluence of two technology trends –
(1) rapidly advancing component technology, enabling high performance and new
techniques and
(2) expanding investment in advanced metrology for high value-added products from
consumer electronics to precision-engineered components.
Keywords:Fiber sensor; Optical encoder; Deflectometry; Focus sensing; Confocal;
OCT; Super resolution;Instantaneous interferometry.
Fiber Sensor for Ultraprecision Positioning Many fiber optic sensing systems use the
fiber itself as a transducerOPTICAL METROLOGY, the section titled “Optical Fiber
Sensors,” in FIBER OPTICS, and in the section titled “FiberInterferometers,”in
INTERFEROMETRY in The Optics Encyclopedia), but there are also benefits to
distribution and light collection systems that measure distances in free space. There
is a long history of measurements of distance or change of distance (displacement)
using fiber optics in partial or complete replacement of conventional bulk optics such
as lenses, prisms, and mirrors . Advantages include ease of setup and alignment, and,
frequently, the ability tomultiplex sensing technologies to multiple sensing areas.
Sensing methods vary from coherent interferometry to intensity-modulated laser
radar. High-accuracy, interferometric fiberbased distance sensors represent a new
generation of devices that combine compact size with installation
flexibility.Thesenew sensors enable high-precision (pm)stage motion and object
position overmacroscopic ranges (mm) with unprecedentedperformance
requirements.Advanced photolithography systems, forexample, require position
monitoringof projection optics and other criticalsubsystems with subnanometer drift
overseveral hours, zero heat dissipation inthe sensing elements, and
extraordinaryreliability over many years to preventsystem down time. Flexibility in
sensorlocation is essential, as is compact sensorsize and insensitivity to
electromagneticinterference.
One of the most demanding applications of optical metrology is for stage positioning
in photolithography systems. Historically, this application has been well served by
free-space, plane mirror displacement interferometers (see the section titled
“Multiaxis Laser Heterodyne Stage Metrology,” in ADVANCES OPTICAL METROLOGY
in The Optics Encyclopedia).The increasing demands of ever-shrinking features on
semiconductor wafers have exceeded the ability of these free-space systems to
accommodate the inevitable disturbances caused by air flow and environmental
sources of uncertainty (see the section titled “Environmental Compensation,” in
ADVANCES IN OPTICAL METROLOGY in The Optics Encyclopedia). Approaches to
overcome these issues using dispersion interferometry or other techniques have
been superseded by a transition to optical encoder technology, specifically, to
heterodyne interferometric methods that rely on an exceptionally precise 2D grating
structures integral to the moving parts of the lithography system.
Conclusion
In these selected examples of advances inoptical metrology, we see the two trendsidentified in the
introduction: improvementin enabling technologies and theincreased demand for high precision.
For fiber-based displacement sensors and encoders, the major advance has been in the demand for
precision, largely driven by the photolithography industry. In the case of encoders, the technology
became an essential solution to the contribution of air turbulence to stage positioning uncertainty,
which was previously, but is no longer, tolerable, given the requirements of modern semiconductor
manufacturing.
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Dynamometer
Defination
A Dynamometer is a device used to measure the
torque being exerted along a rotating shaft so as
to determine the shaft power input or output of
power generating,transmitting and absorbing
machinery.
In addition to being used to determine the torque or power characteristics of a machine
under test, dynamometers are employed in a number of other roles. In standard emissions
testing cycles such as those defined by the United States Environmental Protection
Agency, dynamometers are used to provide simulated road loading of either the engine
(using an engine dynamometer) or full powertrain (using a chassis dynamometer). In fact,
beyond simple power and torque measurements, dynamometers can be used as part of a
testbed for a variety of engine development activities, such as the calibration of engine
management controllers, detailed investigations into combustion behavior, and tribology.
In the medical terminology, hand-held dynamometers are used for routine screening of grip
and hand strength, and the initial and ongoing evaluation of patients with hand trauma or
dysfunction. They are also used to measure grip strength in patients where compromise of
the cervical nerve roots or peripheral nerves is suspected.
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In the rehabilitation, kinesiology, and ergonomics realms, force dynamometers are used for
measuring the back, grip, arm, and/or leg strength of athletes, patients, and workers to
evaluate physical status, performance, and task demands. Typically the force applied to a
lever or through a cable is measured and then converted to a moment of force by
multiplying by the perpendicular distance from the force to the axis of the level.
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Types of dynamometers
In addition to classification as absorption, motoring, or universal, as described above, dynamometers can
also be classified in other ways.
A dyno that is coupled directly to an engine is known as an engine dyno.
A dyno that can measure torque and power delivered by the power train of a vehicle directly from the
drive wheel or wheels (without removing the engine from the frame of the vehicle), is known as a chassis
dyno.
Dynamometers can also be classified by the type of absorption unit or absorber/driver that they use.
Some units that are capable of absorption only can be combined with a motor to construct an
absorber/driver or "universal" dynamometer.
Powder dynamometer
A powder dynamometer is similar to an eddy current dynamometer, but a fine magnetic powder is placed
in the air gap between the rotor and the coil. The resulting flux lines create "chains" of metal particulate
that are constantly built and broken apart during rotation, creating great torque. Powder dynamometers
are typically limited to lower RPM due to heat dissipation problems.
Hysteresis dynamometers
Hysteresis dynamometers use a magnetic rotor, sometimes of AlNiCo alloy, that is moved through flux
lines generated between magnetic pole pieces. The magnetisation of the rotor is thus cycled around its
B-H characteristic, dissipating energy proportional to the area between the lines of that graph as it does
so.
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Unlike eddy current brakes, which develop no torque at standstill, the hysteresis brake develops largely
constant torque, proportional to its magnetising current (or magnet strength in the case of permanent
magnet units) over its entire speed range[2]. Units often incorporate ventilation slots, though some have
provision for forced air cooling from an external supply.
Hysteresis and Eddy Current dynamometers are two of the most useful technologies in small (200 hp
(150 kW) and less) dynamometers.
Hydraulic brake
The hydraulic brake system consists of a hydraulic pump (usually a gear-type pump), a fluid reservoir,
and piping between the two parts. Inserted in the piping is an adjustable valve, and between the pump
and the valve is a gauge or other means of measuring hydraulic pressure. In simplest terms, the engine
is brought up to the desired RPM and the valve is incrementally closed. As the pumps outlet is restricted,
the load increases and the throttle is simply opened until at the desired throttle opening. Unlike most
other systems, power is calculated by factoring flow volume (calculated from pump design
specifications), hydraulic pressure, and RPM. Brake HP, whether figured with pressure, volume, and
RPM, or with a different load cell-type brake dyno, should produce essentially identical power figures.
Hydraulic dynos are renowned for having the quickest load change ability, just slightly surpassing eddy
current absorbers. The downside is that they require large quantities of hot oil under high pressure and
an oil reservoir.
Construction:
A long lever is attached to the upper block which carries weight on its outer end. This
weight placed on the lever balances the brake when unloaded. When the brake is to be
applied, the suitable weight is loaded on the outer end of the lever and nuts are tightened till
shaft of the engine runs at a constant speed. The movement because of the weight loaded
on the outer end of lever balances the movement of frictional resistance between the pulley
and wooden block. The power absorbed during friction is converted into heat which is why
this dynamometer needs to be cooled down often.
Brake power (bp) = 2π NT, where T = Weight applied (W) × distance (l)
Working:
When the brake is to be operated,the long end of lever is
loaded with suitable weights W and nuts are tightened until
the engine shaft runs at the constant speed and the lever is in
horizontal position. Under these conditions, the moment due
to the weight W must balance the moment of frictional
resistance between the blocks and the pulley.
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Working:
for the operation of the brake ,the engine is made to run at a
constant speed. The frictional torque, due to rope,must be equal
to the torque being transmitted by the engine.
Let, W= weight at the end of the rope,N,
S= Spring balance reading,N,
N= engine speed,r.p.m
D= Diameter of the brake wheel,m,
d= diameter of the rope,m,
(D+d)= effective diameter of the brake wheel.
Then, work/revolution= torque × angle turned per
revolution
=(W-S)×(D+d/2)×2π
Work done/min.=(W-S)π(D-d)N
Work done/sec.=(W-S)π(D+d)N/60
B.P=(W-S)π(D+d)N/60×1000kW
=(W-S)πDN/60×1000kW
=(T×2πN/60×1000kW)
Since the energy produced by the engine is absorbed by the
frictional resistance of the brake and is converted into
heat,therefore,it is necessary to keep the brake wheel cool with
soapy water.
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Hydraulic dynamometer:
It works on the principle of dissipating heat in the fluid friction
rather than dry friction. Its construction is similar to that of the
fluid wheel and it consists of an impeller coupled to the
output shaft of the engine. The impeller rotates inside a
casing filled with fluid. Due to the centrifugal force which
develops in the outer casing, it tends to rotate along with the
impeller but its rotation is restricted by the torque arm that
supports weight balance.
Load cell